TWI447869B - Chip stacked package structure and applications thereof - Google Patents

Chip stacked package structure and applications thereof Download PDF

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Publication number
TWI447869B
TWI447869B TW096117272A TW96117272A TWI447869B TW I447869 B TWI447869 B TW I447869B TW 096117272 A TW096117272 A TW 096117272A TW 96117272 A TW96117272 A TW 96117272A TW I447869 B TWI447869 B TW I447869B
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wafer
substrate
active surface
circuit layer
package structure
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TW096117272A
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Chinese (zh)
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TW200845334A (en
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Geng Shin Shen
Chun Ying Lin
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Chipmos Technology Inc
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Priority to TW096117272A priority Critical patent/TWI447869B/en
Priority to US11/872,205 priority patent/US7696629B2/en
Publication of TW200845334A publication Critical patent/TW200845334A/en
Priority to US12/713,333 priority patent/US20100155929A1/en
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Publication of TWI447869B publication Critical patent/TWI447869B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

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  • Wire Bonding (AREA)
  • Semiconductor Integrated Circuits (AREA)

Description

晶片堆疊封裝結構及其應用Wafer stack package structure and its application

本發明是有關於一種半導體封裝結構,且特別是有關於一種堆疊封裝結構。The present invention relates to a semiconductor package structure, and more particularly to a stacked package structure.

隨著電子產品功能與應用之需求的急遽增加,封裝技術亦朝著高密度微小化、單晶片封裝到多晶片封裝、二維尺度到三維尺度的方向發展。其中系統化封裝技術(System In Package)係一種可整合不同電路功能晶片的較佳方法,利用表面黏著(Surface Mount Technology;SMT)製程將不同的晶片堆疊整合於同一基板上,藉以有效縮減封裝面積。具有體積小、高頻、高速、生產週期短與低成本之優點。As the demand for electronic product functions and applications increases rapidly, packaging technology is also moving toward high-density miniaturization, single-chip packaging to multi-chip packaging, and from two-dimensional to three-dimensional. System In Package is a preferred method for integrating different circuit function chips. The surface mount technology (SMT) process is used to integrate different wafer stacks on the same substrate, thereby effectively reducing the package area. . It has the advantages of small size, high frequency, high speed, short production cycle and low cost.

請參照第5圖,第5圖係根據一習知的晶片堆疊封裝結構500所繪示的結構剖面圖。晶片堆疊封裝結構500包括基板510、第一晶片520、第二晶片530以及複數條打線540和550。其中第一晶片520固設於基材510之上,並藉由打線540與基材510電性連接。第二晶片530堆疊於第一晶片520之上,且藉由打線550與基板510電性連接。Please refer to FIG. 5, which is a cross-sectional view of a structure according to a conventional wafer stack package structure 500. The wafer stack package structure 500 includes a substrate 510, a first wafer 520, a second wafer 530, and a plurality of wires 540 and 550. The first wafer 520 is fixed on the substrate 510 and electrically connected to the substrate 510 by the wire 540. The second wafer 530 is stacked on the first wafer 520 and electrically connected to the substrate 510 by the bonding wires 550.

然而,由於疊設於上層的晶片,例如第二晶片530,必須遷就下層晶片(第一晶片520)的打線(打線540)配置,因此上層晶片(第二晶片530)尺寸必須小於下層晶片。因此也限制了晶片堆疊的數量與彈性。又因為上層晶片的尺寸較小,必須延長打550的配線長度並擴大其線弧,方能使其與基材510電性連接。當後續進行壓模製程時,該些被延長的打線容易受到沖移,而出現短路的現象,影響製程良率。However, since the wafer stacked on the upper layer, for example, the second wafer 530, must be placed in the wire bonding (wire bonding 540) configuration of the lower wafer (first wafer 520), the upper wafer (second wafer 530) must be smaller in size than the lower wafer. This also limits the number and flexibility of the wafer stack. Moreover, since the size of the upper layer wafer is small, it is necessary to lengthen the wiring length of the 550 and expand the line arc to electrically connect it to the substrate 510. When the subsequent molding process is performed, the extended wire is easily subjected to the displacement, and a short circuit occurs, which affects the process yield.

請參照第6圖,第6圖係根據另一種習知晶片堆疊封裝結構600所繪示的結構剖面圖。晶片堆疊封裝結構600包括基板610、第一晶片620、第二晶片630、複數條打線640和650以及位於第一晶片620和第二晶片630之間的虛擬晶片660。其中第一晶片620疊設於基板610上,並藉由打線640使第一銲墊670與基材610電性連接;虛擬晶片660疊設於第一晶片620之上;第二晶片則疊設於虛擬晶片660之上,並藉由打線650使第二銲墊680與基材610電性連接。藉由尺寸小於第一晶片620的虛擬晶片560的設置,不僅可在第一晶片620和第二晶片630之間,提供足夠的佈線空間與線弧高度,以容納打線640,而且不會限制上層晶片(第二晶片630)的堆疊尺寸。因此第二晶片630之尺寸實質等於第一晶片620之尺寸。Please refer to FIG. 6. FIG. 6 is a cross-sectional view of the structure according to another conventional wafer stack package structure 600. The wafer stack package structure 600 includes a substrate 610, a first wafer 620, a second wafer 630, a plurality of wires 640 and 650, and a dummy wafer 660 between the first wafer 620 and the second wafer 630. The first wafer 620 is stacked on the substrate 610, and the first pad 670 is electrically connected to the substrate 610 by wire bonding 640; the dummy wafer 660 is stacked on the first wafer 620; and the second wafer is stacked. The second pad 680 is electrically connected to the substrate 610 by the wire 650. By the arrangement of the dummy wafer 560 having a smaller size than the first wafer 620, not only a sufficient wiring space and a line arc height can be provided between the first wafer 620 and the second wafer 630 to accommodate the wire 640, and the upper layer is not limited. The stack size of the wafer (second wafer 630). Therefore, the size of the second wafer 630 is substantially equal to the size of the first wafer 620.

然而虛擬晶片的設置,不僅會增加晶片堆疊的厚度,且徒增製程成本,更限制了裝結構微小化與高密度的趨勢。However, the setting of the virtual wafer not only increases the thickness of the wafer stack, but also increases the manufacturing process cost, and further limits the trend of miniaturization and high density of the package structure.

因此有需要提供一種良率高、製程低廉且不會限制封裝密度的晶片堆疊封裝結構。Therefore, there is a need to provide a wafer stack package structure that has high yield, low process, and does not limit package density.

本發明的目的在提供一種晶片堆疊封裝結構,包括:基材、第一晶片、第二晶片、圖案化線路層以及導電元件。基材具有第一表面以及相對的第二表面。第一晶片位於基材之第一表面,並與基材電性連接。第二晶片位於第一晶片之上,第二晶片具有第二主動面,其中第二主動面配置有至少一個第二銲墊。圖案化線路層,形成於第二主動面之上,且與第二銲墊匹配,再經由導電元件與基材電性連接。It is an object of the present invention to provide a wafer stack package structure comprising: a substrate, a first wafer, a second wafer, a patterned wiring layer, and a conductive element. The substrate has a first surface and an opposite second surface. The first wafer is located on the first surface of the substrate and is electrically connected to the substrate. The second wafer is located above the first wafer, the second wafer has a second active surface, and wherein the second active surface is configured with at least one second bonding pad. The patterned circuit layer is formed on the second active surface and matched with the second bonding pad, and then electrically connected to the substrate via the conductive element.

本發明的另一目的在提供一種晶片堆疊封裝結構,包括:基材、第一晶片、第二晶片、第一圖案化線路層以及第一打線。其中基材具有第一表面與相對的第二表面。第一晶片具有對應於該第一表面的第一晶背以及相對於第一晶背的第一主動面。第二晶片位於第一晶片之上,具有應於該第一主動面的第二主動面對,其中第二主動面配置有至少一個第二銲墊。第一圖案化線路層位於第一主動面之上,且與第二銲墊匹配。並藉由第一打線電性連結第一圖案化線路層與基材。Another object of the present invention is to provide a wafer stack package structure comprising: a substrate, a first wafer, a second wafer, a first patterned wiring layer, and a first wiring. Wherein the substrate has a first surface and an opposite second surface. The first wafer has a first crystal back corresponding to the first surface and a first active surface opposite the first crystal back. The second wafer is located above the first wafer and has a second active surface facing the first active surface, wherein the second active surface is provided with at least one second bonding pad. The first patterned wiring layer is over the first active surface and mates with the second bonding pad. And electrically connecting the first patterned circuit layer and the substrate by the first wire.

本發明的一較佳實施例係在堆疊晶片結構的上層片的主動層上形成一個圖案化線路層。當上層晶片覆晶堆疊於下層晶片時,並藉由圖案化線路層的佈線,將上層晶片之銲墊的打線位置重新分配,使其對應至晶片的邊緣,再藉由一組導電元件使圖案化線路層與基材電性連接。In a preferred embodiment of the invention, a patterned wiring layer is formed on the active layer of the upper layer of the stacked wafer structure. When the upper wafer is flip-chip stacked on the lower wafer, and the wiring of the patterned wiring layer is used, the bonding positions of the pads of the upper wafer are redistributed to correspond to the edges of the wafer, and then the pattern is patterned by a set of conductive elements. The circuit layer is electrically connected to the substrate.

本發明的另一較佳實施例則係,下層晶片上提供一下層圖案化線路層與上層晶片的的銲墊匹配,藉以將上層晶片之銲墊的打線位置重新分配,再藉由打線使銲墊與基材電性連結。In another preferred embodiment of the present invention, the underlying wafer is provided with a pad patterned layer to match the pads of the upper wafer, thereby redistributing the bonding positions of the pads of the upper wafer, and then soldering by wire bonding. The pad is electrically connected to the substrate.

藉此,可解決習知技術中,電性連接上層晶片與基材之打線配線長度過長以及線弧過大的問題。Thereby, in the prior art, the problem that the length of the wire bonding wire of the upper layer wafer and the substrate is electrically connected and the wire arc is excessively large can be solved.

因此根據以上所述之實施例,藉由本發明所提供的技術優勢,可以解決習知晶片堆疊封裝結構良率封及封裝密度不高的問題。Therefore, according to the embodiments described above, by the technical advantages provided by the present invention, the problem that the conventional wafer stack package structure yield seal and the package density are not high can be solved.

為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,特提供數種晶片堆疊封裝結構作為較佳實施例來進一步說明。The above and other objects, features, advantages and embodiments of the present invention will become more apparent.

請參照第1圖,第1圖係根據本發明的第一較佳實施例所繪示之晶片堆疊封裝結構100的剖面示意圖。Please refer to FIG. 1 , which is a cross-sectional view of a wafer stack package structure 100 according to a first preferred embodiment of the present invention.

晶片堆疊封裝結構100包括:基材101第一晶片102、圖案化線路層105、第二晶片106、導電元件120、封膠樹脂122及多個外部連接端子111。The wafer stack package structure 100 includes a substrate 101, a first wafer 102, a patterned wiring layer 105, a second wafer 106, a conductive member 120, a sealant resin 122, and a plurality of external connection terminals 111.

基材101具有第一表面118以及相對於第一表面118的第二表面119。在本發明的較佳實施例之中,基材101係由導線架(Lead Frame)、印刷電路板(Printing Circuit Board)或晶粒承載器(Carrier)所構成。而在本實施例之中,基材101係一印刷電路板,其材質例如是BT或者是FR4電路板或者是其他軟性電路板,且基材101具有一個貫穿開口(Slot)111。The substrate 101 has a first surface 118 and a second surface 119 relative to the first surface 118. In a preferred embodiment of the invention, substrate 101 is comprised of a lead frame, a printed circuit board, or a die carrier. In the present embodiment, the substrate 101 is a printed circuit board, and the material thereof is, for example, a BT or FR4 circuit board or other flexible circuit board, and the substrate 101 has a through hole 111.

第一晶片102係藉由一黏著層(未繪示)疊設於基材101之第一表面118,且第一晶片102具有一個面對基材101的第一主動面107,以及一個與第一主動面107相對的第一晶背108。在本實施例之中,第一主動面107之一部分係黏著於基材101的第一表面118;而另一部分則暴露於該貫穿開口111,且設有複數個第一銲墊117。其中至少一第一銲墊117係藉由穿過貫穿開口111的一條打線113,與基材101電性連結。The first wafer 102 is stacked on the first surface 118 of the substrate 101 by an adhesive layer (not shown), and the first wafer 102 has a first active surface 107 facing the substrate 101, and a first An active surface 107 is opposite the first crystal back 108. In this embodiment, one portion of the first active surface 107 is adhered to the first surface 118 of the substrate 101; and the other portion is exposed to the through opening 111, and a plurality of first pads 117 are disposed. At least one of the first pads 117 is electrically connected to the substrate 101 by a wire 113 passing through the through opening 111.

導電元件120位於第一晶片102的第一晶背108上。在本實施例之中,導電元件120包括形成於第一晶背108上的圖案化線路層103、至少一條打線,例如打線104,以及至少一個導電凸塊,例如導電凸塊116。其中圖案化線路層103係一重佈線路層(Redistribution-Layer,RDL),且圖案化線路層103包括複數條導線,至少一條導線之一端往第一晶片102之第一晶背108的邊緣延伸,並藉由打線104與基材101電性連結;另一端則與導電凸塊116電性連結。Conductive element 120 is located on first crystal back 108 of first wafer 102. In the present embodiment, the conductive element 120 includes a patterned wiring layer 103 formed on the first crystal back 108, at least one wire, such as a wire 104, and at least one conductive bump, such as a conductive bump 116. The patterned circuit layer 103 is a redistribution layer (RDL), and the patterned circuit layer 103 includes a plurality of wires, one end of which extends toward an edge of the first crystal back 108 of the first wafer 102. And electrically connected to the substrate 101 by the wire 104; the other end is electrically connected to the conductive bump 116.

第二晶片106位於第一晶片102上方,且第二晶片106面對第一晶片102之第二主動面109配置有至少一個第二銲墊,例如第二銲墊110,以及一個與第二銲墊110相互匹配的圖案化線路層105。其中圖案化線路層105包括複數條導線,至少一條導線之一端與第二銲墊110之一者電性連結,另一端則與導電凸塊116之一者相互匹配。當第二晶片106以覆晶方式疊設於第一晶片102上時,至少一個第二銲墊110即可藉由圖案化線路層105、導電凸塊116、圖案化線路層103以及打線104與基材電性連結。The second wafer 106 is located above the first wafer 102, and the second active surface 109 of the second wafer 106 facing the first wafer 102 is configured with at least one second bonding pad, such as a second bonding pad 110, and a second bonding The pads 110 are patterned to match each other. The patterned circuit layer 105 includes a plurality of wires, one end of the at least one wire is electrically connected to one of the second pads 110, and the other end is matched with one of the conductive bumps 116. When the second wafer 106 is stacked on the first wafer 102 in a flip chip manner, the at least one second pad 110 can be patterned by the patterned wiring layer 105, the conductive bumps 116, the patterned wiring layer 103, and the bonding wires 104. The substrate is electrically connected.

封膠樹脂120則係填充於基材101、第一晶片102及第二晶片106之間,最後再於基材的第二表面119形成複數個外部連接端子111。這些外部端子111較佳可以是,例如是錫球。藉由這些外部連接端子111,可以將晶片堆疊封裝結構100電性連接至其他外部電路。The sealant resin 120 is filled between the substrate 101, the first wafer 102, and the second wafer 106, and finally a plurality of external connection terminals 111 are formed on the second surface 119 of the substrate. These external terminals 111 may preferably be, for example, solder balls. The wafer stack package structure 100 can be electrically connected to other external circuits by these external connection terminals 111.

在本發明的一些實施例中,圖案化線路層105可以配合不同晶片的銲墊配置改變配線圖案,再配合導電元件120的圖案化線路層103、打線104以及導電凸塊116的佈線變化,可大幅增加堆疊封裝結構中線路配置的靈活性。因此當具有與第一晶片102相同尺寸的第二晶片106與第一晶片102相互堆疊時,圖案化線路層105和導電元件120可以將原來靠近第二晶片106中心的第二銲墊110,或者是將其他位置的第二銲墊110重新佈線,使第二銲墊110可以對應至第二晶片106的其他位置,例如對應至第二晶片106的邊緣,並使第二銲墊110與基材101電性連結,而不會產生佈線過長或線弧過大的問題。In some embodiments of the present invention, the patterned wiring layer 105 can change the wiring pattern in accordance with the pad configuration of different wafers, and then match the wiring pattern of the patterned wiring layer 103, the wiring 104, and the conductive bump 116 of the conductive element 120. Significantly increase the flexibility of line configuration in a stacked package structure. Therefore, when the second wafer 106 having the same size as the first wafer 102 and the first wafer 102 are stacked on each other, the patterned wiring layer 105 and the conductive member 120 may bring the second pad 110 originally close to the center of the second wafer 106, or The second pad 110 at other locations is rerouted so that the second pad 110 can correspond to other locations of the second wafer 106, for example to the edge of the second wafer 106, and the second pad 110 and the substrate are 101 electrical connection, without the problem of excessive wiring or excessive arcing.

在本發明的另外一些實施例中,第二晶片106的第二銲墊110經過圖案化線路層105和導電元件120的重新佈線後,第一晶片101和第二晶片106可以配合多種不同線路設計的基材,以使晶片的堆疊適應各種封裝結構之設計。In still other embodiments of the present invention, after the second pad 110 of the second wafer 106 is rerouted through the patterned wiring layer 105 and the conductive element 120, the first wafer 101 and the second wafer 106 may be designed with various different lines. The substrate is such that the stack of wafers is adapted to the design of the various package structures.

請參照第2圖,第2圖係根據本發明的第二較佳實施例所繪示之晶片堆疊封裝結構200的剖面示意圖。Please refer to FIG. 2, which is a cross-sectional view of a wafer stack package structure 200 according to a second preferred embodiment of the present invention.

晶片堆疊封裝結構200包括:基材201第一晶片202、第二圖案化線路層205、第二晶片206、導電元件220以及封膠樹脂222及多個外部連接端子211。The wafer stack package structure 200 includes a substrate 201, a first wafer 202, a second patterned wiring layer 205, a second wafer 206, a conductive member 220, and a sealant resin 222, and a plurality of external connection terminals 211.

基材201具有第一表面218以及相對於第一表面218的第二表面219。在本發明的較佳實施例之中,基材201係由導線架、印刷電路板或晶粒承載器所構成,其材質例如是BT或者是FR4電路板或者是其他軟性電路板。The substrate 201 has a first surface 218 and a second surface 219 opposite the first surface 218. In a preferred embodiment of the invention, the substrate 201 is constructed of a lead frame, a printed circuit board, or a die carrier, such as a BT or FR4 circuit board or other flexible circuit board.

第一晶片202係藉由一黏著層(未繪示)疊設於基材201之第一表面218,且該第一晶片202具有一個背對基材201的第一主動面208,以及一個與第一主動面208相對的第一晶背207。在本實施例之中,第一主動面208具有至少一個第一銲墊217,而第一銲墊217係藉由一條第二打線212與基材201電性連結。The first wafer 202 is stacked on the first surface 218 of the substrate 201 by an adhesive layer (not shown), and the first wafer 202 has a first active surface 208 opposite to the substrate 201, and a The first active surface 208 is opposite to the first crystal back 207. In the embodiment, the first active surface 208 has at least one first bonding pad 217, and the first bonding pad 217 is electrically connected to the substrate 201 by a second bonding wire 212.

導電元件220位於第一晶片202的第一主動面208上。在本實施例之中,導電元件220包括形成於第一主動面208上的第一圖案化線路層203、至少一條打線,例如第一打線204,以及至少一個導電凸塊,例如導電凸塊216。其中第一圖案化線路層203係一重佈線路層,且第一圖案化線路層203包括複數條導線,例如第一導線203a和第二導線203b。Conductive element 220 is located on first active surface 208 of first wafer 202. In the present embodiment, the conductive element 220 includes a first patterned circuit layer 203 formed on the first active surface 208, at least one wire, such as a first wire 204, and at least one conductive bump, such as a conductive bump 216. . The first patterned circuit layer 203 is a redistributed circuit layer, and the first patterned circuit layer 203 includes a plurality of wires, such as a first wire 203a and a second wire 203b.

其中至少一條第一導線203a之一端往第一晶片202之第一主動面208的邊緣延伸,並藉由第一打線204,使第一導線203a與基材201電性連結;第一導線203a另一端則與導電凸塊216電性連結。而至少一條第二導線203b之一端與位於第一主動面208上的第一銲墊217電性連結;第二導線203b的另外一端則往第一晶片202其他位置延伸,例如往第一晶片202之第一主動面208的邊緣延伸,。再藉由第二打線212,使第一晶片202可與基材201電性連結。One end of the at least one first wire 203a extends toward the edge of the first active surface 208 of the first wafer 202, and the first wire 203a is electrically connected to the substrate 201 by the first wire 204; the first wire 203a is further One end is electrically connected to the conductive bump 216. The one end of the at least one second wire 203b is electrically connected to the first pad 217 on the first active surface 208; the other end of the second wire 203b extends to other positions of the first chip 202, for example, to the first wafer 202. The edge of the first active surface 208 extends. The first wafer 202 can be electrically connected to the substrate 201 by the second bonding line 212.

第二晶片206位於第一晶片202上方,且第二晶片206面對第一晶片202之第二主動面209,配置有至少一個第二銲墊,例如第二銲墊210,以及一個與第二銲墊210相互匹配的第二圖案化線路層205。The second wafer 206 is located above the first wafer 202, and the second wafer 206 faces the second active surface 209 of the first wafer 202, and is configured with at least one second bonding pad, such as the second bonding pad 210, and one and the second The second patterned circuit layer 205 is matched to the pads 210.

其中第二圖案化線路層205包括複數條導線,例如第三導線205a和第四導線205b。其中至少有一條導線,例如第三205a,之一端與第二銲墊210之一者電性連結,第三導線205a之另一端則與導電凸塊216之一者相互匹配。當第二晶片206以覆晶方式疊設於第一晶片202上時,至少一個第二銲墊210即可藉由第二圖案化線路層205的第三導線205a、導電凸塊216、第一圖案化線路層203的第一導線203a以及第一打線204與基材201電性連結。The second patterned circuit layer 205 includes a plurality of wires, such as a third wire 205a and a fourth wire 205b. At least one of the wires, for example, the third 205a, one end is electrically connected to one of the second pads 210, and the other end of the third wire 205a is matched with one of the conductive bumps 216. When the second wafer 206 is stacked on the first wafer 202 in a flip chip manner, the at least one second pad 210 may be the third wire 205a of the second patterned circuit layer 205, the conductive bumps 216, and the first The first wire 203a and the first wire 204 of the patterned circuit layer 203 are electrically connected to the substrate 201.

封膠樹脂220則係填充於基材201、第一晶片202及第二晶片206之間,最後再於基材201的第二表面219形成複數個外部連接端子211,這些外部端子較佳可以是,例如是錫球。藉由這些外部連接端子211,可以將晶片堆疊封裝結構200電性連接至其他外部電路。The sealing resin 220 is filled between the substrate 201, the first wafer 202 and the second wafer 206, and finally a plurality of external connection terminals 211 are formed on the second surface 219 of the substrate 201. The external terminals may preferably be For example, it is a solder ball. The wafer stack package structure 200 can be electrically connected to other external circuits by these external connection terminals 211.

在本發明的一些實施例中,第二圖案化線路層205可以配合不同晶片的銲墊配置改變配線圖案,再配合導電元件220的第一圖案化線路層203、第一打線204以及導電凸塊216的佈線變化,可大幅增加堆疊封裝結構中線路配置的靈活性。因此當具有與第一晶片202相同尺寸的第二晶片206與第一晶片202相互堆疊時,第二圖案化線路層205和導電元件220可以將原來靠近第二晶片106中心的第二銲墊210或者是其他位置的第二銲墊210重新佈線,再經由導電元件220使第二銲墊210可以對應至第二晶片206的邊緣,並使第二銲墊210與基材201電性連結,而不會產生佈線過長或線弧過大的問題。In some embodiments of the present invention, the second patterned circuit layer 205 can change the wiring pattern in accordance with the pad configuration of different wafers, and then match the first patterned circuit layer 203 of the conductive element 220, the first bonding line 204, and the conductive bumps. The wiring variation of 216 can greatly increase the flexibility of the line configuration in the stacked package structure. Therefore, when the second wafer 206 having the same size as the first wafer 202 and the first wafer 202 are stacked on each other, the second patterned wiring layer 205 and the conductive member 220 may be adjacent to the second pad 210 of the center of the second wafer 106. Or the second pad 210 in another position is re-routed, and the second pad 210 can be corresponding to the edge of the second wafer 206 via the conductive component 220, and the second pad 210 is electrically connected to the substrate 201. There is no problem that the wiring is too long or the line arc is too large.

在本發明的另外一些實施例中,第二晶片206的第二銲墊210經過第二圖案化線路層205和導電元件220的重新佈線後,第一晶片201和第二晶片206可以配合多種不同線路設計的基材,以使晶片的堆疊適應各種封裝結構之設計。In still other embodiments of the present invention, after the second pad 210 of the second wafer 206 is rewired through the second patterned wiring layer 205 and the conductive element 220, the first wafer 201 and the second wafer 206 may be matched with various types. The substrate of the circuit design is such that the stack of wafers is adapted to the design of various package structures.

請參照第3圖,第3圖係根據本發明的第三較佳實施例所繪示之晶片堆疊封裝結構300的剖面示意圖。Please refer to FIG. 3, which is a cross-sectional view of a wafer stack package structure 300 according to a third preferred embodiment of the present invention.

晶片堆疊封裝結構300包括:基材301第一晶片302、第二圖案化線路層305、第二晶片306、導電元件320、封膠樹脂322及多個外部連接端子311。The wafer stack package structure 300 includes a substrate 301, a first wafer 302, a second patterned circuit layer 305, a second wafer 306, a conductive element 320, a sealant resin 322, and a plurality of external connection terminals 311.

基材301具有第一表面321以及相對第一表面321的第二表面323。在本發明的較佳實施例之中,基材301係由導線架、印刷電路板或晶粒承載器所構成,其材質例如是BT或者是FR4電路板或者是其他軟性電路板。而在本實施例之中,基材301係一印刷電路板,且基材301具有一個貫穿開口311。The substrate 301 has a first surface 321 and a second surface 323 opposite the first surface 321 . In a preferred embodiment of the invention, the substrate 301 is constructed of a lead frame, a printed circuit board, or a die carrier, such as a BT or FR4 circuit board or other flexible circuit board. In the present embodiment, the substrate 301 is a printed circuit board, and the substrate 301 has a through opening 311.

第一晶片302係藉由一覆晶接合製程疊設於基材301之第一表面321,且此第一晶片302具有一個面對基材301的第一主動面307,以及一個與第一主動面307相對的第一晶背308。在本實施例之中,第一主動面307設有複數個第一銲墊317,並且藉由複數個凸塊318,將這些第一銲墊317與基材301電性連結。另外,更包括使用一底膠312將該些凸塊318包覆,並藉以將第一主動面307固定於基材301之第一表面321。The first wafer 302 is stacked on the first surface 321 of the substrate 301 by a flip chip bonding process, and the first wafer 302 has a first active surface 307 facing the substrate 301, and a first active The face 307 is opposite the first crystal back 308. In the embodiment, the first active surface 307 is provided with a plurality of first pads 317, and the first pads 317 are electrically connected to the substrate 301 by a plurality of bumps 318. In addition, the bumps 318 are covered by a primer 312, and the first active surface 307 is fixed to the first surface 321 of the substrate 301.

在本發明的較佳實施例之中,更包括一個散熱鰭片319形成在第一主動面307上,使其從第一主動面307經由貫穿開口311向外延伸,藉此增加晶片堆疊封裝結構300的散熱效果。In a preferred embodiment of the present invention, a heat dissipation fin 319 is further formed on the first active surface 307 to extend outward from the first active surface 307 via the through opening 311, thereby increasing the wafer stack package structure. 300 heat dissipation effect.

導電元件320位於第一晶片302的第一晶背308上。在本實施例之中,導電元件320包括形成於第一晶背308上的第一圖案化線路層303、至少一條打線,例如打線304,以及至少一個導電凸塊,例如導電凸塊316。其中第一圖案化線路層303係一重佈線路層,且第一圖案化線路層303包括複數條導線,至少一條導線之一端往第一晶片302之其他位置延伸,例如往第一晶片302的邊緣延伸,並藉由打線304與基材301電性連結;而此導線之另一端則與導電凸塊316電性連結。Conductive element 320 is located on first crystal back 308 of first wafer 302. In the present embodiment, the conductive element 320 includes a first patterned wiring layer 303 formed on the first crystal back 308, at least one wire, such as a wire 304, and at least one conductive bump, such as a conductive bump 316. The first patterned circuit layer 303 is a redistributed circuit layer, and the first patterned circuit layer 303 includes a plurality of wires, and one of the at least one wires extends to other locations of the first die 302, for example, to the edge of the first die 302. The extension is electrically connected to the substrate 301 by the wire 304; and the other end of the wire is electrically connected to the conductive bump 316.

第二晶片306位於第一晶片302上方,且第二晶片306面對第一晶片302之第二主動面309,配置有至少一個第二銲墊,例如第二銲墊310,以及一個與第二銲墊310相互匹配的第二圖案化線路層305。其中第二圖案化線路層305包括複數條導線,其中至少一條導線之一端與第二銲墊310之一者電性連結,另一端則與導電凸塊316之一者相互匹配。當第二晶片306以覆晶方式疊設於第一晶片302上時,至少一個第二銲墊310即可藉由第二圖案化線路層305、導電凸塊316、第一圖案化線路層303以及打線304與基材301電性連結。The second wafer 306 is located above the first wafer 302, and the second wafer 306 faces the second active surface 309 of the first wafer 302, and is configured with at least one second bonding pad, such as the second bonding pad 310, and one and the second The second patterned circuit layer 305 is matched to the pads 310. The second patterned circuit layer 305 includes a plurality of wires, wherein one end of the at least one wire is electrically connected to one of the second pads 310, and the other end is matched with one of the conductive bumps 316. When the second wafer 306 is stacked on the first wafer 302 in a flip chip manner, the at least one second pad 310 may be formed by the second patterned circuit layer 305, the conductive bumps 316, and the first patterned circuit layer 303. And the wire 304 is electrically connected to the substrate 301.

封膠樹脂322則係填充於基材301、第一晶片302及第二晶片306之間,最後再於基材的第二表面323形成複數個外部連接端子314,些外部端子較佳可以是,例如錫球。並藉由這些外部連接端子314,可以使晶片堆疊封裝結構300電性連接至其他外部電路。The sealing resin 322 is filled between the substrate 301, the first wafer 302 and the second wafer 306, and finally a plurality of external connection terminals 314 are formed on the second surface 323 of the substrate. The external terminals may preferably be For example, tin balls. And through these external connection terminals 314, the wafer stack package structure 300 can be electrically connected to other external circuits.

在本發明的一些實施例中,第二圖案化線路層305可以配合不同晶片的銲墊配置改變配線圖案,再配合導電元件320的第一圖案化線路層303、打線304以及導電凸塊316的佈線變化,可大幅增加堆疊封裝結構中線路配置的靈活性。因此當具有與第一晶片302相同尺寸的第二晶片306與第一晶片302相互堆疊時,第二圖案化線路層305和導電元件320可以將原來靠近第二晶片306中心的第二銲墊310或者是在第二晶306片其他位置的第二銲墊310重新佈線,使其對應至第二晶片306的邊緣,並使第二銲墊310與基材301電性連結,而不會產生佈線過長或線弧過大的問題。In some embodiments of the present invention, the second patterned circuit layer 305 can change the wiring pattern in accordance with the pad configuration of different wafers, and then match the first patterned circuit layer 303, the wire 304, and the conductive bump 316 of the conductive element 320. Wiring changes can greatly increase the flexibility of line configuration in a stacked package structure. Therefore, when the second wafer 306 having the same size as the first wafer 302 and the first wafer 302 are stacked on each other, the second patterned wiring layer 305 and the conductive member 320 may be adjacent to the second pad 310 originally adjacent to the center of the second wafer 306. Alternatively, the second pad 310 at other positions of the second crystal 306 is re-routed to correspond to the edge of the second wafer 306, and the second pad 310 is electrically connected to the substrate 301 without wiring. The problem of too long or too large a line arc.

在本發明的另外一些實施例中,第二晶片306的第二銲墊310經過第二圖案化線路層305和導電元件320的重新佈線後,第一晶片301和第二晶片306可以配合多種不同線路設計的基材,以使晶片的堆疊適應各種封裝結構之設計。In still other embodiments of the present invention, after the second pad 310 of the second wafer 306 is rewired through the second patterned wiring layer 305 and the conductive element 320, the first wafer 301 and the second wafer 306 may be combined with different types. The substrate of the circuit design is such that the stack of wafers is adapted to the design of various package structures.

請參照第4圖,第4圖係根據本發明的第四較佳實施例所繪示之晶片堆疊封裝結構400的剖面示意圖。Referring to FIG. 4, FIG. 4 is a cross-sectional view of a wafer stack package structure 400 according to a fourth preferred embodiment of the present invention.

晶片堆疊封裝結構400包括:基材401第一晶片402、第二圖案化線路層405、第二晶片406、導電元件420以及封膠樹脂422及多個外部連接端子414。The wafer stack package structure 400 includes a substrate 401 a first wafer 402, a second patterned wiring layer 405, a second wafer 406, a conductive member 420, and a sealant resin 422 and a plurality of external connection terminals 414.

基材401具有第一表面418以及相對於第一表面418的第二表面419。在本發明的較佳實施例之中,基材401係由導線架、印刷電路板或晶粒承載器所構成,其材質例如是BT或者是FR4電路板或者是其他軟性電路板。而在本實施例之中,基材401係一印刷電路板,且基材401具有一個貫穿開口411。The substrate 401 has a first surface 418 and a second surface 419 relative to the first surface 418. In a preferred embodiment of the invention, the substrate 401 is constructed of a lead frame, a printed circuit board, or a die carrier, such as a BT or FR4 circuit board or other flexible circuit board. In the present embodiment, the substrate 401 is a printed circuit board, and the substrate 401 has a through opening 411.

第一晶片402係藉由一黏著層(未繪示)疊設於基材401之第一表面418,且此第一晶片402具有一個面對基材401的第一主動面407,以及一個與第一主動面407相對的第一晶背408。在本實施例之中,第一主動面407之一部分係黏著於基材401的第一表面418;而另一部分則暴露於該貫穿開口411,且設有複數個第一銲墊417。其中至少一個銲墊417係藉由穿過貫穿開口411的一條打線413,與基材401電性連結。The first wafer 402 is stacked on the first surface 418 of the substrate 401 by an adhesive layer (not shown), and the first wafer 402 has a first active surface 407 facing the substrate 401, and a The first active surface 407 is opposite to the first crystal back 408. In this embodiment, one portion of the first active surface 407 is adhered to the first surface 418 of the substrate 401; and the other portion is exposed to the through opening 411, and a plurality of first pads 417 are disposed. At least one of the pads 417 is electrically connected to the substrate 401 by a wire 413 passing through the through opening 411.

第二晶片406具有一第二主動面409以及相對於第二主動面409的第二晶背412。在本實施例之中,第二晶背412藉由一黏著層(未繪示),固設於第一晶片402的第一晶背408上。且第二晶片406的第二主動面409,配置有至少一個第二銲墊410,以及一個與第二銲墊410相互匹配的第二圖案化線路層405。其中第二圖案化線路層405係一重佈線路層,包括複數條導線,其中至少一條導線之一端與第二銲墊410之一者電性連結,另一端則往第二晶片406之第二主動面409的邊緣延伸,並且與導電元件420相互匹配。The second wafer 406 has a second active surface 409 and a second crystal back 412 opposite the second active surface 409. In this embodiment, the second crystal back 412 is fixed on the first crystal back 408 of the first wafer 402 by an adhesive layer (not shown). The second active surface 409 of the second wafer 406 is provided with at least one second bonding pad 410 and a second patterned wiring layer 405 matching the second bonding pad 410. The second patterned circuit layer 405 is a redistributed circuit layer, and includes a plurality of wires, wherein one end of at least one of the wires is electrically connected to one of the second pads 410, and the other end is second to the second wafer 406. The edges of face 409 extend and are mated with conductive elements 420.

在本實施例之中,導電元件420係至少一條與打線,例如打線,用來與基材401電性連結。In this embodiment, at least one of the conductive elements 420 is wire-bonded, for example, wire-bonded, for electrically connecting to the substrate 401.

封膠樹脂420則係填充於基材401、第一晶片402及第二晶片406之間,最後再於基材401的第二表面419形成複數個外部連接端子414,這些外部端子411較佳可以是,例如錫球。藉由這些外部連接端子411,可以將晶片堆疊封裝結構400電性連接至其他外部電路。The sealing resin 420 is filled between the substrate 401, the first wafer 402 and the second wafer 406, and finally a plurality of external connection terminals 414 are formed on the second surface 419 of the substrate 401. The external terminals 411 are preferably Yes, for example, solder balls. The wafer stack package structure 400 can be electrically connected to other external circuits by these external connection terminals 411.

在本實施例中,第二圖案化線路層405可以配合不同晶片的銲墊配置改變配線圖案,將第二銲墊410的打線位置重新分配,並往第二晶片406的其他位置,例如是第二晶片406邊緣延伸,再藉由導電元件420(打線)使第二銲墊410與基材401電性連結。In this embodiment, the second patterned circuit layer 405 can change the wiring pattern in accordance with the pad configuration of different wafers, redistribute the wire bonding position of the second pad 410, and go to other positions of the second wafer 406, for example, The second wafer 406 is extended on the edge, and the second pad 410 is electrically connected to the substrate 401 by the conductive member 420 (wire bonding).

請參照第7圖,第7圖係根據本發明的第五較佳實施例所繪示之晶片堆疊封裝結構700的剖面示意圖。Referring to FIG. 7, FIG. 7 is a cross-sectional view of a wafer stack package structure 700 according to a fifth preferred embodiment of the present invention.

晶片堆疊封裝結構700包括:基材701第一晶片702、第二圖案化線路層705、第二晶片706、導電元件720以及封膠樹脂722及多個外部連接端子711。The wafer stack package structure 700 includes a substrate 701, a first wafer 702, a second patterned circuit layer 705, a second wafer 706, a conductive element 720, and a sealant resin 722 and a plurality of external connection terminals 711.

基材701具有第一表面718以及相對於第一表面718的第二表面719。在本發明的較佳實施例之中,基材701係由導線架、印刷電路板或晶粒承載器所構成,其材質例如是BT或者是FR4電路板或者是其他軟性電路板。Substrate 701 has a first surface 718 and a second surface 719 opposite first surface 718. In a preferred embodiment of the invention, the substrate 701 is constructed of a lead frame, a printed circuit board, or a die carrier, such as a BT or FR4 circuit board or other flexible circuit board.

第一晶片702係藉由一黏著層(未繪示)疊設於基材701之第一表面718,且該第一晶片702具有一個背對基材701的第一主動面708,以及一個與第一主動面708相對的第一晶背707。在本實施例之中,第一主動面708具有至少一個第一銲墊717。The first wafer 702 is stacked on the first surface 718 of the substrate 701 by an adhesive layer (not shown), and the first wafer 702 has a first active surface 708 facing away from the substrate 701, and a The first active surface 708 is opposite to the first crystal back 707. In the present embodiment, the first active surface 708 has at least one first pad 717.

導電元件720位於第一晶片702的第一主動面708上。在本實施例之中,導電元件720包括形成於第一主動面708上的第一圖案化線路層703、至少一條打線,例如第一打線704,以及至少一個導電凸塊,例如導電凸塊716。其中第一圖案化線路層703係一重佈線路層,且第一圖案化線路層703包括複數條導線,第一圖案化線路層703至少一條導線之一端往第一晶片702之第一主動面708的邊緣延伸,並藉由第一打線704,使導線與基材701電性連結;導線的另一端則與導電凸塊716電性連結。在本實施例中,第一圖案化線路層703與導電凸塊716電性連結的導線,又同時與第一銲墊717電性連結,並藉由第一打線704使第一銲墊717與基材701導通。Conductive element 720 is located on first active surface 708 of first wafer 702. In the present embodiment, the conductive element 720 includes a first patterned circuit layer 703 formed on the first active surface 708, at least one wire, such as a first wire 704, and at least one conductive bump, such as a conductive bump 716. . The first patterned circuit layer 703 is a redistributed circuit layer, and the first patterned circuit layer 703 includes a plurality of wires. One of the at least one wire of the first patterned circuit layer 703 is terminated to the first active surface 708 of the first wafer 702. The edge of the wire is electrically connected to the substrate 701 by the first wire 704; the other end of the wire is electrically connected to the conductive bump 716. In this embodiment, the first patterned pad layer 703 and the conductive bump 716 are electrically connected to the first pad 717, and the first pad 717 is electrically connected to the first pad 717. The substrate 701 is turned on.

第二晶片706位於第一晶片702上方,且第二晶片706面對第一晶片702之第二主動面709,配置有至少一個第二銲墊,例如第二銲墊710,以及一個與第二銲墊710相互匹配的第二圖案化線路層705。The second wafer 706 is located above the first wafer 702, and the second wafer 706 faces the second active surface 709 of the first wafer 702, and is configured with at least one second bonding pad, such as the second bonding pad 710, and one and the second The pads 710 are matched to each other by a second patterned circuit layer 705.

其中第二圖案化線路層705包括複數條導線,其中至少有一條導線之一端與第二銲墊710之一者電性連結,而此導線之另一端則與導電凸塊716之一者相互匹配。當第二晶片706以覆晶方式疊設於第一晶片702上時,至少一個第二銲墊710即可藉由第二圖案化線路層705、導電凸塊716、第一圖案化線路層703以及第一打線704與基材701電性連結。由於第一圖案化線路層703可同時與第一晶片702的第一銲墊717以及第二晶片706的第二銲墊710導通,因此第一銲墊71與第二銲墊710可傳輸相同訊號。The second patterned circuit layer 705 includes a plurality of wires, wherein one end of at least one of the wires is electrically connected to one of the second pads 710, and the other end of the wire is matched with one of the conductive bumps 716. . When the second wafer 706 is stacked on the first wafer 702 in a flip chip manner, the at least one second pad 710 may pass through the second patterned circuit layer 705, the conductive bumps 716, and the first patterned circuit layer 703. The first bonding wire 704 is electrically connected to the substrate 701. Since the first patterned circuit layer 703 can be simultaneously connected to the first pad 717 of the first wafer 702 and the second pad 710 of the second wafer 706, the first pad 71 and the second pad 710 can transmit the same signal. .

封膠樹脂720則係填充於基材701、第一晶片702及第二晶片706之間,最後再於基材701的第二表面719形成複數個外部連接端子711,這些外部端子較佳可以是,例如是錫球。藉由這些外部連接端子711,可以將晶片堆疊封裝結構700電性連接至其他外部電路。The sealing resin 720 is filled between the substrate 701, the first wafer 702 and the second wafer 706, and finally a plurality of external connection terminals 711 are formed on the second surface 719 of the substrate 701. The external terminals may preferably be For example, it is a solder ball. The wafer stack package structure 700 can be electrically connected to other external circuits by these external connection terminals 711.

在本發明的一些實施例中,第二圖案化線路層705可以配合不同晶片的銲墊配置改變配線圖案,再配合導電元件720的第一圖案化線路層703、第一打線704以及導電凸塊716的佈線變化,可大幅增加堆疊封裝結構中線路配置的靈活性。因此當具有與第一晶片702相同尺寸的第二晶片706與第一晶片702相互堆疊時,第二圖案化線路層705和導電元件720可以將原來靠近第二晶片706中心的第二銲墊710或者是其他位置的第二銲墊710重新佈線,再經由導電元件720使第二銲墊710可以對應至第二晶片706的邊緣,並使第二銲墊710與基材701電性連結,而不會產生佈線過長或線弧過大的問題。In some embodiments of the present invention, the second patterned wiring layer 705 can change the wiring pattern in accordance with the pad configuration of different wafers, and then match the first patterned wiring layer 703 of the conductive element 720, the first bonding line 704, and the conductive bumps. The 716 wiring changes can greatly increase the flexibility of the line configuration in the stacked package structure. Therefore, when the second wafer 706 having the same size as the first wafer 702 and the first wafer 702 are stacked on each other, the second patterned wiring layer 705 and the conductive member 720 may be adjacent to the second pad 710 originally adjacent to the center of the second wafer 706. Or the second pad 710 at other locations is re-routed, and the second pad 710 can be corresponding to the edge of the second wafer 706 via the conductive component 720, and the second pad 710 is electrically connected to the substrate 701. There is no problem that the wiring is too long or the line arc is too large.

在本發明的另外一些實施例中,第二晶片706的第二銲墊710經過第二圖案化線路層705和導電元件720的重新佈線後,第一晶片701和第二晶片706可以配合多種不同線路設計的基材,以使晶片的堆疊適應各種封裝結構之設計。In still other embodiments of the present invention, after the second pad 710 of the second wafer 706 is rewired through the second patterned wiring layer 705 and the conductive element 720, the first wafer 701 and the second wafer 706 may be combined with different types. The substrate of the circuit design is such that the stack of wafers is adapted to the design of various package structures.

請參照第8圖,第8圖係根據本發明的第六較佳實施例所繪示之晶片堆疊封裝結構800的剖面示意圖。Referring to FIG. 8, FIG. 8 is a cross-sectional view of a wafer stack package structure 800 according to a sixth preferred embodiment of the present invention.

晶片堆疊封裝結構800包括:基材801、第一晶片802、第一圖案化線路層803a、第二晶片804、第一打線803、封膠樹脂815及多個外部連接端子805。The wafer stack package structure 800 includes a substrate 801, a first wafer 802, a first patterned circuit layer 803a, a second wafer 804, a first wire 803, a sealant resin 815, and a plurality of external connection terminals 805.

基材801具有第一表面806以及相對第一表面806的第二表面807。在本發明的較佳實施例之中,基材801係由導線架、印刷電路板或晶粒承載器所構成,其材質例如是BT或者是FR4電路板或者是其他軟性電路板。而在本實施例之中,基材801係一印刷電路板。Substrate 801 has a first surface 806 and a second surface 807 opposite first surface 806. In a preferred embodiment of the invention, the substrate 801 is constructed of a lead frame, a printed circuit board, or a die carrier, such as a BT or FR4 circuit board or other flexible circuit board. In the present embodiment, the substrate 801 is a printed circuit board.

第一晶片802具有一個面對基材801的第一主動面808,以及一個與第一主動面808相對的第一晶背809,且第一晶片802的第一晶背809係藉由表面接合製程疊設於基材801之第一表面806。此在本實施例之中,第一主動面808設有複數個第一銲墊810,並且藉由第一打線803,將這些第一銲墊810與基材801電性連結。The first wafer 802 has a first active surface 808 facing the substrate 801, and a first crystal back 809 opposite the first active surface 808, and the first crystal back 809 of the first wafer 802 is bonded by surface The process is stacked on the first surface 806 of the substrate 801. In this embodiment, the first active surface 808 is provided with a plurality of first pads 810, and the first pads 810 are electrically connected to the substrate 801 by the first bonding wires 803.

第二晶片804位於第一晶片802上方,且第二晶片804面對第一晶片802之第二主動面811,配置有至少一個第二銲墊,例如第二銲墊812。其中第二晶片804的尺寸小於第一晶片802的尺寸。The second wafer 804 is located above the first wafer 802, and the second wafer 804 faces the second active surface 811 of the first wafer 802, and is configured with at least one second bonding pad, such as the second bonding pad 812. The size of the second wafer 804 is smaller than the size of the first wafer 802.

第一圖案化線路層803a位於第一晶片802的第一主動面808上,且與第一銲墊810相距有一段距離。因此第一圖案化線路層803a並未與第一銲墊810直接電性連接。第一圖案化線路層803a包括複數條導線,其中至少一條導線之一端與第二銲墊812之一者相互匹配,並藉由導電凸塊813彼此電性連結;另一端則往第一晶片802之其他位置延伸,例如往第一晶片802之第一主動面808的邊緣延伸,並藉由第二打線814與基材801電性連結。The first patterned wiring layer 803a is located on the first active surface 808 of the first wafer 802 and is at a distance from the first pad 810. Therefore, the first patterned circuit layer 803a is not directly electrically connected to the first pad 810. The first patterned circuit layer 803a includes a plurality of wires, wherein one of the ends of the at least one wire and the second pad 812 are matched with each other, and electrically connected to each other by the conductive bumps 813; the other end is directed to the first die 802. The other locations extend, for example, to the edge of the first active surface 808 of the first wafer 802 and are electrically connected to the substrate 801 by the second bonding wires 814.

封膠樹脂815則係填充於基材801、第一晶片802及第二晶片804之間,最後再於基材801的第二表面807形成複數個外部連接端子805,較佳的,該些外部端子例如是錫球,並藉由這些外部連接端子805,可以使晶片堆疊封裝結構800電性連接至其他外部電路。The sealing resin 815 is filled between the substrate 801, the first wafer 802 and the second wafer 804, and finally a plurality of external connection terminals 805 are formed on the second surface 807 of the substrate 801. Preferably, the external portions are external. The terminals are, for example, solder balls, and by these external connection terminals 805, the wafer stack package structure 800 can be electrically connected to other external circuits.

在本實施例中,第一圖案化線路層803a可以配合第二晶片804之第二銲墊812的配置,改變配線圖案的佈線變化,使其對應至第一晶片802的邊緣,使與基材301電性連結的第二打線814,不會有佈線過長或線弧過大的問題。可大幅增加堆疊封裝結構中線路配置的靈活性。In this embodiment, the first patterned circuit layer 803a can be matched with the configuration of the second pad 812 of the second wafer 804 to change the wiring pattern of the wiring pattern to correspond to the edge of the first wafer 802 to make the substrate The second wire 814 electrically connected to the 301 does not have a problem that the wiring is too long or the arc is too large. The flexibility of the line configuration in the stacked package structure can be greatly increased.

根據以上所述,本發明的一較佳實施例係在晶片堆疊結構的的上層晶片的主動層,形成一個上層圖案化線路層,使上層圖案化線路層與上層晶片的銲墊匹配,藉以將上層晶片之銲墊的打線位置重新分配,再藉由導電元件使銲墊與基材電性連結。According to the above, a preferred embodiment of the present invention is an active layer of an upper wafer of a wafer stack structure, forming an upper patterned wiring layer, so that the upper patterned wiring layer and the upper wafer pad are matched, thereby The bonding positions of the pads of the upper wafer are redistributed, and the bonding pads are electrically connected to the substrate by conductive members.

本發明的另一較佳實施例則係,下層晶片上提供一下層圖案化線路層與上層晶片的的銲墊匹配,藉以將上層晶片之銲墊的打線位置重新分配,再藉由打線使銲墊與基材電性連結。In another preferred embodiment of the present invention, the underlying wafer is provided with a pad patterned layer to match the pads of the upper wafer, thereby redistributing the bonding positions of the pads of the upper wafer, and then soldering by wire bonding. The pad is electrically connected to the substrate.

藉此不僅可以配合不同上層晶片之銲墊設計,來改電圖案化線路層中的佈線,以提供上層晶片多樣化的選擇空間。當上層晶片與下層晶片具有相同尺寸時,更可將上層晶片之銲墊的打線位置重新分配,使其分散至晶片的邊緣,而不會產生佈線過長或線弧過大的問題。由於無需使用虛擬晶片,更可大幅降低堆疊厚度及製程成本,同時提高封裝密度。Thereby, not only the pad design of different upper layers can be matched, but also the wiring in the patterned circuit layer can be modified to provide a variety of selection space for the upper layer wafer. When the upper wafer and the lower wafer have the same size, the bonding positions of the pads of the upper wafer can be redistributed to be dispersed to the edge of the wafer without causing problems of excessive wiring or excessive arcing. By eliminating the need for virtual wafers, stack thickness and process cost can be significantly reduced while increasing package density.

另外本發明的一些實施例中,導電元件係包括位於下層晶片與上層晶片之間的下層圖案化線路層,其中下層圖案化線路層的佈線和上層圖案化線路層相互匹配。當上層晶片覆晶堆疊於下層晶片時,上層圖案化線路層會與下層圖案化線路層電性連結。再藉由打線使圖案化線路層與基材電性連接。由於上層圖案化線路層可以配合不同上層晶片的銲墊配置改變配線圖案,再配合下層圖案化線路層以及打線導電的佈線變化,可大幅增加堆疊封裝結構中線路配置與設計的靈活性。In addition, in some embodiments of the invention, the conductive element comprises a lower patterned circuit layer between the lower wafer and the upper wafer, wherein the wiring of the lower patterned wiring layer and the upper patterned wiring layer match each other. When the upper wafer is flip-chip stacked on the lower wafer, the upper patterned wiring layer is electrically connected to the lower patterned wiring layer. The patterned circuit layer is electrically connected to the substrate by wire bonding. Since the upper patterned circuit layer can be matched with the pad configuration of different upper wafers to change the wiring pattern, and the lower patterned circuit layer and the wiring conductive variation, the flexibility of line configuration and design in the stacked package structure can be greatly increased.

因此,藉由本發明所提供的技術特徵,可以解決習知晶片堆疊封裝結構良率封及封裝密度不高的問題,更可解決以因產品多樣性設導致製程元件無法共用,衍生成本過高的問題。Therefore, by the technical features provided by the present invention, the problem that the conventional wafer stack package structure yield seal and the package density are not high can be solved, and the process components can not be shared due to product diversity, and the derivative cost is too high. problem.

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何相關技術領域具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。While the invention has been described above by way of a preferred embodiment, it is not intended to limit the invention, and it is to be understood by those of ordinary skill in the art that various changes and modifications can be made without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

100...晶片堆疊封裝結構100. . . Wafer stack package structure

101...基材101. . . Substrate

102...第一晶片102. . . First wafer

103...圖案化線路層103. . . Patterned circuit layer

104...打線104. . . Line

105...圖案化線路層105. . . Patterned circuit layer

106...第二晶片106. . . Second chip

107...第一主動面107. . . First active surface

108...第一晶背108. . . First crystal back

109...第二主動面109. . . Second active surface

110...第二銲墊110. . . Second pad

111...貫穿開口111. . . Through opening

113...打線113. . . Line

114...外部連接端子114. . . External connection terminal

116‧‧‧導電凸塊116‧‧‧Electrical bumps

117‧‧‧第一銲墊117‧‧‧First pad

118‧‧‧基材第一表面118‧‧‧The first surface of the substrate

119‧‧‧基材第二表面119‧‧‧The second surface of the substrate

120‧‧‧導電元件120‧‧‧Conducting components

122‧‧‧封膠樹脂122‧‧‧ Sealing resin

200‧‧‧晶片堆疊封裝結構200‧‧‧ wafer stacking structure

201‧‧‧基材201‧‧‧Substrate

202‧‧‧第一晶片202‧‧‧First chip

203‧‧‧第一圖案化線路層203‧‧‧First patterned circuit layer

203a‧‧‧第一導線203a‧‧‧First wire

203b‧‧‧第二導線203b‧‧‧second wire

204‧‧‧第一打線204‧‧‧First line

205‧‧‧第二圖案化線路層205‧‧‧Second patterned circuit layer

205a‧‧‧第三導線205a‧‧‧ Third wire

205b‧‧‧第四導線205b‧‧‧fourth wire

206‧‧‧第二晶片206‧‧‧second chip

207‧‧‧晶背207‧‧‧ crystal back

208‧‧‧第一主動面208‧‧‧First active surface

209‧‧‧第二主動面209‧‧‧second active surface

210‧‧‧第二銲墊210‧‧‧Second pad

212‧‧‧第二打線212‧‧‧Second line

214‧‧‧外部連接端子214‧‧‧External connection terminal

216‧‧‧導電凸塊216‧‧‧Electrical bumps

217‧‧‧第一銲墊217‧‧‧First pad

218‧‧‧基材的第一表面218‧‧‧ The first surface of the substrate

219‧‧‧基材的第二表面219‧‧‧Second surface of the substrate

220‧‧‧導電元件220‧‧‧Conducting components

222‧‧‧封膠樹脂222‧‧‧ Sealant resin

300‧‧‧晶片堆疊封裝結構300‧‧‧ wafer stacking structure

301‧‧‧基材301‧‧‧Substrate

302‧‧‧第一晶片302‧‧‧First chip

303‧‧‧第一圖案化線路層303‧‧‧First patterned circuit layer

304‧‧‧打線304‧‧‧Line

305‧‧‧第二圖案化線路層305‧‧‧Second patterned circuit layer

306‧‧‧第二晶片306‧‧‧second chip

307‧‧‧第一主動面307‧‧‧First active surface

308‧‧‧第一晶背308‧‧‧First crystal back

309‧‧‧第二主動面309‧‧‧second active surface

310‧‧‧第二銲墊310‧‧‧Second pad

311‧‧‧貫穿開口311‧‧‧through opening

312‧‧‧底膠312‧‧‧Bottom glue

314‧‧‧外部連接端子314‧‧‧External connection terminal

316‧‧‧導電凸塊316‧‧‧Electrical bumps

317‧‧‧第一銲墊317‧‧‧First pad

318‧‧‧凸塊318‧‧‧Bumps

319...散熱鰭片319. . . Heat sink fin

320...導電元件320. . . Conductive component

321...基材的第一表面321. . . First surface of the substrate

322...封膠樹脂322. . . Sealing resin

323...基材的第二表面323. . . Second surface of the substrate

400...晶片堆疊封裝結構400. . . Wafer stack package structure

401...基材401. . . Substrate

402...第一晶片402. . . First wafer

405...第二圖案化線路層405. . . Second patterned circuit layer

406...第二晶片406. . . Second chip

407...第一主動面407. . . First active surface

408...第一晶背408. . . First crystal back

409...第二主動面409. . . Second active surface

410...第二銲墊410. . . Second pad

411...貫穿開口411. . . Through opening

412...第二晶背412. . . Second crystal back

413...打線413. . . Line

414...外部連接端子414. . . External connection terminal

417...銲墊417. . . Solder pad

418...基材的第一表面418. . . First surface of the substrate

419...基材的第二表面419. . . Second surface of the substrate

420...導電元件420. . . Conductive component

422...封膠樹脂422. . . Sealing resin

500...晶片堆疊封裝結構500. . . Wafer stack package structure

510...基板510. . . Substrate

520...第一晶片520. . . First wafer

530...第二晶片530. . . Second chip

540...打線540. . . Line

550...打線550. . . Line

610...基板610. . . Substrate

620...第一晶片620. . . First wafer

630...第二晶片630. . . Second chip

640...打線640. . . Line

650...打線650. . . Line

660...虛擬晶片660. . . Virtual chip

670...銲墊670. . . Solder pad

680...銲墊680. . . Solder pad

700...晶片堆疊封裝結構700. . . Wafer stack package structure

701...基材701. . . Substrate

702...第一晶片702. . . First wafer

703...第一圖案化線路層703. . . First patterned circuit layer

704...第一打線704. . . First line

705...第二圖案化線路層705. . . Second patterned circuit layer

706...第二晶片706. . . Second chip

707...第一晶背707. . . First crystal back

708...第一主動面708. . . First active surface

709...第二主動面709. . . Second active surface

710...第二銲墊710. . . Second pad

711...外部連接端子711. . . External connection terminal

716...導電凸塊716. . . Conductive bump

717...第一銲墊717. . . First pad

718...基材的第一表面718. . . First surface of the substrate

719...基材的第二表面719. . . Second surface of the substrate

720...導電元件720. . . Conductive component

722...封膠樹脂722. . . Sealing resin

800...晶片堆疊封裝結構800. . . Wafer stack package structure

801...基材801. . . Substrate

802...第一晶片802. . . First wafer

803...第一打線803. . . First line

803a...第一圖案化線路層803a. . . First patterned circuit layer

804...第二晶片804. . . Second chip

805...外部連接端子805. . . External connection terminal

806...基材的第一表面806. . . First surface of the substrate

807...基材的第二表面807. . . Second surface of the substrate

808...第一主動面808. . . First active surface

809...第一晶背809. . . First crystal back

810...第一銲墊810. . . First pad

811...第二主動面811. . . Second active surface

812...第二銲墊812. . . Second pad

813...導電凸塊813. . . Conductive bump

814...第二打線814. . . Second line

815...封膠樹脂815. . . Sealing resin

為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之詳細說明如下:The above and other objects, features, advantages and embodiments of the present invention will become more apparent and understood.

第1圖係根據本發明的第一較佳實施例所繪示之晶片堆疊封裝結構100的剖面示意圖。1 is a cross-sectional view of a wafer stack package structure 100 in accordance with a first preferred embodiment of the present invention.

第2圖係根據本發明的第二較佳實施例所繪示之晶片堆疊封裝結構200的剖面示意圖。2 is a cross-sectional view of a wafer stack package structure 200 in accordance with a second preferred embodiment of the present invention.

第3圖係根據本發明的第三較佳實施例所繪示之晶片堆疊封裝結構300的剖面示意圖。3 is a cross-sectional view of a wafer stack package structure 300 in accordance with a third preferred embodiment of the present invention.

請參照第4圖,第4圖係根據本發明的第四較佳實施例所繪示之晶片堆疊封裝結構400的剖面示意圖。Referring to FIG. 4, FIG. 4 is a cross-sectional view of a wafer stack package structure 400 according to a fourth preferred embodiment of the present invention.

第5圖係根據一習知的晶片堆疊封裝結構500所繪示的結構剖面圖。Figure 5 is a cross-sectional view of the structure of a conventional wafer stack package structure 500.

第6圖係根據另一種習知晶片堆疊封裝結構600所繪示的結構剖面圖。Figure 6 is a cross-sectional view of the structure of another conventional wafer stack package structure 600.

第7圖係根據本發明的第五較佳實施例所繪示之晶片堆疊封裝結構700的剖面示意圖。Figure 7 is a cross-sectional view of a wafer stack package structure 700 in accordance with a fifth preferred embodiment of the present invention.

第8圖係根據本發明的第六較佳實施例所繪示之晶片堆疊封裝結構800的剖面示意圖。Figure 8 is a cross-sectional view of a wafer stack package structure 800 in accordance with a sixth preferred embodiment of the present invention.

100...晶片堆疊封裝結構100. . . Wafer stack package structure

101...基材101. . . Substrate

102...第一晶片102. . . First wafer

103...圖案化線路層103. . . Patterned circuit layer

104...打線104. . . Line

105...圖案化線路層105. . . Patterned circuit layer

106...第二晶片106. . . Second chip

107...第一主動面107. . . First active surface

108...第一晶背108. . . First crystal back

109...第二主動面109. . . Second active surface

110...第二銲墊110. . . Second pad

111...貫穿開口111. . . Through opening

113...打線113. . . Line

114...外部連接端子114. . . External connection terminal

115...內連線115. . . Internal connection

116...導電凸塊116. . . Conductive bump

117...第一銲墊117. . . First pad

118...基材上表面118. . . Upper surface of substrate

119...基材第二表面119. . . Second surface of substrate

120...導電元件120. . . Conductive component

122...封膠樹脂122. . . Sealing resin

Claims (12)

一種晶片堆疊封裝結構,包括:一基材,該基材具有一第一表面與相對的一第二表面,其中該基材具有一貫穿開口;一第一晶片,位於該基材之該第一表面,並與該基材電性連結,其中該第一晶片之一第一主動面與一第一晶背分別位於該第一晶片之相對二側,該第一主動面與該基材之該第一表面相對且一部分的該第一晶片面對該基材的該第一主動面暴露於該貫穿開口,該第一主動面具有複數個第一銲墊,且該些第一銲墊之至少一者係藉由穿過該貫穿開口的至少一打線與該基材電性連接;一第二晶片,位於該第一晶片之該第一晶背上,該第二晶片之相對二側分別具有一第二主動面與一第二晶背,其中該第二主動面與該第一晶背相面對,且該第二主動面配置有至少一第二銲墊;一第二圖案化線路層,位於該第二主動面上,且與該第二銲墊匹配;以及一導電元件,接合在該第一晶背與該第二主動面上之該第二圖案化線路層之間,以電性連結該第二圖案化線路層與該基材,其中該導電元件包括:一第一圖案化線路層,位於該第一晶片面對該第二主動面的一第一晶背上,且該第一圖案化線路層與該第二圖案化線路層相互匹配;至少一導電凸塊,電性連結該第二圖案化線路層與該 第一圖案化線路層;以及一打線,電性連接該基材與第一圖案化線路層。 A wafer stack package structure comprising: a substrate having a first surface and an opposite second surface, wherein the substrate has a through opening; a first wafer located at the first of the substrate a surface electrically connected to the substrate, wherein the first active surface and the first crystal back of the first wafer are respectively located on opposite sides of the first wafer, and the first active surface and the substrate The first surface of the first surface opposite to the first surface of the first wafer facing the substrate is exposed to the through opening, the first active surface has a plurality of first pads, and the first pads are at least One is electrically connected to the substrate by at least one wire passing through the through opening; a second wafer is located on the first crystal back of the first wafer, and the opposite sides of the second wafer respectively have a second active surface and a second crystal back surface, wherein the second active surface faces the first crystal back, and the second active surface is configured with at least one second solder pad; and a second patterned circuit layer Located on the second active surface and matching the second bonding pad; An electrical component is bonded between the first crystal back and the second patterned circuit layer on the second active surface to electrically connect the second patterned circuit layer and the substrate, wherein the conductive component comprises: a first patterned circuit layer is disposed on a first crystal back of the first wafer facing the second active surface, and the first patterned circuit layer and the second patterned circuit layer are matched with each other; at least one conductive a bump electrically connecting the second patterned circuit layer and the a first patterned circuit layer; and a plurality of wires electrically connected to the substrate and the first patterned circuit layer. 如申請專利範圍第1項所述之堆疊封裝結構,其中該基材係導線架(Lead Frame)、印刷電路板(Printing Circuit Board)或晶粒承載器(Carrier)。 The stacked package structure of claim 1, wherein the substrate is a lead frame, a printed circuit board, or a die carrier. 如申請專利範圍第1項所述之堆疊封裝結構,其中該第一主動面具至少一第一銲墊,並藉由複數個凸塊,將該第一銲墊與基材電性連接。 The stacked package structure of claim 1, wherein the first active mask is at least one first bonding pad, and the first bonding pad is electrically connected to the substrate by a plurality of bumps. 如申請專利範圍第3項所述之堆疊封裝結構,更包括一底膠包覆於該些凸塊,並將該第一主動面固定於該基材之上。 The stacked package structure of claim 3, further comprising a primer covering the bumps and fixing the first active surface on the substrate. 如申請專利範圍第4項所述之堆疊封裝結構,更包括一散熱鰭片配置於該第一主動面上,並經由該貫穿開口向外延伸。 The stacked package structure of claim 4, further comprising a heat dissipation fin disposed on the first active surface and extending outward through the through opening. 如申請專利範圍第1項所述之堆疊封裝結構,其中該第二晶片相對於該第二主動面之一第二晶背,係固著於該第一晶片相對於該第一主動面之一第一晶背上。 The stacked package structure of claim 1, wherein the second wafer is fixed to the first wafer opposite to the first active surface with respect to the second crystal back of the second active surface The first crystal is on the back. 如申請專利範圍第6項所述之堆疊封裝結構,其中該 導電元件係至少一打線,用以使該第二圖案化線路層與該基材電性連結。 The stacked package structure according to claim 6, wherein the The conductive component is at least one wire for electrically connecting the second patterned circuit layer to the substrate. 如申請專利範圍第7項所述之堆疊封裝結構,其中該第一圖案化線路層和該第二圖案化線路層皆係一重佈線路層(Redistribution-Layer,RDL)。 The stacked package structure of claim 7, wherein the first patterned circuit layer and the second patterned circuit layer are both a Redistribution Layer (RDL). 一種晶片堆疊封裝結構,包括:一基材,該基材具有一第一表面與相對的第二表面;一第一晶片,位於該基材的該第一表面上,並與該基材電性連結,其中該第一晶片具有一第一晶背以及一第一主動面位於該第一晶片之相對二側,且該第一晶背與該基材之該第一表面相面對;一第二晶片,位於該第一晶片之該第一主動面上,其中該第二晶片具有一第二主動面與一第二晶背位於該第二晶片之相對二側,該第二主動面與該第一主動面相面對,該第二主動面配置有至少一第二銲墊,且該第一晶片具有大於該第二晶片之一尺寸;一第一圖案化線路層,位於該第一主動面上,且與該第二銲墊匹配;以及一第一打線,電性連結該第一圖案化線路層與該基材。 A wafer stack package structure comprising: a substrate having a first surface and an opposite second surface; a first wafer on the first surface of the substrate and electrically connected to the substrate The first wafer has a first crystal back and a first active surface on opposite sides of the first wafer, and the first crystal back faces the first surface of the substrate; a second wafer on the first active surface of the first wafer, wherein the second wafer has a second active surface and a second crystal back on opposite sides of the second wafer, the second active surface and the second active surface The first active surface faces, the second active surface is configured with at least one second pad, and the first wafer has a size larger than one of the second wafers; and a first patterned circuit layer is located at the first active surface And matching with the second bonding pad; and a first bonding wire electrically connecting the first patterned circuit layer and the substrate. 如申請專利範圍第9項所述之堆疊封裝結構,其中該第一主動面更配置有至少一第一銲墊,並藉由一第二打線 與該基材電性連結,且該第一銲墊與該第一圖案化線路層相距有一距離。 The stacked package structure of claim 9, wherein the first active surface is further configured with at least one first bonding pad and by a second bonding line The substrate is electrically connected to the substrate, and the first pad is spaced apart from the first patterned circuit layer by a distance. 如申請專利範圍第9項所述之堆疊封裝結構,更包括一封膠樹脂,填充於該基材、該第一晶片及該第二晶片之間。 The stacked package structure of claim 9, further comprising a glue resin filled between the substrate, the first wafer and the second wafer. 如申請專利範圍第9項所述之堆疊封裝結構,其中該第一圖案化線路層係一重佈線路層。The stacked package structure of claim 9, wherein the first patterned circuit layer is a redistributed circuit layer.
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