TW200834229A - Fine mold and method for regenerating fine mold - Google Patents

Fine mold and method for regenerating fine mold

Info

Publication number
TW200834229A
TW200834229A TW096135638A TW96135638A TW200834229A TW 200834229 A TW200834229 A TW 200834229A TW 096135638 A TW096135638 A TW 096135638A TW 96135638 A TW96135638 A TW 96135638A TW 200834229 A TW200834229 A TW 200834229A
Authority
TW
Taiwan
Prior art keywords
fine mold
regenerating
formation surface
target film
mold
Prior art date
Application number
TW096135638A
Other languages
English (en)
Inventor
Atsuo Hattori
Original Assignee
Yamaha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamaha Corp filed Critical Yamaha Corp
Publication of TW200834229A publication Critical patent/TW200834229A/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Physical Vapour Deposition (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Micromachines (AREA)
TW096135638A 2006-09-25 2007-09-21 Fine mold and method for regenerating fine mold TW200834229A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006258571A JP4281773B2 (ja) 2006-09-25 2006-09-25 微細成形モールド及び微細成形モールドの再生方法

Publications (1)

Publication Number Publication Date
TW200834229A true TW200834229A (en) 2008-08-16

Family

ID=38895802

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096135638A TW200834229A (en) 2006-09-25 2007-09-21 Fine mold and method for regenerating fine mold

Country Status (6)

Country Link
US (3) US7794225B2 (zh)
EP (1) EP1903392A3 (zh)
JP (1) JP4281773B2 (zh)
KR (1) KR20080028307A (zh)
CN (1) CN101154035B (zh)
TW (1) TW200834229A (zh)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080105524A (ko) * 2007-05-31 2008-12-04 삼성전자주식회사 마스크 몰드 및 그 제작방법과 제작된 마스크 몰드를이용한 대면적 미세패턴 성형방법
WO2009125697A1 (ja) * 2008-04-08 2009-10-15 旭硝子株式会社 モールド、その製造方法および転写微細パターンを有する基材の製造方法
WO2009148138A1 (ja) * 2008-06-05 2009-12-10 旭硝子株式会社 ナノインプリント用モールド、その製造方法および表面に微細凹凸構造を有する樹脂成形体ならびにワイヤグリッド型偏光子の製造方法
JP2009298041A (ja) * 2008-06-13 2009-12-24 Toshiba Corp テンプレート及びパターン形成方法
JP5428513B2 (ja) * 2009-05-14 2014-02-26 大日本印刷株式会社 ナノインプリントモールド用基材の処理方法およびそれを用いたナノインプリントモールドの製造方法
NL2005263A (en) * 2009-09-29 2011-03-30 Asml Netherlands Bv Imprint lithography.
TWI494682B (zh) * 2009-11-18 2015-08-01 Hoya Corp 基板之再生方法、光罩基底之製造方法、附多層反射膜基板之製造方法及反射型光罩基底之製造方法
CN101825842B (zh) * 2010-03-31 2012-05-23 中国科学院半导体研究所 一种制作纳米压印印章的方法
JP5395756B2 (ja) * 2010-07-07 2014-01-22 株式会社東芝 インプリント用テンプレートの製造方法及びパターン形成方法
JP5702174B2 (ja) * 2011-02-01 2015-04-15 東芝機械株式会社 型および型の製造方法
DE102011105679B4 (de) * 2011-06-22 2019-03-28 Nanoscribe Gmbh Verfahren zum Herstellen dreidimensionaler Mikrostrukturen
JP6015140B2 (ja) * 2012-06-01 2016-10-26 大日本印刷株式会社 ナノインプリントモールドおよびその製造方法
KR20140076357A (ko) * 2012-12-12 2014-06-20 삼성전자주식회사 고대비 정렬 마크를 가진 나노임프린트 스탬프 및 그 제조방법
KR101506888B1 (ko) 2013-10-02 2015-03-30 주식회사 에스앤에스텍 블랭크 마스크 및 포토마스크
JP5761320B2 (ja) * 2013-12-05 2015-08-12 大日本印刷株式会社 マイクロコンタクトプリンティング用スタンプの製造方法
TWI662591B (zh) * 2014-07-08 2019-06-11 日商綜研化學股份有限公司 使用分步重複用壓印用模具的分步重複壓印方法、及分步重複用壓印用模具之製造方法
TWI663472B (zh) * 2014-07-25 2019-06-21 日商綜研化學股份有限公司 Manufacturing method of fine structure
JP6733163B2 (ja) * 2015-12-03 2020-07-29 大日本印刷株式会社 インプリントモールド及びその製造方法、並びにインプリント方法
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
KR102089835B1 (ko) 2016-01-27 2020-03-16 주식회사 엘지화학 필름 마스크, 이의 제조방법 및 이를 이용한 패턴 형성 방법
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
KR101846644B1 (ko) * 2016-02-15 2018-05-18 울산과학기술원 수처리 멤브레인 제조용 마이크로 구조 템플릿 제조 방법
CN108673795A (zh) * 2018-06-16 2018-10-19 东莞市东昊新能源实业有限公司 一种利用uv转印及压印加工微纳纹理的模具生产工艺

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0524121A (ja) 1991-07-23 1993-02-02 Hitachi Ltd 光学部品、光学部品マザー、それらの製造方法、及び関連製品
JP3006199B2 (ja) 1991-09-03 2000-02-07 株式会社日立製作所 光ディスクの製造方法
JPH05241011A (ja) 1992-03-02 1993-09-21 Toray Ind Inc 液晶表示用カラ−フィルタの製造方法
JP4078678B2 (ja) * 1996-07-11 2008-04-23 セイコーエプソン株式会社 光ディスクの製造方法
US7063919B2 (en) 2002-07-31 2006-06-20 Mancini David P Lithographic template having a repaired gap defect method of repair and use
US7374864B2 (en) * 2003-02-13 2008-05-20 The Regents Of The University Of Michigan Combined nanoimprinting and photolithography for micro and nano devices fabrication
JP2004304097A (ja) 2003-04-01 2004-10-28 Sharp Corp パターン形成方法および半導体装置の製造方法
JP2006010797A (ja) 2004-06-23 2006-01-12 Nikon Corp マイクロレンズの製造方法、及びマイクロレンズ用の型の製造方法
TWI264823B (en) * 2004-08-31 2006-10-21 Taiwan Tft Lcd Ass Thin film transistor manufacture method and structure therefor
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy

Also Published As

Publication number Publication date
JP2008074043A (ja) 2008-04-03
JP4281773B2 (ja) 2009-06-17
US20100040985A1 (en) 2010-02-18
US7758791B2 (en) 2010-07-20
KR20080028307A (ko) 2008-03-31
EP1903392A3 (en) 2010-03-31
EP1903392A2 (en) 2008-03-26
US20080107973A1 (en) 2008-05-08
CN101154035A (zh) 2008-04-02
CN101154035B (zh) 2012-01-04
US20100117268A1 (en) 2010-05-13
US7794225B2 (en) 2010-09-14

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