TW200827944A - Method of neutralizing developer waste liquid containing tetraalkylammonium hydroxide - Google Patents

Method of neutralizing developer waste liquid containing tetraalkylammonium hydroxide Download PDF

Info

Publication number
TW200827944A
TW200827944A TW96142218A TW96142218A TW200827944A TW 200827944 A TW200827944 A TW 200827944A TW 96142218 A TW96142218 A TW 96142218A TW 96142218 A TW96142218 A TW 96142218A TW 200827944 A TW200827944 A TW 200827944A
Authority
TW
Taiwan
Prior art keywords
waste liquid
neutralization
carbonic acid
acid gas
developing waste
Prior art date
Application number
TW96142218A
Other languages
Chinese (zh)
Other versions
TWI416278B (en
Inventor
Yoshifumi Yamashita
Hajime Ookido
Tatsuya Nakamoto
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of TW200827944A publication Critical patent/TW200827944A/en
Application granted granted Critical
Publication of TWI416278B publication Critical patent/TWI416278B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3092Recovery of material; Waste processing
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/68Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water
    • C02F1/685Devices for dosing the additives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/66Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/68Treatment of water, waste water, or sewage by addition of specified substances, e.g. trace elements, for ameliorating potable water

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Hydrology & Water Resources (AREA)
  • Water Supply & Treatment (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Toxicology (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Removal Of Specific Substances (AREA)

Abstract

A method of neutralizing a developer waste liquid containing a tetraalkylammonium hydroxide wherein an organic matter derived from photoresist is dissolved through reaction with carbon dioxide gas, in which clogging by intra-column resist precipitation at neutralization can be effectively prevented and in which resist precipitated at neutralization ensures a high filterability and can be effectively removed. The method of neutralizing a developer waste liquid containing a tetraalkylammonium hydroxide comprises adding carbon dioxide gas to a developer waste liquid containing tetraalkylammonium hydroxide of 13 or higher pH value in which an organic matter derived from photoresist is dissolved to thereby carry out neutralization to a pH value of 11.5 or below, wherein the rate of carbon dioxide gas added from the time at which the pH of the developer waste liquid is 13 to the time at which the pH reaches 12 is 0.15 L/hr or less per mol of tetraalkylammonium hydroxide contained in the developer waste liquid at the time of pH 13.

Description

200827944 九、發明說明: 【發明所屬之技術領域】 本發明係關於將含有羥化四烷基銨(以下簡稱為 • TAAH。)作為光阻劑之顯影液使用之後,將溶解來自光阻 劑之有機物(以下簡稱為,來自抗蝕劑之有機物。)之含有 TAAH之顯影廢液,藉由碳酸氣體中和之新穎的中和方、去 烊吕之,係關於在將含有TAAH之顯影廢液中和時可防止 鲁於塔内因?餘劑的析出而塞住,且中和時所析出的抗触劑 的過濾性高’因此可有效去除含於該顯影廢液中的抗蝕劑 之中和方法者。 片 【先前技術】 ㈣導體.液晶製造步驟,於晶圓、玻璃等基板上形 寸,於形成在基板表面之金屬層塗佈負片型或正片 對此,由形成該圖案用的光罩曝光,對未硬 ^硬化部分❹顯影㈣影後,進行料而進行於 ^屬層形成圖案之作業。隨著半導體 韻闲於制 卞 < 阿積體化, 對用於i造步驟之藥劑等,嚴格限制 混入雜質,特別Η人H _ 卞夺餵I k步驟 使用,不人I, 子等。因此’於微影步驟廣泛地 3孟屬離子之鹼液之TAAH為主成分 特別是近年,隨著半導體.液晶的生產量的二4二 液之排出量。 Η之纟、、員衫廢 至今’上述含有TAAH之顯影廢液’係藉由習知的排200827944 IX. Description of the Invention: [Technical Field] The present invention relates to a solution containing a tetraalkylammonium hydroxide (hereinafter abbreviated as TAAH) as a photoresist, which is dissolved from a photoresist. A biological waste (hereinafter referred to as an organic substance derived from a resist), a development waste liquid containing TAAH, a neutralization method neutralized by carbonic acid gas, and a deuterium, which is a development waste liquid containing TAAH. During neutralization, it prevents the precipitation of the residual agent in the end of the column, and the anti-catalytic agent precipitated during neutralization has high filterability, so that the resist contained in the developing waste liquid can be effectively removed. And method. [Prior Art] (4) Conductor. The liquid crystal manufacturing step is formed on a substrate such as a wafer or a glass, and a negative film or a positive film is applied to a metal layer formed on the surface of the substrate, and the photomask for forming the pattern is exposed. After the unhardened and hardened portion is developed (four), the material is processed to form a pattern on the layer. With the semiconductor rhyme in the process of 卞 阿 阿 阿 阿 阿 阿 阿 阿 阿 阿 阿 阿 阿 阿 阿 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于 用于Therefore, in the lithography step, the TAAH of the lye of the genus of the genus is the main component, especially in recent years, with the discharge amount of the liquid of the semiconductor. Η之纟, 衫衫废 Until now, the above-mentioned TAAH-containing developing waste liquid is by conventional row

2030-9240-PF 5 200827944 水處理進打無害化而廢棄,以資源的有效利用為目的,提 $有由上述廢液回收TAAH,純化在利用之含有ταμ之顯 如苽液之再生方法。例如,提案有包含:將TAAH濃度濃 縮,1G質量%以上的已使用之ΤΑΑΗ水溶液,藉由碳酸氣 豆等之馱中和至该水溶液的pH成1 0以下,使來自抗蝕 ""有祙物析出之中和步驟;將於該中和步驟所析出之來 2抗鍅劑之有機物分離之分離步驟;及將由該分離步驟所 /于之液電解生A TAAH之電解步驟之方法(參照專利文獻 、在以碳酸氣體之含有TAAH之顯影廢液之中和,於7 、 之反應藉由生成ΤΑΑίί之碳酸鹽,以及重碳酿 鹽’降低溶解來自抗姓劑之有機物之τααη之比例。然後 由於在該顯影廢液中的來自抗钱劑之有機物之溶解度障 低,而來自抗钱劑之有機物析出,故可將此以過濾等操作 去除。2030-9240-PF 5 200827944 The water treatment is harmless and discarded. For the purpose of efficient use of resources, it is possible to recover TAAH from the above-mentioned waste liquid and purify the regeneration method using ταμ. For example, the proposal includes: a concentrated aqueous solution of cerium that is concentrated at a concentration of TAAH and used in an amount of 1% by mass or more, and is neutralized by a hydrazine of a carbonic acid gas or the like until the pH of the aqueous solution becomes 10 or less, so that it is derived from the resist "" a step of separating and extracting the material; a separation step of separating the organic substances of the anti-caries agent from the neutralization step; and a method of electrolyzing the A TAAH by the liquid in the separation step ( Referring to the patent literature, in the development waste liquid containing TAAH in carbonic acid gas, the reaction of 7, the formation of ΤΑΑίί carbonate, and the heavy carbon brewing salt 'reducing the ratio of τααη dissolved from the organic substance of the anti-surname agent Then, since the solubility of the organic substance derived from the anti-money agent in the developing waste liquid is low, and the organic substance derived from the anti-money agent is precipitated, it can be removed by filtration or the like.

_ 2TAAH + C〇2 (TAA)2C〇3 (式 D (taa)2c〇3 + H2〇 + c〇2 今 2(TAA)HC〇3 (式 2) 上述再生方法,可將主要的雜曾 ]雑貝之來自抗蝕劑之有機 物,以過濾等簡便的操作去除,特 于 %別疋作為用於中和之酸 使用碳酸氣體時,由於金屬離子耸太 卞寺在於+導體製造步驟成 為問題之雜質的混入少,故得於 營 糸於工業上有利的含有ΊΑΑ] 之顯影廢液之再生方法。 專利文獻:專利第3110513號 2030-9240-PF 6 200827944 【發明内容】 [發明所欲解決的課題], 酸氣==吏雜質之來自則之有機物析出,以碳 體吹入二二之顯影廢液之中和步驟,單將碳酸氣 有機物的黏著性古,# 來自抗蝕劑之 阿,會附者於反應槽的内壁或連接於此之 官線内,常常將兮笠 疋丧於此之 劑之有機物俜微:子:,由於上述析出之來自抗钮 差,有降:::::狀’故在於去除步驟之過據性非常的 溶性古,故^ 問題點。並且,TAAH為強驗性且脂 問:危險,塞住之管線之咖^ [用以解決課題的手段] 0本^明者們,為達成上述目的,反覆銳意研究“士果, 發現藉由對溶解來自,“制> 士 u t 、、、口果 料㈣几餘劑之有機物之PH13以上的含有 ^四㈡銨之顯影廢液加人碳酸氣體中 =之有機物之析出,係由上述顯影廢液)二 m後進行中和至。h到達u·5附近,則大部分完 液的。H為歌有機物之析出’在上述顯影廢 %點至到達12之時點之區域特別顯著。 區域之炭酸氣體在於上述顯影廢液之所關 4I甲和之添加置,於 η】3 化四烷基銨每1莫耳tt,為Q 液中的經 捏大的絮狀物,可得,來自丄=:,可形成粒 劑之有機物之過濾性極高 。又’在於該操作由於來自抗钱劑之有機物以接 2030-9240-PF 7 200827944 近再結晶的狀態析出餘被 # 故確涊了該有機物的去除效率高。 並且’驚對的是發現上述析 <啊物黏者性低,可極為有地 防止配管等塞住,達至完成本發日月。 有^ 卩本毛㈣種合有經化四燒基銨之顯影廢液的中 和方法’其係藉由對溶解來自光阻劑之有機物之邱為13 二上的含有之顯影聽,加入碳酸氣體中和至pH成 、下者,、特徵在於:使上述顯影廢液的pH由i 3 之m到達12之時點之碳酸氣體之添加量,以在於邱 為13之時點之顯影廢液中的含有經化四烧基録每工莫耳 當量’ 〇.15L/hr以下進行。 、 再者本彳H種含有Μ化四烧基銨之顯影廢液的 中和方法,其係藉由對溶解來自光阻劑之有機物之pH超 過13.7的含有經化四烷基銨之顯影廢液,加入碳酸氣體 中和至、邱成11· 5以下者,其特徵在於:使上述顯影廢液 之ΡΗ成由13以上,13· 7以下的範圍之任意pH之第一中 1 /、、到達4任思的pH後的第二中和以別的反應槽進行, 二 '人务中和’使該顯影廢液的pH由1 3之時點至到 達12之時點之碳酸氣體之添加量,以在於pH為13之時 點之顯影廢液中的冬女、,一 r的3有搜化四烷基銨每1莫耳當量, 〇· 15L/hr以下進行。 [發明效果] 根據本發明φ 和方法’由於可使來自抗钱劑之有機 ^ ^/成粒l大的絮狀物而析出,故可得過濾性高的析出_ 2TAAH + C〇2 (TAA)2C〇3 (Formula D (taa)2c〇3 + H2〇+ c〇2 Today 2 (TAA) HC〇3 (Formula 2) The above-mentioned regeneration method can be used for the main impurity Mussels are organic substances from the resist, which are removed by simple operation such as filtration. Especially when the carbonic acid gas is used as the acid for neutralization, the metal ion towers in the temple is a problem in the + conductor manufacturing step. Since the mixing of the impurities is small, it is necessary to carry out a regeneration method of the development waste liquid containing ΊΑΑ] which is industrially advantageous. Patent Document: Patent No. 3110513 No. 2030-9240-PF 6 200827944 [Summary of the Invention] The problem], acid gas == 吏 impurities come from the organic matter, the carbon body is blown into the developing waste liquid of the second and second steps, the adhesion of the carbonic acid organic substance is ancient, #from the resist It will be attached to the inner wall of the reaction tank or the official line connected to it, and the organic matter of the agent will be smashed: sub:: Because the above precipitation comes from the resistance difference, there is a drop::: The ":" is based on the fact that the removal step is very toxic, so the problem is. TAAH is a strong and fat question: dangerous, plugged in the pipeline of the coffee ^ [means to solve the problem] 0 ^ ^ Ming, in order to achieve the above objectives, repeatedly researched "scientific, found by dissolution From the "developing waste liquid" of the developing waste liquid containing the tetra-(di)ammonium of the organic matter of the above-mentioned "preparation of the organic matter of the ut", ", and the fruit material (4), the addition of the organic matter of the carbonic acid gas After two m, neutralize to. When h reaches near u·5, most of it is finished. H is the precipitation of the organic matter of the song. The area at the point of the above-mentioned development waste % point to the time of reaching 12 is particularly remarkable. The carbonic acid gas in the region is added to the above-mentioned developing waste liquid, and is added to the η]3 tetraalkylammonium per lm, which is a pinched floc in the Q liquid, which is available. From 丄 =:, the organic matter that can form granules is extremely highly filterable. Further, in this operation, since the organic substance derived from the anti-money agent is precipitated in the state of near recrystallization of 2030-9240-PF 7 200827944, it is confirmed that the removal efficiency of the organic substance is high. And the stunned is that the above analysis is found to have a low viscosity, which can prevent the piping from being plugged up to the completion of the date. There is a method for neutralization of a developing waste liquid containing tetraammonium hydride (4), which is prepared by adding a carbonic acid to a substance containing a substance derived from a photoresist. The neutralization of the gas to the pH is as follows: the amount of the carbonic acid gas at the point where the pH of the developing waste liquid reaches the time point from i 3 to 12, in the developing waste liquid at the time point of 13 It is carried out with a molar ratio of 〇.15L/hr per gram of the base of the chemical vaporization. Further, a neutralization method of H kinds of developing waste liquid containing deuterated tetraalkylammonium is carried out by developing waste containing tetraalkylammonium having a pH of more than 13.7 in which the organic substance derived from the photoresist is dissolved. The liquid is added to the neutralization of the carbonation gas to a temperature of 9.5 or less, and the enthalpy of the development waste liquid is 13 or more, and the first of any pH in the range of 13.7 or less is 1/, The second neutralization after reaching the pH of 4 Rensi is carried out in another reaction tank, and the amount of carbonic acid gas added to the pH of the developing waste liquid from the time point of 13 to the point of reaching 12 is In the developing waste liquid at the time point of the pH of 13, the 3rd searched tetraalkylammonium is carried out every 1 molar equivalent, 〇·15 L/hr or less. [Effect of the Invention] According to the present invention, φ and the method can be precipitated by the organic flocculating agent from the anti-money agent, so that a highly filterable precipitate can be obtained.

物因此,可有效地進行在於中和反應以後的電解步驟成 2030-9240-PF 8 200827944 問通之來自抗餘冑j t 朴 有機物之去除。又,由於上述析屮私 黏者性低,而不备斜总 厅出物 曰十S線黏著,故不會塞住管線等, 上安全有效。 菜 再者,上述顯影廢液的PH成13以上,13 7以 圍之任意Ρίί之第一, 、 ld·7以下之範 ϋ,/、到達該任意ρίί後之第一 + 和,以別的反應_推/ ^ 欠心弟一中 〜槽進仃,由於可將各個中和 故可縮短在於中和之作 丁也進仃, 您介業時間,工業上效率佳。 【實施方式】 (溶解來自抗餘劑之右 詳細說明用^ 有ΤΑΑΗ之顯影廢液) 、、、 月用於本發明之溶解爽自j工# w , 人古ΤΛΛυ 解不自抗飿劑之有機物之 5有ΤΑΑΗ之顯影廢液( ^ X ^ ^ 广早%為含有ΤΑΑίί之顯影廢 液。)。於本發明,了 A A Η十曰碰 /、體例’可舉經化四甲基銨、 羥化四乙基銨、羥化四丙基 々士 ☆ 丞叙羥化四丁基銨等。上述ΤΑΑΗ 之中’以廣泛地使用於半導 ^ ^ /± 千V體製以步驟之顯影液之點,可 較么地使用羥化四甲基錢。 用於本發明之中和方法之含 THH、曲洽 有丁AAH之顯影廢液中的 TAAH浪度,並無特別限制, 使用各種TAAH濃度之顯影 廢液。於半導體製造步驟所 · ’、 # 之頒衫廢液中的ΤΑΑίί濃 度通吊為li以下之程度,惟將 料3有TAAH之顯影廢液之中 和在工業上效率良好地進行之 ^ ^ ^ ^ 硯^,又,由可減少該顯影 廢液之運輸成本之觀點,進行f 人士 m 订,辰‘,以提高TAAH含率之 含有TAAH之顯影廢液為佳。 ΤΛΑΙί ^ ^ 茨3有ΤΑΑΙΙ之顯影廢液之 ΤΑΑΗ浪度,如上所述過低則包 5連輸成本等之處理成本變 9Therefore, it is effective to carry out the electrolysis step after the neutralization reaction to 2030-9240-PF 8 200827944 to ask for the removal of the organic matter from the anti-Ember. In addition, since the above-mentioned analytic smuggling is low, and the shovel is not attached to the shovel, the S10 S line is adhered, so that the pipeline is not plugged, and it is safe and effective. In addition, the pH of the above-mentioned developing waste liquid is 13 or more, 13 7 is the first of any Ρίί, ϋ·7 or less, /, the first + and after reaching the arbitrary ρ ίί, Reaction _ push / ^ owe to the heart of a younger ~ trough into the 仃, because each can be shortened in the neutralization of the Ding also into the 仃, your time, industrial efficiency. [Embodiment] (Dissolving the right-hand side of the anti-reagent from the detailed description of the use of the developing waste liquid),,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The organic waste material 5 has a developing waste liquid (^ X ^ ^ is widely used as a developing waste liquid containing ΤΑΑίί.). In the present invention, A A Η 曰 / 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Among the above, 'the use of hydroxylated tetramethyl ketone can be used more widely in the point of use of the developing solution of the semi-conducting ^ ^ / ± 千V system. The TAAH irradiance in the developing waste liquid containing THH and arbitrage AAH used in the method and method of the present invention is not particularly limited, and various developing waste liquids of TAAH concentration are used. In the semiconductor manufacturing process, the concentration of ΤΑΑ ί ί ί ί ί ί ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ̄ ^ 砚^, Furthermore, from the viewpoint of reducing the transportation cost of the developing waste liquid, it is preferable to carry out the development waste liquid containing TAAH in order to increase the TAAH content. ΤΛΑΙί ^ ^ 茨3 has a smashing development waste liquid, as described above, the processing cost becomes lower than the cost of the package.

2030-9240-PF 200827944 高,過高則漠縮所需處理成本變冑,故該含# τΑΜ之顯 影廢液之ΤΑΑΗ濃度,以10~30質量%為佳。 藉由上述濃縮等,提高ΤΑΑΗ含率之含有ΤΑΑΗ之顯影 廢液之pH為13〜15,一般為14〜14. 7之範圍。 又,於上述含有ΤΑΑΗ之顯影廢液,溶解有來自抗蝕 劑之有機物。關於上述來自抗㈣之有機物之濃度,雖依 顯影後之來自抗㈣彳之有機物之溶解量,及在於上述濃縮 後之ΤΑΑΗ濃度之來自抗兹劑之有機物之溶解度而異,惟 於本發明之中和方法,由於溶解於供於中和反應含有Μ 之顯影廢液之來自抗_之有機物之濃度越高,該有機物 之去除效率高,故較有效。 溶解於上述含有ΤΑΑΗ之顯影廢液之來自抗#劑之有 機物之濃度’例如,在於半導體製造步驟所排出之含有 UAH之顯影廢液以⑽換算,為數十〜數百_。又,近 :’提案有對-度供於顯影步驟之含# Τααη之顯影廢液 :加含有ΤΑΜ之顯影廢液調整ΤΑΑΗ濃度後,直接將該調 ι液再利用於顯影步驟之含"ΑΑΗ之顯影廢液之有效利 用法,該含有簡之顯影廢液中的來自抗㈣之有機物 之痕度有較上述濃度高之傾向。於任何含請Η之顧影 廢液’如上所述,ϋ由濃縮等提高mH之含率,並且亦 =來自抗㈣之有機物濃縮。因此,溶解於侧濃度為 :〜3°質量%之含有侧之顯影廢液之來自抗姓劑之有機 物之濃度’通常以⑽換算為數千〜測g卿程度。 (碳酸氣體) 10 2030-9240-pf 200827944 於本發明之中和方法,對pH為13以上的含有簡 之顯影廢液’藉由加入碳酸氣體中和之。於本發明使用之 厌3夂乱體’、要是工業上可人手之碳酸氣體可無任何限制 地使用。X,亦可使用以惰性氣體稀釋之碳酸氣體。將含 有TAAH之顯影廢液以碳酸氣體中和後,將生成之碳酸鹽 及重錢鹽電解’則生成觀之外將副產電解氣體,該 電解乳體主要含有碳酸氣體,亦可作為碳酸氣體之再利用 將該電解氣體使用作為用於中和反應之碳酸氣體。 (碳酸氣體之添加量) 毛月係藉由對pH為1 3以上的含有TAAH之顯影 廢液’加入碳酸氣體中和2030-9240-PF 200827944 High, too high, the processing cost required for the shrinking is changed, so the concentration of the sputum containing #τΑΜ is preferably 10~30% by mass. The range of the pH of the developing waste liquid containing the enthalpy of the enthalpy of the present invention is from 13 to 15 and is generally in the range of from 14 to 14.7. Further, in the above-mentioned developing waste liquid containing ruthenium, an organic substance derived from a resist is dissolved. The concentration of the organic substance derived from the anti-(4) is different depending on the solubility of the organic substance derived from the anti-(tetra) antimony after development, and the solubility of the organic substance derived from the anti-stripping agent in the concentration of the deuterium after the concentration, but the present invention In the neutralization method, since the concentration of the organic substance derived from the anti-depletion dissolved in the developing waste liquid containing hydrazine in the neutralization reaction is high, the removal efficiency of the organic substance is high, which is effective. The concentration of the organic substance derived from the anti-# agent dissolved in the above-mentioned developing waste liquid containing ruthenium is, for example, tens to hundreds of _ of the developing waste liquid containing UAH discharged in the semiconductor manufacturing step in terms of (10). Further, near: 'Proposal has a development waste liquid containing # Τααη for the development step: after adding the developing waste liquid containing hydrazine to adjust the hydrazine concentration, the solution is directly reused in the development step" In the effective use method of the developing waste liquid, the trace of the organic substance derived from the anti-(4) in the simple developing waste liquid tends to be higher than the above concentration. As described above, the slag of the sputum is increased by the concentration, etc., and the organic matter from the anti-(4) is concentrated. Therefore, the concentration of the organic substance derived from the anti-surname agent in the developing waste liquid having a side concentration of ~3°% by mass is usually in the range of (10) to several thousands. (Carbonate gas) 10 2030-9240-pf 200827944 In the present invention, a method is used to neutralize a developing waste liquid having a pH of 13 or more by adding carbonic acid gas. The use of the carbon dioxide gas which is industrially usable can be used without any limitation. X, a carbonic acid gas diluted with an inert gas may also be used. After the development waste liquid containing TAAH is neutralized by carbonic acid gas, the produced carbonate and heavy money salt are electrolyzed, and a by-product electrolytic gas is mainly produced, and the electrolytic emulsion mainly contains carbonic acid gas or carbonic acid gas. The reuse gas is used as the carbonic acid gas for the neutralization reaction. (Addition amount of carbonic acid gas) Maoyue is added to carbon dioxide gas neutralization by developing waste liquid containing TAAH having a pH of 13 or more

夕链史啟、六 Y和至PH成U·5以下之含有TAAH 之^衫廢液的中和方法,i田 ,、取大特徵在於:使上述顯影廢 液的 pH 由 13 之 a# $ η、土 4 ^ , 、”,到達12之時點之碳酸氣體之添加 里’以在於ΡΗ為13之時點之顯影廢液中的漏每 耳當量’調整為〇. 15L/h 、 r(以下,蛟酸氣體之體積,係以 之體積標示)以下,以。.亂/hr以下更佳。 σ上所述,來自抗飿劑 '、访夕Η ^ 』之有機物之析出,係在上述顯影廢 液之pH由13附近之睹赴 ^ γ ^ 、"、、’至到達pH 12之十點之區域顯 著。因此,藉由調整在於卜、十、厂丄 貝 %敫十A 、上述區域之碳酸氣體之添加量, 凋正來自抗蝕劑之有機 析出物。 之析出逮度’而可得過濾性高的 上述碳酸之添加量,魏小 ^ ΛΑ ^ 越ν末自抗蝕劑之有機物之析出 速度的調整效果越高,作3 Λ田、 竹出 ,,. 一疋如果過少則由於中和處理叙 時,故考慮工業上的效率柹 里粍 双丰性,以0.05L/hr以上為佳,以 2030-924 0~pp 200827944 〇· 01L/hr以上更佳。 λ、又’來自抗银劑之有機物,在PH到達11.5之時點大 刀析出口此’將現影廢液之pH由13之時點至到達11. 5 之時點之碳酸氣體之添加量調整為上述添加量,由可得過 濾性局的析出物之點較佳。 於上述區域之碳酸氣體之添加量’於pH為13之時點 之顯影廢液中的TAAH# i莫耳當量,超過,則 來自抗㈣之有機物之析出速度之調整效果低,而由於來 自抗:劑之有機物將以黏著性高的狀態或微粒子狀析出 不么·另方面,上述碳酸氣體之添加量過低,則由於 中#反應所而之時間會變長,故考慮工業上的效率等,由 P Η由1 3之時點至5!丨;查1 9 1 1 r , 、、 到達I2或11.5之時點之時間適宜決定 上述碳酸氣體之添加量即可。通常,由ρΗ由13之時點至 料12之時點所需之時間為U〜10小時’以2.〇〜10小 時為佳’或上述顯影廢液之由ΡΗ由13之時點至到達u.5 之k點所而之時間為3〜3〇小時,最好以時適宜 決定碳酸氣體為佳。 ①以上述添加量開始添加碳酸氣體之時點(以下,稱為 石反酸氣體添加調整起妒點、 、 匙始點),只要是上述含有TAAH之顯影 廢液之PH到達13之時點即可,考慮進行中和之設備、處 理此力專’適宜決定即可。例如,考慮安全性,可將碳酸 乳體添加調整起始點設定較PH13為上。&,亦可將由中 和開始至終點之所有的 μ P ^ 、、、 7百的ΡΗ &域之碳酸氣體之添加量以上 述添加量,惟中和及藤%强 Υ布反應所須之反應時間變長,而難說有工The neutralization method of the shackle Shichi, Liu Y, and the TAAH-containing sap waste liquid, which is below the pH of U·5, i, is characterized by: the pH of the developing waste liquid is 13 a# $ η , soil 4 ^ , , ", the addition of carbonic acid gas at the time of reaching 12" is adjusted to 〇. 15L/h, r (below, 蛟, in the amount of leakage per ear in the developing waste liquid at the time of ΡΗ13) The volume of the acid gas is indicated by the volume of the acid gas. The chaotic/hr or less is better. As described above, the precipitation of the organic matter from the anti-caries agent ', visit Η Η ^ 』 is based on the above-mentioned developing waste liquid The pH is from the vicinity of 13 to ^ γ ^, ",, 'to reach the 10 o'clock of the pH of the region is significant. Therefore, by adjusting the Bu, Shi, factory mussels% 敫 10 A, the above areas of carbonic acid The amount of gas added is positively derived from the organic precipitate of the resist. The precipitation of the precipitate is ', and the addition amount of the above-mentioned carbonic acid having high filterability is obtained, Wei Xiao ^ ΛΑ ^ The final precipitation of the organic substance from the resist The higher the speed adjustment effect, the 3 Λ田, 竹出,,, 疋, if too little, because of the neutralization process, so the test Industrial efficiency is double-beneficial, preferably 0.05L/hr or more, preferably 2030-924 0~pp 200827944 〇· 01L/hr or more. λ, and 'organic matter from anti-silver agent, at PH When the time reaches 11.5, the large knife exits the outlet. The pH of the liquid waste liquid is adjusted from the time point of 13 to the point of reaching 1. 5 to the above-mentioned addition amount, and the point of the precipitate of the filterability is obtained. Preferably, the addition amount of the carbonic acid gas in the above region is less than the TAAH# i molar equivalent in the developing waste liquid at the time point of pH 13, and the adjustment effect of the precipitation rate from the organic substance resistant to (d) is low, The organic substance derived from the anti-agent is precipitated in a state of high adhesion or fine particles. On the other hand, if the amount of the carbonic acid gas added is too low, the time due to the reaction of the medium # is longer, so industrial consideration is considered. Efficiency, etc., from P Η from 1 3 to 5! 丨; check 1 9 1 1 r , , , the time to reach I2 or 11.5 is appropriate to determine the amount of carbon dioxide added. Usually, by ρ Η by 13 The time required from the time point to the time of material 12 is U~10 hours. It is preferable that the time of 2. 〇 10 hours is good or the time of the above-mentioned developing waste liquid is from the time point of 13 to the point k of reaching u. 5 is 3 to 3 hours, and it is preferable to appropriately determine the carbon dioxide gas at the time. (1) When the carbon dioxide gas is added at the above-mentioned addition amount (hereinafter, it is referred to as a stone acid reflux gas addition adjustment point, a key start point), as long as the pH of the above-mentioned TAAH-containing development waste liquid reaches 13 Yes, consider the process of neutralizing the equipment, and handle this force. The appropriate decision can be made. For example, considering the safety, the starting point of the addition of the carbonated milk can be set to be higher than PH13. &, the addition amount of all the μ P ^ , , and 7 hundred ΡΗ & carbonic acid gases from the start to the end of the neutralization may be the above-mentioned addition amount, but the neutralization and the rattan The reaction time becomes longer, and it is hard to say that there is work.

2030-9240-PF 12 200827944 旦業上的效率。因此,在於邱超過]3. 7之含有taah之顯 影廢液,特別適合將碳酸氣體添加調整起始點適宜設定於 ρΗ]3以上〗3· 7以下之範圍之任意ρΗ。 (碳酸氣體之添加方法) ^以上述添加量添加碳酸氣體之方法,只要在上述碳酸 氣體之添加量的範圍内,碳酸氣體之供給方法可採用已知 之方=例如’間歇地供給碳酸氣體之方法,將碳酸氣體 以一定量連續供給之方法等。 於上述碳酸氣體之添加方法之中,連續定量供給碳酸 氣體之方法,由工業管理較容易之點、反應裝置簡便之點 而佳。 (至碳酸氣體添加調整起始點之中和) ;^ 至上述石厌酸氟體添加調整起始點之中和 (乂下稱為第一中和。),關於其反應條件等考慮進行中 和反應^設備 '處理能力等適宜決定即可。如上所述,可 使在於第中和之&酸氣體添加量’為碳酸氣體添加調整 起始點以後之中和(以下 — %為弟一中和。)之添加量,惟 中和反應所需之反應時間將變長,而難以說有卫業上的效 率口此於第+和之碳酸氣體之添加量,以較第二中 和之礙酸氣體之添加量多量為佳。 但是,根據條件,由於 田於因供給之碳酸氣體之偏流而產 生溝流或逆混,後酸氣^ 乳體於反應槽内並不均勻擴散,產生 碳酸氣體之濃度較高的部八 门的口P刀。上述碳酸氣體的濃度高之 處’由於顯影廢液之备辦k ^、交低’故一部分的來自抗钱劑2030-9240-PF 12 200827944 Efficiency in the industry. Therefore, it is particularly suitable for the tarax-containing photographic waste liquid of 7.3, which is particularly suitable for setting the carbonic acid gas addition adjustment starting point to an arbitrary ρ 范围 in the range of ρΗ]3 or more and 3.7 or less. (Method of Adding Carbonic Acid Gas) ^ A method of adding a carbonic acid gas in the above-described addition amount, as long as the carbonic acid gas is supplied in a range of the above-mentioned amount of the carbonic acid gas, a known method can be used, for example, a method of intermittently supplying carbonic acid gas A method in which carbonic acid gas is continuously supplied in a certain amount. Among the above methods for adding carbonic acid gas, the method of continuously and quantitatively supplying carbonic acid gas is preferable because industrial management is easy and the reaction apparatus is simple. (to the middle of the adjustment of the addition of carbonic acid gas); ^ to the above-mentioned stone anaerobic fluorine addition adjustment starting point and (under the nickname referred to as the first neutralization), regarding the reaction conditions and other considerations in progress It is sufficient to determine the processing ability of the reaction equipment. As described above, it is possible to add the amount of the neutralization & acid gas addition amount to the neutralization after the start of the addition of the carbonic acid gas (hereinafter, -% is the neutralization), but the neutralization reaction The reaction time required will become longer, and it is difficult to say that the efficiency of the health industry is higher than the addition amount of the second neutralized acid gas. However, depending on the conditions, due to the channel flow or backmixing caused by the bias of the supplied carbonic acid gas, the post-acid gas emulsion does not uniformly diffuse in the reaction tank, resulting in a high concentration of carbonic acid gas. P knife. The high concentration of the above carbonic acid gas is due to the preparation of the waste liquid, and the low amount of the developing waste liquid.

2030-9240-PF 13 200827944 有枝物,在逹至上述碳酸氣體添加調整起始點之前,以 黏著性高的狀態析*,黏著於管線等,而有塞住的可能。 因此,使在於上述第一中和之碳酸氣體之添加量,以該中 和鈾之顯影廢液中的羥化四烷基銨每j莫耳當量,1 以下,以0· 7L/hr以下進行更適合。 又,上述碳酸氣體之添加量越少,雖第丨中和之來自 抗=劑之有機物之析出防止效果高,但若過少則中和處理 耗時,故考慮工業上的效率性,以〇. 1L/hr以上為佳。 (中和的終點) 山於本發明之中和方法,關於含有TAAH之顯影廢液以 碳酸氣體之中和終了點,可以該顯影廢液之仙為ιΐ5以 下,考慮中和步驟以後的,使用於來自抗蝕劑之有機物之 分離步驟之過濾膜之耐久性,或在於電解步驟之該顯影廢 液之pH之影響專適宜設定。上述中和終點,通常只要^ PH8〜11· 5之範圍適宜設定即可。又,關於上述顯影廢液之 pH較11 · 5低之時點之中和,關於其反應條件等考慮進行 中和反應之設備’處理能力等適宜決定即可。 特別是在於本發明之中和方法,由於上述來自抗蝕劑 之有機物,在上述顯影廢液之pH到達12〜η· 5之時點析 出大部分,故將中和終了點適宜設定於ρΗη〜η· 5之範圍 特別適合。將中和之終點設定於上述範圍内,於上述理由 之外,由於可縮短中和所需之時間之點,由於ρΗ未滿〗」.5 用於TAAH碳酸鹽之中和之碳酸氣體之反應效率會降低, 故進行中和需要過量的碳酸氣體之點,於電解步驟,對以 2030-9240-PF 14 200827944 碳酸鹽1莫耳之電解生成2莫耳之TAAH,對重碳酸鹽1 f耳生成之TAAH為1莫耳,故供於電解之顯影廢液中的 石反酸鹽的比例越多電力效率越高之點等理由亦特別佳 (中和方法之方式) 例示,上述在於本發明之中和方法之方式,則可舉使 用1個反應槽之中和方法、使用2以上之複數反應槽之中 和方法。其中,使用i個反應槽之中和方&,可舉:以中 和王體之pH為1 3之時點之顯影廢液中的Taah每^莫耳 當量,成〇.15L/hr以下之-定的碳酸氣體之添加量進 中和反應之方法;於上述第一中和與第二中和,改變碳酸 =量:行之方法。又’使用上述2以上的複數之反應 才曰之中和方法,可舉將第一中和及 槽進行之方法。 的反應 於上述方式之中,使用2以上的複數反應槽,將第一 中和與弟二中和以個別的反應槽進行中和之方法,係可於 各個反應槽獨立作步驟管理支點’又’可獨立平行地進行 ^而可縮短作業時間之點為佳。再者,㈣-中和與第 數的反應槽進行。押是,反歸2將各個中和分別以複 之步驟管理或反應操作會變繁雜,及伴隨 = 成本等之問題,將卜中㈣之3又置之 r ^弟一中和分別以U固反應槽 進仃取“。(以2個反應槽之中和方法) 二 =細說明將第一中和與第二中和分別以〗個反 丁之本發明之中和方法。圖1係表示於本發明,將2030-9240-PF 13 200827944 There is a branch, which is deposited in a state of high adhesion before the above-mentioned carbonic acid gas addition adjustment starting point, adheres to the pipeline, etc., and is likely to be plugged. Therefore, the amount of the carbonic acid gas to be added in the first neutralization is such that the amount of the hydroxylated tetraalkylammonium in the developing waste liquid of the neutralized uranium is 1 or less, and is less than or equal to 0.7 L/hr. More suitable. Further, the smaller the amount of the carbonic acid gas added, the higher the precipitation prevention effect of the organic substance derived from the anti-drug neutralized by the second, but the neutralization process takes too much if it is too small, so industrial efficiency is considered. More than 1 L/hr is preferred. (End point of neutralization) In the present invention and method, the developing waste liquid containing TAAH is neutralized with carbonic acid gas, and the scent of the developing waste liquid can be ιΐ5 or less, and after the neutralization step, use The durability of the filtration membrane at the separation step of the organic substance from the resist or the influence of the pH of the development waste liquid in the electrolysis step is specifically set. The above neutralization end point is usually set as long as the range of PH8 to 11·5 is appropriately set. In addition, it is sufficient that the pH of the developing waste liquid is lower than the time of 11.5, and the processing ability such as the reaction condition for the neutralization reaction, etc., may be appropriately determined. In particular, in the method and method of the present invention, since the organic substance derived from the resist precipitates most of the pH of the developing waste liquid when it reaches 12 to η·5, the neutralization end point is suitably set to ρΗη~η. · The range of 5 is particularly suitable. The end point of the neutralization is set within the above range, and in addition to the above reasons, since the time required for the neutralization can be shortened, the reaction of the carbon dioxide gas neutralized by TAAH carbonate is not satisfied. The efficiency will be reduced, so the point of neutralization requires an excess of carbonic acid gas. In the electrolysis step, 2 mol of TAAH is generated by electrolysis of 20 mol of 2030-9240-PF 14 200827944 carbonate, and 1 f of bicarbonate is used. The generated TAAH is 1 mol, so the more the proportion of the stone acid salt in the developing waste liquid for electrolysis is, the higher the electric power efficiency is, and the like is also preferable (the method of the neutralization method). The above is the present invention. In the method of the neutralization method, a method of neutralizing one reaction tank and a method of neutralizing a complex reaction tank of two or more may be used. Wherein, the sum of the squares of the i-reaction tanks is used, and the Taah per mole equivalent in the developing waste liquid at the time when the pH of the king's body is neutralized is set to be less than or equal to 15 L/hr. The method of adding the amount of carbonic acid gas to the neutralization reaction; in the above first neutralization and the second neutralization, changing the carbonation amount: the method. Further, a method of using the above two or more complex reactions, and a method of performing the first neutralization and the grooves can be mentioned. In the above method, the first neutralization and the second neutralization are neutralized by individual reaction tanks using a complex reaction tank of 2 or more, and the fulcrum can be independently managed in each reaction tank. 'It is better to perform the operation in parallel and to shorten the working time. Further, (4)-neutralization is carried out with the number of reaction tanks. The bet is that the anti-return 2 will be complicated by the step management or reaction operations of the various neutralizations, and the problems accompanying the cost, etc., will be placed in the middle of the four (4) and the other The reaction tank is pumped in. (The method of neutralizing the two reaction tanks) 2 = The neutralization method of the present invention in which the first neutralization and the second neutralization are respectively reversed. Fig. 1 shows In the present invention,

2030-9240-PF 15 200827944 第一中和與第二中和以個別的反應槽進行之最佳的離樣 之示意圖。 (第一中和) •於反應槽1,進行第一中和。含有TAAH之顯影廢液, 以含有TAAH之顯影廢液供給管3供給。於反應槽},以碳 酸氣體供給管4供給碳酸氣體於反應槽1内進行中和,該 反應液以幫浦5排出反應槽1處理費義肢供給管線6,以 籲該供給管線6,供給反應槽2。未反應之碳酸氣體等,以 未反應氣體排出管線7排出系外。 如上所述,於第一中和之碳酸氣體之添加量,考慮進 行中何反應之設備、處理能力等適宜決定即可,惟由工業 上的效率之觀點’以較第二中和之碳酸氣體之添加量多量 為佳。再者,考慮於反應槽1内之碳酸氣體之偏流之溝流 或逆混之影響,使該中和前之顯影廢液中的含有羥化四烧 基銨每1莫耳當量,1. Ο/hr以下進行更佳。 φ 再者藉由於反應槽1設置幫浦8及循環管線9,於上 述循環管線中設置反應測定裝置1 〇,可管理於反應槽i 之反應。該反應測定裝置,只要已知供於反應之含有taah 之顯影廢液之濃度,則可容易地算出在於反應槽1之中和 終點之T A A Η及碳酸鹽之?辰度’故p Η測定儀之外,亦可使 用超音波濃度劑等,測定容易中的溶質濃度之習知之測定 裝置。 於上述中和,反應液之發泡成問題時,可於上述循環 管線中設置碳酸氣體供給管線,在將碳酸氣體以線上混合 2030-9240-PF 16 200827944 經由該循環管線 ^射出裔荨供給手段供給該循環管線 導入反應槽。 關於在反應槽1之中和反應之反應溫度,考岸含有 ΤΑΜ之顯影廢液為水溶液之點,及溫度過高則含^_ 之顯影廢液中的抗姓劑析出或固型化而降低與碳酸氣體 :反應效率之點’以°。"。。。,特別以2〇销之間進行 中和為佳。 具體例示上述反應槽丨之種類,則可舉具有攪拌翼之 反應槽,充填充㈣之錢氣體之擴散㈣提升充填塔, ,上述合有ΤΑΑΗ之顯影廢液由塔頂部流通於塔底部,由 塔底部供給《氣體,以向㈣作使ΤΑΑΗ與碳酸氣體接 觸反應之中和塔等。於上述反應槽之中,藉由向流操作反 應之中和塔,可連續進行中和而更適合。 士上所述’於第一中和’將上述中和塔以具有複數塔 板^之多段塔進行中和之方法,以塔板u區隔之各段内 可容易地將上述顯影廢液之PH保持一定,藉由上述顯影 X夜由。頂側向塔底侧經由各段流通,可階段地降低顯影 廢液之pH而特別佳。 用於上述多段塔之塔板! j,係以貫通複數孔之多孔板 牛液板12所形成。上述TAAH顯影廢液,經由降液板^ 2 ^塔頂部向塔底部流通,碳酸氣體,係經由多孔板之孔由 塔底部向塔頂部流通β TAAH顯影廢液之中和塔内之流通速 度,可藉由降液板12之内徑控制。上述降液板12之内徑, 過低則中和反應所需之反應變長而並不經濟,過高則上述 2030-9240-PF 17 200827944 顯影廢液之流動速度的調整效果低,故對中和塔内經,以 〇·卜〇.5%,特別是以〇· 2〜1.0%為佳,又,碳酸氣體之流通 速度’可藉由多孔板之數值孔徑控制,該數值孔徑,過低 則中和反應所需之反應變長而並不經濟,過高則上述顯影 廢液之流動速度的調整效果低,故對中和塔内徑,以3〜1 〇 % 為佳。 又’關於上述多段塔之塔板1 1之數目,數目越多, _ 即區隔之段數越高pH的調整效果越高,區隔過多則耗費 多段塔的製造成本,故塔板U之數目以2〜4,即上述顯影 廢液流通之段數以3〜5段為佳。 再者,以促進碳酸氣體之均勻的擴散之目的,以塔板 11區隔之各段内充填充填劑特別佳。該充填劑可無任何限 制地使用用於氣液反應之習知之充填劑。 (第二中和)2030-9240-PF 15 200827944 Schematic diagram of the best neutralization of the first neutralization and the second neutralization with individual reaction tanks. (First Neutralization) • In the reaction tank 1, the first neutralization was performed. The developing waste liquid containing TAAH is supplied in a developing waste liquid supply pipe 3 containing TAAH. In the reaction tank, carbonic acid gas is supplied to the reaction tank 1 for neutralization by the carbon dioxide gas supply pipe 4, and the reaction liquid is discharged from the reaction tank 1 by the pump 5 to process the fertilization limb supply line 6, so as to appeal the supply line 6, and supply the reaction. Slot 2. Unreacted carbonic acid gas or the like is discharged outside the system by the unreacted gas discharge line 7. As described above, the amount of the carbonic acid gas to be neutralized in the first neutralization may be appropriately determined in consideration of the equipment for the reaction, the processing ability, and the like, but the viewpoint of industrial efficiency is to use the second neutral carbon dioxide gas. The amount of addition is preferably a large amount. Further, considering the influence of the flow or the back-mixing of the carbon dioxide gas in the reaction tank 1, the hydrogenated tetraalkylammonium in the developing waste liquid before the neutralization is made per 1 molar equivalent, 1. Ο It is better to do it below /hr. φ Further, by providing the pump 8 and the circulation line 9 in the reaction tank 1, the reaction measuring device 1 is provided in the above-mentioned circulation line, and the reaction in the reaction tank i can be managed. In the reaction measuring apparatus, as long as the concentration of the developing waste liquid containing taah for the reaction is known, the TAA Η and the carbonate of the reaction tank 1 and the end point can be easily calculated. In addition, a conventional measuring device for measuring the concentration of solute in an easy manner can also be used by using an ultrasonic concentration agent or the like. In the above neutralization, when the foaming of the reaction liquid is a problem, a carbonic acid gas supply line may be disposed in the circulation line, and the carbonic acid gas may be mixed by the line 2030-9240-PF 16 200827944 through the circulation line. The circulation line is supplied to the reaction tank. Regarding the reaction temperature in the reaction tank 1 and the reaction, the development waste liquid containing ruthenium is used as an aqueous solution, and when the temperature is too high, the anti-surname agent in the development waste liquid containing _ is precipitated or solidified and lowered. With carbonic acid gas: the point of reaction efficiency 'in °. ". . . In particular, it is better to neutralize between 2 sales. Specifically, the type of the reaction tank is exemplified by a reaction tank having a stirring blade, and the filling of the (4) money gas is filled (4) to enhance the filling tower, and the developing waste liquid having the enthalpy is distributed from the top of the tower to the bottom of the tower. The gas is supplied to the bottom of the column to make the reaction between the ruthenium and the carbonic acid gas and the tower. Among the above reaction tanks, by neutralizing the column to the flow operation, it is possible to continuously perform neutralization and is more suitable. In the above-mentioned "first neutralization", the above-mentioned neutralization tower is neutralized by a multi-stage tower having a plurality of trays, and the above-mentioned developing waste liquid can be easily disposed in each section of the tray u partition. The PH remains constant, by the above development X night. The top side flows to the bottom side of the column through the respective stages, and the pH of the developing waste liquid can be lowered stepwise, which is particularly preferable. Used for the tray of the above multi-stage tower! j is formed by a porous plate bovine plate 12 which penetrates a plurality of holes. The TAAH developing waste liquid flows through the bottom of the downcomer plate to the bottom of the column, and the carbonic acid gas flows through the pores of the perforated plate from the bottom of the column to the top of the column to flow through the β TAAH developing waste liquid and in the column. It can be controlled by the inner diameter of the downcomer 12. If the inner diameter of the downcomer 12 is too low, the reaction required for the neutralization reaction becomes long and uneconomical. If the temperature is too high, the adjustment effect of the flow rate of the developing waste liquid of the above 2030-9240-PF 17 200827944 is low, so In the middle of the tower, it is better to use 5%·〇〇.5%, especially 〇·2~1.0%, and the flow rate of carbonic acid gas can be controlled by the numerical aperture of the perforated plate. When the reaction is low, the reaction required for the neutralization reaction becomes long and uneconomical. If the reaction speed is too high, the effect of adjusting the flow rate of the development waste liquid is low. Therefore, it is preferable that the inner diameter of the neutralization column is 3 to 1%. 'With regard to the number of trays 1 1 of the above-mentioned multi-stage tower, the greater the number, the higher the number of sections, the higher the adjustment effect of pH, and the excessive partitioning cost the manufacturing cost of the multi-stage tower, so the tray U The number is 2 to 4, that is, the number of stages in which the developing waste liquid is circulated is preferably 3 to 5 stages. Further, in order to promote the uniform diffusion of the carbonic acid gas, it is particularly preferable to fill the filler in each section of the tray 11 partition. The filler can be used without any limitation as a conventional filler for gas-liquid reaction. (second neutral)

和。於反應槽!之處理費液供給管線6,以反應槽i中和 之顯影廢液(以後稱為反應槽丨處理廢液。)供給反應槽 2。於反應槽2供給反應槽!處理廢液後,以碳酸氣體供 給管線13’供給碳酸氣體進行中和。中和終了後,反應液 以幫浦14以中和處理液供給管線15,送至進行抗蝕劑之 分離之分離步驟。未反應之碳酸氣體等,係以未反應氣體 排出管線16排出系外。 起始 第二中和,上述顯影廢液之pH由碳 點到達12或11. 5之時點將碳酸氣體 酸氣體添加調整 之添加量,以在 2030-9240-PF 18 200827944 於PH為13之時點之顯影廢液中的TAAH每1莫耳當量 0· 1 5L/hr苡下進行 一以提南反應液的攪拌效率為目的,於反應槽2設置循 玉衣吕線1 8 ’可以幫浦17使反應槽2内之溶液邊循環反應。 …夜之1泡成為問題之情形,亦可於上述循環管線中設 f碳酸氣體供給管線,將碳酸氣體以線上攪拌器、射出器 于“’、、口手#又供給该循環管線,經由該循環管線導入反應 —口上藉由於上述循環管線中設置反應測定裝置1 9, 可“里反應槽2之反應。該反應測定裝置,只要供於反應 槽2之反應槽!處理廢液中的碳酸鹽及了續之濃度已知, 貝:由於:各易地算出在、中和終點之pH、碳酸鹽、及重碳 咬|之/辰度,故在pH測定儀以外,亦可使用超音 計等的測定溶液中的溶質濃度之習知之測定裝置。 (析出之抗蝕劑之去除方法)with. In the reaction tank! The treatment liquid supply line 6 is supplied to the reaction tank 2 by the development waste liquid (hereinafter referred to as reaction tank treatment waste liquid) neutralized in the reaction tank i. The reaction tank is supplied to the reaction tank 2! After the waste liquid is treated, carbonic acid gas is supplied to the carbonic acid gas supply line 13' for neutralization. After the end of the neutralization, the reaction liquid is supplied to the treatment liquid supply line 15 by the pump 14 and sent to the separation step for performing the separation of the resist. The unreacted carbonic acid gas or the like is discharged outside the system by the unreacted gas discharge line 16. Starting from the second neutralization, the pH of the developing waste liquid is increased from the carbon point to 12 or 11. 5, and the carbonic acid gas is added to adjust the addition amount to be at 2030-9240-PF 18 200827944 at a pH of 13. TAAH in the developing waste liquid is carried out at a molar ratio of 0·15 L/hr per 1 molar amount for the purpose of stirring the efficiency of the Tylenan reaction solution, and is set in the reaction tank 2 to follow the jade clothes line 1 8 'can be pumped 17 The solution in the reaction tank 2 is circulated and reacted. In the case where the bubble of the night becomes a problem, a f-carbonation gas supply line may be provided in the above-mentioned circulation line, and the carbonic acid gas is supplied to the circulation line by the on-line agitator and the injector in the "', the mouth hand # The circulation line is introduced into the reaction - the reaction can be carried out by the reaction measuring device 1 9 in the above-mentioned circulation line. The reaction measuring device is supplied to the reaction tank of the reaction tank 2! The concentration of carbonate in the waste liquid is treated, and the concentration is continued. Because of: easy to calculate the pH, carbonate, and heavy carbon bite at the middle, end, and end points, it is outside the pH meter. A conventional measuring device for measuring the concentration of solute in a solution such as a supersonic meter can also be used. (Removal of the deposited resist)

在於本發明之中和方法,析 係大大的絮狀物,且黏著㈣抗耗之有機物 :姓劑之有機物之分離步驟之該有機物之去除方 之過Γΐ用=之離、板框式脫水機、超遽遽膜等 法析出之來自抗㈣/:=Γ"本發明之中和方 供於固液分耗Γ 有上述特徵,可直接 加過助劑、混:之後二更佳“過濾效果為目的,可於添 汪作之㈣:: 分離操作。用於該固液分離 過/慮助劑,可舉活性碳、石夕藻土、纖維素等。其中, 2030-9240-pf 19 200827944 業上可廉扣地入手之點,使用活性碳、矽藻土等之過濾 助劑為佳。 實施例 為更具體說明本發明之方法,舉下述實施例說明,惟 本發明並非限定於該等實施例者。 實施例1 使用具有以透明氯乙烯製作之圖1所示構成之中和裝 Φ置進打。反應槽1之尺寸為直徑100mm、高度1 000_,於 内邓汉置3處具有降液板之塔板。反應槽2使用尺寸為直 徑250mm、高度8〇〇匪者。 在者,含有TAAH之顯影廢液,使用ρΗ14· 7之含有羥 化四曱基銨(以下稱為ΤΜΑΗ)之顯影廢液。再者,該顯影廢 液之ΤΜΑΗ濃度為20質量%,來自抗蝕劑之有機物之含量, 以COD換异為5000ρριη。 首先,於反應槽1放入含有ΤΑΑΗ之顯影廢液6L,由 • 反應槽1下部之碳酸氣體供給配管4供給碳酸氣體 17. 3L/hr ’中和至PH成13。之後,將碳酸氣體以17· 3L/hr 供給,由反應槽1上部之含有TAAH之顯影廢液供給管線3 供給上述顯影廢液4· 6L/hr,以向流操作進行連續中和。 由反應槽1由處理廢液之供給管線6取樣排出之反應槽2 處理廢液確認pH,pH為13。此時於反應槽!之碳酸氣體 之添加量對中和前的顯影廢液中的TMAH1莫耳以表準狀態 為0.39L/hr(以下,碳酸氣體之供給量係以標準狀態之體 積表示。)。於上述中和操作,反應槽〗並未確認到來自 2030-9240-PF 20 200827944 抗蝕劑之有機物之析出。 接著’將於反應槽1之處理液於反應槽2存20L後, 由反應槽2下部之碳酸氣體供給管線4,將碳酸氣體,以 在於PH為13之時點之tmah每1莫耳之碳酸氣體之添加 量以〇· 01L/hr供給中和,得到ρΗ11· 5之處理液。顯影廢 液之pH由13之時點至到達12之時點之所需之時間為9, 7 小日寸’ pH由13之時點至到達11 · 5之時點之所需之時間為 2 8 · 5小時。 對該處理液,以1 · 〇wt%之比例作為過濾助劑添加白鷺 (活石反、商品名·日本Envir〇chemi cai s公司製),攪拌In the present invention, the method and the method are characterized in that the floc is greatly degraded, and the (four) anti-consumption organic matter: the removal step of the organic substance of the organic substance of the surname is used for the removal of the organic matter, and the plate and frame dehydrator The method of super-ruthenium film and the like is derived from anti-(4)/:=Γ" The present invention is used for the solid-liquid consumption and consumption. With the above characteristics, it can be directly added with additives and mixed: after the second is better "filter effect For the purpose, it can be added to Wang (4):: Separation operation. For the solid-liquid separation/consultation aid, it can be activated carbon, Shixiazao, cellulose, etc. Among them, 2030-9240-pf 19 200827944 It is preferable to use a filter aid such as activated carbon or diatomaceous earth. The embodiment is a more specific description of the method of the present invention, and the following examples are described, but the present invention is not limited to the implementation. Example 1 The composition shown in Fig. 1 made of transparent vinyl chloride was used for the middle and the mounting of the Φ. The size of the reaction tank 1 was 100 mm in diameter and 1 000 in height, and it was lowered at 3 places in the inner Denghan. The tray of the liquid plate. The size of the reaction tank 2 is 250mm in diameter and 8 in height. In addition, the development waste liquid containing TAAH uses a development waste liquid containing hydroxylated tetramethylammonium (hereinafter referred to as ruthenium) of ρΗ14·7. Further, the development waste liquid has a ruthenium concentration of 20 The mass %, the content of the organic material from the resist, and the COD exchange rate is 5000 ριη. First, 6 L of the developing waste liquid containing ruthenium is placed in the reaction tank 1, and carbonic acid gas is supplied from the carbon dioxide gas supply pipe 4 at the lower portion of the reaction tank 1. 17. 3L/hr 'neutralization to a pH of 13. After that, carbonic acid gas is supplied at 17·3 L/hr, and the developing waste liquid supply line 3 containing the TAAH in the upper portion of the reaction tank 1 is supplied to the developing waste liquid 4·6 L/ Hr, continuous neutralization in the flow operation. The reaction tank 2 is sampled and discharged from the supply line 6 for treating the waste liquid. The waste liquid is treated to confirm the pH, and the pH is 13. At this time, the addition of the carbonic acid gas in the reaction tank! The amount of TMAH1 in the developing waste liquid before and after the neutralization is 0.39 L/hr (hereinafter, the supply amount of the carbon dioxide gas is expressed by the volume of the standard state.) In the above neutralization operation, the reaction tank Not confirmed from 2030-9240-PF 20 200827944 The organic matter of the etchant is precipitated. Then, after the treatment liquid in the reaction tank 1 is stored in the reaction tank 2 for 20 L, the carbonic acid gas is supplied from the lower portion of the reaction tank 2 to the carbon dioxide gas, so that the pH is 13 at the time of tmah. The amount of addition of 1 mol of carbonic acid gas is neutralized by 〇·01 L/hr to obtain a treatment liquid of ρΗ11·5. The time required for the pH of the development waste liquid from the time point of 13 to the point of reaching 12 is 9, 7 hours. The time required for pH from 13 o'clock to 11 o'clock is 2 8 · 5 hours. Adding an egret to the treatment solution at a ratio of 1 · 〇wt% as a filter aid (live stone, product name, manufactured by Envir〇chemi cai s, Japan), stirring

過渡後’對加壓過濾器KST-142-UH(商品名:ADVANTECH 東洋株式會社製,直徑142_),安裝膜過濾膜 H100A142C(商品名·· ADVANTECH東洋株式會社製,孔徑 ,以〇.15MPa加壓過濾,可良好地過濾,得到澄清 的濾液。該濾液之COD為6〇ppm。又,由過濾速度算出之 _ 上述處理液之過濾處理速度為500L/m3 · Hr。 實施例2〜6 於表1所示顯影廢液之供給速度、碳酸氣體供給速 度、及對中和前之顯影廢液中之TMAH1莫耳之碳酸氣體添 加量進行於反應槽i之中和,接著表!所示,顯影廢液之 PH為13之時點之TMAH1莫耳之碳酸氣體添加量進行於反 應槽2之中和以外,以與實施例j同樣地進行中和反應。 於反應槽2之顯影廢液之邱由13之時點至到達以及ιΐ 5 所需之時間 '以及中和後的過濾結果示於表】。 2030-9240-PF 21 200827944 [表1 ]After the transition, the pressure filter KST-142-UH (trade name: manufactured by ADVANTECH Toyo Co., Ltd., diameter 142_), and membrane filter membrane H100A142C (trade name, ADVANTECH Toyo Co., Ltd., aperture, 〇.15MPa plus The mixture was filtered under pressure to obtain a clear filtrate. The COD of the filtrate was 6 〇ppm. Further, the filtration rate of the treatment liquid was calculated from the filtration rate to be 500 L/m 3 · Hr. Examples 2 to 6 The supply speed of the developing waste liquid shown in Table 1, the supply rate of the carbonic acid gas, and the amount of the TMAH1 molar carbonic acid gas added to the developing waste liquid before the neutralization are carried out in the reaction tank i, and then shown in Table! When the pH of the developing waste liquid was 13, the amount of the TMAH1 molar carbonic acid gas added was carried out in the reaction tank 2, and the neutralization reaction was carried out in the same manner as in the example j. The developing waste liquid in the reaction tank 2 was used. The time from the time of 13 to the arrival and the time required for ιΐ 5 and the filtration results after neutralization are shown in the table. 2030-9240-PF 21 200827944 [Table 1]

Ο 8 α V a § S g § S_y Q Q LO g LO o o LO <3> 〇> LO CD CZ5 LO οα CO 二*上 m LO 〇6 CN! CO — r—1 cnJ CO 寸· τ—H 卜· r—< CO οα ^ r—1 卜 05 05 o r—H ① CO CD —_.上 V讎1 t <3) CD s CD CO T—t o CO <3> <3> Csl C3> 〇· τ—^ —_上 舊,2 οα CD ο CO CD σ^ CO CD CD CD CO CD CD CD CO 卜· τ··Η CO 卜· r—1 卜 od CO r—H 赵辦A 蟛啭上 Si^^o 蘧寒U Cvl CD CO CO CO oi CO 呀· Cvl CO 寸 LO CO SE*wtt^LO.u^CN3IfH-fslwcol-ffiHaw^竣磙蘧:^:.※ ¥浚筚||¥齧^》駿^齋鲽vrrH·衅i HVW1銮+輕蟛礆蘧wfe^-s-^: 一※ 實施例7 使用與實施例1同樣的中和裝置,首先,於反應槽1 放入與實施例1同樣的含有TAAH顯影廢液6L,由反應槽 1下部之碳酸氣體供給配管4供給碳酸氣體24. 8L/hr,中 22Ο 8 α V a § S g § S_y QQ LO g LO oo LO <3>〇> LO CD CZ5 LO οα CO 2*上m LO 〇6 CN! CO — r—1 cnJ CO inch·τ—H卜·r—< CO οα ^ r—1 卜 05 05 or—H 1 CO CD —_.上 V雠1 t <3) CD s CD CO T—to CO <3><3> Csl C3> 〇· τ—^ —_上上,2 οα CD ο CO CD σ^ CO CD CD CD CD CD CD CD CD τ··Η CO 卜·r—1 od CO r—H Zhao Office A Si上Si^^o 蘧寒 U Cvl CD CO CO CO oi CO 呀·Cvl CO 寸 LO CO SE*wtt^LO.u^CN3IfH-fslwcol-ffiHaw^竣磙蘧:^:.※ ¥浚筚| |¥拳^》骏^斋鲽vrrH·衅i HVW1銮+蟛礆蘧蟛礆蘧wfe^-s-^: One ※ Example 7 Using the same neutralization device as in Example 1, first, in the reaction tank 1 8L/hr, 中中22 The carbon dioxide gas supply gas is supplied to the lower part of the reaction tank 1

2030-9240-PF 200827944 彳至pH成13. 5。之後,將碳酸氣體以24·队/以供給,由 反應槽1上口|^之§有TAAH之顯影廢液供給管、線3供給上 述顯影廢液7· 5L/hr,以向流操作進行連續中和。由反應 槽纟處理笔,夜之供給管線6取樣排出之反應槽1處理廢 液確w pH ’ pH為13· 5。此時於反應槽1之碳酸氣體之添 加里對中和則的顯影廢液中的tmahi莫耳以表準狀態為 0· 57L/hr於上述中和操作,反應槽!並未確認到來自抗 $ 蝕劑之有機物之析出。 接著’將於反應槽1之處理液於反應槽2存2GL後, 由反應槽2下部之碳酸氣體供給管線4,將碳酸氣體,以 在於pH為13之%點之TMAH每1莫耳之碳酸氣體之添加 里以〇· 07L/hr供給中和,得到ρΗη· 5之處理液。顯影廢 液之pH由1 3之時點至到達〗2之時點之所需之時間為2 · 8 J寸pH由1 3之日守點至到達11 · 5之時點之所需之時間為 6 · 3小時。 籲 、牙λ處理液以與貫施例1同樣的操作進行過濾、,可 良好地過濾,得到澄清的濾液。該濾液之⑶D為6〇ρ_。 又’由過濾速度算出之上述處理液之過濾處理速度為 400L/in3 · Hr。 實施例8 使用來自抗敍劑之有機物之含量,以C0D換算為 8〇〇〇ppm,PH14.7之含有TMAHi顯影廢液以外,以與實施 例7同樣的操作進行中和。再者,該顯影廢液之TMAH濃 度為20質量%。5。 The pH is 13. 5. Thereafter, the carbon dioxide gas is supplied in a 24/team, and the developing waste liquid supply pipe and the line 3 are supplied to the developing waste liquid 7·5 L/hr from the upper port of the reaction tank 1 and the line 3 to perform the flow operation. Continuous neutralization. The reaction tank 1 was treated by the reaction tank, and the reaction tank 1 sampled and discharged from the night supply line 6 was treated to have a pH of pH of 1.25. At this time, in the addition of the carbonic acid gas in the reaction tank 1, the tmahi molar in the developing waste liquid which is neutralized is in the state of the above-mentioned neutralization operation, and the reaction tank is in the above-mentioned neutralization operation! The precipitation of organic substances from anti-corrosion agents was not confirmed. Then, after the treatment liquid in the reaction tank 1 is stored in the reaction tank 2 for 2 GL, the carbonic acid gas is supplied from the lower portion of the reaction tank 2 to the carbon dioxide gas, and the carbonic acid gas is at a pH of 13% per point of TMAH per 1 mol of carbonic acid. The addition of gas was neutralized with 〇·07 L/hr to obtain a treatment liquid of ρΗη·5. The time required for the pH of the developing waste liquid from the time point of 13 to the time point of reaching 〖2 is 2 · 8 J. The pH is from the date of the day of the 13th to the time when the point of reaching 11 · 5 is 6 · 3 hours. The λ and λ treatment liquids were filtered in the same manner as in Example 1, and were well filtered to obtain a clear filtrate. The (3)D of the filtrate is 6〇ρ_. Further, the filtration treatment rate of the treatment liquid calculated from the filtration rate was 400 L/in3 · Hr. (Example 8) Neutralization was carried out in the same manner as in Example 7 except that the content of the organic substance derived from the antisynthesis agent was 8 〇〇〇ppm in terms of C0D and the TMAHi developing waste liquid of pH 14.7 was used. Further, the developing waste liquid had a TMAH concentration of 20% by mass.

2030-9240-PF 23 200827944 對該處理液,以與實施例7同樣地進行過 地過濾,得到澄清的濾液。該濾液之COD為9〇ppm。又, 由過濾速度算出之上述處理液之過濾處理速度 400L/m3 · Hr。 、、 貫施例9 使用與實施例1同樣的含有TAAH之顯影廢液,將於 反應槽1之中和與實施例6同樣地進行。2030-9240-PF 23 200827944 This treatment liquid was subjected to filtration in the same manner as in Example 7 to obtain a clear filtrate. The filtrate had a COD of 9 〇 ppm. Further, the filtration treatment speed of the treatment liquid calculated from the filtration rate was 400 L/m3 · Hr. Further, the development waste liquid containing TAAH similar to that of Example 1 was used in the same manner as in Example 6 in the reaction tank 1.

接著,將於反應槽1之處理液於反應槽2存2〇L後, 由反應槽2下部之碳酸氣體供給管線4,將碳酸氣體,以 在於PHI U之時點之丁_每!莫耳之碳酸氣體之添加 量以〇.〇2L/hr供給中和至pH12,接著將碳酸氣體之添加 速度增加至G.5GL/hr得到進行中和至pH115之處理液。 顯影廢液之pH由13之時點至到達12之時點之所需之時 間為6.0小時,pH* 13之時點至到達115之時點之所需 之時間為6· 5小時。 樣的操作進行過濾,可 ;慮液之COD為70ppm。 液之過濾、處理速度為 對該處理液,以與實施例1同 良好地過濾,得到澄清的濾液。該 又,由過濾速度算出之上述處理 350L/m3 · Hr。 比較例1〜2 於反應槽1 ’表2所示顯影廢液之供給速度、碳酸氣 體供給速度、及對中和前之顯影廢液中之tmahi莫耳之碳 酸氣體添加量進行於反應槽】之中和,接著表2所示,顯 影廢液之邱為13之時點之_莫耳之碳酸氣體添加量Next, after the treatment liquid in the reaction tank 1 is stored in the reaction tank 2 for 2 〇L, the carbonic acid gas is supplied from the lower portion of the reaction tank 2 to the carbon dioxide gas at the time point of PHI U. The amount of the carbonic acid gas added was neutralized to pH 12 with a supply of L2 L/hr, and then the addition rate of the carbonic acid gas was increased to G.5 GL/hr to obtain a treatment liquid which was neutralized to pH 115. The time required for the pH of the developing waste liquid from the time point of 13 to the point of reaching 12 is 6.0 hours, and the time required from the time point of pH* 13 to the point of reaching 115 is 6.5 hours. The operation is filtered, and the COD of the solution is 70 ppm. The filtration rate and the treatment rate of the liquid were the same as those of Example 1 to obtain a clear filtrate. Further, the above-described processing calculated from the filtration speed is 350 L/m3 · Hr. Comparative Examples 1 to 2 In the reaction tank 1', the supply speed of the developing waste liquid, the carbonation gas supply rate, and the amount of the tmahi molar carbonic acid gas added to the developing waste liquid before the neutralization were carried out in the reaction tank. Neutralization, as shown in Table 2, the amount of carbonic acid gas added to the developing waste liquid is 13

2030-9240-PF 200827944 進行於反應槽2之中和以外,以與實施例1同樣地進行中 和反應。於反應槽2之顯影廢液之pH由1 3之時點至到達 1 2及11. 5所需之時間、以及中和後的過濾結果示於表2。 再者,比較例2,由於在過滤途中,加壓過濾器塞住,而 無法完成過濾。因此,無法算出過滤速度。 [表2 ] 過滤 濾液之C0D (ppm) § 過濾能力 (L/m3 · Hr) CD CD r—< i 反應槽2 pHll.5 到達時間% (hr) oo 1—< r—H pH12 到達時間% (hr) CO CD LTD <3> 破酸氣體 »jv , 田※2 添加篁 (L/hr) t-H CN1 ◦· CN1 ◦· 反應槽1 碳酸氣寧 添加量~ (L/hr) 0.20 0. 39 碳酸氣體 供給速度 (L/hr) 卜 oo CO r-H 顯影廢液 供給速度 (L/hr) CO oi CO 一 r—ί (N1 s£#BW^^LO.H^zi?^fsiBWcoI-ffiHdw^^^ii:i^ ¥浚婆ll^f^瞀w餿^跻鲽衾i:裤ίHVMW¾‘BWcol_¾w疼_ff蘧¾:¢Nl※ 雄窜鲚鲽¾^裨svlus+赵礎磙蘧^靛恭斗葙:一※ 2030-9240-PF 25 200827944 【圖式簡單說明】 圖1係表示在於本發明,將第1中和反應與第2中和 反應以個別的反應槽進行之較佳的態樣之示意圖。 【主要元件符號說明】 1〜反應槽; 2〜反應槽; 3〜顯影廢液供給管線; • 4〜碳酸氣體供給管線; 5〜幫浦; 6〜供給管線; 7〜未反應氣體排出管線; 8〜幫浦; 9〜循環管線; 10〜反應測定裝置; 0 11〜塔板; 12〜降液板; 13〜碳酸氣體供給管線; 14〜幫浦; 15〜中和處理液供給管線; 16〜未反應氣體排出管線; 17〜幫浦; 18〜循環管線; 19〜反應測定裝置。 2030-9240-PF 262030-9240-PF 200827944 Neutralization reaction was carried out in the same manner as in Example 1 except that it was carried out in the reaction tank 2. The filtration time of the developing waste liquid in the reaction tank 2 from the time point of 13 to the time of reaching 1 2 and 11.5, and the filtration result after the neutralization are shown in Table 2. Further, in Comparative Example 2, since the pressure filter was plugged during the filtration, the filtration could not be completed. Therefore, the filtration speed cannot be calculated. [Table 2] COD of filtration filtrate (ppm) § Filtration capacity (L/m3 · Hr) CD CD r-< i Reaction tank 2 pHll.5 Arrival time % (hr) oo 1—< r-H pH12 Arrival Time % (hr) CO CD LTD <3> Acid-breaking gas»jv , Tian*2 Add 篁(L/hr) tH CN1 ◦· CN1 ◦· Reaction tank 1 Addition amount of carbonation gas ~ (L/hr) 0.20 0. 39 Carbon dioxide gas supply rate (L/hr) Bu oo CO rH Development waste liquid supply speed (L/hr) CO oi CO a r—ί (N1 s£#BW^^LO.H^zi?^fsiBWcoI- ffiHdw^^^ii:i^ ¥浚婆 ll^f^瞀w馊^跻鲽衾i: pants ίHVMW3⁄4'BWcol_3⁄4w pain _ff蘧3⁄4:¢Nl※ 雄窜鲚鲽3⁄4^裨svlus+赵础磙蘧^靛恭斗葙:一※ 2030-9240-PF 25 200827944 [Simplified description of the drawings] Fig. 1 shows a preferred aspect of the present invention in which the first neutralization reaction and the second neutralization reaction are carried out in individual reaction tanks. Schematic diagram of the main components: 1~reaction tank; 2~reaction tank; 3~developing waste supply line; • 4~carbonate supply line; 5~help; 6~ supply line; 7~unreacted gas Discharge line; 8~ pump; 9~ Pipeline; 10~ reaction measuring device; 0 11~ tray; 12~ downflow plate; 13~ carbonic acid gas supply line; 14~ pump; 15~ neutralizing treatment liquid supply line; 16~ unreacted gas discharge line; ~ pump; 18 ~ circulation line; 19 ~ reaction measuring device. 2030-9240-PF 26

Claims (1)

200827944 十、申請專利範圍: h一種含有羥化四烷基銨之顯影廢液的中和方法,藉 由:溶解來自光阻劑之有機物之抑為13以上的含有輕化 四虼基叙之顯影廢液,加入碳酸氣體中和至pH成11 5以 下者, 其特徵在於: /吏上述顯影廢液的邱由13之時點至到達12之時點 ::::體之添加量,以在於邱為13之時點之顯影廢液 有趣化四燒基絲1莫耳當量m以下進 仃0 顯旦/=申請專利範圍第1項所述的含有經化四烧基錄之 到^ 的中和方法’其中使顯影廢液之⑽纟^之時點 ’達12之時點所需之時間為0.8〜1〇小時。 申請專利範圍第1項所述的含有經化四烧基錢之 ==液的中和方法,其中使顯影廢液之心13之時點 赴.5之時點之碳酸氣體之添加量,以在於邱為13 =之顯影廢液中的含有經化四烧基銨每】莫耳當量, U. 15L/hr以下進行。 ”=!專利範圍第3項所述的含有經化四烧基銨之 到遠”… m顯衫廢液之PH由13之時點 達丄5之吩點所需之時間為3〜30小時。 5_ #含有羥化四烷基銨之顯影廢液 由對溶解來自光阻#丨之右㈣ ^ 时美❹PH超過13.7的含有經化 一心廢液,加入碳酸氣體中和至pH成n. 5以 2030-9240-PF 27 200827944 下者, 其特徵在於: 使該顯影廢液之pJJ成由〗 叩风田13以上,13· 7以下的餻 任意pH之第一中和,與到读 立 、乾圍之 "" 任思、的pH後的第二中和以 別的反應槽進行,並且於該第_ Α η —士 弟—中和,使該顯影廢液的pH 3之%點至到達12之時點 ^ 之妷酸氣體之添加量,以a 於PH為13之時點之顯影廢 莫耳告詈,n m/u 夜中的含有羥化四烷基銨每1 旲斗田里,0· 15L/hr以下進行。 6 ·如申請專利範圍第 号 項所述的含有羥化四烷基銨之 頒衫廢液的中和方法,其中 / 士 在於弟一中和之碳酸氣體之單 量。 、弟一中和之碳酸氣體添加量多 7·如申請專利範圍第6項所述的含有經化四燒基錢之 ‘員衫廢液的中和方法,盆 _ Θ /、中使在於第一中和之碳酸氣體之 添加置,以中和箭 a θ ㉙衫廢液中的羥化四烷基銨每1莫耳 虽置,以l〇L/hr以下進行。 8 ·如申請專利簕圖楚 圍弟5項所述的含有羥化四燒基録之 ㉟衫廢液的中和方法, 具中弟一中和以多段中和塔進行。 種3有羥化四烷基銨之顯影廢液的中和方法,藉 、解來自光阻劑之有機物之pH超過13.7的含有遂化 ::基銨之顯影廢液,加入碳酸氣體中和至pH成11.5以 下者, 其特徵在於: 使該顯影廢液> ^ 1 ^ 之pH成由1 3以上,13. 7以下的範圍之 2030-9240-PF 28 200827944 任w pH之第一中和,與到達該任意的pH後的第二中和改 變添加碳酸氣體之速度’並且於該第二"”使該顯影廢 pH由13之時點至到達j 2之時點之碟酸氣體之添加 里’以在於pH為13之脖wb夕弓s旦/十 守,*、占之㉝衫廢液中的含有羥化四烷 基銨每1莫耳當詈,D 1ςτ/κ 、升田里〇.15L/hr以下進行,且在於第一中和 之碳酸氣體之單位時間之添 氣體之添加量多量。 較在於弟-中和之碳酸 10.如申請專利範圍第5 〜1 ^ ^ ^ 貝中任一項所述的含有 踁化四烷基銨之顯影廢液的中和 的5有 含有_化四烷A # 其中弟一中和前的 有 基知之顯影廢液中的經化四院基銨之:農产 為10〜30質量%。 凡巷知之乘度200827944 X. Patent application scope: h A method for neutralizing a developing waste liquid containing hydroxylated tetraalkylammonium by: developing a light-weight tetraterpene group containing 13 or more organic substances dissolved from a photoresist The waste liquid is neutralized to a pH of 115 or less by adding carbonic acid gas, and is characterized in that: / 吏 of the developing waste liquid from the time point of 13 to the point of reaching 12:::: the amount of the body added, in the Qiu At the time of 13th, the development waste liquid is interesting. The four-burning base wire 1 molar equivalent m is less than the 仃0 sendan/= the neutralization method of the chemical-containing four-burning base recorded in the first item of the patent scope' The time required to make the point (10) of the developing waste liquid "at 12" is 0.8 to 1 hour. The method for neutralizing the liquid containing the chemistry of the sulphuric acid according to the first aspect of the patent application, wherein the amount of the carbonic acid gas at the time of the development of the waste liquid 13 is at the time of the It is carried out for each of the molar equivalents of U.sub.15 L/hr, which is contained in the developing waste liquid of 13 =. "=! The range of the PH containing the tetrabasic ammonium amide according to the third paragraph of the patent range from the point of time of 13 to the point of reaching the point of 丄5 is 3 to 30 hours. 5_# The developing waste liquid containing the hydroxylated tetraalkylammonium is dissolved by the carbonic acid gas to the pH of n. 5 by dissolving the right (four) ^ from the photoresist #丨2030-9240-PF 27 200827944 The following is characterized in that the pJJ of the developing waste liquid is made up of 叩 田 风 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 13 The second neutralization after the pH of the "" 任思, is carried out in another reaction tank, and neutralized in the first _ η η - 士 -, to make the pH of the developing waste liquid 3% to At the time of reaching 12, the amount of citric acid gas added is as a point at which the pH is 13 at the time of development, and the nano-u night contains the hydroxylated tetraalkylammonium every 1 旲 fighting field, 0· Performed below 15L/hr. 6 · A method for neutralizing a hair styling liquid containing a hydroxylated tetraalkylammonium as described in the scope of the patent application, wherein the amount of carbon dioxide gas in the middle of the brother is neutralized. The amount of carbon dioxide added by the younger brother and the middle is more than 7. The neutralization method of the waste liquid containing the chemistry of the four-burning base according to the sixth paragraph of the patent application, the basin _ Θ /, the middle is in the first The addition of a neutralized carbonic acid gas is carried out to neutralize the hydroxylated tetraalkylammonium in the waste liquid of the a θ 29 shirt every 1 mole, and is carried out at a temperature of 1 〇 L/hr or less. 8 · If applying for a patent, the method of neutralization of the 35-shirt waste liquid containing the hydroxylated four-burning base described in the 5th edition of the brother-in-law, with Zhongdi Yizhong and the multi-stage neutralization tower. A method for neutralizing a developing waste liquid having a hydroxylated tetraalkylammonium, which is a developing waste liquid containing deuterated:: ammonium chloride having a pH of more than 13.7 from the organic substance of the photoresist, and neutralized by adding carbonic acid gas to The pH is 11.5 or less, and the pH of the developing waste liquid > ^ 1 ^ is 13 or more, and the range of 13.7 or less is 2030-9240-PF 28 200827944. And the second neutralization after reaching the arbitrary pH changes the rate of addition of the carbonic acid gas and in the second "" the development waste pH is increased from 13 o'clock to the point of arrival of j2 at the point of the addition of the disc acid gas 'With the pH of 13 neck wb 夕 bow sdan / ten defensive, *, accounted for 33 of the sap waste liquid containing hydroxylated tetraalkylammonium per 1 mole of 詈, D 1ςτ / κ, Sheng Tianli 〇. It is carried out below 15L/hr, and the amount of added gas per unit time of the first neutralized carbonic acid gas is large. It is more in the middle-and-neutralized carbonic acid 10. As claimed in the patent range 5~1 ^ ^ ^ The neutralized 5 of the developing waste liquid containing deuterated tetraalkylammonium contains _tetraoxane A # The basic chemical ammonium of the chemical system in the development waste liquid of the basic knowledge: agricultural production is 10~30% by mass. 2030-9240-PF 292030-9240-PF 29
TW96142218A 2006-11-09 2007-11-08 Neutralization method of developing waste liquid containing tetraalkylammonium hydroxide TWI416278B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006303893 2006-11-09

Publications (2)

Publication Number Publication Date
TW200827944A true TW200827944A (en) 2008-07-01
TWI416278B TWI416278B (en) 2013-11-21

Family

ID=39364486

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96142218A TWI416278B (en) 2006-11-09 2007-11-08 Neutralization method of developing waste liquid containing tetraalkylammonium hydroxide

Country Status (5)

Country Link
JP (1) JP5041297B2 (en)
KR (1) KR101193924B1 (en)
CN (1) CN101529338B (en)
TW (1) TWI416278B (en)
WO (1) WO2008056671A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4689759B2 (en) * 2009-04-24 2011-05-25 旭化成イーマテリアルズ株式会社 Developing device, developer processing method, printing plate manufacturing method, and filtration device
EP2423751B1 (en) 2009-04-24 2013-12-11 Asahi Kasei E-materials Corporation Developing apparatus, process for treating developing solution, process for producing printing plate, and filter apparatus
CN102951761A (en) * 2012-11-14 2013-03-06 杭州格林达化学有限公司 Method for recovering waste photoresist stripper
JP2016075920A (en) * 2015-11-16 2016-05-12 富士フイルム株式会社 Production method of organic process liquid for patterning chemically amplified resist film, pattern forming method, and method for manufacturing electronic device
EP3364251A1 (en) * 2017-02-17 2018-08-22 GS Trading SA Method for etching photopolymer plates
JP7055326B2 (en) * 2017-09-15 2022-04-18 株式会社ササクラ Development waste liquid treatment equipment and treatment method
CN109160639A (en) * 2018-10-23 2019-01-08 南京元亨化工科技有限公司 A kind of wastewater treatment equipment of tetramethylammonium hydroxide

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5354434A (en) * 1991-07-12 1994-10-11 Chlorine Engineers Corp. Ltd. Method for regenerating tetraalkylammonium hydroxide
JPH0517889A (en) * 1991-07-12 1993-01-26 Chlorine Eng Corp Ltd Method for regenerating tetra-alkyl ammonium hydroxide
JP3392483B2 (en) * 1993-11-15 2003-03-31 クロリンエンジニアズ株式会社 Treatment method for wastewater containing tetraalkylammonium hydroxide
JPH0856672A (en) * 1994-08-26 1996-03-05 Kazuaki Chayama Gene of type c hepatitis virus
JP3216998B2 (en) * 1996-08-12 2001-10-09 昭和電工株式会社 Purification and recovery of tetraalkylammonium hydroxide from waste developer
JPH11262765A (en) * 1998-03-16 1999-09-28 Nagase & Co Ltd Method for pretreating and regenerating waste solution containing tetraalkylammonium hydroxide
JP2003190949A (en) * 2001-12-27 2003-07-08 Tokuyama Corp Method for regeneration of photoresist developing waste solution
JP2004097997A (en) * 2002-09-11 2004-04-02 Kurita Water Ind Ltd Method and equipment for treating water-soluble polymer-containing waste liquid
CN1298636C (en) * 2002-11-29 2007-02-07 长濑产业株式会社 Regeneration device and method for waste developing solution
CN1263689C (en) * 2003-10-17 2006-07-12 深圳市金达莱环保有限公司 Method for treating developer and removing tank solution in waste water for circuit board
JP2005249818A (en) * 2004-03-01 2005-09-15 Nishimura Yasuji Method and apparatus for controlling developer for photoresist
JP4810436B2 (en) * 2004-11-30 2011-11-09 株式会社トクヤマ Processing method for waste developer

Also Published As

Publication number Publication date
TWI416278B (en) 2013-11-21
JPWO2008056671A1 (en) 2010-02-25
CN101529338A (en) 2009-09-09
KR20090082202A (en) 2009-07-29
JP5041297B2 (en) 2012-10-03
WO2008056671A1 (en) 2008-05-15
KR101193924B1 (en) 2012-10-24
CN101529338B (en) 2012-01-25

Similar Documents

Publication Publication Date Title
TW200827944A (en) Method of neutralizing developer waste liquid containing tetraalkylammonium hydroxide
JPS60805A (en) Separation of solute-containing solution by reverse osmosis
Segev et al. Improved high recovery brackish water desalination process based on fluidized bed air stripping
RU2007117197A (en) HYDROCARBON FLOW TREATMENT WITH HIGH MOLAR WEIGHT
NO993617D0 (en) Process and apparatus for recovering exhaust gas from an ozonization reactor
CN106277602A (en) The Treated sewage reusing processing system of industrial wastewater and method
JP2002307081A (en) Method of recovering container sterilization wastewater
TW201307215A (en) Processing device of drained water with organic matters
JP4538881B2 (en) Membrane module cleaning method
US2495937A (en) Water-treating process and apparatus
JP5201630B2 (en) Method for neutralizing developer wastewater containing tetraalkylammonium hydroxide
CN102007094B (en) Improved method for eliminating color forming impurities from nitro compounds
JP4359693B2 (en) Wastewater treatment equipment containing persistent organic substances
JP3467234B2 (en) How to remove nitrate nitrogen from tap water
JP2000024692A (en) Device for treating sulfate ion-containing waste water
JP3348446B2 (en) Method and apparatus for removing nitrate ions and / or nitrite ions
CN207451795U (en) A kind of integrated sewage water fluorine removal removes computer hardware
TW200304428A (en) Method and apparatus for treating fluoro-containing water discharge
JP2013022536A (en) Biological treatment method for amine-containing wastewater and treatment equipment
CN206051785U (en) The Treated sewage reusing processing system of industrial wastewater
CN105502831A (en) Waste water biochemical treatment device and technology
JPH10165965A (en) Treatment of ammonia-containing waste solution
EP4296242A1 (en) Method for re-mineralization of water
JPH07265854A (en) Desalted water production device
WO2018123449A1 (en) Method for treating methane fermentation waste water and treatment equipment

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees