TW200826748A - Integrated intermediate electrode and pressure gradient type plasma gun - Google Patents

Abstract

An integrated intermediate electrode (G) comprises a first conductive housing (11), a first conductive sleeve (12) provided concentrically to the first housing in contact with the inner circumferential surface of the first housing, a first magnet (15) contained in the first housing concentrically thereto, a second conductive housing (17) provided coaxially with the first housing, a second conductive sleeve (18) provided concentrically to the second housing in contact with the inner circumferential surface of the second housing, and a second magnet (21) contained in the second housing concentrically thereto. The first housing and the second housing are integrated through an insulating member (16).

Description

200826748 IX. Description of the Invention: [Technical Field] The present invention relates to a pressure gradient type plasma pulverizer used as a plasma source of a film forming apparatus, and an intermediate electrode used therefor. [Prior Art] In the past, a pressure gradient type plasma gun was used as a plasma source of a film forming apparatus. The pressure gradient type plasma gun is configured such that a cathode, a ring-shaped first intermediate electrode, a ring-shaped second intermediate electrode, and an insulating member interposed between the first intermediate electrode and the second intermediate electrode are coaxially arranged in a cylindrical container. . In the pressure gradient type electric gathering, the temporary assembly member temporarily assembles the first electrode and the second intermediate electrode, and the temporary assembly is attached to a force gradient type electric squirt gun. However, when the second intermediate electrode of the intermediate electrode disk of the 帛i is temporarily assembled, (iv) there is a case where the temporarily assembled member is detached, and there is a problem in handling. X: The first intermediate electrode and the second intermediate electrode are temporarily assembled with t, and the weight of the temporary assembly is also increased. Therefore, as shown in Patent Document 1, a pressure gradient type electric power has been disclosed: a fixing member in which an insulating member is assembled is used to secure an intermediate lightning type gradient pressure type plasma, since it can be individually eu : Well...intermediate electrode 'Therefore, there is no case where the temporary set member is detached. 2 The workability when the first intermediate electrode and the second intermediate electrode are attached to the core is raised. [Patent Document 1] Japanese Patent Laid-Open Publication No. Hei 11-256319 A SUMMARY OF THE INVENTION The structure of the intermediate electrode and the 'patent document support means are set to be complicated. It is necessary to support the fixing member 2 intermediate electrode, and there is a structure to ensure the first! The intermediate electrode and the second intermediate electrode are sealed by welding the lid to the housing of the 矾k pole. Dreams - 丄电告田,... 幻不山封' However, when the welding is used to seal the casing, the leakage of the port is difficult to occur in the middle of the middle electrode, and it is difficult to perform the blade knives and δ weeks. Poor maintenance. The present invention has been made to solve the above-described problems, and an object of the present invention is to provide an intermediate electrode which can be easily configured and reduced in weight to improve the convenience of handling, improve the maintainability at the time of decomposition and adjustment, and provide for use thereof. Pressure gradient type plasma grab. In order to solve the above problems, an intermediate type electrode of the present invention includes: a first case having conductivity; a first sleeve having conductivity, and the first case and the inside of the first case The first magnet is accommodated in the i-th casing concentrically with the second casing; the second casing having conductivity is provided in the shape of the i-th casing; The second sleeve is disposed concentrically with the second casing and in contact with the inner circumferential surface of the second casing; and the second magnet is concentrically received with the second casing in the first casing The first case and the second case are integrated through the insulating member. 200826748 r According to the above configuration, it is easy to mount on a device using a pressure gradient type plasma assembled with the intermediate electrode of the body type (for example, a film forming apparatus, the first case has a c-shaped cross section to make the second case The second surface of the body has an open shape; the second housing has a cross section such that the surface of the plaque housing is open to the opposite side; the insulating member is formed to be opposite to the first housing and the second housing a coaxial shape; each of the open surfaces of the i-th casing and the second casing is a cover by the insulating member; the second magnet wind is accommodated in a space between the first casing and the insulating member, and the second magnet 2 accommodating a space between the second casing and the insulating member; and the second casing ', the insulating member, and the second casing may be joined to each other by a bonding tool. Since the number of components constituting the intermediate electrode is reduced, the weight thereof can be reduced, and the handling convenience can be improved. Further, the combination of the bonding tools can be used to remove the cover formed by the insulating member, thereby causing a defect in the inside of the intermediate electrode. Can also be decomposed and In order to improve the maintenance of the C (four) 1 casing, the insulating member, and the second casing, the gas-tight or liquid-tight joint may be sequentially performed. ^ Usually, a cooling medium flow path is formed inside the intermediate electrode, and cooling is performed. The medium is circulated in the cooling medium flow path. Therefore, the above-described configuration prevents leakage of the cooling medium. The bonding is preferably airtight or liquid-tight using a 0-ring. The ith housing, the insulating member, and the second housing are made airtight or liquid-tight. The pressure gradient type plasma gun of the present invention includes any one of the above-described configurations of the body type 200826748 intermediate electrode. Can be installed to install the middle electrode on the pressure gradient

With the above configuration, the workability of the medium-sized electric gathering can be improved. The pressure grading type plasma gun of the present invention is composed of a compaction w & melon 1 - μ, an inlet electrode, an insulating tube, and a cathode holder having a distal end of the cathode electrode. With the above configuration, it is easy to assemble a pressure gradient type plasma grab. The above and other objects, features and advantages of the present invention will become apparent from Since the bulk type intermediate electrode of the present invention has the above-described configuration, it is possible to improve the handling convenience with a simple structure and reduce the weight, and to improve the maintainability during the decomposition and adjustment. Further, the pressure gradient type plasma gun of the present invention has the effect of facilitating the mounting of the intermediate electrode because it is constructed as described above. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. (Embodiment) FIG. 1 is a schematic view showing a schematic configuration of a thin-layer plasma film forming apparatus using a pressure gradient type plasma pulsing according to an embodiment of the present invention. Fig. 2 is a cross-sectional view schematically showing a state in which the pressure gradient type plasma of the embodiment of the present invention is cut perpendicularly along the central axis. 3 is a view showing a pressure-type plasma of the pressure gradient type plasma 9 200826748 of FIG. 2, wherein (4) is a left side view and (b) is a cross-sectional view of a state in which a body-shaped intermediate electrode is vertically cut along a central axis, (4) is the right view. Further, in Fig. 3(b), the portion of the insulating collar and the coupling member that penetrates the second, second, and/or a-edge members is shown as a partially cut B-b cross-sectional view. Hereinafter, a pressure gradient type plasma gun and an integrated intermediate electrode according to the present embodiment will be described with reference to Figs. 1 to 3 . In addition, the left side of the closure 1 and the left side of FIG. 2 are the front side, the right side of FIG. 1, and the right side of FIG. 2 are the rear side.

As shown in Fig. 1, the pressure gradient type plasma paste of the present embodiment is used, for example, as a thin layer plasma film forming apparatus (10). Here, the thin film electropolymerization film forming apparatus 100 is taken as an example of the film forming apparatus using the pressure gradient type plasma %1 of the present embodiment, but it is of course not limited to the thin layer electric II film forming apparatus 100. The configuration of the I-gravity type plasma gun 1 and the integral type intermediate electrode G will be briefly described here, and will be described in detail later. The gradient gradient type plasma grab 1 system, which has a cathode crucible 2, & is mounted on the cylinder 10 of the Guhai cathode support 2 . A cathode 8 is provided on the cathode holder 2. The cylinder 10 is provided with an insulating tube 6 and a body-shaped intermediate electrode G. The integrated intermediate electrode G is composed of an i-th intermediate electrode ～, a second intermediate electrode A, and a permanent member 16. The cathode 8 (cathode holder 2) and the anode 63-based transmission resistor rv, which will be described later, are connected to the negative electrode terminal and the positive electrode terminal of the main bias application unit %, respectively. The middle electrode G is connected to the positive terminal of the main bias application device through the Leiyang p, the hit &amp; The second and second inter-electrode g2 are connected to the positive electrode of the main dust by applying a resistance r2 to the positive electrode of the V + T: k 1 . A predetermined bias voltage is applied between the cathodes 8 盥 10 200826748 and the anodes 63 by the main bias application ' 'and the combination of the resistors Rv, Rl5 R έ 2 '. Thereby, a cylindrical plasma 36 is generated in the vicinity of the cathode 8 of the pressure gradient type plasma. A thin layer of plasma is attached to the rear end of the pressure gradient type plasma gun to form a rear end of 30. The rear end and the front end of the thin plasma forming chamber 3 are formed by being closed by an insulating cover member 29 having a central opening and a first flange 39 of the central opening. The tubular member 3 is formed by non-magnetic separation. A first loop coil W for arranging the shape of the cylindrical plasma 36 is placed around the rear end side of the tubular member 3 . Further, a pair of long-lasting magnets 33 are sighed in front of the position where the i-th toroidal coil 32 of the tubular member 31 is disposed. The pair of permanent magnets 33 are arranged such that the N poles of the respective two are opposed to each other. The pair of permanent magnets 33 form the introduced cylindrical plasma 36 into a thin layer of plasma (hereinafter referred to as a thin layer plasma). Further, a second loop coil 34 for arranging the shape of the thin layered plasma 37 formed is disposed around the front end side of the tubular member 31. The thin layered electricity 37 formed by the bonding layer forming chamber 30 is connected to the film forming chamber 40 at the front end of the thin plasma forming chamber 30. internal. The film is formed into a 40-series chamber 41 having a cylindrical shape. Chamber 4 =: Widely closed, the end of the cavity is on one side. An exhaust port 52 is formed in the cavity system at a position s of a non-magnetic material such as a non-ferrous steel. The exhaust port &lt; is configured such that the valve 53 can be closed by μ m m ^ and the 2 system empty fruit 54n. A true pressure is connected to the exhaust port 52, and the second pump 54 connects the film forming chamber 4 (the chamber 41) to a predetermined pressure capable of transporting the thin layered plasma 37. In = Vacuum <Internal, 11 200826748 Target holder 48 and substrate 俾 雷 将 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Dry the holder 4 8 ® + m to maintain the target 49. The target holder is transmitted through the insulating member 51 to the secret ~ Xuan - Mu '&quot; to 41. The target holder 48 is attached to the chamber 41 by the female t. A bias applying device V2 is connected to the target holding 罝-&amp;, 48. Relative to

The bias voltage of the radonitis A of the layered plasma 37 is applied to the target holder 48 by the bias applying means V7. Therefore, the target 49 is sputtered by the plasma particles in the thin layered plasma 37. "On the other hand, the base material holder 44 is used to hold the base of the film to be formed. The substrate holder 44 is attached to the chamber 41 through the insulating member 50. The material holding 4 44 is airtightly mounted to the chamber 41. The substrate holding material is biased by the application device %. The bias voltage which is negative with respect to the potential of the thin layer plasma η is applied to the base material by the biasing application device. The target material is deposited on the substrate 45 and forms a film. After the anode chamber 6 is connected to the front end of the film forming chamber 40, the rear end and the front end of the cylindrical member 62 are respectively opened by the center portion. The cylindrical member Q is formed by closing the anode 63. The cylindrical member Q is made of, for example, glass. A third annular coil 61 for arranging the shape of the layered electropolymer 37 is disposed around the tubular member 62. As described above, it is connected to the positive terminal of the main bias applying means Vi. On the inner surface of the anode ,, a permanent magnet 64 is provided. The permanent magnet 64 is arranged such that its s pole is in contact with the anode 63. The permanent magnet 64 is used. Finishing the shape of the end of the thin layered plasma η. Further, the thin layer plasma film forming apparatus 100 Control device 12 (not shown) 200826748 The control device controls the operation of the main bias application device, etc. The control device is operated by a microcomputer or the like; =... The layer is electrically formed into a film device 100, and then ... constitutes a 'control thin ai The required components are controlled to control the thinness of the membrane device. Here, Bencheng

The Lb g ^ control device is not only a single (four) device, but also refers to a controller group of a plurality of (four) devices. Therefore, the control device does not necessarily have to separate and configure multiple controllers with separate control and The controllers coordinately operate to control the operation of the thin-film plasma film forming apparatus 100. The thin layer plasma film forming apparatus configured in the above manner will be briefly described. The pressure gradient type plasma is used to generate the film. The cylindrical plasma 36 is formed by the plasma layer forming chamber 30. The permanent magnet 33 is formed into a thin layered plasma 37. The thin layered plasma 37 is introduced into the film forming chamber 4〇 to The target material 49 is sputtered, and the target particles to be sputtered are deposited on the substrate 45 which is held by the thin layered plasma 37 and placed at a relative position to form a film. The pressure of this embodiment will be described in detail with reference to FIG. The gradient type plasma gun 1. In addition, in FIG. 2, for convenience of description, as shown above, the left side of FIG. 2 is the front side and the right side is the rear side. As shown in FIG. 2, the pressure gradient type plasma of the present embodiment is as shown in FIG. The robbery system has a cathode support 2. In the central part of the cathode support 2 (correctly, The discharge gas introduction hole 3' is formed to introduce a discharge gas such as argon gas from the discharge gas introduction hole 3 so as to be located on the central axis 201 of the insulating tube 6 to be described later. Further, a cooling medium is formed inside the cathode holder 2. The flow path 4 is circulated by the cooling medium circulation mechanism (not shown) to the cooling medium flow 13 200826748. The cooling medium may be, for example, water, pure water or glycol water.

Examples of the gas (antifreeze), fluorine-based refrigerant, and the like include, for example, argon, nitrogen, and the like. X is attached to the front end of the cathode holder 2 with a cylindrical insulating tube 6 attached thereto. The smear-edge tube 6 is formed of an insulating material such as glass, ceramics, or the like, and the body-shaped intermediate electrode G and the insulating collar μ, which will be described later, constitute a cylindrical body. The cylinder ίο is a cylindrical body in this embodiment. The opening of the cylinder ι (see Fig. 1) constitutes an electrical rupture outlet. In the cathode holder 2, the cathode 8 is disposed so as to protrude onto the central axis 201 of the insulating tube 6 inside the insulating tube 6. The cathode 8 is provided with a discharge gas flow path 7. The discharge gas system introduced from the discharge gas introduction hole 3 flows through the discharge gas flow path 7. The integral intermediate electrode-integrated intermediate electrode G is attached to the front end of the insulating tube 6, and as described above, the second intermediate electrode, the insulating member 16, and the second intermediate electrode G2 are included. The configuration of the integrated intermediate electrode G will be described in detail later. At the front end of the integral intermediate electrode G, a short cylindrical insulating shaft is mounted at the rear end of each of 24. The insulating collar 24 is disposed coaxially with the insulating tube 6, and a sealing member (not shown) such as a 〇-shaped ring is disposed on both end surfaces thereof. The material constituting the insulating collar 24 is made of an insulating material such as polytetrafluoroethylene or ceramic. A plate-like guide member of a ring (not shown) is attached to the front end of the insulating collar 24. The insulating collar 24 ensures insulation between the integral intermediate electrode G and the guiding member. Next, the 'pressure gradient type plasma grab 1 is attached to the thin plasma film forming apparatus 100 (more specifically, the insulating cover member 29 of the chamber 30) through the guide member. The formation of the thin layer plasma is described in detail with reference to Fig. 3. In addition, in the following description, the structure of the front end &quot;B electrode G is described. Corresponds to "after". "Previous" in W舆圏2, as shown in (4), (b), and (4), the body type_interelectrode G includes: 1 the first intermediate electrode of the casing U, and the second casing The intermediate electrode g2 of the body 17 and the insulating member 16 are formed. The first housing u is attached to the front end of the insulating tube 6 (refer to the 1 housing), which is formed in a ring shape in a zigzag shape. Further, the shape of the first working body 11 is not limited to the annular shape. It can be formed into a square shape such as a square shape or a one-piece shape. The cross section of the first housing u is formed in a U-shaped shape with the second body 17 and 'open to the surface' and is made of the 壳体i casing&quot; The space enclosed by the insulating member 16 in the form of a ub. / ke * is formed as a cooling medium flow path 1. The body 11 is provided with the cylindrical first sleeve 12 and the inside of the first body 11. The circumferential surface is in contact with the outer circumference of the first sleeve 12, for example, eight worms are formed, and the male screw is provided to be screwed to the female thread formed on the inner circumference of the first casing 11. The first sleeve 12 is provided concentrically with the first casing 。. The first casing 1 1 and the first sleeve 12 constitute the ith intermediate electrode 1 and the sleeve 12 is made of a material having high melting point and conductivity. For example, tungsten or molybdenum is used. The first sleeve 12 lifts the heat resistance of the cylindrical casing 36 generated by the first casing 11. The first casing 11 is formed with a cooling medium inlet 111 and a cooling medium. In the present embodiment, the cooling medium inlet 111 and the cooling medium 15 200826748 are formed so as to penetrate through the center of the peripheral wall of the first casing n, that is, with respect to the center of the first casing 1 1 . In the horizontal direction, a cooling medium circulation mechanism (not shown) is connected to the cooling medium inlet lu and the cooling medium outlet 112, and the cooling medium circulation mechanism flows through the cooling medium flow path 14. The cooling medium can be liquid. For example, water, pure water, an aqueous glycol solution (antifreeze), and a fluorine-based refrigerant, etc., may be, for example, helium, argon, or nitrogen. The first casing 11 has a rectangular cross section. The permanent magnet (the second magnet) 15 is accommodated along the inner circumference of the cooling medium flow path 14. The shape of the permanent magnet 15 can be appropriately changed according to the shape of the first casing ,, for example, a square shape, a hexagon shape, or the like. The permanent magnet 15 is housed in a concentric shape with the first casing 11. In other words, the cooling medium flows through the cooling medium formed inside the i-th intermediate electrode G. The permanent magnet 15 is in contact with the cooling medium, and the permanent magnet 15 is sandwiched by the inner peripheral wall of the first casing n and the side wall of the insulating member 16 to determine the position. As shown in Fig. 3(b), c), the i-th protection plate 13 is provided at the rear end of the second casing π. The first protection plate 13 protects the side surface (end surface) of the first casing u from sputtering by the plasma. The screw hole 1 14 is formed at a predetermined interval in the circumferential direction on the surface of the rear end of the second casing u. The screw (not shown) is locked in the screw hole 114 to be coupled (fixed) first. The casing n and the insulating tube 6. Further, an annular ring-shaped annular groove 113 is formed on the surface of the rear end of the first casing. A Ο-shaped ring (not shown) is inserted into the 〇-shaped ring groove 113 to mount the insulating tube 6, whereby the first casing π and the insulating tube 6 are hermetically joined. At the front end of the first intermediate electrode Gi, a short cylindrical insulating structure is provided. Further, the shape of the insulating member 16 is not limited to a cylindrical shape, and may be appropriately changed in accordance with the shapes of the first casing 11 and the second casing 17, and may be formed in a tubular shape such as a quadrangular shape or a hexagonal shape. The insulating member 16 is disposed coaxially with the insulating member 6. The insulating member 6 is made of an insulating material such as polytetraethylene or ceramic. The insulating member 16 insulates the tantalum electrode A in 帛i from the second intermediate electrode g2 described later. A rear end of the second casing 17 is provided at a front end of the insulating member 16. The second body 1 7 is formed in a ring shape in a zigzag shape. Further, the shape of the second casing 17 is not limited to an annular shape, and may be formed into a ring shape such as a quadrangle or a hexagon according to the shape of the i-th casing. The cross section of the second casing 17 is formed in a U-shape that is open to the surface of the casing 1 1 , and is surrounded by the second casing 17 and the short cylindrical insulating member μ. The cold portion medium flow path 20 is formed. In the second casing 17, the annular second sleeve ° is placed along the inner circumference Φ of the second casing P. For example, a male screw is formed on the outer circumference of the second sleeve 18, and the male screw is provided to be screwed to a female screw formed on the inner circumference of the second installation body 17. The second sleeve 18 is provided in the same manner as the second redundant body 17 and is in the same shape as the second redundant body. The second casing 18 and the second sleeve 18 constitute the second intermediate electrode G. Chu 1 + 2 The sleeve 2 is made of a high-melting-point and conductive filament progenitor such as tungsten or I m ^ belt. The second sleeve 12 is used to raise the heat resistance of the second casing 17 when the cylindrical-water passage is generated. The second body 17 is formed with a cooling medium inlet ι 71 and a cooling outlet 172. In the case of a too heterogeneous a I shell, the cooling medium inlet 117 and the cooling medium outlet 172 are inferior, and become the opposite part of the outer edge of the peripheral wall of the second casing 17 The square knives, that is, the portions in the horizontal direction 17 200826748 with respect to the center of the second casing 17 are. A cooling medium circulation mechanism (not shown) is connected to the cooling medium inlet 171 and the cooling medium outlet 172, and the medium flows through the cooling medium flow path 20 by the cooling medium circulation mechanism Δ. The cooling medium may, for example, be water, pure water, an aqueous glycol solution (antifreeze), or a fluorine-based cooling medium. Examples of the gas include helium, argon, and nitrogen. In the second casing 17, an annular electromagnetic coil (second magnet) 21 having a rectangular cross section is housed so as to be in contact with the inner circumference of the cooling medium flow path 20. Further, the shape of the electromagnetic coil 1 1 can be appropriately changed in accordance with the shape of the second casing 17 , and for example, a ring shape such as a quadrangle or a hexagonal shape can be formed. The electromagnetic coil 21 is received in a concentric shape with the second casing 17. In other words, the cooling medium flows through the cooling medium flow path 2〇 formed inside the second intermediate electrode 2, and the electromagnetic coil 21 is in contact with the cooling medium. The electromagnetic coil 21 is wound into a ring shape. The electromagnetic coil 21 is sandwiched between the side wall of the insulating member 16 and the inner peripheral wall of the second casing 17, thereby determining the position. A second protective plate 19 is provided at the front end of the second installation body 17. The second protection 1 plate 19 protects the side surface (end surface) of the second casing 17 from sputtering by the plasma, and forms an annular ring 环 = ring groove 173 on the front surface of the second casing 17 . A 〇-shaped ring (not shown) is inserted into the 〇-shaped ring groove 173 to mount the insulating collar 24, whereby the second casing 17 and the insulating collar 24 and the rim shaft 24 are hermetically joined to each other. Short cylindrical. Further, the shape of the insulating collar 24 can be appropriately changed in accordance with the shape of the second casing 17, and for example, a tubular shape such as a quadrangular shape or a hexagonal shape can be formed. Further, the first housing 11, the second &quot;the body 17 and the insulating member 6 are formed with screw holes 28 (see Figs. 3(b) and (c)). The bolt holes 28 are formed in the third The casing 丨丨 and the insulating structure 18 are formed by the through holes 28a and 28b of the member 16 2008267 and the screw holes formed in the second casing i7. Then, the cylindrical insulating collar 26 is inserted into the through hole W, and the bolt (bonding device) 27 is inserted into the insulating shaft 胄% and screwed into the screw hole 28c'. The insulating member 16 and the second casing η are coupled to each other and integrated. Thereby, the insulating member 16 is formed as an opening on the open surface of the ith housing U and the second housing 17. That is, the respective open faces of the casing 1 and the second casing 17 are closed by the insulating member 16. The i-shaped ring groove 22 is positioned in the i-th housing U and the second housing 17, and the 〇-shaped ring 23 is inserted into the 〇-shaped ring groove 22. It is assumed that the housing u, the insulating member 16, and the second housing 17 are joined by a desired or liquid-tight type. That is, when the gas is used to cool the medium f, the 22'% edge member 16 and the second casing 17 are sequentially airtightly connected. On the other hand, when the liquid cooling medium is used, the shell and the shell are used. The edge member 16, and the second but the 1 g - and the second body 2 are sequentially liquid-tightly connected. k is to ensure the sealing of the insulating member 16 material i and the second D : to prevent the cooling medium from leaking from the integral type intermediate electrode. The housing 1 of the first housing 11, the insulating member 16, and the second housing i are offset from the predetermined center by the bolt hole 28, 25 is passed through... Form a loose plug hole ~ Hai 3 (a) to (4)). The bolt insertion holes are respectively formed in the i-th housing U, the insulating member i', and the beacon holes 25a, 25b, 25e of the book π w A Han's 2 body 17, and the bolts are inserted. In the snail} into the 4,000, s 丨〇ς ^ ^ ^ ^ ^ ^ ^ ^ 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首 首The pressure gradient type electric blasting (10) of the 曰 body type 曰 electrode G is transmitted through the guiding member, and is applied to the thin layer plasma film forming apparatus 100 of 19 200826748 (more specifically, it is installed in the thin layer plasma forming chamber 30). Insulation cover member 29) Here, the first case 11 and the second case 17 are preferably made of an aluminum alloy. The aluminum alloy can reduce the first case because the specific gravity is smaller than that of the ordinary intermediate electrode. The weight of the body 11 and the second casing 17 improves the workability when the first casing 11 and the second casing 17 are processed.

As an example of the aluminum alloy, for example, an aluminum-based alloy (JIS 5 000 series), a LV-magnesium-based alloy (JJS6000 series), and a Zn-zinc-magnesium alloy (JIS 7000 series) are preferably used for maintaining strength. And corrosion resistance. Further, the surface of the contact portion between the first casing 11 and the second casing 17 and the cooling medium (the surface of the inner portion of the c-shaped portion formed in the first casing 11 and the second casing 17) is formed to be electrically conductive or non-conductive. A magnetically and corrosion-resistant surface treatment layer is preferred. Such a surface-treated layer having conductivity, non-magnetic properties, and corrosion resistance may, for example, be an electroless Ni layer. Thereby, deterioration of the contact portion between the first casing 11 and the second casing 17 and the cooling medium is suppressed. As described above, the body type = electrode G can be assembled by joining the first body U, the insulating member 16, and the second case 17 with bolts (joints) 27. X, the integral intermediate electrode G can be decomposed by performing the opposite operation. Further, an assembled intermediate electrode 〇 can be attached to the wall (insulating member 29) of the thin layer forming chamber 30 through the guiding member. Since the body type intermediate electrode G of the present embodiment has the above configuration, the number of components can be reduced, and the weight can be reduced. Further, the integrated intermediate electrode 亦可 can also be made small. Thereby, the workability when mounting the body type intermediate electrode G is improved. Further, since the first magnet 15 can be detached from the first casing 11 by the detaching bolt 27 20 200826748 and the second magnet can be detached from the second casing 17, the maintainability of the intermediate electrode can be improved. Further, in the 'in the present embodiment', the cylindrical body 10 constituting the pressure gradient type plasma is used as a cylindrical body, but the cross-sectional shape thereof is an arbitrary shape, for example, the cross-sectional shape perpendicular to the central axis is a positive polygonal shape. can. Further, although the i-th sleeve 12 and the second sleeve 18 in which the male screw is formed are screwed to the inner circumferences of the second housing n and the second housing 17, respectively, the male threadless portion may be provided. The sleeve 12 and the second sleeve 18 are respectively inserted along the inner circumferences of the first and second housings 1 and 17 and are sandwiched by the protective plates 13 and 19 from the outside. According to the above configuration, it is possible to prevent the thread from being slid and to easily replace the second sleeve 12 and the second sleeve 18. Many modifications and other embodiments of the invention will be apparent to those skilled in the <RTIgt; It is to be understood that the foregoing description is intended to be illustrative of the embodiments of the invention. The detailed construction and/or function may be substantially changed without departing from the spirit of the invention. The intermediate electrode of the present invention is an intermediate electrode which is used as a simple structure to reduce the weight, to improve the handling convenience, and to improve the maintainability during decomposition and adjustment. The pressure gradient type plasma gun of the present invention is used as a pressure gradient type plasma grab for the workability of the middle of the installation. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing a schematic configuration of a thin layer plasma film forming apparatus which is not used in the embodiment of the present invention. Fig. 2 is a cross-sectional view schematically showing a state in which the pressure gradient type plasma gun of the present invention is cut perpendicularly along the central axis. Fig. 3 is a cross-sectional view showing a state in which the intermediate electrode of the pressure gradient type plasma of Fig. 2 is taken as a left side view, (b) is a state in which the intermediate electrode is vertically cut along the central axis, and (c) is right. view. &amp; [Main component symbol description] 1 Pressure gradient type plasma gun 2 Cathode holder 3 Discharge gas introduction hole 4 Cooling medium flow path 6 Insulation tube 7 Discharge gas flow path 8 Cathode 10 Cylinder 11 First case 12 First set Cartridge 13 First protection plate H, 20 Cooling medium flow path 15 Permanent magnet (first magnet) 16 Insulating member 17 Second housing 18 Second sleeve 22 200826748 19 Second protection plate 21 Electromagnetic coil (2 magnet) 22 0 type ring groove 23 0 type ring 24 Insulation collar 25 Bolt insertion hole 25a, 25b, 25c through hole 26 Insulation collar 27 Bolt (bonding) 28 Bolt hole 28a, 28b Through hole 28c Screw hole 29 Insulation cover member 30 Thin layer plasma forming chamber 31 cylindrical member 32 first toroidal coil 33 permanent magnet 34 second toroidal coil 36 cylindrical plasma 37 thin layered plasma 39 first flange 40 film forming chamber 41 chamber 42 Upper cover 23 200826748

43 lower cover 44 substrate holder 45 substrate 48 target holder 49 target 50, 51 insulating member 52 exhaust port 53 valve 54 vacuum pump 59 second flange 60 anode chamber 61 third annular coil 62 cylindrical member 63 Anode 64 permanent magnet 111, 171 cooling medium inlet 112, 172 cooling medium outlet 113, 173 0 type ring groove 114 screw hole 201 central axis G integral type intermediate electrode first intermediate electrode g2 second intermediate electrode Rv, Ri, R2 resistance 24 200826748 V! V25 V3 main bias application device bias application device 25

Claims (1)

200826748 X. Patent Application Range: 1. An integrated intermediate electrode comprising: a first housing having conductivity; a first sleeve having conductivity, disposed concentrically with the first housing and The inner surface of the first casing is in contact with each other; the first magnet 'contained in the first casing concentrically with the first casing; and the second casing having electrical properties is provided in the first casing Coaxially; a second sleeve having conductivity is disposed concentrically with the second casing and in contact with an inner circumferential surface of the second casing; and the second magnet is concentric with the second casing The second casing is housed in the second casing; wherein the first casing and the second casing are integrated through the insulating member. 2. The body type intermediate electrode according to claim 1, wherein the first housing has a c-shaped cross section such that a surface opposite to the second housing is open; ° the second housing has a shape a cross section such that the surface facing the second casing is open; the insulating member is formed in a shaft shape with the first casing and the second casing; and the first casing and the same Each of the open surfaces of the second casing has a joint as a cover; and the first magnet is housed between the first casing and the insulating member, and the second magnet is housed in the first magnet. 2 Between the housing and the insulating member: 26 200826748 The first housing, the insulating member, and the second housing are coupled to each other by a bonding tool. 3. The body type intermediate electrode according to claim 2, wherein the first casing, the insulating member, and the second casing are sequentially joined in a gas-tight or liquid-tight manner. 4. A bulk type intermediate electrode according to claim 3, wherein the joint is made airtight or liquid tight using a 〇-shaped ring. 5 · A pressure gradient type plasma gun characterized by having a body type intermediate electrode of any one of the first to fourth aspects of the application. 6. The pressure gradient type plasma blasting according to claim 5, wherein the collar, the integral intermediate electrode, the insulating tube, and the cathode having the cathode and sealing the insulating tube from the far end of the integrated intermediate electrode The brackets are combined with each other to form the pressure gradient type plasma gun. XI. Round: I as the next page 27