TW200821751A - Alkali soluble polymer and positive working photosensitive resin composition using the same - Google Patents

Abstract

The invention provides an alkali soluble polymer containing a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition containing such an alkali soluble resin.

Description

200821751 25912pif.doc IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a soluble polymer type photosensitive resin composition, which is further used as a positive film of the polymer [previous technique] u ^ Photoresist and its similar fields. The patterning and translucent (10) makes Xiao Yuxian such as a separator, an insulating film and a protective film, and has been proposed in various parts, and the sheet-like fine-featured composition (see, for example, Patent No. 2 = use is known to be included) 4. Recording styrene as: to the other 'resin composition (see, for example, the positive photosensitive image of the patent article (such as having a thin film transistor and a solid-state shadow H-night display device) having an insulating film to arrange The positive-type photosensitive tree in which the layered r-phase m _ is a material of the edge-forming material is used in a small amount, and the positive-film photosensitive resin composition has an insulating film having a desired pattern. Further, positive-type photosensitive light =, and In the process of forming the insulation process, it is necessary to have a large process range. The system or iL uses an insulating film or a display device of a positive-type photosensitive resin composition in the subsequent step, which is determined by the impregnation and dissolution of the solution. Or its analogy is in contact and requires heat treatment.

[Patent Document 1] JP 51-34711 A [Patent Document 2] JP 56-122031 A [Patent Document 3] JP 5-165214 A

[Patent Document 4] JP 52-41050 B [Summary of the Invention] 200821751 25912pif.doc, in the form of a dome, requires a positive-type photosensitive resin composition or its resistance to an aqueous solution which is excellent in obtaining an aqueous solution: Goodness, high acid resistance, high alkali resistance, high heat resistance, =^^ and the film of the substrate, which is a transparent film (patterned transparent film) formed by the wood. 'The ground' also needs to have high _ solvent, high water resistance, high catering, high heat resistance, high bribery, fish substrate =, characteristic patterned transparent film, insulating film, display device T correction The copolymerization is obtained by a radical polymerization polymerizable monomer (Β) represented by the general formula (1); and a sensory agent, and based on this finding, the present invention has been completed. (1) Obtained by the monomer (Α) indicated.

[1] The present invention provides a polymer which is polymerizable by (1) in the formula (1) t · R, R and R3 each represents a filament of ammonia or a carbon atom, and any hydrogen in the filament can be reducted R6, r7# each means argon, fangs, grabs and 'two plants-OH, have! To the appearance of five carbon materials, any of the wires in this wire can be replaced by -ax)-, :〇C〇4CO_ and any hydrogen can be exchanged by ^^^^^^^^^^^^^^^^^^^^^^^^^^ The alkoxy group of the atom, any hydrogen in the oxy group may be replaced by a halogen, wherein at least one of R4 to R8 is _〇11. [2] Further, the present invention provides a soluble base polymer by copolymerizing a monomer (A) represented by the formula (1) with a radical polymerizable monomer other than the monomer (A) (B) ) and get.

In the general formula (1): the scales 1, # and R3 each represent hydrogen or have! To the atomic group of the anti-atomic element of the stone, any hydrogen in the alkyl group may represent hydrogen-OH, an alkyl group having 1 to 5 carbon atoms, and the second to the -COO. (10)_ or (3)_substitution and any hydrogen may be placed via a dentate-two, or an alkoxy group having from 1 to 5 carbon atoms, and any of the alkoxy groups may be substituted with (tetra)in 'where 'R4 to R8 At least - the one is -OH. [3] The present invention provides the soluble base polymer according to [2], wherein R1 R and R8 each represent hydrazine and R6 represents 〇H. It is possible to provide a soluble polymer according to the item [2], wherein the radical to the quinone B) comprises a radical selected from the group consisting of: 1 Μ V oxy (10) yl (GXimnyl) Polymeric monomer (b2'r) ketone Xetany I radical polymerizable polymer rj /, N-substituted maleic imine free radical polymerizable single X and has a ruthenium [5.2丄〇2,6] fluorenyl radical free polymerizable single 200821751 25912pif.doc polymerizable compound 'wherein free radical polymerizable monomer (10) mer monomer (10) with free radicals [6] The present invention provides as in [5] The polymerizable monomer (B) consists of the following: a free radical (10), a radical polymerizable monomer, a ruthenium, a radical polymerizable monomer (Μ), and a free radical other than (b4). And free radical polymerizable in addition to the radical polymerizable monomer [7] The present invention provides, as described in the first [middle (), the polymerizable monomer (8) is free from beauty; ^ polymer 'where free radicals and (b3) The composition of the present invention (M), (b2) is provided by [8] The present invention provides that the polymerizable monomer (B) is composed of a free radical compound, wherein the radical and (M) are composed. σ 早 early limbs (bl), (b2) to [9] The present invention provides, for example, the [51 ^ k 'polymerizable monomer, a free radical complex, in which a radical and (b4) are composed. Bl), (b3) to [10] The present invention provides, for example, the [5-base polymerizable monomer (B) is derived from a free, di-polymer, wherein the free [11] is provided by the present invention. a composition, wherein the radical polymerizable single f is a smear of a polymerizable (M) and (Μ) composition. The radically polymerizable monomer [12] The present invention provides as described in [6] to (1) The compound 'where ···, the soluble alkali of the item 200821751 25912pif.doc The radical polymerizable monomer (bl) is one of the following or two or more of the following: · glycidol Ester, bis-glycolic acid glycidyl ester, and methyl methacrylate methacrylate yttrium methyl methacrylate = by polymerization monomer (b2) is one or both of the following Or more: acrylic acid (3_ethyl_3_oxyalkyl) methyl ester, methacrylic acid (3-ethyl-3-oxetanyl) methyl ester coating = (,: acid (2_ Ethyl-2-oxetanyl)methyl ester and -2_oxetanyl)methyl acrylate; the soil-radical polymerizable monomer (b3) is one of N_phenylmaleimide and N-cyclohexylmaleimide Or both, and the 自由基· radical polymerizable monomer (M) is a methacrylic acid tricyclo[5·2·ι.02,6] [13] The present invention provides a soluble base polymer according to the item Wherein the radical polymerizable monomer (b5) is one or both of methyl propyl: if acid steryl ester and styrene. [14] The present invention provides a positive-working filament composition comprising the soluble polymer according to any one of [2] to [13] and the sensitizer (C). The invention provides the photosensitive resin composition according to the item [14], wherein the light sword (C) is an acid generating compound. The present invention provides a positive-working photosensitive resin composition according to the item [14], wherein the sensitizer (6) is a diazo compound. /, ^ In the specification of the present invention, to indicate that acrylic acid and mercaptopropene = can be described as "(meth)acrylic acid, in addition, in the form of six, in the form of acrylate and methacrylic acid The ester can be described as "(meth) acrylate" in the specification of 200821751 25912pif.doc. The "hospital group" in the specification of the present invention means a linear or branched alkyl group. Examples include methyl, ethyl, propyl, n-butyl, t-butyl, pentyl and hexyl groups. In the present specification, "mercapto," refers to a linear or branched alkenyl group having a double bond. Specific examples include ethyl, i-propyl, 2-propenyl, 1-methylvinyl, Butenyl, 2-butadienyl, 3•丁妇^, 〇2_methyl_2_propyl, μpentyl, 2-pentyl, 4-pentenyl, 3.methyl 2 -butenyl, hexyl, 2-hexyl, j-heptyl, 2-heptyl, 1-octenyl, 2-octenyl, octadienyl, 2-nonenyl , hydrazine, 3-decadienyl and 2-decenyl. 'A "drying group" means an alkynyl group having a straight or branched chain containing hydrazine to 3 porphyrins. Specific examples include an yl group, 丨Propyl group, 2-propyl group, butynyl, 2-butynyl, 3-butynyl, indolyl, pentynyl, pentylene, 1-octynyl, 6- The base film photosensitive resin composition of the present invention has the characteristics required for the polymer composition such as high solvent resistance, high water solubility, and high Acid resistance, high economy, high heat resistance, high transparency and adhesion to the substrate. Furthermore, the present invention can The positive-working photosensitive resin composition is provided without using any polymerizable monomer having a carboxyl group. In addition, the positive-working photosensitive resin composition of the present invention can have excellent resistance; bulkiness, acid resistance, and durability, Heat resistance and transparency. Therefore, the resin film (such as a transparent film, an insulating film, and a display device) using the positive-working photosensitive resin composition of the present invention is post-processed even after the process of manufacturing the resin film (for example, 200821751 25912 pif.doc) (such as The impregnation of the solvent, the acid solution, and the contact of the test solution, and the heat treatment, hardly cause the resin film to be m/port, and the transparent film prepared by using the positive photosensitive resin composition of the present invention has an increase. The light transmittance of the force 0 and the display quality of the display device using the tree-shaped film are also increased. [Embodiment] <1 Soluble alkali polymer> The soluble polymer of the present X month has the following The extent of the solubility of the poly 3: in the form of solution spin coating and 纟 12 (formed by heating under rc for 3 〇 minutes = thickness, 0.01 to 100 micron film, when it is at, for example, about 25. When the membrane was washed with pure water and then the membrane was completely washed without leaving residual 0 <M first soluble Alkali Polymer> A first soluble base polymer of the present invention is a polymer obtained by polymerizing a monomer (A) represented by the formula (A). The monomer (A) can be a monomer form of (10) single face. Use 'may be a combination of two or more monomers; use.

In the general formula (1), 'R', R and R. Each represents hydrogen or a burnt group having 1 to carbon atoms, this: !: any hydrogen in the complete group may be replaced by fluorine; and 200821751 25912pif.doc R, R, R, R and R each represent hydrogen, halogen, _CN , -CF3, -〇cf3, -OH, an alkyl group having 1 to 5 carbon atoms, any of which may be replaced by -COO-, -OCO- or _c〇_ and any hydrogen may be subjected to self-priming And, or an alkoxy group having 1 to 5 carbon atoms, any gas in the decyloxy group may be replaced by a halogen, wherein at least one of r8 is the collar. The first-identifiable polymer of the present invention can be obtained by radical polymerization. Free radical polymerization can make the self-entertainment. It is expected that the first soluble alkali polymer of the present invention is a patterned resin film in the field of knowledge. For photoresist technology <1-2 一一一〉谷研研> A second soluble alkali polymer of the present invention is represented by a combination of monomer (A) and monomer (4) The polymer obtained after the free radical (1) table. In other words, the copolymer obtained by polymerizing the monomer (Β) is dissolved. In the second soluble polycondensation = content of the polymerized monomer u), as long as the monomer (A) and the two: two, (b) of the polymer have the above-mentioned alkali solubility, the soil can be combined with the single, It is preferably from G. 5 to 85%, more preferably from 丨 to 8 (), and the weight percentage is from 5 to 80%. Further, the step of the radical polymerizable monomer (B) is preferably from 15 to 5%, more preferably from 2 to 2, more preferably from 20 to 95 by weight. %. 99%, further 12 200821751 25912pif.doc

(1) R5 R4 R3 f In the formula (1), R], R2 and R3 each represent hydrogen or an alkyl group having from 2 to 3 fluorene atoms, and any hydrogen in the alkyl group may be subjected to fluorine (, R, R, ^ and ^ each represent hydrogen, ·, %, ^^, 〇H, an alkyl group having 1 to 5 carbon atoms, and any _CH _ in the alkyl group may be via -COO-, -〇C〇_ Or c〇_substitution and any chlorine may be exchanged by dentate, or a decyloxy group having 1 to 5 carbon atoms, any of the alkoxy groups may be replaced by γ, wherein at least R4 to R8 Further, in the case of the soluble base polymer of the present invention, it is possible to evaluate the monomer component 'for example, a gas generated by decomposition of 卩GC_M 后 after thermal decomposition of the soluble base polymer. (, :1-2·1, the monomer (A) represented by the formula (1): &gt;'body# (A) is a radical having a group derived from a group as a polymerizable group. The polymerizable monomer (monomer) may be used in the form of a mono-monomer or may be used in combination, and can be easily obtained by using the radical polymerizable polymer, which can be easily obtained during development. ^/night has a souther solubility ( That is, it has a high developing property), and the obtained film has solvent resistance, high water resistance, high adhesion H, high heat resistance, high transparency, and high with the substrate 13 200821751 25912pif.doc In the polymerization of the second soluble base polymer, the weight of the monomer (A) to be used is preferably from 〇5 to 85%, more preferably from 1 to 80% by weight based on the total of the monomers. When the weight of Α) is within this range, the transparent film obtained from the positive photosensitive resin composition of the present invention can have improved resistance; graininess, water resistance, acid resistance, compatibility, heat, transparency and Examples of the monomer (Α) preferably include a compound wherein R1 to R5, R7 and R are each 虱 and R6 is _〇H. Hereinafter, monomer (a) is also referred to as "single &lt;1" -2·2 radical polymerizable monomer other than monomer (A) (B)> The radical polymerizable monomer (8) may be a monomer free of unbonded precursor. Free radical polymerizable monomer (B ring An oxyethylidene radical polymerizable monomer (Μ), a radical polymerizable monomer (b2), having N-passing = heterocyclic a radically polymerizable monomer (10) having a tricyclic ring [521], a radical polymerizable monomer (b4), and a radical (3) other than these mono-'hexyl groups. Another free radical polymerizable monomer (B) may be ruthenium to (b4). (b) to (b4) a group selected from the group consisting of a polymerizable monomer-based polymerizable monomer. The base polymerizable monomer or one of the plurality of free polymerizable monomers (M) and (b2) preferably contains a radical free radical polymerizable monomer (M), and more preferably includes a range of effects Within the free radical polymerizable single in the absence of damage to the hair &quot;) can be further included in addition to 14 200821751 25912pif.doc free radical polymerizable monomer (5)) to (b4) to body (b5). For example, a radical polymerizable monomeric polymerizable mono-group polymerizable monomer (M) is formed; it may be composed of: two from free (b2) and (b5); may be composed of a radical polymer (10), and (b3) constitution; may be composed of the two bodies (M), (b2), and ((4); the radical polymerizable monomer (8) may be described below by the free side (8). The radical polymerizable monomer (8) is also referred to as "monomer B. In the description, the oxirane-based free radical can be smashed & In addition, it has a free radical polymerizable single early; the base is early (b4), and the other free radical polymerizable single is also 7 Also referred to as "monomer bl", "monomer b2", "monomer b3", i-body b4", and "monomer b5". Early <1 2 ϋ has &amp; oxyethylene alkyl radical 'free radical polymerizable Monomer (bl ) &gt; has a radically polymerizable monomer (b2) having an ethylene oxide group, which may be a monomer B containing the epoxy group and used in the present invention, but is not particularly limited thereto. Thus, as long as it contains such a functional group, specific examples of the monomer oxime include glycidyl (meth)acrylate, fluorenyl (meth) acrylate, glycidyl amide, α - glycidyl ethacrylate and 3,4-epoxyhexyl (meth) acrylate. Also in the above specific examples, glycidyl acrylate 15 can be easily obtained. 200821751 25912pif.doc ester, methyl acrylate shrinkage Gan, 占, &lt;methyl propyl _34^1 · θ, f-based acid methyl glycidol vinegar 1 Γ Weiji ring _, and the resulting patterned transparent film "to make wide * water resistance, acid resistance, durability It is preferred in terms of properties, heat resistance, transparency and the like. The bell is used in the form of a single-type monomer and can be used in combination of two or more soaps. In the polymerization of the substance, it is preferable to control the soluble test and δ, and the monomer bl is preferable. The monomer Μ, the weight of the ruthenium bromide is preferably from 5 to 90% based on the total weight of the total monomers. The second is preferably used in the range of 1Q to 8G%. When the monomer bl in the range of i === is used, various characteristics obtained by the present invention: the photosensitive resin composition of the type 1 can be further improved. Such as solvency, water resistance, acid resistance, resistance, _ ness and transparency. (b2) <r_2_2 has oxetane The free-radical polymerizable monomer comprises a radical-polymerizable monomer (b2), which may be a diterpenoid, but does not specifically contain a specific example of a compound of the saponin b2. 3·Methyl-3-oxetanyl)methyl ester, (methyl'=(3-ethyl·3_oxetanyl)methyl acetate, (methyl^=butanyl)ethyl vinegar , (meth)acrylic acid-(methyl, (meth)acrylic acid (2-methyloxetanealkyl)methyl ester, (methyl-propionyl-(2-ethyl-2-oxo-heterocyclic) Ding Xuanji) ester, p-_3·ethyl oxetane 3-f _, 2_ grid 3_ ($ 200821751 25912pif.doc methyl oxetane:!: finished, 2 - &gt; ^ Oxygen Cyclobutane and heart-to-heart (methyl) propylene methoxymethylcyclobutane. Fluke 2 - (meth) propylene methoxymethyl oxalate mouth carving = use of at least one selected from some of the radical polymerizable monomers for use as a liquid with higher solubility II, can be easily obtained For an illustrative water soluble film. Further, it is preferable to have a transparent base, a high resistance to alkalinity, a high water resistance, a high acid resistance, and a high resistance. In terms of transparency and adhesion to the substrate, the example of hunting on oysters is obtained by ethyl-3-oxebutanol ^ '^light (IV) to obtain (meth)acrylic acid (:heterocyclic butyl) It is preferred that vinegar, ^1, hydrazine and (meth)acrylic acid (2-ethyl_4) are solvent-soluble, water-resistant, and resistant to the patterned transparent film thus obtained. Sex, heat resistance and transparency rfj car body b2 can be millet -,,

It may be used in the form of a monomer or two or more types of stencil + species or may be carried out in two. 'Characteristics of the alkali polymer, in the polymerization of the compound, the weight of the soluble w is controlled to be relatively good, in the range of the monomer used, more preferably in the range of 5 _ 'weight 1 Within the range of 1 to 80%, the range is from 3 to 100%. When the weight of the iron-light resin composition is used, the characteristics of the positive film, water resistance, and film resistance of the present invention such as solvent resistance &lt;1-2^3 alkali resistance, heat resistance, and the like are further improved. transparency. N-substituted maleimide free radical polymerizable 200821751 25912pif.doc monomer (b3) &gt; a radically polymerizable monomer having N substituted maleimide, which may be N-containing The monomer B of the present invention is used in place of the maleimide, but is not particularly limited as long as it contains the functional group. Specific examples of the monomer b3 include N-methyl maleimide, group ethyl maleamine, N-butyl maleimide, N-cyclohexylmaleimide, benzylmaline Yttrium imine, N-phenyl maleimide, N_(4-ethylphenyl) maleate (% subtropic, N-(2,6-diethylphenyl)maleimide , N-(4-dimethylamino) 3 5 dinitrophenyl) maleimide, N_(1-anilinophthyl-4) maleimide, N-[4-(2-benzene And oxazolyl)phenyl]maleimide and n quinone imine. 丞)Ma Dang uses at least one of the free radical polymerizable monomers to be selected, when it is poly(t), it can be (four) Obtaining high solubility for the aqueous test solution and the resistance to the filth, which is difficult to obtain, and (4) the imine easily obtains the resistance to dissolution of the Ν·cyclohexylmalan-coated transparent film. It is preferred. When the heat resistance is used in the form of a seed or a monomer and the two sides are polymerized, it is preferred to prepare the early version b3. In terms of the total weight of the monomer used, b3 18 200821751 25912pif.doc sr ^ is preferably in the range of mountain · f: 〇 %, such as, 駄 resistance, alkali resistance, heat resistance and transparency Production. Among them, it is more effective in terms of improving heat resistance and lowering the dielectric constant. ,, body ^2·Γ奸三环 [5.2.i.Q2,6] 癸基的(四)polymerizable 单立可ίΐΐίϋ.1.02'6] thiol radical polymerizable monomer (b3), two 3 The second group 2·1·02'6] is used in the present invention as the monomer B, but the other is: as long as it contains the functional group. Monomer μ inch of 匕3 ( 3 (meth)acrylic acid tricyclo[5·2·1·〇2,6] oxime ester. Ρίί! The at least one of the radical polymerizable monomers is selected to be easily soluble to obtain a patterned transparent film which has high solubility for the aqueous solution and has an epitaxial property. In addition, it is easy to get the solvent resistance, high water resistance, high acid resistance, high resistance, heat resistance, transparency, and adhesion to the substrate. The monomer b4 may be used in a single type of monomer and may be used in combination of two or more monomers. When the polymerization of the soluble alkali polymer of the present invention is carried out, the monomer b4 is preferred in terms of controlling the characteristics of the soluble base 4 δ 1 . The weight of the monomer b4f to be used is preferably in the range of from 1 to 80%, more preferably from 5 to 30%, based on the total weight of the total monomers. When the monomer b4 in the range of the weight ratio of 19, 2008, 21, 25, 912, pif. doc is used, the various transparent films obtained by the photosensitive resin composition can be positively film-formed, water-resistant, acid-resistant, and resistant. For the purpose of improving the heat resistance and reducing the dielectric constant, such as solvent resistance, lightness: In detail: 1-2-2-5 Another radical polymerizable monomer "" is effective. -&gt; 〇,) When polymerizing the test polymer, if the free radicals can be aggregated, :==, water resistance, the effect of her ^ = is small, and the above-mentioned development of the ceramics is not acceptable. In the range of any of the other radical polymerizable monomers b5^:r5==the monomer may be used or may be-two or more fine toluene single examples comprising styrene, methylstyrene, B Women's pentyl r-dimethyl) propyl-amine, (meth)acrylic acid bicyclo=dicyclopentenyloxyacetate, (methyl) propyl qingru, _ _ _ "A (:) propyl) := A ==;, (;_ Benzene vinegar, (methyl),: two:: = butyl ~ diacid 1 water clothing miscellaneous, poly stupid (four) and, olefin oxime methyl ester macromonomer, Ν-acryl hydrazine The morpholine and the hydrazine. In the above specific examples, the prepared ruthenium has excellent Ι»Μ寺性 and extremely high resistance to dissolution = resistance to resistance. Selected to the brightness, the positive photosensitive resin ethyl ester, (meth)acrylic acid ethyl ester, propylene, ketone, (a) prepared by copolymerization of the following various lipid compositions Acrylic olefin Methyl)cyclohexylpropionate and polystyrene. When carrying out the properties of the soluble base polymer of the present invention, the weight of the soluble base is controlled relative to all monomers in the case of the combination of the single base. Further, b5 is preferred. The inside of the monomer b5 to be used is more preferably 5 to 50 Å m'. Preferably, it is in the range of 1 to 8% by weight: 1]:: alkali polymer: polymerization method 〉 iii g is not particularly limited to the method of polymerization by polymerizing a monomer A * a single polymer, but it can be obtained in a solution, and a mixture of the mixture can be obtained in a solution. Free radical polymerization. The radical polymerization initiated by the special agent is initiated within the range of 24 hours. In addition, it can be applied by (4), ^ generally under 3 pressure or under atmospheric pressure. A. The solvent in the monomer reaction is preferably a soluble monomer. The solution contains Γ ΐ ΐ 聚合物 聚合物 聚合物 甲 甲 甲 甲 甲 甲 甲 甲 甲 甲 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- 1- Alcohol monoethyl ether, propylene glycol monoglycol monoterpene, diethylene glycol dimethyl ether, dimethyl 2 21 2·21 /!) 丄25912pif.doc ethyl ether, 3 A τ 乳 乳 丙 丙 丙 丙 丙 Τ Τ Τ Τ Τ Τ Τ Τ Τ Τ Τ Τ Τ Τ Τ Τ Τ 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸 乙酸A single type can be used to synthesize a mixture of soluble (four) = above. The radical polymerization agent is formed by a thermal nitrile; and a peroxy initiator, such as an azo-bisisobutyl equivalent chain transfer agent. Awkward peroxidation. A molecular weight of f can be added. The gas thioacetic acid' is used to regulate the molecular weight of the soluble polymer, and the weight of the polymer is in the range of 1000 to 100000. The unit of the sputum is the polyoxyethylene B. This is because the test 2 (1), (GPC) analysis Defined. The development time required for proper and film surface shading is good. The average weight is eight early denier; Further, it is more soluble in the range of (10) to 50,000 by the developer, because the development time of the developing surface is appropriate, the film surface is extremely small, and the residue during development is particularly preferable. &lt; All of them can be used as a polyene standard with a molecular weight of 1000 to 51 Å (for example, TSK standard manufactured by Dingoso Corporation), with Shodex KD-806 M (by Showa Denk〇κ κ The weight average molecular weight of the tube is measured by the sole DMF as the shift _, (4) the soluble test ^= mouth &lt; 2 the positive photosensitive resin composition of the present invention> 200821751 25912pif.doc The positive photosensitive resin composition is described A soluble base polymer (which is a second soluble base polymer) obtained by the monomer (4) represented by I (1) and another self-recorded polymerizable monomer (8); and a sensitizer (C). The soluble polymer in the positive photosensitive resin composition of the present invention may be a second soluble base polymer or may further comprise another soluble base polymer as long as it does not impair any effects of the present invention. &lt;2-1 sensitizer (c) &gt; "About the above sensitizer (C), a compound which generates an acid by irradiation with a wavelength of 190 to 5 (8) nm may be used. Examples of the sensitizer include irradiation with radiation Will produce acid acid to produce compounds as well as The hydrazine diazonium compound which is converted into an acid by irradiation. In the present invention, any one of them may be used as the sensitizer (C). &lt;2-1-1 Acid generating compound&gt; Examples of the acid generating compound include·· Various types of rust compounds, such as salt, diazonium salt, barium salt, salt, barium salt and salt, organic halogen compounds, such as phenyltrihalomethylsulfonic acid compound, _methyltriazine a compound and a fluorenyl oxadiazole compound; a nitrobenzyl alcohol ester compound; a sulfonate compound; a sulfonate compound of N-hydroxyguanamine or quinone; a β-ketone sulfone compound And a sulfonic acid generator, such as an Amnesium, a sulfonate compound. This compound may be used singly or in combination of two. 1 Specific examples of the phthalic acid-generating compound include: trifluoromethanesulfonic acid Tributyl benzene) diphenyl sulfonium, diphenyl sulfonium tetrafluoroborate, dipyridamole hexafluorophosphate, diphenyl sulfonium trifluoromethanesulfonate, benzene diazonium salt of p-toluenesulfonic acid, six ^ 23 200821751 25912pif.doc 4-P-Phenylphenyl-fluorenyl-2,5-diethoxy-benzene diazonium phosphate Dimethaneamine-4-diazosulfate, tris(tributylphenyl)phosphonium trifluorosulfonate, triphenylsulfonium trifluorosulfonate, triphenylselenium tetrafluoroborate, O-nitrobenzyl benzene sulfonate, benzointosylate, benzoin a sylvestre κ acid @曰, feminine difluoromethane oleate, benzoin_2_ Trimethyl sulfonate sulfonate, anise acetophenone sulfonate (anis〇int〇sylate), fragrant acesulfame methane sulfonate, anise acenation trifluoromethane sulfonate, = cumin-2 - trifluorodecane benzoate, benzophenone acetonyl sulfonyloxy oxy-cyclohexane, 2-[(p-tolylsulfonyl)oxy H-phenyl octanone, ^ 蔡基续) 基 Η Η-phenyl propylene _, 2 乙 胺 胺 苯基 苯基 ) ) Η 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( , benzoic acid, sulphuric acid, sulphuric acid, ν: = yloxy, o-xylylenediamine, yttrium trifluoromethane, oxygen, yttrium, yttrium ··Cai Cai Di ya ya 3 benzene 焼 benzene sulfonate aryl) oxy]-1, 8. naphthalene dicarboxylic acid imine: ▲ oxy 2 , a · a base of the horse to the imine, Ν _ [(2_ three = Keqing, 3 · diphenyl maleimine, tetrafluoro acid 4 _ (two Ϊ ί : benzoquinone salt, 4 · A Base trichloromethyl"pyran, 4-(3,4,5-J-based- 2-pyran, heart (4-methoxyphenylethyl saliva, tri-radical-oxime, 2,4_m base) And taste 醯 醯 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Base)_4 6_德_,甲土-s-二基小基)-46雔1田I Dimethylmethyltriazine, 2_(naphthalene, aceto-methyl-s-diazine, 2_(naphthyl winter) Base)_4,6_double-three 24 200821751 25912pif.doc Chloromethyl-S-triazine, 2-('ethoxymethazine, 2-(benzoxanyl) base: alkaloid HA bis-trichloromethyl-s-decyloxy-indol-1-yl)-4,6-cone--,-di-methyl-S-triazine, 2-(4-bis-trichloromethyl) --S-trimethyl _S_triazine, 2-(phenanthryl)_4,6-oxyphenyl)-5-trichloromethyl:=5_trichloromethyl , 2_(p-pyrene, 2_(n-butyl)5_3^;^, 2·styryl tris(tetramethyl) hydroxybenzoic acid, 9-(4 辛: noise-唆, α_Trifluoroethane, benzene, brewing winter 9-(4-methylpropane_ A is \: \ f the present stuffed imino-yloxy) _ Di and may be used alone or in combination of two imino-yloxy) - CAI. This combination is used in combination of the above. t, preferably by the following transparency from the transparency of the 17-plate photosensitive resin composition: gas ST:, the acid-selecting compound is selected from the group: basal ester, benzoin three fine, fluorene-benzoic acid ] 邻 邻 酿 曰 曰 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 邮 ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί For 100 parts to 50%, the acid generating compound has a methane content of 5 2 1-2 1,2-醌diazo compound> 2, and a nitrogen compound, for example, can be used for photoresist nitrogen-5- Rhein acid 夕 ❻ 酿 酿 酿 酿 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ "3 times formed ester; a compound of a phenolic compound having a hydroxyl group substituted with an amine group 25 200821751 25912pif.doc and 1,2-benzoquinonediazide-4-sulfonic acid or 1,2-benzoquinonediazo-5- a synthetic amine of rhein; and a compound of a compound which is substituted with an amine group, and 1,2-naphthoquinonediazolidine-4-sulfonic acid or 1,2-naphthoquinonediazide-5-sulfonic acid a sulfonamide formed. This compound can be used alone or in Or a combination of two or more. Specific examples of the above-mentioned compounds are described below. 2,3'4-diylbenzophenone, 2,4,6-tris-benzophenone, 2,2 ',4,4匕tetrahydroxybenzophenone, 2,3,3丨,4_tetra-tetrabenzoquinone, 2,3,4,4-tetrahydroxydibenzophenone, double (2,4 -dihydroxyphenyl)methane, bis(p-hydroxyphenyl)decane, tris(p-hydroxyphenyl)methane, 丨1 1_ 幻乙烧, 切, (tetra)phenyl cis, 2,2. )propane, 1,1,3,(2,5-dimethyl collarylphenyl)_3_phenylpropanone, Γ[=·Γ4 marriage phenyl H_f group benzene fine ethyl] double age, double (2,5-Dimethyl-4 Old Phenyl) Tetramethyl-1,1,-Spiral 茚5,6,7 5丨6丨曱兀,,, 3 _ -7,2, , 4, _ tri-basic scutellaria, 7 # and 2,2,4-trimethyl to increase the positive sensation, preferably using the transparent nitrogen of the S, / 曰 composition composed of the following a compound: a vinegar formed from a U-acid selected from the group consisting of 2, 3, 'trisyl diterpenes; an ester formed from 2,3,4-trisocene and U^S Kun diazonium sulfonic acid; 4,441^4A_and 丨, 2-naphthoquinonediazide·benzine]Ethylene]Blood and 1 , 2_naphthoquinone quinone^ &amp; base group]-1-methylethyl^ is an ester formed from 4,4,·[ΗΗΗ4_ 经基基基]1^4, tarnish; 2_naphthalene 1 quinone diazo _5_lithic acid formed by &gt; phenylethyl] benzyl]ethylene] In addition, in the positive film of the present invention = mode photosensitive resin composition, 1 ( 26 200821751 25912 pif. doc The weight of the soluble base polymer, the relative content of the 1,2-quinonediazide compound is from 5 to 50 parts by weight. &lt;2-2 Solvent&gt; The positive photosensitive resin composition of the present invention may preferably contain a solvent in addition to the soluble base polymer and the 1,2-quinonediazide compound. In this case, the solvent to be used is preferably a solvent which can dissolve the soluble base polymer and the 1,2-quinonediazide compound. Further, the solvent used in the present invention is preferably a compound having at least one compound having a boiling point of from \100 ° C to 300 ° C or a mixed solvent containing 20% by weight or more of such a compound. Specific examples of the solvent having a boiling point of 100 ° C to 300 ° C include water, butyl acetate, butyl acetonate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, decyloxyacetic acid. Ethyl ester, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, decyl 3-oxopropionate, ethyl 3-oxopropionate, 3-hydrazine Ethyl oxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, decyl 2-oxopropionate, 2-oxopropane Ethyl acetate, V propyl 2-oxopropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, 2-ethoxypropionic acid Oxime ester, ethyl 2-ethoxypropionate, decyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, 2-methoxy-2-indole Methyl propyl propionate, ethyl 2-ethoxy-2-methylpropionate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetate, ethyl acetate, 2- Methyl oxobutanoate, ethyl 2-oxobutanoate, dioxane, ethylene glycol, diethylene glycol, triethylene glycol, propylene glycol, dipropylene glycol, tripropylene Alcohol, 1,4-butanediol, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol single 27 200821751 25912pif.doc methyl ether, propylene glycol monodecyl ether acetate, propylene glycol single B Ethyl acetate, propylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, cyclohexanone, cyclopentanone, diethylene glycol monodecyl ether, diethylene glycol monodecyl Ether acetate, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, diethylene Alcohol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol decyl ethyl ether, terpene benzene, diterpene benzene, γ-butyrolactone, and N,N-dimercaptoacetamide. In addition to the above mixed solvent, as long as the solvent is known to be any solvent having a boiling point of 100 to 300 ° C, one, two or more kinds of known solvents may be used. In these solvents, when the positive-working photosensitive resin composition contains at least one selected from the group consisting of propylene glycol monomethyl ether, propylene glycol monodecyl ether acetate, and propylene glycol monoethyl Ethyl acetate, methoxy 3-methoxypropionate, ethyl 3-ethoxypropionate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, Diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, ethyl lactate, and butyl acetate are preferred because these solvents improve coating uniformity. Further, when at least one solvent is selected from the group consisting of propylene glycol monodecyl ether acetate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, diethyl The diol methyl ethyl ether, ethyl lactate, and butyl acetate are more preferable in terms of higher coating uniformity of the positive photosensitive resin composition and safety to the human body. Further, it is preferred to add a solvent to the positive photosensitive resin composition of the present invention such that the total amount of the solid portion (i.e., the alkali-soluble polymer and the sensitizer) is relative to the soluble base polymer, the sensitizer, and the solvent. The total amount is 5 to 50% by weight of 28 821751 25912 pif.doc. &lt;2-3 Other Components&gt;&lt;2_3-1Additives&gt; In the present invention, it is possible to improve the resolution and the resin composition in the present invention, and to add various additives to the resin composition. , ', ^ + uniformity, development characteristics and adhesion.

Acid ester-based macromolecular dispersion::, polyethyleneimine or amine methyl fluoride interface (four); feed, cation, non-ionic or improver, such as Shi Xizhen doll" 曰: ductility improver; Adhesive oxydibenzoic steel; condensed into a two-wire (uv) absorbent, such as an alkane such as an epoxy compound, ^==poly__; a thermal crosslinking agent's solubility promoter, various: or double Azide... 'Specific examples of price addition include Polyflow No. 45, P〇lyfl〇W-KL_245, Polyflow Νο· 75, p〇lyf]〇w Ν〇· 9〇 and

Polyflow No. 95 (all are trademarks manufactured by Kyoeisha Chemical Co., Ltd.); Disperbyk 161, Disperbyk 162, Disperbyk 163, Disperbyk 164, Disperbyk 166, Disperbyk 170, Disperbyk 180, Disperbyk 18 Disperbyk 182, BYK300, BYK306, BYK310, BYK320, BYK330, BYK344 and BYK346 (both trademarks manufactured by BYK-Chemic Japan K.K.); KP-341, KP-358, KP-368, KF-96-50CS and KF -5 (M〇〇CS (all product trademarks manufactured by Shin-Etsu Chemical Co., Ltd.); Surflon SC-101 and Surflon KH-40 (all manufactured by Seimi Chemical Co., Ltd.) Trademark), Ftergent 29 200821751 25912pif.doc 222F ? Ftergent 251 and FTX-218 (both trademarks manufactured by Neos Co·, Ltd.); EFTOP EF-351, EFTOP EF-352, EFTOPEF-601, EFTOPEF- 801 and EFTOPEF-802 (both trademarks manufactured by Mitsubishi Materials Corporation); Megaface F-l71, Megaface F_177, Megaface F-475, Megaface R-08 and Megaface R-30 (all by Dainippon Ink and Chemic) A trademark of ALS Incorporated; fluoroalkyl benzenesulfonate, fluoroalkyl carboxylate, fluoroalkyl polyoxyethylene ether, fluoroalkyl ammonium iodide, fluoroalkyl betaine, fluoroalkyl sulfonate, two Glycerol bismuth (fluoroalkyl polyoxyethylene,), fluoroalkyl trimethyl ammonium salt, fluoroalkyl sulfonate, polyoxyethylene hydrazine base, polyoxyethylene phenyl phenyl, polyoxyethylene Butanyl ether, polyoxyethylene, lauryl ether, polyoxyethylene oleyl ether, polyoxyethylene tridecyl, polyene ten = alkyl ether, polyoxyethylene stearyl ether, polyoxygen Ethylene laurel, polyoxyethylene oleate, polyoxyethylene stearate, polyoxyethylene laurylamine, sorbitan laurate, sorbitan citrate, water sorbitol Stearate, sorbitan oleic acid vinegar, dehydrated mountain f-alcoholic fatty acid ester, polyoxyethylene sorbitan lauric acid S, polyoxyethylene, hydrazine purpose 'polyoxyethylene sorbitan hard Fatty acid-based stupid; Don Juan vinegar, polyoxyethylene thiazide (10), burning % of these substances, preferably 1 °, can be selected, Additives.

In order to increase the coating of the positive-type photosensitive composition, it is preferable to add a Z-surfactant selected from the following materials, such as benzoquinone^3 chaotic+disrupted/any day, carboxylic acid mouse Alkyl ester, fluoroalkyl poly 30 200821751 25912pif.doc Oxygen B, fluorescene moth, fluoroantimonyl sweet, heterofluorene, hydrazine (seeking polyoxyethylene), fluoroalkyl trimethyl Money salt and amine 2 = and _ fat ductility improvers, such as liver let, ΒΥΚ346 'ΚΡ_341, ΚΡ·358 and ΚΡ-368. &lt;2-3-2 Other Polymer: r&gt; ί In addition to the above soluble polymer, any other polymer == and its like characteristics may be added to the positive film of the present invention. The polymer to be added, preferably a polymer or not, any carboxy group 1::C oxiranyl group-containing polymer or no acrylic acid other radical acrylonitrile copolymer ; 3 · Ethyl acetonide oxy methoxy Γ ί: _: _ and 3 · ethyl _ 3- methyl monomer filaments. ;dt and another kind of free radical polymerizable monofunctional properties and similar properties 2, = resistance to f, chemical resistance, development of the group added to these money == Mingzheng-style sense of resin first, public development special i It is possible to further improve the heat resistance, chemical resistance and the following substances: 添 Adding acid glycidol to the composition of the positive photosensitive resin composition and the homopolymer of = enoic acid (4) Methyl propylene propylene oxime 曱 土 丙烯酸 丙烯酸 丙烯酸 丙烯酸 、 、 、 、 、 、 、 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 Copolymer of an ester with fluorene-phenylmaleic acid imide and methyl propyl glyceride and 3-ethyl-3-methylpropenyloxymethyl oxetane. In addition, as long as the heat resistance of the composition and the chemical resistance are not reduced, a small amount of a group-containing polymerization having a rebel group or a oxetane group having a county can be added to the composition. Examples of the polymerized polymer of this type include a methyl diglycolic acid glycidyl ester/methacrylic acid copolymer as described in JP 4_198937; a homopolymer of methacrylic acid and a hexahydrogenated product; The o-stanoic acid monomethyl propylene-based copolymer is not particularly limited as long as each of the polymers has a oxyethylidene group or an oxetane group and a county. Specific examples of radical polymerizable bodies which can be used as a raw material of these polymers include (meth)propionic acid and butyric acid ((10) acuO, w-propionic acid, cinnamic acid, butadiene Acid, acid reflux, necgonic acid, methyl butyl bromide, fluorinated hexamethylene oxide (10), mono [2-(indenyl) propyl fine g oxyethyl] chuanbeiding _ 醯 醯 醯 醯 乙基 ] _ _ _ _ _ 以及 以及 以及 以及 以及 以及 以及 以及 以及 以及 以及 以及 以及 以及 以及 以及 以及 车 车 车 车 车 车 车 车 车 车 车 车 车 车 车 车 车 车 车(Methyl)acrylic acid condensed = thioglycolic acid, ethyl propyl acrylate, a specific example of a free radical condensable 5 early body having an oxetane sulphonate Contains: (methyl) squalene (3t ethyl oxo 200821751 25912pif.doc

_ A and (meth)acrylic acid (2-ethyl oxetanyl f) oxime ester. Each has a right private * J; 7L These free radicals can be fluorenyl and epoxy or oxacyclobutane are called two or two 2? Can be used in a single type of monomer or can be: i acid: body - ('acid, such as a bitter ί two ^ piece of beef-type photosensitive resin composition added a plurality of two kinds of oxalic anhydride. In this two] phthalic anhydride or 4_f-based hexene burn, 1, 2 · Among the 70 carboxylic acids, trimellitic anhydride is preferred. The carboxylic acid is added to the positive film of the present invention: photosensitive resin group * resin composition; B: base and positive film epoxy epoxy or oxygen Ding; ^ 衣丁力元基 (if there is chemicality. In addition, when _ counter,, to improve its composition of the heat and wealth of wax;; can add = invented positive film decomposition, thus Anti-Bu·ρ ΰd (3), prevent 〗 〖, 2 醌 醌 氮化 若 若 若 若 若 若 若 若 若 若 若 若 若 若 变色 变色 变色 变色 变色 变色 变色 变色 变色 变色 变色 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加 添加Soluble test group = first = composition is preferably from 1 to 30 parts by weight, more preferably from 2 to part by weight, &lt; 2-4 positive film type photosensitive resin group Storage of the object > When the positive-type photosensitive tree of the present invention is applied to the machine, it is preferable because the composition is read (10) and the temperature is between the commission and the post. The mrn is qualitative. When a precipitate is produced, it is more ambiguous. Because it does not <3 the wax film made of the positive-type photosensitive tree (four) of the present invention> 200821751 25912pif.doc When the photosensitive resin composition is suitable for patterning, it has a relatively high transparent resin film. And a small hole having a pore diameter of 10 μm or less is suitable for forming a film, for example, a layered arrangement, and a marginal plate. Here, the term "insulating insulator". _,,, An insulating film is provided between the interlayer (the upper transparent film, the insulating film, and the 苴= coffee field for forming a resin film, and S can be formed as follows. It is recognized as a first method by a conventional method. (such as spin, coating the positive-type photosensitive tree wax composition of the present invention; == coating method), on the substrate, the substrate, the glass plate, the blue-colored synthetic tree m Or substrate, such as by; ^ =, colored glass; acrylic tree , vinyl chloride resin, aromatic diamine]: wind, ester, amide and polyamine, metal substrate, such as =, = = amine nickel plate and stainless steel plate; ceramic plate, ♦ _, '5 plates, conductor substrates. These substrates can be treated with a chemical treatment of any pretreatment part or a similar chemical treatment of decane: chemical vapor deposition; and vacuum deposition: processing; Use a hot plate or a supply box to dry the film on the substrate. - Generally, it is irradiated with Lr hood at a dose of 6. =; = similar to ultraviolet light or its positive film type \丹月 i\, : The film which has been dried may be determined by the type of the sensitizer in the composition of the snail. For example, 200821751 25912pif.doc, when the sensitizer is a 1,2-oxime diazonium compound, it is suitable to be irradiated with i rays of 5 to 1000 megajoules per square centimeter. The 1,2-quinonediazide compound located in the ultraviolet irradiation unit 2 is converted into a hydrazine carboxylic acid and is in a state of being rapidly dissolved in the developing solution. The irradiated film can be developed using a developing solution such as an alkali solution. The development causes the irradiated portion of the film to be quickly dissolved in the developing solution. The developing method may be, but not particularly limited to, immersion development (d, -deVel〇pment), agitation development (paddle_devd〇pment), or shower-development. - The above-mentioned blouse; the gluten is preferably a test solution. Specific test in the test solution = example of oxidized tetramethyl ketone, ruthenium tetraethyl oxide, hydrogen peroxide 2, = dimethyl dimethyl ammonium, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate, And wind potassium oxide. In addition, the aqueous solution of any of the foregoing tests is: in other words, the example of the developing solution comprises: an organic compound/liquid mixture, such as tetramethyl hydroxyhydroxide, 2 ethoxylates of oxychloride, (10) tetraethylate And an aqueous solution of cage (1) soil-methylammonium; and an aqueous solution of an inorganic base such as sodium chlorate, sodium hydroxide and potassium hydroxide. Less obvious: it::::::: Alcohol, ethanol or surfactant to reduce the sex, can: two suitable patterns. For example, the interface is alive; the selection::: yang: the child is constructed with f non-ionic surfactant, added as non-separated + ruler, where 'Yang Luzhi' will increase the resolution It is preferred that the polyoxyethylene chamber of the agent is preferred. Radiation is taken on: Plate:: Water, sampled and then again with specific, soil surface. For example, when the radiation is 35 200821751 25912pif.doc = line day = it is 1 每 每 焦 焦 ' , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , ^10^120^o^b, T: ^ 180 transparent film. There is a required pattern. The pattern thus obtained can also be obtained: Positive: Margin: The hole formed is directly from above: (2) is square, rectangular, circular or expanded. The car 4 f t forms a transparent electrode, and can then be carried out by means of: a film formed after the edge film can be oriented. ° Wooding, with («ng one), so even if there is no "folding on the film, it can maintain a high transparency." 4" display device containing the above resin film> such as: === In the display device of the object, the display device is manufactured by using a grease film, that is, "and" can use a phase transparent film or an insulating film, and then; == reversely form a pattern biased filter substrate alignment and yarn a Manufactured with respect to the color crystal of the substrate. The latter is privately sealed to prevent the liquid port from being able to be formed by the photosensitive resin composition in the liquid crystal display. It has excellent transparency. ^== positive film 36 200821751 25912pif.doc In addition to the liquid crystal display device Liquid crystal (that is, any one of the liquid crystal compound and the liquid crystal composition. (Ren is not limited to) liquid crystal compounding a positive-type photosensitive tree wax composition of an embodiment, and::= various characteristics required for the object , such as high-yield solvent, X f raw, back acid resistance, high ancient _ degrees and on the substrate silk ·. Sex, still transparent In addition, in the present invention - in the embodiment: from Γ = monomer, provide positive film Photosensitive = into: the object, because the positive film type photosensitive resin of the embodiment constitutes a transparent source i (four) ^ system, acid resistance, testability, and f heat and the two soil = raw 'so the positive film type photosensitive resin The gas, film, display device or the like prepared by the object, even if it is immersed in the contact or subjected to heat treatment or thousands, does not cause surface roughness of the resin film. Therefore, the positive film according to the present invention - the embodiment Preparation of photosensitive resin composition Or the like, the light transmittance can be increased and the display quality of the product (such as a display device) using this =, 3:1, and the like can be improved. L example] &amp; The present invention will be further described. In the following, the present invention is not limited to these examples. [Synthesis Example 1] The base of the soluble base polymer (1) is synthesized, and the following amount is 4 Benzene 脰 early A), glycidyl acrylate (as monomer 37 200821751 25912pif.doc

Di) 帀 、, 舻 舻 - - - - - - - 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为 作为Person), the receiver makes, in the butanone of the butanone double-(2,4-diindole, base; ^)', time. The polymerization initiator used is 2, 2, - 200.0 g 25.0 g 3 〇, 〇 克 20 〇 gram 25 〇 gram 2.0 g 2-butanone 'hydroxy stupid vinyl hydrazine with acrylic glycidol 酉 'c Dilute acid (3-ethylj oxetanyl) methyl methacrylate methacrylate 2 = azobis(2,4_di^ylla) 2 〇公免将 The solution of the sigh is cooled to room temperature, And then add it to a large amount of $=turn ΓΓ dissolved in 3_methoxypropionic acid ¥si (lower biliary), then under 1 〇〇t and 133 χ 1 〇 4 kPa decompression = The polymerization solvent (hexane) is obtained, thereby obtaining a solution of the polymer. 9 The two parts of the solution were sampled, and the sample of this volume was dried in the next 30 knives, and then the dried fish was measured = the reduced weight. Next, the yield was measured by using the obtained weight as the polymerization. In addition, based on the obtained weight value, a solution of 4% by weight of the polymer is added by 1 'twisting', and '^ is measured by GPC analysis (polyethylene oxide standard) Its weight is even. The knife is smashing. The knot was not as follows, and the yield of the obtained solvable polymer (1) was 0. Further, by GPC analysis (polyethylene oxide standard), it was obtained that the weight average molecular weight of the polymerizable base polymer (1) was 58 (8). 38 200821751 25912pif.doc [Synthesis Example 2] The person of the soluble base polymer (2) was polymerized in a similar manner to the synthesis example i: glycidyl enoate was used as the monomer bl; The weight of the 2-butanone 'hydroxyphenyl vinyl ketone methylpropionate glycidol 环 环 环 曱 曱 曱 旨 旨 is used as a monomer b2; f = acid (3 ~ ethyl oxo and The ethylene is used as the monomer b5, and 200.0 g 20.0 g methacrylic acid (3-ethyl_3_oxygen 30.0 g styrene milk surface, butadiene) methyl hydrazine 2, 2i-azo double (2) , 4_ dimethyl pentoxide) gram in the same manner as the synthesis example 丄 么 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑 兑Solution. Polymer (2) [Synthesis Example 3] The solvable polymer was polymerized in a similar manner to the synthetic acid methyl glycidol § of the synthesis example 1, but using thiol propyl Ganzima early coarse b2; and N-phenyl maleimide as a sputum and will be privately listened to the following bottle. Butanone 4 ~ 苴野po 200.0 grams 2 basic red 3G.0 grams ^ acrylic acid base Cai Gan (4) (10) grams ^ soil propylene ethyl 2 - oxetane danthene) ^ vinegar gram 39 3921 21121 25912pif.doc N-phenyl maleimine II π a 3U.0 male branch 2, 2M 禺 nitrogen double (2,4-Dimethylvaleronitrile) 2·〇克克 was treated as a synthetic example, and a ΜΜρ solution having a weight percent wave of 30% of the soluble polymer (3) was obtained. The yield of the polymer was 82%. By GPC analysis (polyethylene oxide standard), the average molecular weight of the obtained soluble dipolymer (3) was 5 Å. [Synthesis Example 4] The synthesis of the polymer (4) can be carried out in a manner similar to the synthesis of Example 1, but using the glycidyl enoate as a monomer bl; thiol-acid (2_ Ethyl 2 $cyclobutanyl) A as monomer b2; and mercapto acrylic acid The oxime ester is used as b4 and the weight of the koji is added to the lap. · 2_butanone + 2〇〇.〇克克 4-Phenylphenylethylene _ 3〇〇g methacrylic acid glycidol g brother methyl _, money heterocyclic Dingqing II J methacrylic acid owe 2 is [5·2·102,6] 250250 2,2,-azobis(2,4-dimercapto valeronitrile) 2; 〇(4) is a weight percent concentration of soluble polymer (10). The solution was analyzed by GPC. The yield of the polymer was averaged by the weight of the polymer (4), and the obtained soluble test [Synthesis Example 5] was solvable and polymerized in a manner similar to the synthesis of the formula 1, the hydrazine 1 / the olefinic acid glycidol was used as the monomer. Χ2^ΤχΚσ but using methyl two early group bl; cycline hexylmametidine imine as single 40 200821751 25912pif.doc body b3 ; and trimethyl methacrylate [5·2·1·〇2,6] decyl ester As b4, it was charged into the flask with the following weight. : 〃 200.0 g 4 〇 · 〇 gram 4 〇 〇 gram 10.0 gram ιο· ο gram 2.0 gram and obtain soluble polymer 2-butanone 4-hydroxyphenyl vinyl ketone methacrylic acid glycidol vine N-ring Benzyl maleimide methacrylic acid tricyclo[5.2丄〇2,6]nonyl ester 2,2'-azobis(2,4-dimethylvaleronitrile) was treated in the same manner as in Synthesis Example 1 - |/ν (5) A 30% by weight solution of VtMP. The polymer is 75%. By GPC analysis (polyethylene oxide standard), the obtained weight average molecular weight of the polymer (6) was 4,700. [Synthesis Example 6] Synthesis of Soluble Base Polymer (6) Using the same apparatus as in Synthesis Example 1, the following group was used, and 2-butanone was used as a solvent while heating 〇/, under redundant conditions. = to aggregate. ..., ·) hour (; 200.0 g 15 · 〇 克 85 · 〇 gram 4 · 〇 gram 2-butanone, 4-Phenyl phenyl hydrazine 酉 with methyl propyl fine glycerol g 2, 2 - azobis(2,4-dioxyl valeronitrile) was treated in the same manner as in Synthesis Example 1, and a read solution having a weight concentration of (4) of (4) was obtained. Poly ==, not 85 By GPC analysis (polyethylene oxide standard), the weight average molecular weight of the compound (5) is 897 〇〇. 于岭軚聚41 200821751 25912pif.doc [Synthesis example η face-to-face polymerization is similar to the synthesis example i Gu Gu, i ene glycidyl ester as a monomer I line poly &amp; used methyl two b4 ? 2 - butanone, a lining into the flask. 200.0 grams 3 〇 · 〇 gram 45.0 grams 2 2 gram 2 · 〇 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克 克戊 腈 ) ) 曰 曰 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 合成 m m m m m m m m m m m m m m m m m m m The weight of the polymer (7) is flat The average molecular 2 (four) quasi-) obtained the soluble test Lima 4600. [Comparative Synthesis Example 1R compared to the copolymer (1) is similar to the synthetic example 1 of the square mouth ^ ^ r / 丄 _ _ _ _ _ _ _ _ _ _ _ Dilute into a component having the following weight: ~ muscle dressing 200.0 g 15.0 g 30.0 g 20.0 g 35.0 g 2.0 g 2-butanone · acrylic acid glycerol glycosidic acid (3_B Base _3_oxetanyl) benzyl methacrylate benzyl 2,2'-azobis(2,4-dioxyl valeronitrile) μ publicly known in the manner of synthesis example 1 耔泠 / 曰x ^ , 仃 仃 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , ,

72%. According to the GPC analysis (narrowing each X object, the eve will be the same as the comparative copolymer (1), the average molecular weight is 62 〇〇. [Comparative Synthesis Example 2] Comparative copolymer (2) The polymerization was carried out in a manner similar to Synthesis Example 1, and the bottle was charged with a component having 24 as described below. And a ring coat 200.0 g 18.0 g 30.0 g 20.0 g 32.0 g 2.0 g into butanone oxime Acrylic acid methyl acrylate glycidyl acrylate (3_ethyl I oxetanyl) methyl ester N-phenyl mala yue 2, 2' azo double (2, 4' diterpene 20 gram of valeronitrile to synthesize Example 1 of the square 彳, warehouse &quot; is m # 人υ a brother by weight concentration of 3G, get 4 comparative copolymer (2) 83%. GPC analysis (Λ \ ΜΜΡ solution The yield of the polymer is the weight average of the substance (7), and the obtained comparative copolymer [Comparative Synthesis Example 3] is compared with the synthetic method to carry out polymerization in a manner similar to the synthesis example VII, #Λ, SX, and The bottle was filled with a component having a weight as described below. A bottle of 200.0 g 10.0 g 90.0 g 4.0 g was obtained. Comparative copolymer (3) 2-butanone methacrylic acid glycidyl methacrylate 2,2'-azobis(2,4.dipentyl nitrile) has a weight percent deviation of 3. 'two == The synthesis was carried out in the manner of Synthesis Example 1, 隹 詈 ... ... ... 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 By GPC analysis (polyethylene oxide standard), the weight average molecular weight of the substance (3) was % 〇〇. [Example 1] [Production of positive-working photosensitive resin composition] By mixing and dissolving the following contents by weight as shown below, a positive-type photosensitive resin composition: a soluble alkali polymerization obtained in the synthesis example was prepared.

Compound (1), 4,441_[4-[1·[4-PhenylphenylH-methylethyl]phenyl]ethylidene] bis and 1,2-naphthoic acid diazonium·5_continued chloroform The condensation product (average vinegarization rate: 58%, hereinafter referred to as "PAD"), the fluorine-containing interface activity as an additive, is Megaface R-〇8 manufactured by Dai-Nipp〇n Ink Chemicals (hereinafter Abbreviated as "R-08") and %~^ as solvent. 1·4 gram grams of solution

The weight percent concentration of the MMP soluble base polymer (1) is 3 〇 10.00 gram 0.60 gram 0.006 gram

PAD R-08 [Evaluation method of positive photosensitive resin composition] (1) Formation of patterned transparent film The positive photosensitive resin composition synthesized in Example 1 was spin-coated on a glass substrate at a speed of 8 (10) rpm. Iq for a second, then, dry on the hot plate for 2 minutes. The substrate was exposed to g, h, and i rays in an air using a Proximity Exposure System TME-150 PRC manufactured by Topc® I1c0e, Ltd. through a mask for forming a hole pattern with an exposure gap of 100 μm. The g, h, and i rays described above can be cut to 350 nm or less via 44 200821751 25912pif.doc. Obtained using a skin length cut filter by Ushio Inc = using a cumulative j-meter light quantity manufactured by Usln〇 Inc., 150 mils fine. After exposure, the glass substrate is immersed in a solution of hydrogen peroxide for 6 seconds to remove the exposed portion of the resin: the substrate is washed with pure water for four seconds, followed by the knife 4e A patterned transparent film having a film thickness of m 3 μm was subjected to post-bake for 30 minutes without exposing the exposure amount of the MJ to the exposure amount of the mask. Using the film thickness measured by the thickness of -tep, the thickness of the film measured by the same amount, the film thickness of the film (2) residual film ratio after development is corrected, and the film thickness is calculated by the following equation. χ , (3) The degree of resolution is studied with a microscope, and the substrate with the crystallization of the film obtained by (1) is obtained at a magnification of 400 times to be affixed to the bottom of the mesh pattern. The size of the mask at the exposed glass. (4) Transparency Denier C (manufactured by Tokyo Denshoku Co. Ltd.) to form a transparent glass substrate, at a wavelength of 400 nm. 45 200821751 25912pif.doc No flattening of the patterned transparent film obtained from (1), Ν-methyl 2 ketone ketone for 5 minutes, and film y ' = before entering Measure the thickness and adjust it by the lamp. In the dip ratio: the percentage change of Tt pancreas (decentage after immersion / film thickness before immersion) χ (10) Γ When the percentage change of film thickness is 2 to 2 a It is more than 2% due to swelling m or it is excellent because it is dissolved in ^ = Κ. Good.,. 'Chemical' is not (6) Acid resistance will be obtained by (1) the pattern of transparent acid / stone The acid/water weight ratio is 4/2/4, and the immersion in the salinity is measured. The film thickness is measured before and after immersion, and the percentage change of the thickness of the film is measured by the following: The equation is calculated by the equation (film thickness after immersion / percentage change of film thickness before immersion, 2 to;; day:, 100,) when it exceeds 2% due to swelling or is dissolved due to its excellentness. When ^2%, judge it as not (7) The testability will be obtained from the patterned dialyzed potassium oxide solution obtained in (1) for 10 minutes, at 60 ° C, immersed in 5% before and after _ thickness, And (4) change under immersion (film thickness after immersion / percentage change of thickness before immersion: and degree) M 〇〇 (%) 46 200821751 25912pif.doc ^ film thickness, t-segment ratio _2 to 2 ^ due to swelling more than 2% or less than good due to dissolution. (8) heat resistance will be re-baked in (1) by the oven with _ _ _ _ _ _ _ 23υ c The light transmittance is measured by the method of (4). The exposure is 彳^彳^==):t= is τ, 'and the light transmittance of the extra tank is baked and the film thickness is measured before and after. In addition, in the case of heating #, the change in film thickness is calculated by the following equation (n) (the thickness after the extra baking is the thickness after the exposure) χ _ (9) Adhesion ==: square亳米),,__::: (10) Sputter resistance is obtained by the pattern obtained under (1) under the boot, the rider has a transparent electrode called 3=^: made of tin (rib) . A = degree of indium oxide temperature, and by visual observation, the surface of the film is 47. When the wrinkles are not formed on the surface of the film, it is judged that the splash resistance is excellent (G). On the other hand, when wrinkles were formed on the surface of the film, it was judged to be bad (NG). The evaluation results of the evaluation of the positive photosensitive resin composition synthesized in Example 1 by the above evaluation method are shown in Table 1. Γ 48 200821751 25912pif.doc T懈卜{鹏rH 卜3.04 97.0 100.2 ΙΟ ο ο CSI ί—Η rH 96.0 3· 01 ο σ! CH) 〇τ-Η ο 累魏〇94.2 〇- 3.02 〇00 100. 0 I 100.3 100· 7 ! & 3.00 CO σ&gt; 100 ο 94.8 卜 3. 00 00 1 99· 9 II 100.3 1 Ι 100.9 CO 2. 97 ο α&gt; 〇' 〇rH ο Wei inch 94.9 卜 3.05 S; 100.2 1 100.8 1 100.8 00 3· 01 Bu 00 3 〇rH ο Example 3 ο LO σ&gt; 00 2. 96 96.8 ί 100.5 1 100· 7 CO r-~t ο CO LO 2· 91 CO οό ο τ—&lt; ο 2 CO LO σ&gt; 00 3· 01 00 100.2 UD Ο τΗ 101· 0 CO 05 2. 97 卜 CT CT) ο τ-Η ο Example 1 94.9 !&gt;- 2· 98 97.0 1 99.7 I ί 100.8 1 101· 2 t—H CD 2. 92 卜卜·cn ο ο ι—Η ο Residual film ratio after development (%) Resolution (μm) Film thickness after exposure and baking (micron) Transmittance Ί\ (% Solvent resistance, acid and alkali resistance, light transmittance τ2 (%) ι Film thickness after additional baking (micron) Heat resistance (% change in film thickness, %) Adhesion resistance to sputtering 49 200821751 25912pif.doc [ Example 2] to synthesize The soluble base polymer (2) obtained in Example 2 was substituted for the soluble base polymer (1) of Example 1, and a positive-type photosensitive resin composition was prepared in a manner similar to that of Example 1, and evaluated. The results are shown in Table 1. [Example 3] The soluble base polymer (1) in Example 1 was replaced with the soluble base polymer (3) obtained in Synthesis Example 3, and a positive-film photosensitive resin composition was prepared in a manner similar to Example 1, And evaluate. The results are shown in Table 1. [Example 4] The soluble base polymer (1) in Example 1 was replaced with the soluble base polymer (4) obtained in Synthesis Example 4, and a positive-film photosensitive resin composition was prepared in a manner similar to Example 1, And evaluate. The results are shown in Table 1. [Example 5] The soluble base polymer (1) in Example 1 was replaced with the soluble base polymer (5) obtained in Synthesis Example 5, and a positive-film photosensitive resin composition was prepared in a manner similar to Example 1, And evaluate. The results are shown in Table 1 [Example 6] The soluble base polymer (1) in Example 1 was replaced with the soluble base polymer (6) obtained in Synthesis Example 6, using a method similar to that of Example 1. A positive film photosensitive resin composition was prepared and evaluated. The results are shown in Table 1 in 2008, 200821751 25912pif.doc. [Example 7] The soluble base polymer (1) in Example 1 was replaced with the soluble base polymer (7) obtained in Synthesis Example 7, and a composition similar to that of Example 1 was used to prepare a positive photosensitive resin composition. And evaluate it. The results are shown in Table 1. [Comparative Example 1] / , In order to compare the soluble base polymer (1) obtained in Synthesis Example 1 with the soluble base polymer (1) in Example 1, a positive-type photosensitive resin composition was prepared in a manner similar to Example 1. And evaluate it. The results are shown in Table 2. Table 2

Comparative Example 1 Comparative Example 2 Comparative Example 3 Residual film ratio after development (%) 92. 1 91. 5 93.7 Resolution (Wei Mi) 7 8 7 Film thickness after baking (micron) 3.01 2.97 3,03 Light transmittance Ti (%) 93.8 92.8 95.8 Solvent resistance 99. 5 99· 8 100. δ Acid resistance 100.9 100. 8 101.2 Alkali resistance 101.2 101. 6 101.4 * Light transmittance 1 (%) 90.6 89.4 94.2 Additional baking Film thickness after baking (micron) 2. 89 2. 85 2.94 Heat resistance (% change in film thickness, %) 96.0 96.0 97.0 Adhesion 100 100 100 Sputter-resistant GGG

[Comparative Example 2] The comparative copolymer (2) obtained in Comparative Synthesis Example 2 was used instead of the soluble polymer (1) in Example 1, and a positive-type photosensitive resin composition was prepared in a manner similar to Example 1, And evaluate. The results are shown in Table 2. 200821751 25912pif.doc [Comparative Example 3] The comparative base copolymer (3) obtained in Synthesis Example 3 was substituted for the soluble base polymer (1) in Example 1, and a positive film type photosensitive method was prepared in a manner similar to Example 1. The resin composition was evaluated. The results are shown in Table 2. For example, the positive-working photosensitive resin composition of the present invention can be used in a process for producing a liquid crystal display device. [Simple description of the diagram] None. [Main component symbol description] Benefit. 52

Claims (1)

200821751 25912pif.doc X. Patent application scope: 1) Representation 1. A soluble base polymer obtained by polymerizing a monomer (A) of the formula: (1) ^中: RKR2 and R3 each represent hydrogen or a pyridyl group having from 1 to 3 carbon atoms, any hydrogen in the alkyl group may be replaced by fluorine; and R4, r5, trans6, R7 and R8 each represent hydrogen , halogen, _CN, -eh, · 〇α?3, seven h, a filament having 1 to 5 atoms, any of the filaments in the filament =0-, chi or _Cq_ permutation and any hydrogen can be _ Substitution of two 4 1 to: only the green base, Wei oxygen by "replacement, in which m8, at least - is a broadly reduceable polymer, which is represented by the general formula (1) by means of copolymerization (free) (4) Wherein: R1, R2 and only 3夂(1) burnt group, any of the bases in the hospital base: or have 1 to 3 broken atoms. The ordered milk can be replaced by fluorine; and R4, R5, r6, 53 200821751 25912pif. Docs 7 and R8 each represent hydrogen, halogen, _CN, -CF3, -〇CF3, _〇H, an alkyl group having 1 to 5 carbon atoms, and any _CH^ in the alkyl group may undergo COO-, -OC〇4_c〇 substituted and any hydrogen may be substituted by halogen, or an alkoxy group having 1 to 5 carbon atoms, any hydrogen in the alkoxy group may be replaced by halogen 'wherein; at least one of p4 to R8 The person is _〇H. 3. A soluble base polymer as described in claim 2, wherein R1 to R7 and R8I represent hydrogen and R6 represents -OH. Fx 4· The soluble base polymer according to claim 2, wherein the radical polymerizable monomer (Β) comprises at least one of the groups consisting of the following: A radically polymerizable monomer (bl) of oxiran, oxime; a radically polymerizable monomer having an oxetanyl group (b2); a maladed with N substituted a free radical polymerizable monomer (b3) of ruthenium; and a radical polymerizable monomer (b4) having a tricyclo[5·2·1·02,6]fluorenyl group. 5. The soluble polymer according to claim 4, wherein (4) the radical polymerizable monomer (B) is contained from the base polymerizable monomer (B), and the radical polymerizable monomer One of (1⁄2) ▲ both. 6. The ruthenium polymer according to claim 5, wherein the radical polymerizable monomer (B) is composed of the following: the radical polymerizable monomer (M), the free radical Polymerizable monomer (5)) and a radical polymerizable monomer (5) excluding the radical polymerizable monomer (M). 7. The conjugated polymer according to claim 5, wherein the radical chelable monomer (Β) is derived from the radical polymerizable monomer (匕1), (b2), and (b3) composition. 54 200821751 25912pif.doc The secretable polymer of the fourth item (4), the free radical polymerizable monomer (8) consists of the self, the middle (b2) and the (b4). "Mouth 脰 (M), = towel, please turn over the soluble (tetra) compound described in item 5, (b3 (Β) (Μ) (b3) and (b4). ...0. The soluble polymer according to item 5, wherein the terpene monomer (Β) is composed of the radical polymerizable monomer (bi). y; 11. Please refer to (4) 5 a soluble polymer, wherein the n-free radical polymerizable monomer (8) is composed of the radical polymerizable monomer (and (b4). J 12. If the application is made in the sixth illusion, any alkali polymer, Wherein: "Hehai free radical polymerizable monomer (bl) is composed of the following, one of the group, two or more: acrylic glycidol vinegar, methacrylic acid glycidol vinegar and a Propionate, thioglycolic acid; soil &quot;: free radical polymerizable monomer (b2) is composed of the following: selected, two or more: acrylic acid (3_ethyl Methyl oxadiphenyl) methyl ester, methacrylic acid (3-ethyl; oxetanyl) methyl ester: ethenyl (2-ethyl-2-oxetanyl π ester and 2-oxetanyl methacrylate 0-based radical polymerizable monomer (bs) is Ν phenyl phenyl malea-cyclohexyl maleimide or both; and 200821751 25912pif.doc the free radical polymerizable The monomer (b4) is a tricyclo[5·2·1·02,6] decyl methacrylate. The soluble base polymer according to claim 6, wherein the radical polymerizable single The body (b5) is one or both of benzyl methacrylate and styrene. 14. A positive-working photosensitive resin composition comprising the soluble base polymer and the photosensitive material as described in claim 2 The positive-type photosensitive resin composition as described in claim 14, wherein the sensitizer (C) is an acid-generating compound. 16. The positive film type as described in claim 14 Photosensitive resin composition, wherein the sensitizer (C) is a 1,2-oxime diazonium compound. 56 200821751 25912pif.doc VII. Designated representative figure (1) The representative representative of the case is: No. (2) The representative Simple description of the symbol of the figure: No. 0. If there is a chemical formula in this case, please reveal the most obvious Chemical formula showing the characteristics of the invention: