TW200801797A - Photo curable composition, color filter and method of producing thereof - Google Patents

Photo curable composition, color filter and method of producing thereof

Info

Publication number
TW200801797A
TW200801797A TW096100396A TW96100396A TW200801797A TW 200801797 A TW200801797 A TW 200801797A TW 096100396 A TW096100396 A TW 096100396A TW 96100396 A TW96100396 A TW 96100396A TW 200801797 A TW200801797 A TW 200801797A
Authority
TW
Taiwan
Prior art keywords
solvent
curable composition
producing
color filter
photo curable
Prior art date
Application number
TW096100396A
Other languages
Chinese (zh)
Other versions
TWI533081B (en
Inventor
Hiroshi Morishita
Tsutomu Okita
Original Assignee
Fujifilm Electronic Materials
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Electronic Materials filed Critical Fujifilm Electronic Materials
Publication of TW200801797A publication Critical patent/TW200801797A/en
Application granted granted Critical
Publication of TWI533081B publication Critical patent/TWI533081B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C08L101/06—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Liquid Crystal (AREA)

Abstract

The invention provides a light curable composition comprising a colorant having an average particle diameter of 150nm or less, an alkali soluble resin, a polymerizable compound, a photo polymerization initiator, and a solvent. The alkali soluble resin or the polymerizable compound contains an alkylene oxide, the solvent includes at least one solvent having a boiling point of 200 DEG C or more and at least one solvent having a boiling point of less than 200 DEG C, and the sum (Σ TX) of products (T x X) of respective boiling points, T( DEG C), multiplied by respective content ratios relative to the total solvent, X (mass %), of each of the solvents is 120*10<SP>2</SP> to 190*10<SP>2</SP>( DEG C. %)
TW096100396A 2006-01-18 2007-01-05 Photo curable composition, color filter and method of producing thereof TWI533081B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006009719 2006-01-18
JP2006345999A JP2007219499A (en) 2006-01-18 2006-12-22 Photosetting composition, color filter using the same and method for producing the color filter

Publications (2)

Publication Number Publication Date
TW200801797A true TW200801797A (en) 2008-01-01
TWI533081B TWI533081B (en) 2016-05-11

Family

ID=38496797

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096100396A TWI533081B (en) 2006-01-18 2007-01-05 Photo curable composition, color filter and method of producing thereof

Country Status (4)

Country Link
JP (1) JP2007219499A (en)
KR (1) KR20070076435A (en)
CN (1) CN101004553B (en)
TW (1) TWI533081B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4841980B2 (en) * 2006-03-20 2011-12-21 新日鐵化学株式会社 Resin composition for color filter and color filter
JP4837500B2 (en) * 2006-09-05 2011-12-14 富士フイルム株式会社 Curable composition, color filter, and method for producing the same
JP4954647B2 (en) 2006-09-11 2012-06-20 太陽ホールディングス株式会社 Plasma display panel having photosensitive paste and fired product pattern formed from the photosensitive paste
JP4403174B2 (en) * 2006-12-25 2010-01-20 Ａｚエレクトロニックマテリアルズ株式会社 Pattern forming method and photosensitive resin composition used therefor
JP2008164886A (en) * 2006-12-28 2008-07-17 Sumitomo Chemical Co Ltd Colored photosensitive resin composition
JP5121522B2 (en) * 2008-03-24 2013-01-16 富士フイルム株式会社 Colored curable composition, color filter, and liquid crystal display device
JP5156442B2 (en) * 2008-03-13 2013-03-06 東京応化工業株式会社 Colored photosensitive resin composition, black matrix, color filter, and liquid crystal display
JP5544760B2 (en) * 2008-06-27 2014-07-09 凸版印刷株式会社 Red coloring composition, color filter substrate using the same, and method for producing the same
JP5422931B2 (en) * 2008-07-01 2014-02-19 凸版印刷株式会社 Color filter substrate and transflective liquid crystal display device
JP2010013557A (en) * 2008-07-03 2010-01-21 Konica Minolta Ij Technologies Inc Cationic polymerizable inkjet ink composition and its manufacturing method
KR101040593B1 (en) 2008-09-26 2011-06-10 주식회사 엘지화학 The photoresist composition for black matrix
TW201214033A (en) * 2010-06-17 2012-04-01 Sumitomo Chemical Co Photosensitive resin composition
JP5919830B2 (en) * 2011-02-08 2016-05-18 住友化学株式会社 Colored photosensitive resin composition
JP5899973B2 (en) * 2012-02-01 2016-04-06 東洋インキＳｃホールディングス株式会社 Method for producing coloring composition for color filter, coloring composition for color filter, and color filter
KR102508652B1 (en) * 2016-10-06 2023-03-14 롬엔드하스전자재료코리아유한회사 Transparent photosensitive resin composition and organic insulating film using same
JP7560970B2 (en) 2019-07-31 2024-10-03 住友化学株式会社 Colored curable resin composition

Also Published As

Publication number Publication date
TWI533081B (en) 2016-05-11
CN101004553B (en) 2012-05-23
CN101004553A (en) 2007-07-25
KR20070076435A (en) 2007-07-24
JP2007219499A (en) 2007-08-30

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