TW200745843A - System and method for electronic diagnostics of a process vacuum environment - Google Patents

System and method for electronic diagnostics of a process vacuum environment

Info

Publication number
TW200745843A
TW200745843A TW095129874A TW95129874A TW200745843A TW 200745843 A TW200745843 A TW 200745843A TW 095129874 A TW095129874 A TW 095129874A TW 95129874 A TW95129874 A TW 95129874A TW 200745843 A TW200745843 A TW 200745843A
Authority
TW
Taiwan
Prior art keywords
vacuum environment
anomaly
occurred
process vacuum
vacuum
Prior art date
Application number
TW095129874A
Other languages
English (en)
Other versions
TWI417715B (zh
Inventor
Joseph D Arruda
Kathleen D Keay
Glen F R Gilchrist
Original Assignee
Brooks Automation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brooks Automation Inc filed Critical Brooks Automation Inc
Publication of TW200745843A publication Critical patent/TW200745843A/zh
Application granted granted Critical
Publication of TWI417715B publication Critical patent/TWI417715B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/26—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors
    • G01M3/32—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators
    • G01M3/3236—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators by monitoring the interior space of the containers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/02—Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/26—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors
    • G01M3/32—Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for containers, e.g. radiators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Examining Or Testing Airtightness (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
TW095129874A 2005-08-18 2006-08-15 用於製程真空環境之電子診斷之系統及方法 TWI417715B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/206,675 US7289863B2 (en) 2005-08-18 2005-08-18 System and method for electronic diagnostics of a process vacuum environment

Publications (2)

Publication Number Publication Date
TW200745843A true TW200745843A (en) 2007-12-16
TWI417715B TWI417715B (zh) 2013-12-01

Family

ID=37440915

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095129874A TWI417715B (zh) 2005-08-18 2006-08-15 用於製程真空環境之電子診斷之系統及方法

Country Status (7)

Country Link
US (1) US7289863B2 (zh)
EP (1) EP1915603B1 (zh)
JP (1) JP5411498B2 (zh)
KR (2) KR101385634B1 (zh)
CN (1) CN101243312B (zh)
TW (1) TWI417715B (zh)
WO (1) WO2007022067A1 (zh)

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CN102612641B (zh) * 2009-11-09 2015-01-14 Mks仪器公司 真空质量测量系统
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
US9817407B2 (en) * 2014-12-01 2017-11-14 Varian Semiconductor Equipment Associates, Inc. System and method of opening a load lock door valve at a desired pressure after venting
TW201700785A (zh) * 2015-03-06 2017-01-01 英飛康公司 監測反應室的運行
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
DE102018203096B9 (de) * 2018-03-01 2020-02-27 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Drucksystems für eine Vorrichtung zum Abbilden, Analysieren und/oder Bearbeiten eines Objekts und Vorrichtung zum Ausführen des Verfahrens
US11860059B2 (en) 2019-05-31 2024-01-02 Greene, Tweed Technologies, Inc. Smart seals for monitoring and analysis of seal properties useful in semiconductor valves
US11545379B2 (en) * 2020-07-31 2023-01-03 Nanya Technology Corporation System and method for controlling semiconductor manufacturing equipment
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CN117026197B (zh) * 2023-08-09 2024-06-18 苏州东福来机电科技有限公司 一种纳米真空镀膜分区压力控制方法及系统

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Also Published As

Publication number Publication date
US7289863B2 (en) 2007-10-30
KR101385634B1 (ko) 2014-04-16
JP5411498B2 (ja) 2014-02-12
CN101243312A (zh) 2008-08-13
JP2009505425A (ja) 2009-02-05
EP1915603B1 (en) 2012-11-07
US20070043534A1 (en) 2007-02-22
CN101243312B (zh) 2012-12-19
KR20140019878A (ko) 2014-02-17
KR20080036216A (ko) 2008-04-25
EP1915603A1 (en) 2008-04-30
TWI417715B (zh) 2013-12-01
WO2007022067A1 (en) 2007-02-22

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