TW200741925A - Wire bonding machine and method for processing a semiconductor device - Google Patents

Wire bonding machine and method for processing a semiconductor device

Info

Publication number
TW200741925A
TW200741925A TW096114438A TW96114438A TW200741925A TW 200741925 A TW200741925 A TW 200741925A TW 096114438 A TW096114438 A TW 096114438A TW 96114438 A TW96114438 A TW 96114438A TW 200741925 A TW200741925 A TW 200741925A
Authority
TW
Taiwan
Prior art keywords
wire bonding
semiconductor device
bonding machine
processing
site area
Prior art date
Application number
TW096114438A
Other languages
English (en)
Inventor
Gary Gillotti
Steven Mak
E Walter Frasch
Original Assignee
Kulicke & Soffa Ind Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kulicke & Soffa Ind Inc filed Critical Kulicke & Soffa Ind Inc
Publication of TW200741925A publication Critical patent/TW200741925A/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/002Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating specially adapted for particular articles or work
    • B23K20/004Wire welding
    • B23K20/005Capillary welding
    • B23K20/007Ball bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/38Selection of media, e.g. special atmospheres for surrounding the working area
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/78Apparatus for connecting with wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45147Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/781Means for controlling the bonding environment, e.g. valves, vacuum pumps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/7825Means for applying energy, e.g. heating means
    • H01L2224/78268Discharge electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/7825Means for applying energy, e.g. heating means
    • H01L2224/783Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/78301Capillary
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/787Means for aligning
    • H01L2224/78703Mechanical holding means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85009Pre-treatment of the connector or the bonding area
    • H01L2224/8503Reshaping, e.g. forming the ball or the wedge of the wire connector
    • H01L2224/85035Reshaping, e.g. forming the ball or the wedge of the wire connector by heating means, e.g. "free-air-ball"
    • H01L2224/85045Reshaping, e.g. forming the ball or the wedge of the wire connector by heating means, e.g. "free-air-ball" using a corona discharge, e.g. electronic flame off [EFO]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85053Bonding environment
    • H01L2224/85054Composition of the atmosphere
    • H01L2224/85075Composition of the atmosphere being inert
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • H01L2224/85201Compression bonding
    • H01L2224/85205Ultrasonic bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding
TW096114438A 2006-04-26 2007-04-24 Wire bonding machine and method for processing a semiconductor device TW200741925A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/380,233 US20070251980A1 (en) 2006-04-26 2006-04-26 Reduced oxidation system for wire bonding

Publications (1)

Publication Number Publication Date
TW200741925A true TW200741925A (en) 2007-11-01

Family

ID=38647404

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096114438A TW200741925A (en) 2006-04-26 2007-04-24 Wire bonding machine and method for processing a semiconductor device

Country Status (6)

Country Link
US (2) US20070251980A1 (zh)
JP (1) JP2007294975A (zh)
KR (1) KR100874328B1 (zh)
CN (1) CN100501958C (zh)
SG (2) SG136864A1 (zh)
TW (1) TW200741925A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI508248B (zh) * 2008-06-20 2015-11-11 United Test & Assembly Ct Lt 有機保焊之互連上之銅及加強之打線接合製程

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4043495B2 (ja) * 2006-04-20 2008-02-06 株式会社カイジョー ワーククランプ及びワイヤボンディング装置
CN101971314B (zh) * 2008-06-10 2013-10-09 库力索法工业公司 用于在引线接合操作中降低氧化的输气系统
US20100078464A1 (en) * 2008-10-01 2010-04-01 Kabushiki Kaisha Shinkawa Wire bonding apparatus and ball forming method
CN101862897B (zh) * 2010-02-11 2013-07-03 深圳市贵鸿达电子有限公司 一种功率器件的铜线键合方法
CN102254841B (zh) * 2010-05-17 2013-04-03 南茂科技股份有限公司 导气管装置
CN101894770B (zh) * 2010-05-28 2013-12-11 日月光封装测试(上海)有限公司 半导体封装打线表面的预氧化处理方法及其预氧化层结构
US8186562B1 (en) * 2010-12-14 2012-05-29 Asm Technology Singapore Pte Ltd Apparatus for increasing coverage of shielding gas during wire bonding
JP5618974B2 (ja) 2011-08-16 2014-11-05 株式会社新川 ワイヤボンディング装置
CN102513687B (zh) * 2011-12-16 2014-03-05 先进光电器材(深圳)有限公司 焊线机及其防氧化结构
CN102554526A (zh) * 2012-01-18 2012-07-11 福建福顺半导体制造有限公司 一种半导体器件铜线焊接铜球保护方法及其保护装置
WO2013111452A1 (ja) 2012-01-26 2013-08-01 株式会社新川 酸化防止ガス吹き出しユニット
KR101620351B1 (ko) 2012-01-30 2016-05-12 삼성전자주식회사 회로소자의 와이어 본딩 방법
CN103311136A (zh) * 2012-03-06 2013-09-18 深圳赛意法微电子有限公司 基于bga封装的铜线焊接装置及铜线焊接实现方法
JP2014075519A (ja) 2012-10-05 2014-04-24 Shinkawa Ltd 酸化防止ガス吹き出しユニット
WO2014054305A1 (ja) 2012-10-05 2014-04-10 株式会社新川 酸化防止ガス吹き出しユニット
CN112427796B (zh) * 2020-11-11 2022-03-25 广西天正钢结构有限公司 一种高强度低密度钢材焊接工艺

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3281571A (en) * 1964-12-08 1966-10-25 American Chain & Cable Co Flexible conduit assembly for welding apparatus
US4572772A (en) * 1983-11-07 1986-02-25 Texas Instruments Incorporated Method for cleaning an electrode
JPS61172343A (ja) * 1985-01-28 1986-08-04 Toshiba Corp ワイヤボンデイング方法及び装置
JPS62136835A (ja) * 1985-12-10 1987-06-19 Mitsubishi Electric Corp 半導体装置の製造方法
DE3915472C2 (de) * 1988-06-02 1995-11-30 Samsung Electronics Co Ltd Bondvorrichtung
JPH0354837A (ja) * 1989-07-24 1991-03-08 Nippon Steel Corp ワイヤーボンディング方法
JPH04186852A (ja) * 1990-11-21 1992-07-03 Shinkawa Ltd ボンデイング装置
US5295619A (en) * 1992-05-22 1994-03-22 Rohm Co., Ltd. Method and apparatus for performing wire bonding by using solder wire
US5205463A (en) * 1992-06-05 1993-04-27 Kulicke And Soffa Investments, Inc. Method of making constant clearance flat link fine wire interconnections
JPH07273138A (ja) * 1994-03-31 1995-10-20 Tatsuta Electric Wire & Cable Co Ltd ワイヤボンデイング法
US6062462A (en) * 1997-08-12 2000-05-16 Kulicke And Soffa Investments, Inc. Apparatus and method for making predetermined fine wire ball sizes
US6156990A (en) * 1998-06-22 2000-12-05 Kulicke & Soffa Industries, Inc. Long-wearing impervious conductive wire clamp
US6234376B1 (en) * 1999-07-13 2001-05-22 Kulicke & Soffa Investments, Inc. Supplying a cover gas for wire ball bonding
JP3798983B2 (ja) * 2000-04-05 2006-07-19 パスウェイ メディカル テクノロジーズ インコーポレイテッド 経管的に閉塞物質を除去するシステム
JP2003179092A (ja) 2001-12-10 2003-06-27 Nitto Denko Corp 半導体装置の製造方法及びそれに用いるワイヤボンディング装置
TWI287282B (en) * 2002-03-14 2007-09-21 Fairchild Kr Semiconductor Ltd Semiconductor package having oxidation-free copper wire
US7229906B2 (en) * 2002-09-19 2007-06-12 Kulicke And Soffa Industries, Inc. Method and apparatus for forming bumps for semiconductor interconnections using a wire bonding machine
US6866182B2 (en) * 2002-10-08 2005-03-15 Asm Technology Singapore Pte Ltd. Apparatus and method to prevent oxidation of electronic devices
US7182793B2 (en) * 2004-01-22 2007-02-27 Asm Technology Singapore Pty Ltd. System for reducing oxidation of electronic devices

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI508248B (zh) * 2008-06-20 2015-11-11 United Test & Assembly Ct Lt 有機保焊之互連上之銅及加強之打線接合製程

Also Published As

Publication number Publication date
CN100501958C (zh) 2009-06-17
SG156626A1 (en) 2009-11-26
CN101064263A (zh) 2007-10-31
US20100230476A1 (en) 2010-09-16
SG136864A1 (en) 2007-11-29
KR100874328B1 (ko) 2008-12-18
JP2007294975A (ja) 2007-11-08
US20070251980A1 (en) 2007-11-01
KR20070105912A (ko) 2007-10-31

Similar Documents

Publication Publication Date Title
TW200741925A (en) Wire bonding machine and method for processing a semiconductor device
SG179409A1 (en) Gas delivery system for reducing oxidation in wire bonding operations
SG116586A1 (en) Method for detaching a semiconductor chip from a foiland apparatus for mounting semiconductor chips.
EP2030229A4 (en) DEVICE AND METHOD FOR SEMICONDUCTOR BONDING
MY146842A (en) Supply mechanism for the chuck of an integrated circuit dicing device
MY159064A (en) Semiconductor die package and method for making the same
EP1818971A4 (en) METHOD FOR MANUFACTURING A DIRECT BONDING WAFER AND DIRECT BONDING WAFER
EP2053635A4 (en) METALLIZING APPARATUS OF WAFER
EP1720244A4 (en) POWER SOURCE DEVICE FOR A WORK MACHINE
SG118364A1 (en) Bondhead for wire bonding apparatus
HK1163603A1 (zh) 劃線裝置及劃線裝置的刀片架更換方法
EP2015699A4 (en) CORRECTION SUPPORT FOR TOOTH SET, SUPPORT POSITIONING JIG, CORRECTION SYSTEM FOR TEETH ASSEMBLY USING THE SAME, AND METHOD FOR MANUFACTURING THE SAME
TWI368943B (en) Semiconductor wafer including semiconductor chips divided by scribe line and process-monitor electrode pads formed on scribe line
EP2020023A4 (en) METHOD FOR PRODUCING C4 COMPOUNDS ON IC CHIPS AND COMPONENTS PRODUCED THEREFOR
GB2438567B (en) Free-standing substrate, method for producing the same and semiconductor light-emitting device
TW200636890A (en) Apparatus and method for bonding wires
MY140911A (en) Au bonding wire for semiconductor device
WO2011011298A3 (en) Method of operating a clamping system of a wire bonding machine
WO2005124830A3 (en) Apparatus and method for indexing of substrates and lead frames
TW200625484A (en) Lead solder indicator and method
GB0523645D0 (en) Structure & apparatus for a semiconductor device
TW200631113A (en) Wire bonding apparatus and process
TW200635220A (en) Chip with adjustable pinout function and method thereof
TW200603312A (en) Apparatus and method for indexing of substrates and lead frames
TW200601535A (en) Package structure