TW200741373A - Exposure apparatus and device production method - Google Patents
Exposure apparatus and device production methodInfo
- Publication number
- TW200741373A TW200741373A TW096109034A TW96109034A TW200741373A TW 200741373 A TW200741373 A TW 200741373A TW 096109034 A TW096109034 A TW 096109034A TW 96109034 A TW96109034 A TW 96109034A TW 200741373 A TW200741373 A TW 200741373A
- Authority
- TW
- Taiwan
- Prior art keywords
- light beams
- exposure
- exposure apparatus
- exposure light
- production method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006074243 | 2006-03-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200741373A true TW200741373A (en) | 2007-11-01 |
Family
ID=38517419
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096109034A TW200741373A (en) | 2006-03-17 | 2007-03-16 | Exposure apparatus and device production method |
Country Status (6)
Country | Link |
---|---|
US (1) | US8982322B2 (zh) |
EP (1) | EP2003682A1 (zh) |
JP (1) | JPWO2007108414A1 (zh) |
KR (1) | KR20090004905A (zh) |
TW (1) | TW200741373A (zh) |
WO (1) | WO2007108414A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004013886A1 (de) * | 2004-03-16 | 2005-10-06 | Carl Zeiss Smt Ag | Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem |
EP2009678A4 (en) * | 2006-04-17 | 2011-04-06 | Nikon Corp | OPTICAL LIGHTING DEVICE, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD |
KR101399768B1 (ko) * | 2006-12-28 | 2014-05-27 | 칼 짜이스 에스엠티 게엠베하 | 기울어진 편향 미러를 갖는 반사굴절식 투영 대물렌즈, 투영 노광 장치, 투영 노광 방법 및 미러 |
US8665418B2 (en) * | 2007-04-18 | 2014-03-04 | Nikon Corporation | Projection optical system, exposure apparatus, and device manufacturing method |
US20090303454A1 (en) * | 2008-06-10 | 2009-12-10 | Nikon Corporation | Exposure apparatus with a scanning illumination beam |
US8736813B2 (en) * | 2008-08-26 | 2014-05-27 | Nikon Corporation | Exposure apparatus with an illumination system generating multiple illumination beams |
US8705170B2 (en) | 2008-08-29 | 2014-04-22 | Nikon Corporation | High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations |
US20100091257A1 (en) * | 2008-10-10 | 2010-04-15 | Nikon Corporation | Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location |
US20100123883A1 (en) * | 2008-11-17 | 2010-05-20 | Nikon Corporation | Projection optical system, exposure apparatus, and device manufacturing method |
KR101215094B1 (ko) | 2010-10-25 | 2012-12-24 | 삼성전자주식회사 | 피측정체 정렬장치 |
Family Cites Families (43)
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US3656849A (en) * | 1967-02-20 | 1972-04-18 | Texas Instruments Inc | Multiple image systems |
JPS60134240A (ja) | 1983-12-23 | 1985-07-17 | Nec Corp | 縮小投影露光装置 |
JP2503572B2 (ja) * | 1988-03-08 | 1996-06-05 | 株式会社ニコン | 露光装置及び露光方法 |
JP2895703B2 (ja) * | 1992-07-14 | 1999-05-24 | 三菱電機株式会社 | 露光装置およびその露光装置を用いた露光方法 |
KR100300618B1 (ko) * | 1992-12-25 | 2001-11-22 | 오노 시게오 | 노광방법,노광장치,및그장치를사용하는디바이스제조방법 |
US5617182A (en) * | 1993-11-22 | 1997-04-01 | Nikon Corporation | Scanning exposure method |
US5482819A (en) * | 1994-04-04 | 1996-01-09 | National Semiconductor Corporation | Photolithographic process for reducing repeated defects |
JPH08313842A (ja) | 1995-05-15 | 1996-11-29 | Nikon Corp | 照明光学系および該光学系を備えた露光装置 |
KR100500199B1 (ko) * | 1995-05-29 | 2005-11-01 | 가부시키가이샤 니콘 | 마스크패턴을겹쳐서노광하는노광방법 |
JP3894979B2 (ja) | 1996-03-28 | 2007-03-22 | ローム株式会社 | 露光装置 |
JP4029182B2 (ja) | 1996-11-28 | 2008-01-09 | 株式会社ニコン | 露光方法 |
JP4029183B2 (ja) | 1996-11-28 | 2008-01-09 | 株式会社ニコン | 投影露光装置及び投影露光方法 |
CN1144263C (zh) | 1996-11-28 | 2004-03-31 | 株式会社尼康 | 曝光装置以及曝光方法 |
DE69735016T2 (de) * | 1996-12-24 | 2006-08-17 | Asml Netherlands B.V. | Lithographisches Gerät mit zwei Objekthaltern |
JP4210871B2 (ja) | 1997-10-31 | 2009-01-21 | 株式会社ニコン | 露光装置 |
US6020964A (en) | 1997-12-02 | 2000-02-01 | Asm Lithography B.V. | Interferometer system and lithograph apparatus including an interferometer system |
US6897963B1 (en) * | 1997-12-18 | 2005-05-24 | Nikon Corporation | Stage device and exposure apparatus |
JP4264676B2 (ja) | 1998-11-30 | 2009-05-20 | 株式会社ニコン | 露光装置及び露光方法 |
WO1999049504A1 (fr) | 1998-03-26 | 1999-09-30 | Nikon Corporation | Procede et systeme d'exposition par projection |
JP2000021742A (ja) | 1998-06-30 | 2000-01-21 | Canon Inc | 露光方法および露光装置 |
JP2000021748A (ja) * | 1998-06-30 | 2000-01-21 | Canon Inc | 露光方法および露光装置 |
JP3969855B2 (ja) * | 1998-07-02 | 2007-09-05 | キヤノン株式会社 | 露光方法および露光装置 |
US6538713B1 (en) * | 1999-04-16 | 2003-03-25 | Hitachi, Ltd. | Active matrix liquid crystal display comprising a plurality of electrodes and/or a black matrix having zigzag shaped edges along the long side of the pixel field |
JP2001297976A (ja) | 2000-04-17 | 2001-10-26 | Canon Inc | 露光方法及び露光装置 |
AU2001264776A1 (en) * | 2000-05-22 | 2001-12-03 | Adc Telecommunications Inc. | Polarization control of uv writing |
WO2002069049A2 (en) | 2001-02-27 | 2002-09-06 | Asml Us, Inc. | Simultaneous imaging of two reticles |
US6956659B2 (en) * | 2001-05-22 | 2005-10-18 | Nikon Precision Inc. | Measurement of critical dimensions of etched features |
TW529172B (en) * | 2001-07-24 | 2003-04-21 | Asml Netherlands Bv | Imaging apparatus |
EP1280007B1 (en) | 2001-07-24 | 2008-06-18 | ASML Netherlands B.V. | Imaging apparatus |
US6980280B2 (en) * | 2001-10-12 | 2005-12-27 | Eastman Kodak Company | Two level image writer |
US7050155B2 (en) * | 2001-10-30 | 2006-05-23 | Pixelligent Technologies Llc | Advanced exposure techniques for programmable lithography |
EP1532489A2 (en) | 2002-08-23 | 2005-05-25 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
JP2004304135A (ja) | 2003-04-01 | 2004-10-28 | Nikon Corp | 露光装置、露光方法及びマイクロデバイスの製造方法 |
US6831768B1 (en) * | 2003-07-31 | 2004-12-14 | Asml Holding N.V. | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography |
JP5106858B2 (ja) | 2003-12-15 | 2012-12-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 高開口数と平面状端面とを有する投影対物レンズ |
JP5102492B2 (ja) | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結晶素子を有するマイクロリソグラフィー投影用対物レンズ |
US7588869B2 (en) * | 2003-12-30 | 2009-09-15 | Lg Display Co., Ltd. | Divided exposure method for making a liquid crystal display |
US7164465B2 (en) * | 2004-07-13 | 2007-01-16 | Anvik Corporation | Versatile maskless lithography system with multiple resolutions |
US7227613B2 (en) * | 2004-07-26 | 2007-06-05 | Asml Holding N.V. | Lithographic apparatus having double telecentric illumination |
JP2006074243A (ja) | 2004-08-31 | 2006-03-16 | Fujitsu Ltd | カメラモジュールの製造方法 |
US7394080B2 (en) * | 2004-12-23 | 2008-07-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mask superposition for multiple exposures |
US7209217B2 (en) * | 2005-04-08 | 2007-04-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing plural patterning devices |
US7782442B2 (en) * | 2005-12-06 | 2010-08-24 | Nikon Corporation | Exposure apparatus, exposure method, projection optical system and device producing method |
-
2007
- 2007-03-14 US US11/717,748 patent/US8982322B2/en active Active
- 2007-03-16 JP JP2008506280A patent/JPWO2007108414A1/ja active Pending
- 2007-03-16 EP EP07738844A patent/EP2003682A1/en not_active Withdrawn
- 2007-03-16 WO PCT/JP2007/055399 patent/WO2007108414A1/ja active Application Filing
- 2007-03-16 KR KR1020087024164A patent/KR20090004905A/ko not_active Application Discontinuation
- 2007-03-16 TW TW096109034A patent/TW200741373A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
WO2007108414A1 (ja) | 2007-09-27 |
KR20090004905A (ko) | 2009-01-12 |
US8982322B2 (en) | 2015-03-17 |
JPWO2007108414A1 (ja) | 2009-08-06 |
EP2003682A1 (en) | 2008-12-17 |
US20070216884A1 (en) | 2007-09-20 |
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