TW200736851A - Exposure method and apparatus, and device manufacturing method - Google Patents

Exposure method and apparatus, and device manufacturing method

Info

Publication number
TW200736851A
TW200736851A TW096107312A TW96107312A TW200736851A TW 200736851 A TW200736851 A TW 200736851A TW 096107312 A TW096107312 A TW 096107312A TW 96107312 A TW96107312 A TW 96107312A TW 200736851 A TW200736851 A TW 200736851A
Authority
TW
Taiwan
Prior art keywords
illuminating
exposure
pattern
scanning direction
conditions
Prior art date
Application number
TW096107312A
Other languages
English (en)
Inventor
Yuichi Shibazaki
Hideki Komatsuda
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200736851A publication Critical patent/TW200736851A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096107312A 2006-03-03 2007-03-03 Exposure method and apparatus, and device manufacturing method TW200736851A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006058739 2006-03-03

Publications (1)

Publication Number Publication Date
TW200736851A true TW200736851A (en) 2007-10-01

Family

ID=38459176

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107312A TW200736851A (en) 2006-03-03 2007-03-03 Exposure method and apparatus, and device manufacturing method

Country Status (5)

Country Link
EP (1) EP1993120A1 (zh)
JP (1) JPWO2007100081A1 (zh)
KR (1) KR20080108226A (zh)
TW (1) TW200736851A (zh)
WO (1) WO2007100081A1 (zh)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103777363A (zh) * 2007-10-24 2014-05-07 株式会社尼康 照明光学设备、曝光设备、照明方法、曝光方法和装置制造方法
TWI454734B (zh) * 2007-12-04 2014-10-01 Blackeye Optics Llc 變焦透鏡系統及照相系統
US8879161B2 (en) 2009-04-10 2014-11-04 Blackeye Optics, Llc Variable power optical system
TWI490658B (zh) * 2009-04-03 2015-07-01 V Technology Co Ltd 曝光方法及曝光裝置（一）
US9285511B2 (en) 2009-04-10 2016-03-15 Blackeye Optics, Llc Variable power optical system
US9581736B2 (en) 2007-12-04 2017-02-28 Blackeye Optics, Llc. Liquid optics image stabilization

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2008007632A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
CN101681123B (zh) 2007-10-16 2013-06-12 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
SG185313A1 (en) 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
WO2009145048A1 (ja) 2008-05-28 2009-12-03 株式会社ニコン 空間光変調器の検査装置および検査方法、照明光学系、照明光学系の調整方法、露光装置、およびデバイス製造方法
JP5256434B2 (ja) * 2008-06-11 2013-08-07 株式会社ブイ・テクノロジー 近接露光装置
US8153335B2 (en) 2009-05-26 2012-04-10 Infineon Technologies Ag Lithography masks, systems, and manufacturing methods
JP5764364B2 (ja) 2011-03-31 2015-08-19 株式会社ニューフレアテクノロジー 半導体装置の製造方法、描画装置、プログラム及びパターン転写装置

Family Cites Families (18)

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Publication number Priority date Publication date Assignee Title
US4780617A (en) 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
US5473410A (en) 1990-11-28 1995-12-05 Nikon Corporation Projection exposure apparatus
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
SG88824A1 (en) 1996-11-28 2002-05-21 Nikon Corp Projection exposure method
JP4029182B2 (ja) 1996-11-28 2008-01-09 株式会社ニコン 露光方法
EP0890136B9 (en) 1996-12-24 2003-12-10 ASML Netherlands B.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
JPH1123692A (ja) 1997-06-30 1999-01-29 Sekisui Chem Co Ltd 地中探査用アンテナ
JPH11111601A (ja) 1997-10-06 1999-04-23 Nikon Corp 露光方法及び装置
JP4210871B2 (ja) 1997-10-31 2009-01-21 株式会社ニコン 露光装置
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
JP4264676B2 (ja) 1998-11-30 2009-05-20 株式会社ニコン 露光装置及び露光方法
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP3969855B2 (ja) * 1998-07-02 2007-09-05 キヤノン株式会社 露光方法および露光装置
JP3910333B2 (ja) 2000-03-03 2007-04-25 富士通株式会社 ガルバノマイクロミラーとその製造方法
AU2003256081A1 (en) 2002-08-23 2004-03-11 Nikon Corporation Projection optical system and method for photolithography and exposure apparatus and method using same
TWI366219B (en) 2004-02-06 2012-06-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
JP2006038952A (ja) 2004-07-22 2006-02-09 Fujinon Corp カメラ
JP4545524B2 (ja) 2004-08-23 2010-09-15 東京応化工業株式会社 積層体、およびレジストパターン形成方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103777363A (zh) * 2007-10-24 2014-05-07 株式会社尼康 照明光学设备、曝光设备、照明方法、曝光方法和装置制造方法
TWI454734B (zh) * 2007-12-04 2014-10-01 Blackeye Optics Llc 變焦透鏡系統及照相系統
US9581736B2 (en) 2007-12-04 2017-02-28 Blackeye Optics, Llc. Liquid optics image stabilization
US9658436B2 (en) 2007-12-04 2017-05-23 Blackeye Optics, Llc. Liquid optics in a zoom lens system and imaging apparatus
TWI490658B (zh) * 2009-04-03 2015-07-01 V Technology Co Ltd 曝光方法及曝光裝置（一）
US8879161B2 (en) 2009-04-10 2014-11-04 Blackeye Optics, Llc Variable power optical system
US9201175B2 (en) 2009-04-10 2015-12-01 Blackeye Optics, Llc. Variable power optical system
US9285511B2 (en) 2009-04-10 2016-03-15 Blackeye Optics, Llc Variable power optical system

Also Published As

Publication number Publication date
JPWO2007100081A1 (ja) 2009-07-23
EP1993120A1 (en) 2008-11-19
KR20080108226A (ko) 2008-12-12
WO2007100081A1 (ja) 2007-09-07

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