TW200732294A - Cleaning liquid for chemical supply apparatus for semiconductor manufacturing - Google Patents

Cleaning liquid for chemical supply apparatus for semiconductor manufacturing

Info

Publication number
TW200732294A
TW200732294A TW095142437A TW95142437A TW200732294A TW 200732294 A TW200732294 A TW 200732294A TW 095142437 A TW095142437 A TW 095142437A TW 95142437 A TW95142437 A TW 95142437A TW 200732294 A TW200732294 A TW 200732294A
Authority
TW
Taiwan
Prior art keywords
supply apparatus
semiconductor manufacturing
chemical supply
cleaning liquid
cleaning
Prior art date
Application number
TW095142437A
Other languages
English (en)
Inventor
Masaaki Yoshida
Kazumasa Wakiya
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200732294A publication Critical patent/TW200732294A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
TW095142437A 2005-11-16 2006-11-16 Cleaning liquid for chemical supply apparatus for semiconductor manufacturing TW200732294A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005332193 2005-11-16

Publications (1)

Publication Number Publication Date
TW200732294A true TW200732294A (en) 2007-09-01

Family

ID=38111741

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095142437A TW200732294A (en) 2005-11-16 2006-11-16 Cleaning liquid for chemical supply apparatus for semiconductor manufacturing

Country Status (3)

Country Link
KR (1) KR20070052205A (zh)
CN (1) CN1970715A (zh)
TW (1) TW200732294A (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009147293A (ja) * 2007-11-22 2009-07-02 Renesas Technology Corp 半導体装置の製造方法
JP6187778B2 (ja) * 2012-07-19 2017-08-30 日産化学工業株式会社 半導体用洗浄液及びそれを用いた洗浄方法
KR102478194B1 (ko) * 2017-06-26 2022-12-15 에이지씨 가부시키가이샤 진공 증착용의 마스크의 세정 방법 및 린스 조성물

Also Published As

Publication number Publication date
KR20070052205A (ko) 2007-05-21
CN1970715A (zh) 2007-05-30

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