TW200731030A - Method for regenerating a resist treatment liquid and its apparatus - Google Patents

Method for regenerating a resist treatment liquid and its apparatus

Info

Publication number
TW200731030A
TW200731030A TW096104507A TW96104507A TW200731030A TW 200731030 A TW200731030 A TW 200731030A TW 096104507 A TW096104507 A TW 096104507A TW 96104507 A TW96104507 A TW 96104507A TW 200731030 A TW200731030 A TW 200731030A
Authority
TW
Taiwan
Prior art keywords
resist
treatment liquid
regenerating
metal film
liquid
Prior art date
Application number
TW096104507A
Other languages
Chinese (zh)
Inventor
Suk-Il Yoon
Seong-Bae Kim
Jong-Hyun Jeong
Soon-Beom Huh
Byung-Uk Kim
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200731030A publication Critical patent/TW200731030A/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47G—HOUSEHOLD OR TABLE EQUIPMENT
    • A47G33/00—Religious or ritual equipment in dwelling or for general use
    • A47G33/02—Altars; Religious shrines; Fonts for holy water; Crucifixes
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
    • G11B23/02—Containers; Storing means both adapted to cooperate with the recording or reproducing means
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47G—HOUSEHOLD OR TABLE EQUIPMENT
    • A47G2200/00—Details not otherwise provided for in A47G
    • A47G2200/14—Sound
    • A47G2200/143—Sound producing means

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Catalysts (AREA)

Abstract

To provide a method for regenerating a resist treatment liquid and to provide an apparatus for the method, more particularly, a method for regenerating a resist treatment liquid and an apparatus for the method, the method including steps removing a resist from a substrate having a resist coating for patterning metal wiring of an electric circuit or a display element and then bringing a resist containing treatment liquid discharged in the resist removing step into contact with a heterogeneous photocatalyst to remove and decompose the resist, by using the method not only the resist remaining on a patterned metal film can be removed but the resist component can be decomposed from the resist containing treatment liquid produced in the above steps, and therefore, the liquid shows little composition changes and chemical liquid fatigue by volatilization at high temperature and corrosion of a patterned metal film can be minimized.
TW096104507A 2006-02-07 2007-02-07 Method for regenerating a resist treatment liquid and its apparatus TW200731030A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060011520A KR101285775B1 (en) 2006-02-07 2006-02-07 Method for regenerating a resist treatment composition and its apparatus

Publications (1)

Publication Number Publication Date
TW200731030A true TW200731030A (en) 2007-08-16

Family

ID=38491486

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096104507A TW200731030A (en) 2006-02-07 2007-02-07 Method for regenerating a resist treatment liquid and its apparatus

Country Status (4)

Country Link
JP (1) JP2007213074A (en)
KR (1) KR101285775B1 (en)
CN (1) CN101017334A (en)
TW (1) TW200731030A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012160721A1 (en) * 2011-05-20 2012-11-29 パナソニック株式会社 Photoresist stripping solution, stripping solution recycling system and operating method, and method for recycling stripping solution
CN103030239B (en) * 2011-09-29 2015-04-15 中国石油化工股份有限公司 Circulating water treatment method adopting deionized water as supplement water
TWI518467B (en) * 2013-11-15 2016-01-21 達興材料股份有限公司 Photoresist stripper composition, electronic device and method of fabricating the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200256959Y1 (en) * 2001-08-27 2001-12-24 고명한 ANT(Advanced New Technology) Process of Waste-water Treatment
KR20030075063A (en) * 2002-03-15 2003-09-22 지충수 Photocatalytic reactor for purification of waste water
JP2004241602A (en) * 2003-02-06 2004-08-26 Toagosei Co Ltd Method for regenerating peeling and cleaning liquid

Also Published As

Publication number Publication date
KR20070080316A (en) 2007-08-10
CN101017334A (en) 2007-08-15
JP2007213074A (en) 2007-08-23
KR101285775B1 (en) 2013-07-18

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