TW200730876A - Optical integrator, illuminating system, exposure system, and manufacturing method of the device - Google Patents

Optical integrator, illuminating system, exposure system, and manufacturing method of the device

Info

Publication number
TW200730876A
TW200730876A TW095143915A TW95143915A TW200730876A TW 200730876 A TW200730876 A TW 200730876A TW 095143915 A TW095143915 A TW 095143915A TW 95143915 A TW95143915 A TW 95143915A TW 200730876 A TW200730876 A TW 200730876A
Authority
TW
Taiwan
Prior art keywords
area
defraction
optical integrator
manufacturing
central part
Prior art date
Application number
TW095143915A
Other languages
English (en)
Inventor
Osamu Tanitsu
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200730876A publication Critical patent/TW200730876A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Eyeglasses (AREA)
  • Microscoopes, Condenser (AREA)
TW095143915A 2005-12-21 2006-11-28 Optical integrator, illuminating system, exposure system, and manufacturing method of the device TW200730876A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005367647 2005-12-21

Publications (1)

Publication Number Publication Date
TW200730876A true TW200730876A (en) 2007-08-16

Family

ID=38188422

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095143915A TW200730876A (en) 2005-12-21 2006-11-28 Optical integrator, illuminating system, exposure system, and manufacturing method of the device

Country Status (6)

Country Link
US (3) US20090002664A1 (zh)
EP (1) EP1970943A4 (zh)
JP (1) JPWO2007072639A1 (zh)
KR (1) KR20080053500A (zh)
TW (1) TW200730876A (zh)
WO (1) WO2007072639A1 (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7920794B1 (en) * 2007-01-05 2011-04-05 Lockheed Martin Corporation Free space optical communication
JP5035747B2 (ja) 2007-03-16 2012-09-26 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法
US20080297753A1 (en) * 2007-05-31 2008-12-04 Micron Technology, Inc. Apparatus and method for defect-free microlithography
JPWO2009020014A1 (ja) * 2007-08-03 2010-10-28 株式会社ニコン インテグレータおよび該インテグレータを使用した照明装置
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
KR101546987B1 (ko) 2007-10-16 2015-08-24 가부시키가이샤 니콘 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법
US8233210B2 (en) * 2008-12-30 2012-07-31 Intel Corporation Illumination aperture for optical lithography
EP2354853B1 (en) * 2010-02-09 2013-01-02 Carl Zeiss SMT GmbH Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus
SG193124A1 (en) * 2012-02-28 2013-09-30 Johnson & Johnson Vision Care Method of arranging ring segments on a wafer for functionalized layers of an ophthalmic lens
CN103207530B (zh) * 2013-03-22 2014-12-17 中国科学院上海光学精密机械研究所 光刻机光瞳整形光学系统及产生离轴照明模式的方法
DE102013212613B4 (de) 2013-06-28 2015-07-23 Carl Zeiss Sms Gmbh Beleuchtungsoptik für ein Metrologiesystem sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik
US10122918B2 (en) * 2016-06-16 2018-11-06 Maurizio Sole Festa System for producing 360 degree media
DE202016103819U1 (de) * 2016-07-14 2017-10-20 Suss Microtec Lithography Gmbh Lichtquellenanordnung für ein Belichtungssystem sowie Fotolithografie-Belichtungssystem
DE102016113978B4 (de) * 2016-07-28 2021-09-02 Lilas Gmbh Vorrichtung zum Ablenken einer Laserstrahlung oder zum Ablenken von Licht
CN109469884A (zh) * 2017-09-08 2019-03-15 法雷奥照明公司 用于发光装置的配光元件以及发光装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE34634E (en) * 1982-02-26 1994-06-07 Nippon Kogaku Kabushiki Kaisha Light illumination device
JPS622540A (ja) * 1985-06-28 1987-01-08 Canon Inc ライトインテグレ−タとそれを含むケ−ラ−照明系
JP2773401B2 (ja) * 1990-07-27 1998-07-09 松下電器産業株式会社 光学レンズ
US5636003A (en) * 1992-11-05 1997-06-03 Nikon Corporation Illumination optical apparatus and scanning exposure apparatus
JP3428055B2 (ja) * 1992-11-05 2003-07-22 株式会社ニコン 照明光学装置、露光装置、半導体製造方法および露光方法
DE19635942A1 (de) * 1996-09-05 1998-03-12 Vitaly Dr Lissotschenko Optisches Strahlformungssystem
EP1069600A4 (en) * 1998-03-24 2002-11-20 Nikon Corp ILLUMINATOR, EXPOSURE METHOD AND APPARATUS, METHOD FOR MANUFACTURING SAID DEVICE
JP2002258019A (ja) * 2000-12-26 2002-09-11 Olympus Optical Co Ltd 光学シート、光学シート製造システム、光学シート切断装置
US6807003B2 (en) * 2000-12-26 2004-10-19 Olympus Optical Co., Ltd. Optical sheet, optical sheet manufacturing system, and optical sheet cutting machine
JP2003015314A (ja) * 2001-07-02 2003-01-17 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2003178952A (ja) * 2001-12-12 2003-06-27 Nikon Corp 照明光学装置、露光装置および露光方法
TW567406B (en) * 2001-12-12 2003-12-21 Nikon Corp Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
EP1367446A1 (en) * 2002-05-31 2003-12-03 ASML Netherlands B.V. Lithographic apparatus
JP4366948B2 (ja) 2003-02-14 2009-11-18 株式会社ニコン 照明光学装置、露光装置および露光方法
WO2005017483A1 (ja) * 2003-08-18 2005-02-24 Nikon Corporation 照度分布の評価方法、光学部材の製造方法、照明光学装置、露光装置および露光方法
JP4323903B2 (ja) * 2003-09-12 2009-09-02 キヤノン株式会社 照明光学系及びそれを用いた露光装置
CN102314096B (zh) * 2006-02-17 2014-05-21 卡尔蔡司Smt有限责任公司 制造长的微透镜阵列的方法
TWI456267B (zh) * 2006-02-17 2014-10-11 Zeiss Carl Smt Gmbh 用於微影投射曝光設備之照明系統

Also Published As

Publication number Publication date
US20100245796A1 (en) 2010-09-30
JPWO2007072639A1 (ja) 2009-05-28
US20140226211A1 (en) 2014-08-14
US8611013B2 (en) 2013-12-17
US20090002664A1 (en) 2009-01-01
EP1970943A1 (en) 2008-09-17
KR20080053500A (ko) 2008-06-13
WO2007072639A1 (ja) 2007-06-28
EP1970943A4 (en) 2010-07-28

Similar Documents

Publication Publication Date Title
TW200730876A (en) Optical integrator, illuminating system, exposure system, and manufacturing method of the device
DK2112425T3 (da) Projektor til diffust lys
SI1746339T1 (sl) Naprava za osvetljevanje ali signaliziranje, zlasti za vozila
WO2007070759A3 (en) Compensation free illuminatton of instrument cluster display
WO2006023942A3 (en) Lighting systems for producing different beam patterns
WO2006066638A8 (en) A filter device for the compensation of an asymmetric pupil illumination
DE502004012477D1 (de) Stufenlinsenscheinwerfer
DE602008002911D1 (de) Lichtstrahlenformer
JO3220B1 (ar) طريقة ونظام وجهاز لتوزيع الضوء بشكل عالي التحكم من تركيبة ضوء تستخدم مصادر ضوء متعددة (اجهزة دايود باعثه للضوء)
TW200630179A (en) Optical illumination system for creating a line beam
ATE341016T1 (de) Holographische multifokallinse
EP1847762A3 (en) Compact lighting device, in particular for use in a dental lamp
WO2006076899A3 (de) Beleuchtungseinrichtung
WO2007016363A3 (en) Free-form lenticular optical elements and their application to condensers and headlamps
EP1645794A3 (en) Lighting device
SG163534A1 (en) Optimizing use and performance of optical systems implemented with telecentric on-axis dark field illumination
TW200630642A (en) Light distribution
TW200741818A (en) Exposure apparatus and device manufacturing method
EP1793278A3 (en) Illumination system
ATE405951T1 (de) Modul für die projektion eines lichtstrahls
TW200717039A (en) Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
TWI263800B (en) Optical projection apparatus
TW200625015A (en) A lithographic apparatus having a contaminant trapping system, a contaminant trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus
DE502004001032D1 (de) Lichtsignal
EP1763095A3 (en) Efficiency enhancement methods for OLED light source through index bridging