TW200721563A - Organic light emitting devices having latent activated layers and methods of fabricating the same - Google Patents

Organic light emitting devices having latent activated layers and methods of fabricating the same

Info

Publication number
TW200721563A
TW200721563A TW095128750A TW95128750A TW200721563A TW 200721563 A TW200721563 A TW 200721563A TW 095128750 A TW095128750 A TW 095128750A TW 95128750 A TW95128750 A TW 95128750A TW 200721563 A TW200721563 A TW 200721563A
Authority
TW
Taiwan
Prior art keywords
light emitting
organic light
fabricating
methods
emitting devices
Prior art date
Application number
TW095128750A
Other languages
English (en)
Chinese (zh)
Inventor
Jie Liu
Larry Neil Lewis
Anil Raj Duggal
Rubinsztajn Slawomir
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of TW200721563A publication Critical patent/TW200721563A/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H10K50/15—Hole transporting layers
    • H10K50/155—Hole transporting layers comprising dopants
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H10K50/16—Electron transporting layers
    • H10K50/165—Electron transporting layers comprising dopants
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/17—Carrier injection layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/17—Carrier injection layers
    • H10K50/171—Electron injection layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
TW095128750A 2005-10-04 2006-08-04 Organic light emitting devices having latent activated layers and methods of fabricating the same TW200721563A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/243,194 US20070077452A1 (en) 2005-10-04 2005-10-04 Organic light emitting devices having latent activated layers and methods of fabricating the same

Publications (1)

Publication Number Publication Date
TW200721563A true TW200721563A (en) 2007-06-01

Family

ID=37401542

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095128750A TW200721563A (en) 2005-10-04 2006-08-04 Organic light emitting devices having latent activated layers and methods of fabricating the same

Country Status (7)

Country Link
US (2) US20070077452A1 (https=)
EP (1) EP1935042A1 (https=)
JP (1) JP2009510795A (https=)
KR (1) KR20080063764A (https=)
CN (1) CN101283462B (https=)
TW (1) TW200721563A (https=)
WO (1) WO2007040728A1 (https=)

Families Citing this family (13)

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US20070075628A1 (en) * 2005-10-04 2007-04-05 General Electric Company Organic light emitting devices having latent activated layers
JP5261028B2 (ja) * 2007-08-21 2013-08-14 富士フイルム株式会社 表示素子
CA2720694C (en) * 2008-04-11 2017-05-23 Plextronics, Inc. Doped conjugated polymers, devices, and methods of making devices
US20090284158A1 (en) * 2008-05-16 2009-11-19 General Electric Company Organic light emitting device based lighting for low cost, flexible large area signage
US8350144B2 (en) * 2008-05-23 2013-01-08 Swaminathan Ramesh Hybrid photovoltaic cell module
US8022623B2 (en) * 2008-08-15 2011-09-20 General Electric Company Ultra-thin multi-substrate color tunable OLED device
US20110008525A1 (en) * 2009-07-10 2011-01-13 General Electric Company Condensation and curing of materials within a coating system
JP6035706B2 (ja) 2010-04-09 2016-11-30 三菱化学株式会社 有機電界素子用組成物の製造方法、有機電界素子用組成物、有機電界発光素子の製造方法、有機電界発光素子、有機ｅｌ表示装置および有機ｅｌ照明
KR101562859B1 (ko) * 2014-04-02 2015-10-27 한국생산기술연구원 광산발생제를 이용한 전도성 플라스틱 막 및 그 제조방법 및 그에 대한 패턴형성방법
TWI579492B (zh) * 2015-05-11 2017-04-21 綠點高新科技股份有限公司 燈具的製造方法及該燈具
CN104952908B (zh) * 2015-07-01 2018-12-21 上海和辉光电有限公司 一种oled显示面板及其制备方法
TWI808111B (zh) * 2017-12-20 2023-07-11 日商日產化學股份有限公司 電荷輸送性塗料、電荷輸送性薄膜以及有機電致發光元件
KR20220166888A (ko) * 2021-06-10 2022-12-20 삼성디스플레이 주식회사 발광 소자 및 이의 제조 방법

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US5198153A (en) * 1989-05-26 1993-03-30 International Business Machines Corporation Electrically conductive polymeric
US5200112A (en) * 1989-05-26 1993-04-06 International Business Machines Corporation Electrically conductive polymeric materials and uses thereof
US5650261A (en) * 1989-10-27 1997-07-22 Rohm And Haas Company Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system
US5514878A (en) * 1994-03-18 1996-05-07 Holmes; Andrew B. Polymers for electroluminescent devices
US5719467A (en) * 1995-07-27 1998-02-17 Hewlett-Packard Company Organic electroluminescent device
US5965280A (en) * 1997-03-03 1999-10-12 Hewlett-Packard Company Patterned polymer electroluminescent devices based on microlithographic processes
GB9718393D0 (en) * 1997-08-29 1997-11-05 Cambridge Display Tech Ltd Electroluminescent Device
US6045977A (en) * 1998-02-19 2000-04-04 Lucent Technologies Inc. Process for patterning conductive polyaniline films
GB9815271D0 (en) * 1998-07-14 1998-09-09 Cambridge Display Tech Ltd Particles and devices comprising particles
SG78412A1 (en) * 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
NL1014545C2 (nl) * 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
ATE410791T1 (de) * 1999-04-06 2008-10-15 Cambridge Display Tech Ltd Verfahren zur dotierung von polymeren
CN1084134C (zh) * 1999-08-25 2002-05-01 吉林大学 利用光辐照方式可逆地形成或消除图像的电致发光器件
TWI272451B (en) * 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
KR100862281B1 (ko) * 2000-12-04 2008-10-15 시바 홀딩 인크 오늄 염, 이를 포함하는 화학적으로 증폭된 감광성 내식막 조성물 및 감광성 내식막의 제조방법
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JP4554329B2 (ja) * 2004-06-02 2010-09-29 大日本印刷株式会社 有機電子デバイス、及び有機電子デバイスの製造方法
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Also Published As

Publication number Publication date
CN101283462A (zh) 2008-10-08
JP2009510795A (ja) 2009-03-12
US20070077452A1 (en) 2007-04-05
KR20080063764A (ko) 2008-07-07
EP1935042A1 (en) 2008-06-25
CN101283462B (zh) 2011-08-24
WO2007040728A1 (en) 2007-04-12
US20100230829A1 (en) 2010-09-16

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