TW200719091A - Laser resist transfer for microfabrication of electronic devices - Google Patents
Laser resist transfer for microfabrication of electronic devicesInfo
- Publication number
- TW200719091A TW200719091A TW095136167A TW95136167A TW200719091A TW 200719091 A TW200719091 A TW 200719091A TW 095136167 A TW095136167 A TW 095136167A TW 95136167 A TW95136167 A TW 95136167A TW 200719091 A TW200719091 A TW 200719091A
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- microfabrication
- electronic devices
- resist pattern
- laser resist
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
- B41M5/38207—Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/398—Processes based on the production of stickiness patterns using powders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
- B41M2205/08—Ablative thermal transfer, i.e. the exposed transfer medium is propelled from the donor to a receptor by generation of a gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0502—Patterning and lithography
- H05K2203/0528—Patterning during transfer, i.e. without preformed pattern, e.g. by using a die, a programmed tool or a laser
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/240,964 US7198879B1 (en) | 2005-09-30 | 2005-09-30 | Laser resist transfer for microfabrication of electronic devices |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200719091A true TW200719091A (en) | 2007-05-16 |
Family
ID=37667173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095136167A TW200719091A (en) | 2005-09-30 | 2006-09-29 | Laser resist transfer for microfabrication of electronic devices |
Country Status (6)
Country | Link |
---|---|
US (1) | US7198879B1 (zh) |
JP (1) | JP2009510521A (zh) |
KR (1) | KR20080050593A (zh) |
CN (1) | CN101277821B (zh) |
TW (1) | TW200719091A (zh) |
WO (1) | WO2007040950A1 (zh) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI295822B (en) * | 2006-03-29 | 2008-04-11 | Advanced Semiconductor Eng | Method for forming a passivation layer |
US7867688B2 (en) * | 2006-05-30 | 2011-01-11 | Eastman Kodak Company | Laser ablation resist |
US7994021B2 (en) * | 2006-07-28 | 2011-08-09 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing semiconductor device |
US7989146B2 (en) * | 2007-10-09 | 2011-08-02 | Eastman Kodak Company | Component fabrication using thermal resist materials |
TWI375498B (en) * | 2007-11-21 | 2012-10-21 | Ind Tech Res Inst | High perfromance laser-assisted transferring system and transfer component |
US20090155963A1 (en) * | 2007-12-12 | 2009-06-18 | Hawkins Gilbert A | Forming thin film transistors using ablative films |
TW201001624A (en) * | 2008-01-24 | 2010-01-01 | Soligie Inc | Silicon thin film transistors, systems, and methods of making same |
US8415260B2 (en) * | 2010-04-08 | 2013-04-09 | International Business Machines Corporation | Chip identification for organic laminate packaging and methods of manufacture |
WO2012158709A1 (en) | 2011-05-16 | 2012-11-22 | The Board Of Trustees Of The University Of Illinois | Thermally managed led arrays assembled by printing |
US9555644B2 (en) | 2011-07-14 | 2017-01-31 | The Board Of Trustees Of The University Of Illinois | Non-contact transfer printing |
CN103717387B (zh) | 2011-08-03 | 2017-11-07 | 印刷包装国际公司 | 用于形成带图案化微波能量相互作用材料的层叠件的系统和方法 |
US20140160452A1 (en) * | 2011-08-16 | 2014-06-12 | Asml Netherlands B.V | Lithographic apparatus, programmable patterning device and lithographic method |
JP5874331B2 (ja) * | 2011-10-17 | 2016-03-02 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物 |
KR101680130B1 (ko) * | 2012-06-08 | 2016-12-12 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 디바이스 제조 방법 |
US9583669B2 (en) | 2012-08-16 | 2017-02-28 | Sun Chemical Corporation | Inkjet printable etch resist |
KR20150005264A (ko) * | 2013-07-05 | 2015-01-14 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
ES2702380T3 (es) * | 2013-09-26 | 2019-02-28 | Graphic Packaging Int Llc | Estratificados, y sistemas y procedimientos para la estratificación |
JP6619335B2 (ja) * | 2013-10-14 | 2019-12-11 | オルボテック リミテッド | 複数組成材料構造体のlift印刷 |
EP2955981A1 (en) * | 2014-06-13 | 2015-12-16 | Irepa Laser | Method for manufacturing selective surface deposition using a pulsed radiation treatment |
BR112017009698B1 (pt) | 2014-12-22 | 2022-01-18 | Graphic Packaging International, Llc | Método para formar um laminado, e sistema para formação de um laminado |
CN107849687B (zh) * | 2015-07-09 | 2020-01-14 | 奥博泰克有限公司 | 对激光诱导正向转移喷射角度的控制 |
US10080806B2 (en) | 2015-08-19 | 2018-09-25 | International Business Machines Corporation | Sulfur-containing polymers from hexahydrotriazine and dithiol precursors as a carrier for active agents |
US9550863B1 (en) | 2015-10-05 | 2017-01-24 | International Business Machines Corporation | Polymers from stabilized imines |
US9534084B1 (en) | 2015-11-02 | 2017-01-03 | International Business Machines Corporation | High molecular weight polythioaminals from a single monomer |
US9862802B2 (en) | 2015-11-30 | 2018-01-09 | International Business Machines Corporation | Poly(thioaminal) probe based lithography |
JP6839476B2 (ja) * | 2016-09-26 | 2021-03-10 | カンタツ株式会社 | パターン形成用シート |
US11097465B2 (en) | 2018-04-23 | 2021-08-24 | Io Tech Group Ltd. | Laser-based droplet array jetting of high viscous materials |
WO2022003431A1 (en) * | 2020-06-28 | 2022-01-06 | Orbotech Ltd. | Laser printing of solder pastes |
CN111787707A (zh) * | 2020-07-27 | 2020-10-16 | 深圳市卓创通电子有限公司 | 一种覆铜板的内层线路激光刻印加工工艺 |
US11877398B2 (en) | 2021-02-11 | 2024-01-16 | Io Tech Group Ltd. | PCB production by laser systems |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4973572A (en) | 1987-12-21 | 1990-11-27 | Eastman Kodak Company | Infrared absorbing cyanine dyes for dye-donor element used in laser-induced thermal dye transfer |
US4772582A (en) | 1987-12-21 | 1988-09-20 | Eastman Kodak Company | Spacer bead layer for dye-donor element used in laser-induced thermal dye transfer |
US4876235A (en) * | 1988-12-12 | 1989-10-24 | Eastman Kodak Company | Dye-receiving element containing spacer beads in a laser-induced thermal dye transfer |
US5891602A (en) | 1992-05-29 | 1999-04-06 | Eastman Kodak Company | Dye donor binder for laser-induced thermal dye transfer |
CA2091286A1 (en) * | 1992-07-20 | 1994-01-21 | John Grunwald | Direct imaging process for forming resist pattern on a surface, and use thereof in fabricating printed boards |
EP0679531B1 (en) * | 1994-04-26 | 1997-07-23 | E.I. Du Pont De Nemours And Company | Element and process for laser-induced ablative transfer |
GB9508027D0 (en) * | 1995-04-20 | 1995-06-07 | Minnesota Mining & Mfg | Laser absorbable photobleachable compositions |
US5935758A (en) * | 1995-04-20 | 1999-08-10 | Imation Corp. | Laser induced film transfer system |
AU7256496A (en) * | 1995-10-17 | 1997-05-07 | Minnesota Mining And Manufacturing Company | Method for radiation-induced thermal transfer of resist for flexible printed circuitry |
US5578416A (en) | 1995-11-20 | 1996-11-26 | Eastman Kodak Company | Cinnamal-nitrile dyes for laser recording element |
US5714301A (en) * | 1996-10-24 | 1998-02-03 | Eastman Kodak Company | Spacing a donor and a receiver for color transfer |
US5858607A (en) | 1996-11-21 | 1999-01-12 | Kodak Polychrome Graphics | Laser-induced material transfer digital lithographic printing plates |
US6136509A (en) | 1998-06-05 | 2000-10-24 | Creo Srl | Method of exposing thermoresist |
US6252621B1 (en) | 1998-08-03 | 2001-06-26 | Eastman Kodak Company | Printing lenticular images |
US6787283B1 (en) | 1999-07-22 | 2004-09-07 | Fuji Photo Film Co., Ltd. | Positive photoresist composition for far ultraviolet exposure |
US6228555B1 (en) * | 1999-12-28 | 2001-05-08 | 3M Innovative Properties Company | Thermal mass transfer donor element |
US6165671A (en) | 1999-12-30 | 2000-12-26 | Eastman Kodak Company | Laser donor element |
US6190827B1 (en) | 2000-05-04 | 2001-02-20 | Eastman Kodak Company | Laser donor element |
US6855384B1 (en) | 2000-09-15 | 2005-02-15 | 3M Innovative Properties Company | Selective thermal transfer of light emitting polymer blends |
US6695029B2 (en) | 2001-12-12 | 2004-02-24 | Eastman Kodak Company | Apparatus for permitting transfer of organic material from a donor to form a layer in an OLED device |
US20030162108A1 (en) | 2002-01-30 | 2003-08-28 | Eastman Kodak Company | Using spacer elements to make electroluminscent display devices |
JP2005064143A (ja) * | 2003-08-08 | 2005-03-10 | Seiko Epson Corp | レジストパターンの形成方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置及び電子機器 |
-
2005
- 2005-09-30 US US11/240,964 patent/US7198879B1/en not_active Expired - Fee Related
-
2006
- 2006-09-15 JP JP2008533412A patent/JP2009510521A/ja active Pending
- 2006-09-15 WO PCT/US2006/035955 patent/WO2007040950A1/en active Application Filing
- 2006-09-15 CN CN2006800363901A patent/CN101277821B/zh not_active Expired - Fee Related
- 2006-09-15 KR KR1020087007668A patent/KR20080050593A/ko not_active Application Discontinuation
- 2006-09-29 TW TW095136167A patent/TW200719091A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
US7198879B1 (en) | 2007-04-03 |
CN101277821B (zh) | 2011-10-05 |
KR20080050593A (ko) | 2008-06-09 |
CN101277821A (zh) | 2008-10-01 |
US20070077511A1 (en) | 2007-04-05 |
JP2009510521A (ja) | 2009-03-12 |
WO2007040950A1 (en) | 2007-04-12 |
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