TW200712798A - Novel method and system for advanced reticle contaimination cleaning - Google Patents
Novel method and system for advanced reticle contaimination cleaningInfo
- Publication number
- TW200712798A TW200712798A TW095130726A TW95130726A TW200712798A TW 200712798 A TW200712798 A TW 200712798A TW 095130726 A TW095130726 A TW 095130726A TW 95130726 A TW95130726 A TW 95130726A TW 200712798 A TW200712798 A TW 200712798A
- Authority
- TW
- Taiwan
- Prior art keywords
- cleaning
- contaimination
- novel method
- substrate
- acid solution
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 5
- 238000000034 method Methods 0.000 title abstract 2
- 239000002253 acid Substances 0.000 abstract 5
- 239000000758 substrate Substances 0.000 abstract 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/08—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/40—Specific cleaning or washing processes
- C11D2111/46—Specific cleaning or washing processes applying energy, e.g. irradiation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1111—Using solvent during delaminating [e.g., water dissolving adhesive at bonding face during delamination, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Inorganic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71811805P | 2005-09-16 | 2005-09-16 | |
US11/261,116 US20070066071A1 (en) | 2005-09-16 | 2005-10-28 | Novel organic remover for advanced reticle contamination cleaning |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200712798A true TW200712798A (en) | 2007-04-01 |
TWI357534B TWI357534B (en) | 2012-02-01 |
Family
ID=37884746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095130726A TWI357534B (en) | 2005-09-16 | 2006-08-21 | Novel method and system for advanced reticle conta |
Country Status (2)
Country | Link |
---|---|
US (1) | US20070066071A1 (zh) |
TW (1) | TWI357534B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI576657B (zh) * | 2014-12-25 | 2017-04-01 | 台灣積體電路製造股份有限公司 | 光罩清潔設備以及光罩清潔方法 |
CN109103073A (zh) * | 2018-08-29 | 2018-12-28 | 汉能新材料科技有限公司 | 一种废弃晶片的再利用方法及制备得到的晶片 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102931143B (zh) * | 2011-08-10 | 2015-04-29 | 无锡华润上华科技有限公司 | NOR Flash器件制作方法 |
KR101819825B1 (ko) * | 2016-06-13 | 2018-01-18 | 아주대학교산학협력단 | 플렉시블 전극 제조방법 |
CN109755100B (zh) * | 2017-11-01 | 2022-04-08 | 天津环鑫科技发展有限公司 | 一种干法打砂清洗工艺 |
TWI673566B (zh) * | 2018-02-13 | 2019-10-01 | 特銓股份有限公司 | 光罩洗淨設備以及光罩洗淨方法 |
WO2020225789A2 (en) * | 2019-05-08 | 2020-11-12 | Consiglio Nazionale Delle Ricerche | Molecular doping |
CN114887990A (zh) * | 2022-05-13 | 2022-08-12 | 安徽光智科技有限公司 | 胶合镜片超声波清洗工艺 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5773348A (en) * | 1997-05-21 | 1998-06-30 | Powerchip Semiconductor Corp. | Method of fabricating a short-channel MOS device |
JPH11176798A (ja) * | 1997-12-08 | 1999-07-02 | Toshiba Corp | 基板洗浄・乾燥装置及び方法 |
US6230720B1 (en) * | 1999-08-16 | 2001-05-15 | Memc Electronic Materials, Inc. | Single-operation method of cleaning semiconductors after final polishing |
US6764552B1 (en) * | 2002-04-18 | 2004-07-20 | Novellus Systems, Inc. | Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials |
TWI377453B (en) * | 2003-07-31 | 2012-11-21 | Akrion Technologies Inc | Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
US7231682B1 (en) * | 2003-08-28 | 2007-06-19 | Lam Research Corporation | Method and apparatus for simultaneously cleaning the front side and back side of a wafer |
-
2005
- 2005-10-28 US US11/261,116 patent/US20070066071A1/en not_active Abandoned
-
2006
- 2006-08-21 TW TW095130726A patent/TWI357534B/zh active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI576657B (zh) * | 2014-12-25 | 2017-04-01 | 台灣積體電路製造股份有限公司 | 光罩清潔設備以及光罩清潔方法 |
CN109103073A (zh) * | 2018-08-29 | 2018-12-28 | 汉能新材料科技有限公司 | 一种废弃晶片的再利用方法及制备得到的晶片 |
Also Published As
Publication number | Publication date |
---|---|
US20070066071A1 (en) | 2007-03-22 |
TWI357534B (en) | 2012-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200712798A (en) | Novel method and system for advanced reticle contaimination cleaning | |
MY165977A (en) | Imprint lithography system and method | |
BRPI0507024A (pt) | partìculas, processo para a preparação de partìculas, e, uso das partìculas | |
SG148975A1 (en) | Methods and apparatus for cleaning deposition chamber parts using selective spray etch | |
EA200701749A1 (ru) | Способ селективного травления поверхности стеклянного изделия | |
EP2171537A4 (en) | ALIGNMENT SYSTEM AND METHOD FOR A SUBSTRATE IN A NANODRUCK PROCESS | |
TW200801224A (en) | Apparatus and method for synthesizing carbon nanotube film | |
SG148015A1 (en) | Lithographic apparatus and device manufacturing method | |
WO2009091189A3 (en) | Substrate holder, substrate supporting apparatus, substrate processing apparatus, and substrate processing method using the same | |
MY163029A (en) | Apparatus for making bio-organic compounds | |
EA201070862A1 (ru) | Разлагаемые неводные гелевые системы | |
WO2006053127A8 (en) | Process and photovoltaic device using an akali-containing layer | |
TWI339856B (en) | Method and apparatus for improving uniformity of large-area substrates | |
TW200943398A (en) | Novel treatment and system for mask surface chemical reduction | |
TW200717640A (en) | Polishing method and polishing apparatus, and program for controlling polishing apparatus | |
SG136953A1 (en) | Aqueous cleaning composition and method for using same | |
EP2147130A4 (en) | APPARATUS AND METHOD FOR COATING SUBSTRATES WITH APPROXIMATE PROCESS INSULATION | |
DK1858655T3 (da) | Fremgangsmåde og apparat til fjernelse af maling og tætningsmiddel | |
NZ591223A (en) | Viscosity reduction via highly propogating ultrasonic energy | |
SG147361A1 (en) | Cleaning process and apparatus | |
EP2277236A4 (en) | PROCESS FOR IMPROVING THE PERFORMANCE, ANTENNA AND DEVICE | |
TW200626248A (en) | Film-forming apparatus and film-forming method | |
CY1112047T1 (el) | Διαδικασια για την παρασκευη γκαμπαπεντινης | |
EP2088469A4 (en) | RESISTANT SUBSTRATE TREATMENT SOLUTION AFTER DEVELOPMENT PROCESSING AND PROCESS FOR TREATING RESERVE SUBSTRATE USING THE SAME | |
GB0620725D0 (en) | Method and apparatus for the application of power material to substrates |