TW200706548A - Composition for forming low refractive index membrane and substrate having cured membrane of the same - Google Patents

Composition for forming low refractive index membrane and substrate having cured membrane of the same

Info

Publication number
TW200706548A
TW200706548A TW095112680A TW95112680A TW200706548A TW 200706548 A TW200706548 A TW 200706548A TW 095112680 A TW095112680 A TW 095112680A TW 95112680 A TW95112680 A TW 95112680A TW 200706548 A TW200706548 A TW 200706548A
Authority
TW
Taiwan
Prior art keywords
membrane
composition
refractive index
low refractive
group
Prior art date
Application number
TW095112680A
Other languages
Chinese (zh)
Other versions
TWI388573B (en
Inventor
Mitsuaki Kumazawa
Toshiharu Hirai
Hiroyuki Hosoi
Naomi Takenaka
Original Assignee
Catalysts & Chem Ind Co
Kyoeisha Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Catalysts & Chem Ind Co, Kyoeisha Chemical Co Ltd filed Critical Catalysts & Chem Ind Co
Publication of TW200706548A publication Critical patent/TW200706548A/en
Application granted granted Critical
Publication of TWI388573B publication Critical patent/TWI388573B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties
    • C08L2201/10—Transparent films; Clear coatings; Transparent materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group

Abstract

To provide a composition for forming a low refractive index membrane excellent in scratch resistance, chemical resistance, transparency, reflection-preventing performance, etc., and useful as a reflection-preventing membrane. This composition for forming a low refractive index consists of a perfluoro group-containing (meth)acrylic acid ester and hollow silica-based particles treated with a silane-coupling agent expressed by the general formula: RnSiX(4-n) [wherein, R is a 1-4C alkoxy, a methacryloyloxy group, an acryloyloxy group or a perfluoro(meth)acryloyl group; and X is a 1-4C alkoxy, a silanol group, a halogen or H].
TW095112680A 2005-04-12 2006-04-10 A composition for low refractive index film and a substrate having a hardening film are formed TWI388573B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005115164A JP4614813B2 (en) 2005-04-12 2005-04-12 Low refractive index film-forming composition and cured film-coated substrate

Publications (2)

Publication Number Publication Date
TW200706548A true TW200706548A (en) 2007-02-16
TWI388573B TWI388573B (en) 2013-03-11

Family

ID=37077064

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095112680A TWI388573B (en) 2005-04-12 2006-04-10 A composition for low refractive index film and a substrate having a hardening film are formed

Country Status (4)

Country Link
JP (1) JP4614813B2 (en)
KR (1) KR100968685B1 (en)
CN (1) CN1847305A (en)
TW (1) TWI388573B (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5433926B2 (en) * 2006-04-18 2014-03-05 Ｊｓｒ株式会社 Curable resin composition and antireflection film
JP2008115329A (en) * 2006-11-07 2008-05-22 Nof Corp Fluorine-containing curable coating fluid and reflection-reducing material using the same
KR100907357B1 (en) * 2007-05-23 2009-07-10 한화엘앤씨 주식회사 Method for Producing a Coating Agent for Anti-Glare Coating, and the Coating Agent and Anti-Glare Film
US20100196687A1 (en) * 2007-08-01 2010-08-05 Dai Nippon Printing Co., Ltd. Antireflection laminate
US8617693B2 (en) 2007-08-01 2013-12-31 Dai Nippon Printing Co., Ltd. Antireflection laminate
JP5216501B2 (en) 2007-09-28 2013-06-19 富士フイルム株式会社 Optical film, polarizing plate, and image display device
JP2009108123A (en) * 2007-10-26 2009-05-21 Jgc Catalysts & Chemicals Ltd Method of manufacturing surface-treated metal oxide particles, coating liquid for forming transparent film including the same, and substrate with transparent coating film
JP2009242475A (en) * 2008-03-28 2009-10-22 Sekisui Chem Co Ltd Hollow organic-inorganic hybrid fine particle, antireflective resin composition, coating agent for antireflective film, antireflective laminated product and antireflective film
JP5531509B2 (en) * 2008-09-05 2014-06-25 大日本印刷株式会社 Optical laminate, polarizing plate, and image display device
JP2010181613A (en) * 2009-02-05 2010-08-19 Nof Corp Antireflection film
KR101546098B1 (en) 2009-08-03 2015-08-20 동우 화인켐 주식회사 Coating composition for low refractive layer anti-reflection film using the same and image displaying device comprising said anti-reflection film
CN102086246B (en) * 2010-11-29 2012-12-26 江苏足迹涂料有限公司 Method for preparing nano silica-fluorine-containing acrylic resin through in-situ solution polymerization
JP5876870B2 (en) * 2011-03-31 2016-03-02 新日鉄住金化学株式会社 Image forming resin composition used in ink jet method, display element manufacturing method, and image forming method
KR102285627B1 (en) 2012-02-02 2021-08-04 닛산 가가쿠 가부시키가이샤 Low refractive index film-forming composition
JP2014001294A (en) * 2012-06-18 2014-01-09 Hitachi Chemical Co Ltd Low refractive index resin film, and composite film using the same
JP6087559B2 (en) 2012-09-28 2017-03-01 富士フイルム株式会社 Film mirror and composite film used therefor
CN103305116B (en) * 2013-06-17 2015-09-30 武汉绿凯科技有限公司 A kind of photocuring anti-reflection film coating liquid and preparation method thereof and application
JP5931009B2 (en) * 2013-06-19 2016-06-08 日揮触媒化成株式会社 Method for producing surface-treated metal oxide particles, coating liquid for forming transparent film containing the particles, and substrate with transparent film
WO2017018489A1 (en) 2015-07-30 2017-02-02 旭硝子株式会社 Fluorine-containing compound, curable composition, and cured product
CN109535812A (en) * 2018-12-05 2019-03-29 苏州锦艺新材料科技有限公司 The preparation method and delustring filler of delustring filler

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2247310B (en) * 1990-07-03 1993-09-22 Meitaku Syst Kk Edge light panel device
DE19518865A1 (en) * 1995-05-23 1996-11-28 Bayer Ag (Meth) acrylates containing fluoroalkenyl groups, their preparation and use
TW363976B (en) * 1996-06-10 1999-07-11 Nof Corp Fluoride-containing polyfunctional (meth)acrylates, compositions comprising the same, materials with low refractivity and reflection-reduction film
JP4046921B2 (en) * 2000-02-24 2008-02-13 触媒化成工業株式会社 Silica-based fine particles, method for producing the fine particle dispersion, and coated substrate
JP2002277604A (en) * 2001-03-16 2002-09-25 Toppan Printing Co Ltd Antireflection film
JP4058256B2 (en) * 2001-11-02 2008-03-05 Ｔｄｋ株式会社 Anti-reflection film and anti-reflection treated object
JP3890022B2 (en) * 2002-02-21 2007-03-07 共栄社化学株式会社 Perfluoro group-containing (meth) acrylic acid ester
JP3940086B2 (en) * 2003-02-06 2007-07-04 共栄社化学株式会社 Fluorine-substituted alicyclic group-containing (meth) acrylic acid ester and cured product thereof
JP4484612B2 (en) * 2004-07-20 2010-06-16 富士フイルム株式会社 Composition, coating composition, antireflection film, polarizing plate, image display device

Also Published As

Publication number Publication date
JP2006291077A (en) 2006-10-26
JP4614813B2 (en) 2011-01-19
KR20060108236A (en) 2006-10-17
KR100968685B1 (en) 2010-07-06
TWI388573B (en) 2013-03-11
CN1847305A (en) 2006-10-18

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