TW200705136A - Lithographic apparatus and lithographic product produced thereby - Google Patents

Lithographic apparatus and lithographic product produced thereby

Info

Publication number
TW200705136A
TW200705136A TW095118436A TW95118436A TW200705136A TW 200705136 A TW200705136 A TW 200705136A TW 095118436 A TW095118436 A TW 095118436A TW 95118436 A TW95118436 A TW 95118436A TW 200705136 A TW200705136 A TW 200705136A
Authority
TW
Taiwan
Prior art keywords
lithographic
stages
confined
lithographic apparatus
final element
Prior art date
Application number
TW095118436A
Other languages
English (en)
Other versions
TWI301565B (en
Inventor
Den Brink Marinus Aart Van
Jozef Petrus Henricus Benschop
Erik Roelof Loopstra
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/135,655 external-priority patent/US7161659B2/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200705136A publication Critical patent/TW200705136A/zh
Application granted granted Critical
Publication of TWI301565B publication Critical patent/TWI301565B/zh

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW95118436A 2005-05-24 2006-05-24 Lithographic apparatus and lithographic product produced thereby TWI301565B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/135,655 US7161659B2 (en) 2005-04-08 2005-05-24 Dual stage lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
TW200705136A true TW200705136A (en) 2007-02-01
TWI301565B TWI301565B (en) 2008-10-01

Family

ID=37484043

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95118436A TWI301565B (en) 2005-05-24 2006-05-24 Lithographic apparatus and lithographic product produced thereby

Country Status (3)

Country Link
JP (1) JP4410216B2 (zh)
CN (2) CN1873542B (zh)
TW (1) TWI301565B (zh)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI497220B (zh) * 2008-12-19 2015-08-21 尼康股份有限公司 An exposure apparatus and an exposure method, and an element manufacturing method
TWI502284B (zh) * 2009-06-19 2015-10-01 尼康股份有限公司 移動體裝置、曝光裝置及裝置製造方法
US9316928B2 (en) 2010-08-25 2016-04-19 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and method of positioning an object table

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG178791A1 (en) 2006-02-21 2012-03-29 Nikon Corp Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method
WO2007097466A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation 測定装置及び方法、処理装置及び方法、パターン形成装置及び方法、露光装置及び方法、並びにデバイス製造方法
EP2003680B1 (en) 2006-02-21 2013-05-29 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
WO2008044612A1 (en) * 2006-09-29 2008-04-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US7903866B2 (en) 2007-03-29 2011-03-08 Asml Netherlands B.V. Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
CN104111587B (zh) * 2007-07-18 2017-01-11 株式会社尼康 测量方法、载台装置、及曝光装置
KR101470671B1 (ko) 2007-11-07 2014-12-08 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
KR100891307B1 (ko) 2007-11-22 2009-03-31 삼성전기주식회사 스테이지 장치 및 이를 구비한 노광 장치
US8115906B2 (en) 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
US8711327B2 (en) * 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8237916B2 (en) 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
TWI547769B (zh) * 2007-12-28 2016-09-01 尼康股份有限公司 An exposure apparatus, a moving body driving system, a pattern forming apparatus, and an exposure method, and an element manufacturing method
KR101670624B1 (ko) * 2008-04-30 2016-11-09 가부시키가이샤 니콘 스테이지 장치, 패턴 형성 장치, 노광 장치, 스테이지 구동 방법, 노광 방법, 그리고 디바이스 제조 방법
JP5195022B2 (ja) * 2008-05-23 2013-05-08 株式会社ニコン 位置計測装置及び位置計測方法、パターン形成装置及びパターン形成方法、露光装置及び露光方法、並びにデバイス製造方法
JP5612810B2 (ja) * 2008-05-23 2014-10-22 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
JP5262455B2 (ja) * 2008-09-01 2013-08-14 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US8294878B2 (en) * 2009-06-19 2012-10-23 Nikon Corporation Exposure apparatus and device manufacturing method
JP2011222726A (ja) 2010-04-08 2011-11-04 Elpida Memory Inc 半導体装置の製造方法、ウェハ処理システム及びプログラム
NL2008157A (en) 2011-02-22 2012-08-24 Asml Netherlands Bv Lithographic apparatus and lithographic projection method.
WO2014063995A1 (en) * 2012-10-24 2014-05-01 Asml Netherlands B.V. Substrate positioning system, lithographic apparatus and device manufacturing method
CN103034074B (zh) * 2012-12-26 2015-04-15 清华大学 一种带有浸液回收装置的光刻机硅片台双台交换系统
CN103034073B (zh) * 2012-12-26 2015-01-21 清华大学 带有浸液回收装置和激光干涉仪的硅片台双台交换系统
US9529280B2 (en) * 2013-12-06 2016-12-27 Kla-Tencor Corporation Stage apparatus for semiconductor inspection and lithography systems
TWI734799B (zh) * 2016-06-20 2021-08-01 日商尼康股份有限公司 具有失真匹配的密集線極紫外光微影系統以及將圖案轉移至工件上的方法
EP3696605A1 (en) * 2019-02-13 2020-08-19 ASML Netherlands B.V. Method and lithograph apparatus for measuring a radiation beam
CN113050380B (zh) * 2019-12-27 2021-12-10 上海微电子装备（集团）股份有限公司 浸没头的集成工装及其集成方法和光刻机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1244018C (zh) * 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
EP1111471B1 (en) * 1999-12-21 2005-11-23 ASML Netherlands B.V. Lithographic projection apparatus with collision preventing device
JP2002289515A (ja) * 2000-12-28 2002-10-04 Nikon Corp 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法
CN1200321C (zh) * 2003-08-29 2005-05-04 清华大学 步进投影光刻机双台轮换曝光超精密定位硅片台系统

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI497220B (zh) * 2008-12-19 2015-08-21 尼康股份有限公司 An exposure apparatus and an exposure method, and an element manufacturing method
TWI502284B (zh) * 2009-06-19 2015-10-01 尼康股份有限公司 移動體裝置、曝光裝置及裝置製造方法
US9316928B2 (en) 2010-08-25 2016-04-19 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and method of positioning an object table
US9915880B2 (en) 2010-08-25 2018-03-13 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and method of positioning an object table

Also Published As

Publication number Publication date
TWI301565B (en) 2008-10-01
CN102096339B (zh) 2013-10-09
JP4410216B2 (ja) 2010-02-03
JP2006332656A (ja) 2006-12-07
CN1873542B (zh) 2011-04-13
CN1873542A (zh) 2006-12-06
CN102096339A (zh) 2011-06-15

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