TW200705112A - Data generating method, data generating apparatus, and program - Google Patents

Data generating method, data generating apparatus, and program

Info

Publication number
TW200705112A
TW200705112A TW095112429A TW95112429A TW200705112A TW 200705112 A TW200705112 A TW 200705112A TW 095112429 A TW095112429 A TW 095112429A TW 95112429 A TW95112429 A TW 95112429A TW 200705112 A TW200705112 A TW 200705112A
Authority
TW
Taiwan
Prior art keywords
data generating
data
writing
tone
tone values
Prior art date
Application number
TW095112429A
Other languages
English (en)
Inventor
Yoshiyuki Taniguchi
Tatsuo Morimoto
Akira Nakada
Tadahiro Ohmi
Original Assignee
Univ Tohoku
Univ Kumamoto
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Tohoku, Univ Kumamoto filed Critical Univ Tohoku
Publication of TW200705112A publication Critical patent/TW200705112A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW095112429A 2005-04-07 2006-04-07 Data generating method, data generating apparatus, and program TW200705112A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005110819A JP4691653B2 (ja) 2005-04-07 2005-04-07 データ生成方法、データ生成装置、及びプログラム

Publications (1)

Publication Number Publication Date
TW200705112A true TW200705112A (en) 2007-02-01

Family

ID=37086984

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095112429A TW200705112A (en) 2005-04-07 2006-04-07 Data generating method, data generating apparatus, and program

Country Status (4)

Country Link
US (1) US7971159B2 (zh)
JP (1) JP4691653B2 (zh)
TW (1) TW200705112A (zh)
WO (1) WO2006109709A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8539395B2 (en) 2010-03-05 2013-09-17 Micronic Laser Systems Ab Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
US11681228B2 (en) * 2018-06-19 2023-06-20 Ev Group E. Thallner Gmbh Method and apparatus for illuminating image points
CN110441290B (zh) * 2019-08-16 2020-08-07 吉林大学 一种基于数字微镜的icp-aes及元素检测方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56128946A (en) * 1980-03-14 1981-10-08 Fujitsu Ltd Photomask correcting method
JP2525794B2 (ja) * 1987-02-27 1996-08-21 大日本スクリ−ン製造株式会社 網点画像記録装置
SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
SE0104238D0 (sv) * 2001-12-14 2001-12-14 Micronic Laser Systems Ab Method and apparatus for patterning a workpiece
US7663734B2 (en) 2003-04-11 2010-02-16 Tadahiro Ohmi Pattern writing system and pattern writing method
JP2006021533A (ja) * 2004-06-18 2006-01-26 Oce Technologies Bv 露光装置、露光装置を用いた印刷装置、および、ノンインパクト印刷装置を調節するための方法

Also Published As

Publication number Publication date
US7971159B2 (en) 2011-06-28
JP4691653B2 (ja) 2011-06-01
WO2006109709A1 (ja) 2006-10-19
US20080189674A1 (en) 2008-08-07
JP2006292866A (ja) 2006-10-26

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