TW200703537A - Substrate processing apparatus and substrate housing method - Google Patents

Substrate processing apparatus and substrate housing method

Info

Publication number
TW200703537A
TW200703537A TW095109170A TW95109170A TW200703537A TW 200703537 A TW200703537 A TW 200703537A TW 095109170 A TW095109170 A TW 095109170A TW 95109170 A TW95109170 A TW 95109170A TW 200703537 A TW200703537 A TW 200703537A
Authority
TW
Taiwan
Prior art keywords
substrate
processing apparatus
substrate processing
housing method
transport means
Prior art date
Application number
TW095109170A
Other languages
English (en)
Other versions
TWI417977B (zh
Inventor
Katsuyuki Hashimoto
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200703537A publication Critical patent/TW200703537A/zh
Application granted granted Critical
Publication of TWI417977B publication Critical patent/TWI417977B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095109170A 2005-03-22 2006-03-17 基材處理裝置與基材收納方法 TWI417977B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005081607A JP2006269497A (ja) 2005-03-22 2005-03-22 基板処理装置及び基板収納方法

Publications (2)

Publication Number Publication Date
TW200703537A true TW200703537A (en) 2007-01-16
TWI417977B TWI417977B (zh) 2013-12-01

Family

ID=37015718

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095109170A TWI417977B (zh) 2005-03-22 2006-03-17 基材處理裝置與基材收納方法

Country Status (4)

Country Link
US (1) US7747343B2 (zh)
JP (1) JP2006269497A (zh)
CN (1) CN100533704C (zh)
TW (1) TWI417977B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8600150B2 (en) * 2006-02-13 2013-12-03 Samsung Electronics Co., Ltd. Wafer aligning apparatus and related method
JP4914761B2 (ja) * 2007-05-16 2012-04-11 オリンパス株式会社 外観検査装置
JP5303254B2 (ja) * 2008-12-15 2013-10-02 東京エレクトロン株式会社 異物除去方法及び記憶媒体
KR102238649B1 (ko) * 2014-09-16 2021-04-09 삼성전자주식회사 반도체 칩 본딩 장치
JP6985815B2 (ja) * 2017-05-09 2021-12-22 キヤノン株式会社 搬送装置、システム、および物品の製造方法
KR102624577B1 (ko) * 2020-10-28 2024-01-15 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
TW202238803A (zh) * 2021-02-26 2022-10-01 日商東京威力科創股份有限公司 搬運系統、搬運裝置及搬運方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07263518A (ja) 1994-03-18 1995-10-13 Fujitsu Ltd 半導体ウェハの搬送装置及び搬送方法並びに半導体ウェハ処理装置
JPH09102257A (ja) 1995-07-28 1997-04-15 Matsushita Electric Works Ltd 封止接点装置
US5822213A (en) * 1996-03-29 1998-10-13 Lam Research Corporation Method and apparatus for determining the center and orientation of a wafer-like object
US5980194A (en) * 1996-07-15 1999-11-09 Applied Materials, Inc. Wafer position error detection and correction system
TW350115B (en) * 1996-12-02 1999-01-11 Toyota Automatic Loom Co Ltd Misregistration detection device and method thereof
WO2001084606A1 (fr) * 2000-04-27 2001-11-08 Shin-Etsu Handotai Co., Ltd. Plaquette de semi-conducteur et dispositif pour procede de fabrication d'un dispositif a semi-conducteurs
US6327517B1 (en) * 2000-07-27 2001-12-04 Applied Materials, Inc. Apparatus for on-the-fly center finding and notch aligning for wafer handling robots
TW559855B (en) 2000-09-06 2003-11-01 Olympus Optical Co Wafer transfer apparatus
US6678055B2 (en) * 2001-11-26 2004-01-13 Tevet Process Control Technologies Ltd. Method and apparatus for measuring stress in semiconductor wafers
US6900877B2 (en) * 2002-06-12 2005-05-31 Asm American, Inc. Semiconductor wafer position shift measurement and correction
US20050151947A1 (en) * 2002-07-31 2005-07-14 Nikon Corporation Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method
KR100935291B1 (ko) * 2002-11-28 2010-01-06 도쿄엘렉트론가부시키가이샤 기판 처리 시스템 및 도포 현상 장치
JP3880589B2 (ja) * 2004-03-31 2007-02-14 キヤノン株式会社 位置計測装置、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
US20060215152A1 (en) 2006-09-28
CN1838398A (zh) 2006-09-27
TWI417977B (zh) 2013-12-01
JP2006269497A (ja) 2006-10-05
US7747343B2 (en) 2010-06-29
CN100533704C (zh) 2009-08-26

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees