TW200702459A - Method of manufacturing gray-tone blankmask and photomask - Google Patents

Method of manufacturing gray-tone blankmask and photomask

Info

Publication number
TW200702459A
TW200702459A TW095110664A TW95110664A TW200702459A TW 200702459 A TW200702459 A TW 200702459A TW 095110664 A TW095110664 A TW 095110664A TW 95110664 A TW95110664 A TW 95110664A TW 200702459 A TW200702459 A TW 200702459A
Authority
TW
Taiwan
Prior art keywords
gray
tone
light
blankmask
layer pattern
Prior art date
Application number
TW095110664A
Other languages
English (en)
Other versions
TWI319017B (en
Inventor
Kee-Soo Nam
Han-Sun Cha
Shin-Ju Yang
Hyoung-Jong Kang
Gi-Hun Ryu
Byoung-Wook Park
Original Assignee
S&S Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by S&S Tech Co Ltd filed Critical S&S Tech Co Ltd
Publication of TW200702459A publication Critical patent/TW200702459A/zh
Application granted granted Critical
Publication of TWI319017B publication Critical patent/TWI319017B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW095110664A 2005-07-05 2006-03-28 Method of manufacturing gray-tone blankmask and photomask TWI319017B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR20050060497 2005-07-05
KR20050092481 2005-09-30
KR20050105232 2005-11-04
KR20050127882 2005-12-22
KR1020060001480A KR100800301B1 (ko) 2005-07-05 2006-01-05 그레이톤 블랭크마스크 및 포토마스크 제조방법

Publications (2)

Publication Number Publication Date
TW200702459A true TW200702459A (en) 2007-01-16
TWI319017B TWI319017B (en) 2010-01-01

Family

ID=37871103

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095110664A TWI319017B (en) 2005-07-05 2006-03-28 Method of manufacturing gray-tone blankmask and photomask

Country Status (2)

Country Link
KR (1) KR100800301B1 (zh)
TW (1) TWI319017B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI400559B (zh) * 2007-01-11 2013-07-01 S&S Tech Co Ltd 灰度光罩基板及光罩製造方法
CN101315517A (zh) 2007-05-30 2008-12-03 北京京东方光电科技有限公司 像素沟道区的掩模版及用该掩模版形成的薄膜晶体管
KR100887172B1 (ko) * 2007-06-16 2009-03-10 주식회사 피케이엘 마스크 및 그 제조 방법
KR102089468B1 (ko) * 2012-09-04 2020-03-16 엘지디스플레이 주식회사 금속 산화물 반도체 층을 차광하는 광 흡수층을 구비한 박막 트랜지스터 기판 및 그 제조 방법
JP5982013B2 (ja) * 2012-12-27 2016-08-31 アルバック成膜株式会社 位相シフトマスクおよびその製造方法
CN113539797B (zh) * 2021-07-12 2023-03-24 武汉新芯集成电路制造有限公司 半导体器件及其制造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100340865B1 (ko) * 1999-11-05 2002-06-20 박종섭 반도체 소자의 콘택 형성용 마스크 및 그 제조방법
JP2003173015A (ja) * 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法
KR100472115B1 (ko) * 2002-07-16 2005-03-10 주식회사 에스앤에스텍 블랭크 마스크 및 그의 제조 방법
KR100885316B1 (ko) * 2002-10-18 2009-02-25 하이디스 테크놀로지 주식회사 액정표시소자용 판넬 아이디마크 형성방법
JP4345333B2 (ja) 2003-03-26 2009-10-14 凸版印刷株式会社 位相シフトマスク及びそれを用いたパターン転写法
TWI286663B (en) * 2003-06-30 2007-09-11 Hoya Corp Method for manufacturing gray tone mask, and gray tone mask
JP4210166B2 (ja) * 2003-06-30 2009-01-14 Ｈｏｙａ株式会社 グレートーンマスクの製造方法
JP4521694B2 (ja) * 2004-03-09 2010-08-11 Ｈｏｙａ株式会社 グレートーンマスク及び薄膜トランジスタの製造方法

Also Published As

Publication number Publication date
TWI319017B (en) 2010-01-01
KR20070005451A (ko) 2007-01-10
KR100800301B1 (ko) 2008-02-01

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