TW200636401A - Resist recycling device - Google Patents

Resist recycling device

Info

Publication number
TW200636401A
TW200636401A TW094123479A TW94123479A TW200636401A TW 200636401 A TW200636401 A TW 200636401A TW 094123479 A TW094123479 A TW 094123479A TW 94123479 A TW94123479 A TW 94123479A TW 200636401 A TW200636401 A TW 200636401A
Authority
TW
Taiwan
Prior art keywords
resist
recycling
alkali solution
recycle
separate
Prior art date
Application number
TW094123479A
Other languages
Chinese (zh)
Other versions
TWI313793B (en
Inventor
Masahiro Midorikawa
Kisaburo Niiyama
Takashi Yatabe
Kiyoshi Sugawara
Original Assignee
Tokyo Kakoki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Kakoki Co Ltd filed Critical Tokyo Kakoki Co Ltd
Publication of TW200636401A publication Critical patent/TW200636401A/en
Application granted granted Critical
Publication of TWI313793B publication Critical patent/TWI313793B/en

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00—Technologies for solid waste management
    • Y02W30/50—Reuse, recycling or recovery technologies
    • Y02W30/62—Plastics recycling; Rubber recycling

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Filtration Of Liquid (AREA)
  • Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)

Abstract

The objective of this invention is to provide a kind of resist recycling device. First it increases the recycling efficiency of resist and extends the lifetime of alkali solution and simplifies the cleaning operation. Second, it works without adding bubble elimination solvent and prevents the defect of circuit substrate. Third, it prevents the blocks of meshes and intensifies the density of meshes. Fourth, it compacts the device. The technical means for this invention is that the recycling device 11 of resist is used in the process of circuit substrate manufacturing. Resist A is separated, recycled from the mixture D of photosensitive resist A and alkali solution B. Furthermore, it is provided with pre-processing solution portion 13, resist condensing portion 14, resist recycling portion 15, bubble recycling portion 30, etc. First, the pre-processing portion 13 is to separate, recycle alkali solution B from the mixture D. Then, the resist condensing portion 14 is to condense resist A and separate, recycle the alkali solution B. Finally, the resist recycling portion 15 is to collect, recycle resist A and separate, recycle the alkali solution B.
TW94123479A 2005-04-15 2005-07-12 Resist recycling device TWI313793B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005118120A JP4099489B2 (en) 2005-04-15 2005-04-15 Resist collection device

Publications (2)

Publication Number Publication Date
TW200636401A true TW200636401A (en) 2006-10-16
TWI313793B TWI313793B (en) 2009-08-21

Family

ID=37469401

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94123479A TWI313793B (en) 2005-04-15 2005-07-12 Resist recycling device

Country Status (2)

Country Link
JP (1) JP4099489B2 (en)
TW (1) TWI313793B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI610969B (en) * 2016-03-29 2018-01-11 鋒霈環境科技股份有限公司 One-to-many light resistance recovery system and the controlling method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4790589B2 (en) * 2006-12-26 2011-10-12 パナソニック株式会社 Waste liquid treatment apparatus and treatment method
JP4673430B2 (en) * 2009-02-16 2011-04-20 東京化工機株式会社 Foam processing equipment
DE102009032217A1 (en) * 2009-07-06 2011-01-13 Gebr. Schmid Gmbh & Co. Method and device for the treatment of substrates
CN102114360A (en) * 2010-01-05 2011-07-06 东京化工机株式会社 Foam processing apparatus
JP5627404B2 (en) * 2010-11-15 2014-11-19 三菱製紙株式会社 Dry film resist thinning method
JP6659278B2 (en) * 2015-09-03 2020-03-04 日鉄日新製鋼株式会社 Masking cured film removing device and etching metal plate manufacturing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI610969B (en) * 2016-03-29 2018-01-11 鋒霈環境科技股份有限公司 One-to-many light resistance recovery system and the controlling method

Also Published As

Publication number Publication date
TWI313793B (en) 2009-08-21
JP2006300994A (en) 2006-11-02
JP4099489B2 (en) 2008-06-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees