TW200633793A - Substrate processing device - Google Patents

Substrate processing device

Info

Publication number
TW200633793A
TW200633793A TW094145250A TW94145250A TW200633793A TW 200633793 A TW200633793 A TW 200633793A TW 094145250 A TW094145250 A TW 094145250A TW 94145250 A TW94145250 A TW 94145250A TW 200633793 A TW200633793 A TW 200633793A
Authority
TW
Taiwan
Prior art keywords
iced
substrate
plasma
substrate processing
processing device
Prior art date
Application number
TW094145250A
Other languages
Chinese (zh)
Other versions
TWI276482B (en
Inventor
Satoshi Yamamoto
Original Assignee
Dainippon Screen Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg filed Critical Dainippon Screen Mfg
Publication of TW200633793A publication Critical patent/TW200633793A/en
Application granted granted Critical
Publication of TWI276482B publication Critical patent/TWI276482B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The present invention is to provide a substrate processing device in which treatment solution containing iced particles is directed to the surface of a substrate so as to process the substrate with desirable uniform treatment and without damage on the coating on the substrate. The substrate processing device comprises: a substrate processing unit for processing the substrate; an iced plasma producing device for adding iced particles into water; a mechanism for dissolving gas into iced plasma; a pressure pump and pressure tank for pressurizing the iced plasma; and an iced plasma supplying pipe for providing the substrate processing unit with pressurized iced plasma dissolved gas therein.
TW094145250A 2005-03-24 2005-12-20 Substrate treatment device TWI276482B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005085351A JP2006269714A (en) 2005-03-24 2005-03-24 Substrate treatment device

Publications (2)

Publication Number Publication Date
TW200633793A true TW200633793A (en) 2006-10-01
TWI276482B TWI276482B (en) 2007-03-21

Family

ID=37014386

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094145250A TWI276482B (en) 2005-03-24 2005-12-20 Substrate treatment device

Country Status (4)

Country Link
JP (1) JP2006269714A (en)
KR (1) KR100671774B1 (en)
CN (1) CN1836799A (en)
TW (1) TWI276482B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008310172A (en) 2007-06-15 2008-12-25 Fujinon Corp Image blur correction unit, image blur correction device, photographing device and portable apparatus
CN102161042A (en) * 2010-12-09 2011-08-24 武汉奋进电力技术有限公司 Granular ice charged water washing device
CN102052813B (en) * 2010-12-15 2012-11-21 浙江海洋学院 Miniaturized binary ice generator
CN102580954A (en) * 2011-12-27 2012-07-18 哈尔滨工业大学 Pipeline ice crystal flusher
CN104634034A (en) * 2015-02-15 2015-05-20 天津商业大学 Device for preparing ice slurry by use of spiral drawknife device
CN104826831B (en) * 2015-05-15 2016-10-19 北京七星华创电子股份有限公司 A kind of low temperature medicinal liquid cleans device
JP6235070B2 (en) * 2015-07-06 2017-11-22 芝浦メカトロニクス株式会社 Substrate processing apparatus and substrate processing method
CN105215015A (en) * 2015-10-13 2016-01-06 安徽松羽工程技术设备有限公司 A kind of cleaning device
JP7256053B2 (en) * 2019-03-27 2023-04-11 日本液炭株式会社 Cleaning agents containing CO2-enriched ice

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8511702D0 (en) * 1985-05-09 1985-06-19 Unilever Nv Producing ice confection product
JPH02246255A (en) * 1989-03-20 1990-10-02 Hitachi Ltd Semiconductor device
JP2000077828A (en) * 1998-08-27 2000-03-14 Fuji Seiki Mach Works Ltd Method for cleaning electric circuit board
KR100607765B1 (en) * 2002-09-17 2006-08-01 동부일렉트로닉스 주식회사 Apparatus for removing slurry stuck on the chemical-mechanical polisher

Also Published As

Publication number Publication date
KR20060103090A (en) 2006-09-28
CN1836799A (en) 2006-09-27
JP2006269714A (en) 2006-10-05
TWI276482B (en) 2007-03-21
KR100671774B1 (en) 2007-01-19

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees