TW200630757A - Rendering method and device - Google Patents

Rendering method and device

Info

Publication number
TW200630757A
TW200630757A TW094133888A TW94133888A TW200630757A TW 200630757 A TW200630757 A TW 200630757A TW 094133888 A TW094133888 A TW 094133888A TW 94133888 A TW94133888 A TW 94133888A TW 200630757 A TW200630757 A TW 200630757A
Authority
TW
Taiwan
Prior art keywords
position information
substrate
plotting
reference mark
wiring pattern
Prior art date
Application number
TW094133888A
Other languages
Chinese (zh)
Inventor
Takuya Hirashima
Takeshi Fujii
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200630757A publication Critical patent/TW200630757A/en

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Position Or Direction (AREA)

Abstract

In the case of plotting a plurality of small wiring pattern on one large substrate, high precise alignment is performed without affecting the formation of the substrate. Detecting a plurality of reference mark 12a disposed on a substrate 12 where a plurality of preset position information of reference mark is shown and obtaining a detected position information showing the position of the reference marks, then compensating, respectively, the plotting position information 12c showing positions of two wiring pattern p1, p2 disposed on the predetermined position on the substrate 12 according to the declination between detecting position information of the common reference mark 12a and position information of the reference mark, and arranging and plotting the wiring pattern p1, p2 on the substrate 12 according to the compensated plotting position information 12c.
TW094133888A 2004-09-30 2005-09-29 Rendering method and device TW200630757A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004287320 2004-09-30
JP2005069332 2005-03-11
JP2005247166A JP4588581B2 (en) 2004-09-30 2005-08-29 Drawing method and apparatus

Publications (1)

Publication Number Publication Date
TW200630757A true TW200630757A (en) 2006-09-01

Family

ID=37407141

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094133888A TW200630757A (en) 2004-09-30 2005-09-29 Rendering method and device

Country Status (2)

Country Link
JP (1) JP4588581B2 (en)
TW (1) TW200630757A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI771080B (en) * 2020-09-23 2022-07-11 日商斯庫林集團股份有限公司 Substrate position detection method, drawing method, substrate position detection apparatus and drawing apparatus

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6116456B2 (en) * 2013-09-25 2017-04-19 株式会社Ｓｃｒｅｅｎホールディングス Drawing method and drawing apparatus
JP6355544B2 (en) * 2014-12-15 2018-07-11 株式会社Ｓｃｒｅｅｎホールディングス Position measuring apparatus, data correcting apparatus, position measuring method and data correcting method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2578519B2 (en) * 1990-06-01 1997-02-05 株式会社日立製作所 Charged particle beam exposure system with position detection function by light beam
JP3309747B2 (en) * 1996-12-20 2002-07-29 株式会社日立製作所 Alignment method of ceramic multilayer wiring board and thin film pattern
JP2000122303A (en) * 1998-10-20 2000-04-28 Asahi Optical Co Ltd Plotting device
JP4203307B2 (en) * 2002-12-03 2008-12-24 独立行政法人科学技術振興機構 Pattern transfer method and exposure apparatus
JP2006251160A (en) * 2005-03-09 2006-09-21 Fuji Photo Film Co Ltd Drawing method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI771080B (en) * 2020-09-23 2022-07-11 日商斯庫林集團股份有限公司 Substrate position detection method, drawing method, substrate position detection apparatus and drawing apparatus

Also Published As

Publication number Publication date
JP2006285186A (en) 2006-10-19
JP4588581B2 (en) 2010-12-01

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