TW200628973A - Resist composition - Google Patents
Resist compositionInfo
- Publication number
- TW200628973A TW200628973A TW094142281A TW94142281A TW200628973A TW 200628973 A TW200628973 A TW 200628973A TW 094142281 A TW094142281 A TW 094142281A TW 94142281 A TW94142281 A TW 94142281A TW 200628973 A TW200628973 A TW 200628973A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- resist
- dipropylene glycol
- resist composition
- hydrogen atom
- Prior art date
Links
Landscapes
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
To provide a resist composition which not only improve the properties such as the dissolubility when the resist is prepared and the adhesiveness of the resist film during development but also improve the stability of the resist and has excellent safety. A resist composition comprises a resist component and an organic solvent which is at least one dipropylene glycol derivative selected from the group consisting of dipropylene glycol monoalkyl ether and dipropylene glycol alkyl ether acetate and the like, wherein the dipropylene glycol derivative is a structural isomer mixture comprising the structural isomers represented by formulae (1) to (4), , (wherein R1 represents an alkyl group or an aryl group, R2 represents hydrogen atom, an alkyl group, an aryl group, an acetyl group or a propionyl group, and R2' represents hydrogen atom, an acetyl group or a propionyl group.) wherein 30% by weight or more and less than 100% by weight of the structural isomer represented by formula (1) is contained.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004349853A JP2006162668A (en) | 2004-12-02 | 2004-12-02 | Resist composition |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200628973A true TW200628973A (en) | 2006-08-16 |
Family
ID=36664803
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094142281A TW200628973A (en) | 2004-12-02 | 2005-12-01 | Resist composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2006162668A (en) |
KR (1) | KR20060061907A (en) |
CN (1) | CN1782877A (en) |
TW (1) | TW200628973A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4593638B2 (en) * | 2008-02-18 | 2010-12-08 | ダイセル化学工業株式会社 | Method for producing ester solvent |
JP2014071373A (en) * | 2012-09-28 | 2014-04-21 | Asahi Kasei E-Materials Corp | Photosensitive resin composition |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63307836A (en) * | 1987-06-09 | 1988-12-15 | Daicel Chem Ind Ltd | Recovery of dipropylene glycol monomethyl ether |
JPH10186637A (en) * | 1996-12-26 | 1998-07-14 | Clariant Internatl Ltd | Radiation sensitive composition for roll coating |
JP4204751B2 (en) * | 2000-11-24 | 2009-01-07 | ダイセル化学工業株式会社 | Photoresist resin composition for printed wiring board |
JP4116342B2 (en) * | 2001-08-29 | 2008-07-09 | 関西ペイント株式会社 | Positive photosensitive coating composition, method for producing positive photosensitive resin, and pattern forming method |
JP2005234045A (en) * | 2004-02-17 | 2005-09-02 | Fujifilm Electronic Materials Co Ltd | Color resin composition |
-
2004
- 2004-12-02 JP JP2004349853A patent/JP2006162668A/en active Pending
-
2005
- 2005-11-16 CN CN 200510124725 patent/CN1782877A/en active Pending
- 2005-12-01 TW TW094142281A patent/TW200628973A/en unknown
- 2005-12-01 KR KR1020050116277A patent/KR20060061907A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP2006162668A (en) | 2006-06-22 |
CN1782877A (en) | 2006-06-07 |
KR20060061907A (en) | 2006-06-08 |
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