TW200627076A - Method for removing defect material of a lithography mask - Google Patents
Method for removing defect material of a lithography maskInfo
- Publication number
- TW200627076A TW200627076A TW094147731A TW94147731A TW200627076A TW 200627076 A TW200627076 A TW 200627076A TW 094147731 A TW094147731 A TW 094147731A TW 94147731 A TW94147731 A TW 94147731A TW 200627076 A TW200627076 A TW 200627076A
- Authority
- TW
- Taiwan
- Prior art keywords
- region
- lithography mask
- removing defect
- defect material
- absorber
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
- G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005004070A DE102005004070B3 (de) | 2005-01-28 | 2005-01-28 | Verfahren zum Entfernen von Defektmaterial einer Lithographiemaske |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200627076A true TW200627076A (en) | 2006-08-01 |
Family
ID=35929832
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094147731A TW200627076A (en) | 2005-01-28 | 2005-12-30 | Method for removing defect material of a lithography mask |
Country Status (7)
Country | Link |
---|---|
US (1) | US20070037071A1 (zh) |
EP (1) | EP1842098A1 (zh) |
JP (1) | JP2007534993A (zh) |
KR (1) | KR100841036B1 (zh) |
DE (1) | DE102005004070B3 (zh) |
TW (1) | TW200627076A (zh) |
WO (1) | WO2006079529A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10384238B2 (en) | 2007-09-17 | 2019-08-20 | Rave Llc | Debris removal in high aspect structures |
US10330581B2 (en) | 2007-09-17 | 2019-06-25 | Rave Llc | Debris removal from high aspect structures |
CN118192160A (zh) | 2017-07-21 | 2024-06-14 | 卡尔蔡司Smt有限责任公司 | 用于处理光刻掩模的多余材料的方法与设备 |
DE102021201669B4 (de) | 2021-02-22 | 2023-08-17 | Carl Zeiss Smt Gmbh | Verfahren und vorrichtung zum bearbeiten einer probe |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03139647A (ja) * | 1989-10-26 | 1991-06-13 | Fujitsu Ltd | マスクの修正方法 |
JP3377119B2 (ja) * | 1993-12-27 | 2003-02-17 | Hoya株式会社 | マスクパターンの欠陥修正方法 |
JP3015646B2 (ja) * | 1993-12-27 | 2000-03-06 | 株式会社東芝 | 位相シフトマスクの欠陥修正方法及び欠陥修正装置 |
US5882823A (en) * | 1997-05-21 | 1999-03-16 | International Business Machines Corporation | Fib repair method |
US6016357A (en) * | 1997-06-16 | 2000-01-18 | International Business Machines Corporation | Feedback method to repair phase shift masks |
JP3761681B2 (ja) * | 1997-08-19 | 2006-03-29 | 沖電気工業株式会社 | フォトマスク欠損欠陥修正方法 |
DE69840719D1 (de) * | 1998-05-18 | 2009-05-20 | Ibm | Methode zum Reparieren von Photomasken |
US6322672B1 (en) * | 2000-03-10 | 2001-11-27 | Fei Company | Method and apparatus for milling copper interconnects in a charged particle beam system |
US6933081B2 (en) * | 2002-05-15 | 2005-08-23 | Micron Technology, Inc. | Method for quartz bump defect repair with less substrate damage |
DE10244399B4 (de) * | 2002-09-24 | 2006-08-03 | Infineon Technologies Ag | Defekt-Reparatur-Verfahren zur Reparatur von Masken-Defekten |
DE10310136B4 (de) * | 2003-03-07 | 2007-05-03 | Infineon Technologies Ag | Maskensatz zur Projektion von jeweils auf den Masken des Satzes angeordneten und aufeinander abgestimmten Strukturmustern auf einen Halbleiterwafer |
US7150946B2 (en) * | 2004-01-08 | 2006-12-19 | Infineon Technologies Ag | Method for the repair of defects in photolithographic masks for patterning semiconductor wafers |
US20060147814A1 (en) * | 2005-01-03 | 2006-07-06 | Ted Liang | Methods for repairing an alternating phase-shift mask |
-
2005
- 2005-01-28 DE DE102005004070A patent/DE102005004070B3/de not_active Expired - Fee Related
- 2005-12-30 TW TW094147731A patent/TW200627076A/zh unknown
-
2006
- 2006-01-26 WO PCT/EP2006/000660 patent/WO2006079529A1/de active Application Filing
- 2006-01-26 KR KR1020067026053A patent/KR100841036B1/ko not_active IP Right Cessation
- 2006-01-26 JP JP2007510047A patent/JP2007534993A/ja active Pending
- 2006-01-26 EP EP06703614A patent/EP1842098A1/de active Pending
- 2006-08-28 US US11/510,701 patent/US20070037071A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1842098A1 (de) | 2007-10-10 |
KR20070042921A (ko) | 2007-04-24 |
DE102005004070B3 (de) | 2006-08-03 |
JP2007534993A (ja) | 2007-11-29 |
US20070037071A1 (en) | 2007-02-15 |
WO2006079529A1 (de) | 2006-08-03 |
KR100841036B1 (ko) | 2008-06-24 |
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