TW200625007A - Radiation sensitive composition for colored layer formation, color filter and color liquid crystal display panel - Google Patents

Radiation sensitive composition for colored layer formation, color filter and color liquid crystal display panel

Info

Publication number
TW200625007A
TW200625007A TW094123581A TW94123581A TW200625007A TW 200625007 A TW200625007 A TW 200625007A TW 094123581 A TW094123581 A TW 094123581A TW 94123581 A TW94123581 A TW 94123581A TW 200625007 A TW200625007 A TW 200625007A
Authority
TW
Taiwan
Prior art keywords
colored layer
layer formation
radiation sensitive
sensitive composition
liquid crystal
Prior art date
Application number
TW094123581A
Other languages
Chinese (zh)
Inventor
Takayoshi Koyama
Takahiro Iijima
Tomio Nagatsuka
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200625007A publication Critical patent/TW200625007A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

A radiation sensitive composition comprising colorant, alkali soluble resin, multifunctional monomers, and O-acyl oxime type photo-free radical generator for colored layer formation which produces neither undissolved matter nor scum on a pattern edge during development, causes neither chipping nor undercut of a pattern edge even under low exposure energy, and gives pixels and a black matrix.
TW094123581A 2004-07-26 2005-07-12 Radiation sensitive composition for colored layer formation, color filter and color liquid crystal display panel TW200625007A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004217720A JP4492238B2 (en) 2004-07-26 2004-07-26 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display panel

Publications (1)

Publication Number Publication Date
TW200625007A true TW200625007A (en) 2006-07-16

Family

ID=35904212

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094123581A TW200625007A (en) 2004-07-26 2005-07-12 Radiation sensitive composition for colored layer formation, color filter and color liquid crystal display panel

Country Status (3)

Country Link
JP (1) JP4492238B2 (en)
KR (1) KR100850170B1 (en)
TW (1) TW200625007A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414886B (en) * 2007-02-23 2013-11-11 Jsr Corp Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
TWI427408B (en) * 2007-03-13 2014-02-21 Jsr Corp Radiation-sensitive composition for forming colored layer
TWI818883B (en) * 2021-03-05 2023-10-11 日商旭化成股份有限公司 Photosensitive resin laminate and manufacturing method thereof

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4633582B2 (en) 2005-09-06 2011-02-16 東京応化工業株式会社 Photosensitive composition
SG140559A1 (en) * 2006-08-31 2008-03-28 Jsr Corp Radiation sensitive resin composition for forming a colored layer and color filter
WO2008084853A1 (en) * 2007-01-12 2008-07-17 Toyo Ink Mfg. Co., Ltd. Colored composition, color filter, and method for production of the color filter
JP5056025B2 (en) * 2007-01-22 2012-10-24 Ｊｓｒ株式会社 Radiation sensitive resin composition and color filter
CN101681102B (en) * 2007-12-19 2014-04-02 东洋油墨制造株式会社 Color composition, method for producing color filter, and color filter
JP5254650B2 (en) * 2008-03-28 2013-08-07 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5189392B2 (en) * 2008-03-28 2013-04-24 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5241289B2 (en) * 2008-03-31 2013-07-17 富士フイルム株式会社 Polymerizable composition, light-shielding color filter, and solid-state imaging device
JP5528677B2 (en) * 2008-03-31 2014-06-25 富士フイルム株式会社 Polymerizable composition, light-shielding color filter for solid-state image sensor, solid-state image sensor, and method for producing light-shielding color filter for solid-state image sensor
JP5189395B2 (en) * 2008-03-31 2013-04-24 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5512095B2 (en) * 2008-04-28 2014-06-04 富士フイルム株式会社 Photosensitive composition, photosensitive composition for solid-state imaging device, light-shielding color filter for solid-state imaging device, and solid-state imaging device
JP5688159B2 (en) * 2010-11-19 2015-03-25 エルジー・ケム・リミテッド Photosensitive composition containing an acrylate compound
CN104284888B (en) 2012-05-09 2017-10-27 巴斯夫欧洲公司 Oxime ester photoinitiators
CN107710060B (en) * 2016-01-26 2021-11-12 积水化学工业株式会社 Sealing agent for liquid crystal display element, vertical conduction material, and liquid crystal display element

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1395615B1 (en) * 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
TW200714651A (en) * 2002-10-28 2007-04-16 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
WO2004050653A2 (en) 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP4442292B2 (en) * 2003-06-10 2010-03-31 三菱化学株式会社 Photopolymerizable composition, color filter and liquid crystal display device
JP4437651B2 (en) * 2003-08-28 2010-03-24 新日鐵化学株式会社 Photosensitive resin composition and color filter using the same
JP2005202252A (en) * 2004-01-16 2005-07-28 Dainippon Printing Co Ltd Photosensitive coloring composition for solid-state imaging device color filter, solid-state imaging device color filter, solid-state imaging device and manufacturing method of solid-state imaging device color filter
TWI279644B (en) 2004-01-19 2007-04-21 Chi Mei Corp Photo-sensitive resin composite for black matrix
JP4830310B2 (en) * 2004-02-23 2011-12-07 三菱化学株式会社 Oxime ester-based compound, photopolymerizable composition, and color filter using the same
JP2005300994A (en) * 2004-04-13 2005-10-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
JP4448381B2 (en) * 2004-05-26 2010-04-07 東京応化工業株式会社 Photosensitive composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI414886B (en) * 2007-02-23 2013-11-11 Jsr Corp Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
TWI427408B (en) * 2007-03-13 2014-02-21 Jsr Corp Radiation-sensitive composition for forming colored layer
TWI818883B (en) * 2021-03-05 2023-10-11 日商旭化成股份有限公司 Photosensitive resin laminate and manufacturing method thereof

Also Published As

Publication number Publication date
JP2006039140A (en) 2006-02-09
KR20060046569A (en) 2006-05-17
KR100850170B1 (en) 2008-08-04
JP4492238B2 (en) 2010-06-30

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