TW200620555A - Method of manufacturing a thin film transistor substrate and stripping composition - Google Patents

Method of manufacturing a thin film transistor substrate and stripping composition

Info

Publication number
TW200620555A
TW200620555A TW094129706A TW94129706A TW200620555A TW 200620555 A TW200620555 A TW 200620555A TW 094129706 A TW094129706 A TW 094129706A TW 94129706 A TW94129706 A TW 94129706A TW 200620555 A TW200620555 A TW 200620555A
Authority
TW
Taiwan
Prior art keywords
thin film
film transistor
manufacturing
transistor substrate
stripping composition
Prior art date
Application number
TW094129706A
Other languages
Chinese (zh)
Other versions
TWI430400B (en
Inventor
Hong-Sick Park
Shi-Yul Kim
Jong-Hyun Choung
Won-Suk Shin
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of TW200620555A publication Critical patent/TW200620555A/en
Application granted granted Critical
Publication of TWI430400B publication Critical patent/TWI430400B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thin Film Transistor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Liquid Crystal (AREA)

Abstract

A method of manufacturing a thin film transistor substrate includes forming a transistor thin layer pattern, forming a protecting layer, forming a photoresist film, forming a pixel electrode and a conductive layer that are separated from each other, stripping a photoresist pattern to remove the conductive layer using a stripping composition and dissolving the conductive layer. The method of manufacturing a thin film transistor substrate is capable of improving an efficiency of manufacturing process of the thin film transistor substrate. In addition, the stripping composition is recycled.
TW094129706A 2004-08-30 2005-08-30 Method of manufacturing a thin film transistor substrate and stripping composition TWI430400B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20040068791 2004-08-30
KR1020050044153A KR101129433B1 (en) 2004-08-30 2005-05-25 Method of manufacturing thin film transistor substrate and stripping composition

Publications (2)

Publication Number Publication Date
TW200620555A true TW200620555A (en) 2006-06-16
TWI430400B TWI430400B (en) 2014-03-11

Family

ID=36139612

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094129706A TWI430400B (en) 2004-08-30 2005-08-30 Method of manufacturing a thin film transistor substrate and stripping composition

Country Status (3)

Country Link
KR (1) KR101129433B1 (en)
CN (2) CN101477969B (en)
TW (1) TWI430400B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5143731B2 (en) * 2006-06-21 2013-02-13 出光興産株式会社 Stripping composition, method for producing TFT substrate, and recycling method for stripping composition
KR101300183B1 (en) 2006-11-20 2013-08-26 삼성디스플레이 주식회사 Thin film transistor substrate and method for fabricating the same
KR102009545B1 (en) 2015-03-05 2019-10-21 동우 화인켐 주식회사 Resist stripper composition
KR102269328B1 (en) * 2015-03-12 2021-06-25 동우 화인켐 주식회사 Etchant composition and method for fabricating metal pattern

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6326130B1 (en) * 1993-10-07 2001-12-04 Mallinckrodt Baker, Inc. Photoresist strippers containing reducing agents to reduce metal corrosion
KR100249387B1 (en) * 1997-12-02 2000-03-15 김영환 Foreign substance removal method for dry etching apparatus for semiconductor manufacturing
JP2000284506A (en) * 1999-03-31 2000-10-13 Sharp Corp Photoresist stripper composition and stripping method
KR100874173B1 (en) * 2001-03-27 2008-12-15 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 An aqueous cleaning composition containing a copper specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates.
KR20040009100A (en) * 2002-07-22 2004-01-31 삼성전자주식회사 Photoresist stripper recycling method
US8236485B2 (en) * 2002-12-20 2012-08-07 Advanced Technology Materials, Inc. Photoresist removal

Also Published As

Publication number Publication date
KR101129433B1 (en) 2012-03-26
CN1744300A (en) 2006-03-08
CN101477969A (en) 2009-07-08
CN101477969B (en) 2010-12-22
TWI430400B (en) 2014-03-11
KR20060048092A (en) 2006-05-18
CN100533710C (en) 2009-08-26

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