TW200619854A - Patterning process, film-forming process, electroluminescence device manufacturing process, electroluminescence device, and electroluminescence display apparatus - Google Patents

Patterning process, film-forming process, electroluminescence device manufacturing process, electroluminescence device, and electroluminescence display apparatus

Info

Publication number
TW200619854A
TW200619854A TW094133142A TW94133142A TW200619854A TW 200619854 A TW200619854 A TW 200619854A TW 094133142 A TW094133142 A TW 094133142A TW 94133142 A TW94133142 A TW 94133142A TW 200619854 A TW200619854 A TW 200619854A
Authority
TW
Taiwan
Prior art keywords
electroluminescence device
patterning
electroluminescence
film
display apparatus
Prior art date
Application number
TW094133142A
Other languages
English (en)
Inventor
Takashi Fukuchi
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Publication of TW200619854A publication Critical patent/TW200619854A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
TW094133142A 2004-09-24 2005-09-23 Patterning process, film-forming process, electroluminescence device manufacturing process, electroluminescence device, and electroluminescence display apparatus TW200619854A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004278158 2004-09-24
JP2005166848 2005-06-07

Publications (1)

Publication Number Publication Date
TW200619854A true TW200619854A (en) 2006-06-16

Family

ID=38156904

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094133142A TW200619854A (en) 2004-09-24 2005-09-23 Patterning process, film-forming process, electroluminescence device manufacturing process, electroluminescence device, and electroluminescence display apparatus

Country Status (7)

Country Link
US (1) US20070264590A1 (zh)
EP (1) EP1807733A2 (zh)
JP (1) JP2007018994A (zh)
KR (1) KR20070059175A (zh)
CN (1) CN101027608A (zh)
TW (1) TW200619854A (zh)
WO (1) WO2006033470A2 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4563265B2 (ja) * 2005-06-29 2010-10-13 大日本印刷株式会社 有機機能性素子用基板、および有機機能性素子
JP5297072B2 (ja) * 2008-04-14 2013-09-25 ローム株式会社 有機発光装置及び有機発光装置の製造方法
CN103263906A (zh) * 2013-05-16 2013-08-28 陕西科技大学 一种纳米晶氧化锡光催化剂及其制备方法
WO2015065649A1 (en) 2013-10-30 2015-05-07 California Institute Of Technology Direct photopatterning of robust and diverse materials
US9908783B2 (en) 2014-01-22 2018-03-06 California Institute Of Technology Methods for producing crystalline microporous solids with the RTH topology and compositions derived from the same
CN110459677B (zh) * 2014-08-01 2022-11-22 正交公司 有机电子装置的光刻法图案化
CN104218190B (zh) 2014-08-26 2017-02-15 京东方科技集团股份有限公司 有机电致发光器件及其制造方法、显示装置
CN107873015B (zh) 2015-06-01 2021-12-24 加州理工学院 具有新的cit-13拓扑结构的晶体锗硅酸盐材料及其制备方法
US10828625B2 (en) 2015-06-01 2020-11-10 California Institute Of Technology Crystalline germanosilicate materials of new CIT-13 topology and methods of preparing the same
CN107275513B (zh) * 2017-05-31 2020-07-10 上海天马有机发光显示技术有限公司 Oled器件阴极和显示面板的制作方法、显示面板及显示装置
CN108538886B (zh) * 2018-03-28 2020-08-25 京东方科技集团股份有限公司 像素界定层及制造方法、显示基板、显示装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1376228B1 (en) * 1997-08-08 2010-10-13 Dai Nippon Printing Co., Ltd. Process for producing a lens
US6156393A (en) * 1997-11-12 2000-12-05 John C. Polanyi Method of molecular-scale pattern imprinting at surfaces
US6818153B2 (en) * 1998-10-13 2004-11-16 Peter Burnell-Jones Photocurable thermosetting luminescent resins
KR20010085420A (ko) * 2000-02-23 2001-09-07 기타지마 요시토시 전계발광소자와 그 제조방법
US6617186B2 (en) * 2000-09-25 2003-09-09 Dai Nippon Printing Co., Ltd. Method for producing electroluminescent element
JP4094217B2 (ja) * 2000-10-31 2008-06-04 大日本印刷株式会社 濡れ性可変皮膜用組成物、及び、濡れ性可変皮膜
KR100877708B1 (ko) * 2001-03-29 2009-01-07 다이니폰 인사츠 가부시키가이샤 패턴 형성체의 제조 방법 및 그것에 사용하는 포토마스크
JP4217868B2 (ja) * 2002-05-07 2009-02-04 大日本印刷株式会社 エレクトロルミネッセント素子およびその製造方法
JP4165692B2 (ja) * 2002-08-05 2008-10-15 大日本印刷株式会社 エレクトロルミネッセント素子の製造方法
JP4289852B2 (ja) * 2002-09-18 2009-07-01 大日本印刷株式会社 エレクトロルミネッセント素子の製造方法
JP4945893B2 (ja) * 2004-11-11 2012-06-06 大日本印刷株式会社 パターン形成用基板

Also Published As

Publication number Publication date
CN101027608A (zh) 2007-08-29
EP1807733A2 (en) 2007-07-18
KR20070059175A (ko) 2007-06-11
JP2007018994A (ja) 2007-01-25
US20070264590A1 (en) 2007-11-15
WO2006033470A3 (en) 2006-05-18
WO2006033470A2 (en) 2006-03-30

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