TW200619418A - Pretreatment agent for electroless plating and copper clad laminate for a flexible circuit board - Google Patents
Pretreatment agent for electroless plating and copper clad laminate for a flexible circuit boardInfo
- Publication number
- TW200619418A TW200619418A TW094129458A TW94129458A TW200619418A TW 200619418 A TW200619418 A TW 200619418A TW 094129458 A TW094129458 A TW 094129458A TW 94129458 A TW94129458 A TW 94129458A TW 200619418 A TW200619418 A TW 200619418A
- Authority
- TW
- Taiwan
- Prior art keywords
- circuit board
- flexible circuit
- electroless plating
- clad laminate
- copper clad
- Prior art date
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title abstract 6
- 229910052802 copper Inorganic materials 0.000 title abstract 6
- 239000010949 copper Substances 0.000 title abstract 6
- 239000003795 chemical substances by application Substances 0.000 title abstract 5
- 238000007772 electroless plating Methods 0.000 title abstract 2
- 238000007747 plating Methods 0.000 abstract 3
- 239000006087 Silane Coupling Agent Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229920001187 thermosetting polymer Polymers 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/208—Multistep pretreatment with use of metal first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
This invention provides an electroless plating-pretreating agent for a copper clad laminate used in a flexible circuit board, and a copper clad laminate used in a flexible circuit board made by using the above electroless plating-pretreating agent. Said electroless-pretreating agent is characterized in comprising a silane coupling agent having metal-capturing ability and a thermosetting resin. Said copper clad laminate used in a flexible circuit board is characterized in forming a copper plating layer by electroless plating on a substrate which has been treated with said electroless plating-pretreating agent, and then forming another copper plating layer thereon by electric plating.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004263861 | 2004-09-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200619418A true TW200619418A (en) | 2006-06-16 |
TWI305237B TWI305237B (en) | 2009-01-11 |
Family
ID=36036235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94129458A TWI305237B (en) | 2004-09-10 | 2005-08-29 | Pretreatment agent for electroless plating and copper clad laminate for a flexible circuit board |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070269680A1 (en) |
JP (2) | JP4859232B2 (en) |
KR (1) | KR20070088611A (en) |
TW (1) | TWI305237B (en) |
WO (1) | WO2006027947A1 (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100764294B1 (en) * | 2003-11-05 | 2007-10-05 | 닛코킨조쿠 가부시키가이샤 | Inkjet ink composition |
KR100796894B1 (en) * | 2004-01-29 | 2008-01-22 | 닛코킨조쿠 가부시키가이샤 | Pretreating agent for electroless plating, method of electroless plating using the same and product of electroless plating |
JP2008007849A (en) * | 2006-06-01 | 2008-01-17 | Nippon Paint Co Ltd | Primer composition for electroless plating and electroless plating method |
JP5092391B2 (en) * | 2006-12-22 | 2012-12-05 | 富士通株式会社 | Resin casing and manufacturing method thereof |
JP2008210892A (en) * | 2007-02-23 | 2008-09-11 | Sekisui Chem Co Ltd | Method for manufacturing electromagnetic wave shielding material, and electromagnetic wave shielding material |
JP5461988B2 (en) * | 2007-07-02 | 2014-04-02 | 株式会社Jcu | Metal laminated polyimide substrate and manufacturing method thereof |
DE102007051930A1 (en) | 2007-10-29 | 2009-04-30 | Leonhard Kurz Gmbh & Co. Kg | Method for producing a printed conductor structure |
KR20090067744A (en) | 2007-12-21 | 2009-06-25 | 엘지전자 주식회사 | Flexible film |
KR100947608B1 (en) | 2007-12-28 | 2010-03-15 | 엘지전자 주식회사 | Flexible Film |
KR100965327B1 (en) * | 2008-02-28 | 2010-06-22 | 엘에스엠트론 주식회사 | Flexible copper clad laminate improved in vibration resistance property |
JP5404452B2 (en) * | 2010-01-28 | 2014-01-29 | 京セラ株式会社 | Wiring board manufacturing method and wiring board |
US8814997B2 (en) * | 2010-03-23 | 2014-08-26 | Jx Nippon Mining & Metals Corporation | Electroless plating pretreatment agent, electroless plating method using same, and electroless plated object |
JP6020833B2 (en) * | 2011-04-12 | 2016-11-02 | 日産化学工業株式会社 | Electroless plating base material containing hyperbranched polymer and fine metal particles |
US9499912B2 (en) | 2014-05-26 | 2016-11-22 | Rohm And Haas Electronic Materials Llc | Copolymers of diglycidyl ether terminated polysiloxane compounds and non-aromatic polyamines |
JP6352059B2 (en) * | 2014-06-05 | 2018-07-04 | 奥野製薬工業株式会社 | Composition for forming electroless plating underlayer |
JP6578204B2 (en) * | 2014-12-29 | 2019-09-18 | 四国化成工業株式会社 | Surface treatment agent, resin composition and use thereof |
CN104789949B (en) * | 2015-04-27 | 2017-03-01 | 电子科技大学 | The collocation method of self-catalysis electroless copper epoxy resin solution and electroless copper plating method |
ES2646237B2 (en) | 2017-09-28 | 2018-07-27 | Avanzare Innovacion Tecnologica S.L. | Formulation for the biting of polymeric materials prior to coating them |
CN110527990B (en) * | 2019-09-04 | 2022-05-24 | 中国科学院深圳先进技术研究院 | Modifier, glass substrate with metal layer, and preparation method and application of glass substrate |
KR102538130B1 (en) * | 2021-01-26 | 2023-05-30 | 도레이첨단소재 주식회사 | Copper clad layer, electronic device including the same, and method of preparing the copper clad layer |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3618760A (en) * | 1968-10-07 | 1971-11-09 | Diamond Shamrock Corp | Storage stable one-part polymercaptan compositions |
JPS531233A (en) * | 1976-06-25 | 1978-01-09 | Toshiba Corp | Adhesives for chemical plating |
JPS5952701B2 (en) * | 1977-09-05 | 1984-12-21 | ソニー株式会社 | Metsuki method |
JPS62250086A (en) * | 1986-04-22 | 1987-10-30 | Nippon Soda Co Ltd | Substrate adhesive for electroless plating |
JPS6429479A (en) * | 1987-07-23 | 1989-01-31 | Ibiden Co Ltd | Adhesive composition for electroless plating |
DE4036591A1 (en) * | 1990-11-16 | 1992-05-21 | Bayer Ag | PRIMER FOR METALLIZING SUBSTRATE SURFACES |
JP2991794B2 (en) * | 1991-01-21 | 1999-12-20 | 住友ベークライト株式会社 | Manufacturing method of flexible printed circuit board |
JPH05239657A (en) * | 1992-02-27 | 1993-09-17 | Mitsubishi Gas Chem Co Inc | Production of moisture resistant copper clad substrate |
JPH06334334A (en) * | 1993-05-20 | 1994-12-02 | Sumitomo Bakelite Co Ltd | Manufacture of printed wiring board |
JP2751881B2 (en) * | 1995-08-02 | 1998-05-18 | 有限会社さくらホビークラフト | How to make a decorative body |
JP3277463B2 (en) * | 1998-07-07 | 2002-04-22 | 株式会社ジャパンエナジー | Metal plating pretreatment agent and metal plating method using the same |
US6440576B1 (en) * | 1999-02-03 | 2002-08-27 | Ube Industries, Ltd. | Metal plated aromatic polyimide film |
JP2001303254A (en) * | 2000-04-24 | 2001-10-31 | Mitsuboshi Belting Ltd | Pattern plating method for glass substrate surface and pattern plated glass substrate |
US6780467B2 (en) * | 2000-04-25 | 2004-08-24 | Nikko Materials Co., Ltd. | Plating pretreatment agent and metal plating method using the same |
US7179741B2 (en) * | 2002-04-23 | 2007-02-20 | Nikko Materials Co., Ltd. | Electroless plating method and semiconductor wafer on which metal plating layer is formed |
KR100764294B1 (en) * | 2003-11-05 | 2007-10-05 | 닛코킨조쿠 가부시키가이샤 | Inkjet ink composition |
KR100796894B1 (en) * | 2004-01-29 | 2008-01-22 | 닛코킨조쿠 가부시키가이샤 | Pretreating agent for electroless plating, method of electroless plating using the same and product of electroless plating |
-
2005
- 2005-08-22 JP JP2006535103A patent/JP4859232B2/en active Active
- 2005-08-22 KR KR20077008060A patent/KR20070088611A/en not_active Application Discontinuation
- 2005-08-22 US US11/662,046 patent/US20070269680A1/en not_active Abandoned
- 2005-08-22 WO PCT/JP2005/015228 patent/WO2006027947A1/en active Application Filing
- 2005-08-29 TW TW94129458A patent/TWI305237B/en active
-
2011
- 2011-09-30 JP JP2011216833A patent/JP2012007244A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JPWO2006027947A1 (en) | 2008-07-31 |
JP4859232B2 (en) | 2012-01-25 |
US20070269680A1 (en) | 2007-11-22 |
TWI305237B (en) | 2009-01-11 |
WO2006027947A1 (en) | 2006-03-16 |
JP2012007244A (en) | 2012-01-12 |
KR20070088611A (en) | 2007-08-29 |
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