JP4859232B2 - Electroless plating pretreatment agent and copper-clad laminate for flexible substrate - Google Patents
Electroless plating pretreatment agent and copper-clad laminate for flexible substrate Download PDFInfo
- Publication number
- JP4859232B2 JP4859232B2 JP2006535103A JP2006535103A JP4859232B2 JP 4859232 B2 JP4859232 B2 JP 4859232B2 JP 2006535103 A JP2006535103 A JP 2006535103A JP 2006535103 A JP2006535103 A JP 2006535103A JP 4859232 B2 JP4859232 B2 JP 4859232B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- electroless plating
- pretreatment agent
- clad laminate
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000007772 electroless plating Methods 0.000 title claims description 30
- 239000003795 chemical substances by application Substances 0.000 title claims description 29
- 239000000758 substrate Substances 0.000 title claims description 22
- 238000007747 plating Methods 0.000 claims description 36
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 26
- 229910052802 copper Inorganic materials 0.000 claims description 26
- 239000010949 copper Substances 0.000 claims description 26
- -1 azole compound Chemical class 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 229920005989 resin Polymers 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 11
- 229920001187 thermosetting polymer Polymers 0.000 claims description 11
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims description 7
- KAESVJOAVNADME-UHFFFAOYSA-N 1H-pyrrole Natural products C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 7
- 239000003822 epoxy resin Substances 0.000 claims description 7
- 229920000647 polyepoxide Polymers 0.000 claims description 7
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 claims description 6
- 239000004593 Epoxy Substances 0.000 claims description 6
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 5
- 230000002000 scavenging effect Effects 0.000 claims description 5
- 238000009713 electroplating Methods 0.000 claims description 3
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 claims 1
- 229910000510 noble metal Inorganic materials 0.000 description 16
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 11
- 239000000344 soap Substances 0.000 description 11
- 229920001721 polyimide Polymers 0.000 description 10
- 239000003960 organic solvent Substances 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- 230000032683 aging Effects 0.000 description 8
- 235000014113 dietary fatty acids Nutrition 0.000 description 8
- 239000000194 fatty acid Substances 0.000 description 8
- 229930195729 fatty acid Natural products 0.000 description 8
- 150000004665 fatty acids Chemical class 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 150000002736 metal compounds Chemical class 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 3
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- RSWGJHLUYNHPMX-UHFFFAOYSA-N 1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylic acid Chemical compound C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 1H-imidazole silane Chemical compound [SiH4].N1C=NC=C1 ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 0.000 description 2
- JYZJYKOZGGEXSX-UHFFFAOYSA-N 2-hydroxymyristic acid Chemical compound CCCCCCCCCCCCC(O)C(O)=O JYZJYKOZGGEXSX-UHFFFAOYSA-N 0.000 description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 2
- YPIFGDQKSSMYHQ-UHFFFAOYSA-N 7,7-dimethyloctanoic acid Chemical compound CC(C)(C)CCCCCC(O)=O YPIFGDQKSSMYHQ-UHFFFAOYSA-N 0.000 description 2
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- YAQXGBBDJYBXKL-UHFFFAOYSA-N iron(2+);1,10-phenanthroline;dicyanide Chemical compound [Fe+2].N#[C-].N#[C-].C1=CN=C2C3=NC=CC=C3C=CC2=C1.C1=CN=C2C3=NC=CC=C3C=CC2=C1 YAQXGBBDJYBXKL-UHFFFAOYSA-N 0.000 description 2
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 150000002941 palladium compounds Chemical class 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical compound C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- BAXOFTOLAUCFNW-UHFFFAOYSA-N 1H-indazole Chemical compound C1=CC=C2C=NNC2=C1 BAXOFTOLAUCFNW-UHFFFAOYSA-N 0.000 description 1
- QJGNSTCICFBACB-UHFFFAOYSA-N 2-octylpropanedioic acid Chemical compound CCCCCCCCC(C(O)=O)C(O)=O QJGNSTCICFBACB-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 229920001646 UPILEX Polymers 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical compound NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- CQDAMYNQINDRQC-UHFFFAOYSA-N oxatriazole Chemical compound C1=NN=NO1 CQDAMYNQINDRQC-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- YGNGABUJMXJPIJ-UHFFFAOYSA-N thiatriazole Chemical compound C1=NN=NS1 YGNGABUJMXJPIJ-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000010005 wet pre-treatment Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1639—Substrates other than metallic, e.g. inorganic or organic or non-conductive
- C23C18/1641—Organic substrates, e.g. resin, plastic
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/208—Multistep pretreatment with use of metal first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
Description
【技術分野】
【0001】
本発明は、プリント配線用フレキシブル基板の素材等となる銅張り積層体の基材に用いる無電解めっき前処理剤、及びそれを用いて作製されたフレキシブル基板用銅張り積層体に関する。
【背景技術】
【0002】
ポリイミド基板は、電子部品用の絶縁基板材料として多用されている。最近では電子機器の薄型化、小型化に伴い、ポリイミドフィルムに直接金属層を形成した、より自由度の高い2層銅ポリイミド基板が注目されているが、この基板は、ポリイミドフィルムと金属層の常態での初期密着力は実用レベルだが、耐熱・高温高湿環境での密着力などの特性が不安視されている。
【0003】
また、ポリイミドフィルムのフレキシブル銅張り積層板について、金属層をスパッタリング法により製造する方法が例えば特許文献1に開示されている。しかしこの方法ではコスト高であり、耐熱・高温高湿環境での密着力は満足できるものではなかった。
【0004】
ポリイミドフィルムと金属層の密着性を向上するための方法としてはプラズマ、UV等の乾式プロセス、アルカリ等での湿式プロセスがあるが、使用液の安全性・作業性や、過度に処理すると金属層表面に凹凸ができ、微細配線形成に悪影響を与える可能性がある。
【0005】
また、特許文献2には、ポリイミドフィルムに樹脂組成物被膜を形成する工程、該被膜活性化工程、触媒付与工程、触媒活性化工程、無電解金属めっき工程の5工程からなる無電解銅めっきを行なった後電気銅めっきを行う方法が記載されている。この方法は密着付与層として樹脂組成物層を生成させることを主題としており、その結果樹脂組成物層の膜厚は1〜20μmを有し、工程が煩雑である。
【特許文献1】
特開平9−136378号公報
【特許文献2】
特開2001−168496号公報
【発明の開示】
【発明が解決しようとする課題】
本発明は、基材と銅めっき層の常態での初期密着力、及び耐熱エージング試験(大気中、150℃、168時間)での密着力が0.4kgf/cm以上となるフレキシブル基板用銅張り積層体に用いる無電解めっき前処理液、及び該無電解めっき前処理液を用いて作製されたフレキシブル基板用銅張り積層体を提供することを目的とする。
【課題を解決するための手段】
本発明者らは、上記課題について鋭意検討した結果、フレキシブル基板用銅張り積層体の無電解めっき前処理剤として、金属捕捉能を有するシランカップリング剤と熱硬化性樹脂とを含む有機溶媒溶液からなる無電解めっき前処理剤を用いることにより、上記課題を解決することができることを見出した。即ち、本発明は以下の通りである。
【0008】
(1)フレキシブル基板用銅張り積層体の基材に用いる無電解めっき前処理剤であって、アゾール系化合物またはアミン化合物とエポキシ系化合物との反応により得られる金属捕捉能を有するシランカップリング剤、またはγ−アミノプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、N−β(アミノエチル)γ−アミノプロピルトリメトキシシラン、N−β(アミノエチル)γ−アミノプロピルトリエトキシシラン、γ−メルカプトプロピルトリメトキシシランから選ばれる金属捕捉能を有するシランカップリング剤と、熱硬化性樹脂とを含むことを特徴とする無電解めっき前処理剤。
(2)前記熱硬化性樹脂がエポキシ樹脂であることを特徴とする前記(1)記載の無電解めっき前処理剤。
(3)基材を前記(1)又は(2)記載の無電解めっき前処理剤で処理した後、無電解めっきにより銅めっき層を形成し、その上に電気めっきにより銅めっき層を形成したことを特徴とするフレキシブル基板用銅張り積層体。
【発明の効果】
本発明の無電解めっき前処理剤を用いて基材を処理し、その後無電解銅めっき層、電気銅めっき層を積層したフレキシブル基板用銅張り積層体は、基材と銅めっき層の常態での初期密着力、及び耐熱エージング試験(大気中、150℃、168時間)での密着力が0.4kgf/cm以上となる、密着性に優れた2層銅張りフレキシブル基板用銅張り積層体となる。基材表面へは乾式・湿式前処理を全く行なわずに密着力を付与できる。
【発明を実施するための最良の形態】
本発明の無電解めっき前処理剤は、金属捕捉能を有するシランカップリング剤と熱硬化性樹脂とを含む。
【0013】
金属捕捉能を有するシランカップリング剤を添加することにより、被めっき面に対してシランカップリング剤を介して貴金属触媒をより均一に、より確実に固着することができる。
【0014】
前記シランカップリング剤として、好ましいものはアゾール系化合物またはアミン化合物とエポキシ系化合物との反応により得られるものである。
アゾール系化合物としては、イミダゾール、オキサゾール、チアゾール、セレナゾール、ピラゾール、イソオキサゾール、イソチアゾール、トリアゾール、オキサジアゾール、チアジアゾール、テトラゾール、オキサトリアゾール、チアトリアゾール、ベンダゾール、インダゾール、ベンズイミダゾール、ベンゾトリアゾールなどが挙げられる。これらに制限されるものではないが、イミダゾールが特に好ましい。
【0015】
また、アミン化合物としては、例えばプロピルアミン等の飽和炭化水素アミン、ビニルアミン等の不飽和炭化水素アミン、フェニルアミン等の芳香族アミン等を挙げることができる。
【0016】
また前記シランカップリング剤とは、前記アゾール系化合物またはアミン化合物由来の貴金属捕捉基の他に、−SiX1X2X3基を有する化合物であり、X1、X2、X3はアルキル基、ハロゲンやアルコキシ基などを意味し、被めっき物への固定が可能な官能基であれば良い。X1、X2、X3は同一でもまた異なっていても良い。
【0017】
前記シランカップリング剤は、前記アゾール系化合物またはアミン化合物とエポキシシラン化合物を反応させることにより得ることができる。
【0018】
このようなエポキシシラン化合物としては、
【化1】
(式中、R1、R2は水素または炭素数が1〜3のアルキル基、nは0〜3)
で示されるエポキシカップリング剤が好ましい。
【0019】
前記アゾール系化合物と前記エポキシ基含有シラン化合物との反応は、例えば特開平6−256358号公報に記載されている条件で行うことができる。
【0020】
例えば、80〜200℃でアゾール系化合物1モルに対して0.1〜10モルのエポキシ基含有シラン化合物を滴下して5分〜2時間反応させることにより得ることができる。その際、溶媒は特に不要であるが、クロロホルム、ジオキサン、メタノール、エタノール等の有機溶媒を用いてもよい。
【0021】
特に好ましい例としてイミダゾール化合物とエポキシシラン系化合物の反応を下記に示す。
【化2】
(式中、R1、R2は水素または炭素数が1〜3のアルキル基、R3は水素、または炭素数1〜20のアルキル基、R4はビニル基、または炭素数1〜5のアルキル基、nは0〜3を示す。)
【0022】
本発明に使用する金属捕捉能を持つ官能基を有するシランカップリング剤のその他の例として、γ−アミノプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、N−β(アミノエチル)γ−アミノプロピルトリメトキシシラン、N−β(アミノエチル)γ−アミノプロピルトリエトキシシラン、γ−メルカプトプロピルトリメトキシシラン等が挙げられる。
【0023】
本発明の無電解めっき前処理剤に用いる熱硬化性樹脂としては、エポキシ樹脂、尿素樹脂、フェノール樹脂、メラミン樹脂、ウレタン樹脂等が挙げられる。熱硬化性樹脂を添加することにより、密着力が向上する。熱硬化性樹脂としては、エポキシ樹脂を用いると特に密着力向上の効果が大きく、好ましい。
【0024】
本発明において、無電解めっき前処理剤に貴金属化合物が含有されることは必須ではない。本めっき前処理剤に浸漬後、塩化パラジウム水溶液に浸漬することでめっき活性を得ることができる。しかし、めっき前処理剤が貴金属化合物等の触媒を含有することがより好ましい。触媒としては、パラジウム、銀、白金、金等の貴金属化合物、例えば、それらのハロゲン化物、水酸化物、硫酸塩、炭酸塩、貴金属石鹸等を挙げることができ、特にパラジウム化合物が好ましい。また、従来の塩化スズなどの触媒も本発明の目的の範囲内において含有させることができる。
【0025】
貴金属石鹸は、脂肪酸、樹脂酸、またはナフテン酸と、貴金属化合物との反応により得ることができ、本発明において好ましく用いることができる。
【0026】
脂肪酸としては、炭素原子数が5〜25のものが好ましく、より好ましくは8〜16である。脂肪酸の炭素数が4以下であると、有機溶媒に溶解しにくくなり、不安定となる。また炭素原子数が26以上であると有機溶媒への可溶分が限定されること、貴金属含有量が低下することで添加量が多くなり実用的でない。
【0027】
前記脂肪酸としては、オクチル酸、ネオデカン酸、ドデカン酸、ペンタデカン酸、オクタデカン酸等の飽和脂肪酸、オレイン酸、リノール酸等の不飽和脂肪酸、ヒドロキシテトラデカン酸、カルボキシデカン酸等の含酸素脂肪酸、あるいはこれらの混合物を挙げることができる。
【0028】
また、前記脂肪酸、樹脂酸、ナフテン酸のうち、好ましいものを例示すると、ナフテン酸、オクチル酸、ネオデカン酸、ペンタデカン酸等を挙げることができる。
【0029】
また、前記貴金属化合物としては無電解めっき液から被めっき物表面に銅やニッケルなどを析出させる際の触媒効果を示すパラジウム、銀、白金、金等のハロゲン化物、水酸化物、硫酸塩、炭酸塩等の化合物であって、脂肪酸等と石鹸を形成し得る化合物を挙げることができるが、特にパラジウム化合物が好ましい。
【0030】
本発明に使用する貴金属石鹸は、前記脂肪酸等と前記貴金属化合物とを複分解法、直接法等の金属石鹸製造法の常法により得ることができる。
【0031】
本発明に使用する貴金属石鹸として好ましいナフテン酸パラジウムを下記に示す。
【化3】
【0032】
本発明に使用する前記貴金属石鹸は、有機溶剤に可溶性であり、また溶液として安定である。このような有機溶剤としては、例えば、ブタノール、2−エチルへキサノール、オクチルアルコール等のアルコール、キシレン等の芳香族炭化水素、ヘキサン等の脂肪族炭化水素、クロロホルム、ジオキサン等を挙げることができる。
【0033】
本発明の無電解めっき前処理剤は、上記金属捕捉能を有するシランカップリング剤、熱硬化性樹脂、貴金属石鹸等を、例えば、ブタノール、2−エチルへキサノール、オクチルアルコール等のアルコール、キシレン等の芳香族炭化水素、ヘキサン等の脂肪族炭化水素、クロロホルム、ジオキサン等の有機溶剤に溶解させて用いる。
【0034】
無電解めっき前処理剤中の金属捕捉能を有するシランカップリング剤の濃度はこれに限ったものではないが、0.001〜10重量%が好ましく、0.05〜3重量%がより好ましい。0.001重量%未満の場合、基材の表面に付着する化合物量が低くなりやすく、効果が得にくい。また、10重量%を超えると付着量が多すぎて乾燥しにくかったり、粉末の凝集を起こしやすくなる。
【0035】
無電解めっき前処理剤中の熱硬化性樹脂の濃度は0.001〜30重量%が好ましく、0.05〜10重量%がより好ましい。0.001重量%より少ないと効果がなく、30重量%を超えると液粘度が高くなりすぎるため、めっき付きにむらが出る。
【0036】
また、貴金属石鹸は、無電解めっき前処理剤の溶液中において、1〜30000mg/L、好ましくは50〜10000mg/Lの濃度(貴金属換算)で使用することができる。
【0037】
本発明のフレキシブル基板用銅張り積層体の基材としては、各種ポリイミドフィルム、PET等が好ましく用いられる。ポリイミドフィルムとしては、例えば、カプトン(東レデュポン製)、ユーピレックス(宇部興産製)等が、PETとしては、ルミラー(東レ製)が挙げられる。
【0038】
基材を無電解めっき前処理剤で処理する方法としては、浸漬、刷毛塗り、スピンコート等の方法が一般的であるが、これらに限定されるものではなく、表面に前処理剤を付着させる方法であれば良い。
【0039】
表面処理後に使用した溶剤を揮発させるにはこの溶媒の揮発温度以上に加熱して表面を乾燥すれば十分であるが、さらに60〜120℃で3〜60分間加熱することが好ましい。
また、本発明の無電解めっき前処理剤層の膜厚は1〜200nmが好ましい。
【0040】
本発明のフレキシブル基板用銅張り積層体は、これまで述べてきた前処理を施した基材上に、常法の無電解めっき法により銅めっき層を形成し、更に常法の電気めっきにより銅めっき層を形成したものである。こうして、本発明により、均一で密着性に優れたフレキシブル基板用銅張り積層体を得ることができる。
【実施例】
【0041】
以下、実施例によって本発明を更に詳細に説明する。
【0042】
実施例1
市販のポリイミドフィルムカプトン(200H、東レデュポン製)の表面に、イミダゾールシラン(イミダゾールと3−グリシドキシプロピルトリメトキシシランの等モル反応生成物)1g/Lと、Pd石鹸(ナフテン酸Pd、日鉱マテリアルズ製)0.5g/L(Pd換算100mg/L)と、エポキシ樹脂(エピコートEP828、ジャパンエポキシレジン製)1g/Lを含んだ有機溶媒(ブタノール)系無電解めっき前処理剤を塗布した。150℃で溶媒除去し、膜厚70nmの前処理剤層を形成した後、無電解銅めっき(めっき液:NKM554、日鉱メタルプレーティング製)により膜厚0.5μmの銅めっき層を形成し、次に、電流密度2A/dm2で電気銅めっき(めっき液:硫酸銅系、日鉱メタルプレーティング製)を行ない、膜厚35μmの銅めっき層を形成した。その常態でのピール強度、その後空気中150℃、168時間エージングした後のピール強度をそれぞれ測定した。ピール強度はJIS C−6481に基づく90度引き剥がし試験による。以下の実施例、比較例においても同様である。結果は表1の通り、エージング後での強度も0.7kgf/cmと高い数値を示した。
【0043】
実施例2
市販のポリイミドフィルムカプトン(200H、東レデュポン製)の表面に、イミダゾールシラン(イミダゾールと3−グリシドキシプロピルトリメトキシシランの等モル反応生成物)1g/LとPd石鹸(ナフテン酸Pd、日鉱マテリアルズ製)0.5g/L(Pd換算100mg/L)と、フェノール樹脂(XLC−4L、三井化学製)2g/Lを含んだ有機溶媒(ブタノール)系無電解めっき前処理剤を塗布した。150℃で溶媒除去し、膜厚70nmの前処理剤層を形成した後、無電解銅めっき(めっき液:NKM554、日鉱メタルプレーティング製)により膜厚0.5μmの銅めっき層を形成し、次に、電気銅めっき(めっき液:硫酸銅系、日鉱メタルプレーティング製)を行ない、膜厚35μmの銅めっき層を形成した。その常態でのピール強度、その後空気中150℃、168時間エージングした後のピール強度をそれぞれ測定した。
【0044】
実施例3
実施例1のイミダゾールシランの変わりにアミノシラン(γ−アミノプロピルトリエトキシシラン、信越化学製)を用いた以外は実施例1と同様に処理・試験を行なった。結果は表1の通り、エージング後での強度も0.4kgf/cmと高い数値を示した。
【0045】
比較例1
エポキシ樹脂を含まない以外は実施例1と同様に処理・試験を行なった。結果は表1の通り、初期ピール強度は0.9kgf/cmと高かったが、エージング後のピール強度は0.1kgf/cmと低いものとなった。
【0046】
比較例2
スパッタリング法により銅シード層を0.5μm形成した後、実施例1と同様に電気銅めっきで35μmの銅めっき層を形成し、実施例1と同様に試験を行なった。結果は表1の通り、初期ピール強度は0.9kgf/cmと高かったが、エージング後は低いものとなった。
【0047】
【表1】
【Technical field】
[0001]
The present invention relates to an electroless plating pretreatment agent used for a base material of a copper-clad laminate that is a material for a flexible substrate for printed wiring, and a copper-clad laminate for a flexible substrate produced using the same.
[Background]
[0002]
Polyimide substrates are frequently used as insulating substrate materials for electronic components. Recently, with the thinning and miniaturization of electronic devices, a two-layer copper polyimide substrate with a higher degree of freedom, in which a metal layer is directly formed on a polyimide film, has attracted attention. The initial adhesion in the normal state is at a practical level, but there are concerns about characteristics such as adhesion in a heat-resistant, high-temperature, high-humidity environment.
[0003]
Further, for example, Patent Document 1 discloses a method of manufacturing a metal layer by a sputtering method for a flexible copper-clad laminate of polyimide film. However, this method is expensive, and the adhesion in a heat-resistant, high-temperature and high-humidity environment is not satisfactory.
[0004]
Methods for improving the adhesion between the polyimide film and the metal layer include dry processes such as plasma, UV, etc., and wet processes using alkali, etc. The surface may be uneven, which may adversely affect the formation of fine wiring.
[0005]
Patent Document 2 discloses electroless copper plating comprising five steps: a step of forming a resin composition coating on a polyimide film, the coating activation step, a catalyst application step, a catalyst activation step, and an electroless metal plating step. A method of performing electrolytic copper plating after performing is described. This method is intended to produce a resin composition layer as an adhesion-imparting layer. As a result, the film thickness of the resin composition layer is 1 to 20 μm, and the process is complicated.
[Patent Document 1]
JP-A-9-136378 [Patent Document 2]
[Patent Document 1] Japanese Patent Application Laid-Open No. 2001-168896
[Problems to be solved by the invention]
The present invention provides a copper-clad for a flexible substrate in which the initial adhesion strength of the base material and the copper plating layer in a normal state and the adhesion strength in a heat aging test (in the atmosphere, 150 ° C., 168 hours) are 0.4 kgf / cm or more It aims at providing the electroless-plating pretreatment liquid used for a laminated body, and the copper clad laminated body for flexible substrates produced using this electroless-plating pretreatment liquid.
[Means for Solving the Problems]
As a result of intensive studies on the above problems, the present inventors have found that an organic solvent solution containing a silane coupling agent having a metal capturing ability and a thermosetting resin as a pretreatment agent for electroless plating of a copper-clad laminate for a flexible substrate It has been found that the above-described problems can be solved by using an electroless plating pretreatment agent comprising: That is, the present invention is as follows.
[0008]
(1) A pretreatment agent for electroless plating used as a base material for a copper-clad laminate for a flexible substrate, and having a metal scavenging ability obtained by a reaction between an azole compound or an amine compound and an epoxy compound , Or γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropyltriethoxysilane, γ- An electroless plating pretreatment agent comprising a silane coupling agent having a metal capturing ability selected from mercaptopropyltrimethoxysilane and a thermosetting resin.
(2) The electroless plating pretreatment agent according to (1), wherein the thermosetting resin is an epoxy resin.
(3) After the substrate was treated with the electroless plating pretreatment agent described in (1) or (2) above, a copper plating layer was formed by electroless plating, and a copper plating layer was formed thereon by electroplating. A copper-clad laminate for a flexible substrate.
【Effect of the invention】
The copper-clad laminate for a flexible substrate, in which the base material is treated using the electroless plating pretreatment agent of the present invention, and then the electroless copper plating layer and the electrolytic copper plating layer are laminated, is a normal state of the base material and the copper plating layer. A copper-clad laminate for a two-layer copper-clad flexible substrate with excellent adhesion, wherein the initial adhesion and the adhesion in a heat-resistant aging test (in the atmosphere, 150 ° C., 168 hours) are 0.4 kgf / cm or more, Become. Adhesion can be applied to the substrate surface without any dry or wet pretreatment.
BEST MODE FOR CARRYING OUT THE INVENTION
The electroless plating pretreatment agent of the present invention includes a silane coupling agent having a metal capturing ability and a thermosetting resin.
[0013]
By adding a silane coupling agent having a metal scavenging ability, the noble metal catalyst can be more uniformly and more reliably fixed to the surface to be plated via the silane coupling agent.
[0014]
Preferred as the silane coupling agent is one obtained by reaction of an azole compound or an amine compound with an epoxy compound.
Examples of azole compounds include imidazole, oxazole, thiazole, selenazole, pyrazole, isoxazole, isothiazole, triazole, oxadiazole, thiadiazole, tetrazole, oxatriazole, thiatriazole, benzazole, indazole, benzimidazole, and benzotriazole. It is done. Although not limited thereto, imidazole is particularly preferable.
[0015]
Examples of the amine compound include saturated hydrocarbon amines such as propylamine, unsaturated hydrocarbon amines such as vinylamine, and aromatic amines such as phenylamine.
[0016]
Also, the a silane coupling agent, in addition to the noble metal capture group derived from the azole compound or amine compound is a compound having a -SiX 1 X 2 X 3 group, X 1, X 2, X 3 is an alkyl group It means a halogen, an alkoxy group or the like, and any functional group that can be fixed to an object to be plated. X 1 , X 2 and X 3 may be the same or different.
[0017]
The silane coupling agent can be obtained by reacting the azole compound or amine compound with an epoxy silane compound.
[0018]
As such an epoxy silane compound,
[Chemical 1]
(Wherein R 1 and R 2 are hydrogen or an alkyl group having 1 to 3 carbon atoms, n is 0 to 3)
The epoxy coupling agent shown by these is preferable.
[0019]
The reaction between the azole compound and the epoxy group-containing silane compound can be performed under the conditions described in, for example, JP-A-6-256358.
[0020]
For example, it can be obtained by dropping 0.1 to 10 moles of an epoxy group-containing silane compound at 80 to 200 ° C. with respect to 1 mole of an azole compound and reacting them for 5 minutes to 2 hours. At that time, a solvent is not particularly required, but an organic solvent such as chloroform, dioxane, methanol, ethanol or the like may be used.
[0021]
As a particularly preferred example, the reaction between an imidazole compound and an epoxysilane compound is shown below.
[Chemical formula 2]
(Wherein R 1 and R 2 are hydrogen or an alkyl group having 1 to 3 carbon atoms, R 3 is hydrogen or an alkyl group having 1 to 20 carbon atoms, R 4 is a vinyl group, or 1 to 5 carbon atoms) An alkyl group, n represents 0-3.)
[0022]
Other examples of the silane coupling agent having a functional group having a metal scavenging ability used in the present invention include γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, and N-β (aminoethyl) γ-amino. Examples include propyltrimethoxysilane, N-β (aminoethyl) γ-aminopropyltriethoxysilane, and γ-mercaptopropyltrimethoxysilane.
[0023]
Examples of the thermosetting resin used for the electroless plating pretreatment agent of the present invention include an epoxy resin, a urea resin, a phenol resin, a melamine resin, and a urethane resin. By adding a thermosetting resin, the adhesion is improved. As the thermosetting resin, use of an epoxy resin is preferable because the effect of improving the adhesion is particularly large.
[0024]
In the present invention, it is not essential that the pretreatment agent for electroless plating contains a noble metal compound. Plating activity can be obtained by dipping in an aqueous palladium chloride solution after dipping in the pretreatment agent for plating. However, it is more preferable that the pretreatment agent for plating contains a catalyst such as a noble metal compound. Examples of the catalyst include noble metal compounds such as palladium, silver, platinum, and gold, such as halides, hydroxides, sulfates, carbonates, noble metal soaps, and the like, and palladium compounds are particularly preferable. Conventional catalysts such as tin chloride can also be included within the scope of the object of the present invention.
[0025]
The noble metal soap can be obtained by a reaction between a fatty acid, a resin acid, or naphthenic acid and a noble metal compound, and can be preferably used in the present invention.
[0026]
As a fatty acid, a C5-C25 thing is preferable, More preferably, it is 8-16. When the number of carbon atoms of the fatty acid is 4 or less, it becomes difficult to dissolve in an organic solvent and becomes unstable. On the other hand, if the number of carbon atoms is 26 or more, the soluble amount in an organic solvent is limited, and the amount of addition is increased due to a decrease in the noble metal content.
[0027]
Examples of the fatty acid include saturated fatty acids such as octylic acid, neodecanoic acid, dodecanoic acid, pentadecanoic acid and octadecanoic acid, unsaturated fatty acids such as oleic acid and linoleic acid, oxygen-containing fatty acids such as hydroxytetradecanoic acid and carboxydecanoic acid, or these Can be mentioned.
[0028]
Examples of the fatty acid, resin acid, and naphthenic acid include naphthenic acid, octylic acid, neodecanoic acid, and pentadecanoic acid.
[0029]
The noble metal compounds include palladium, silver, platinum, gold and other halides, hydroxides, sulfates, carbonates that exhibit a catalytic effect when copper or nickel is deposited on the surface of the object to be plated from an electroless plating solution. A compound such as a salt, which can form a soap with a fatty acid or the like, can be mentioned, and a palladium compound is particularly preferable.
[0030]
The noble metal soap used in the present invention can be obtained by a conventional method of producing a metal soap such as a metathesis method and a direct method using the fatty acid or the like and the noble metal compound.
[0031]
Palladium naphthenate preferable as a noble metal soap used in the present invention is shown below.
[Chemical 3]
[0032]
The noble metal soap used in the present invention is soluble in an organic solvent and is stable as a solution. Examples of such an organic solvent include alcohols such as butanol, 2-ethylhexanol and octyl alcohol, aromatic hydrocarbons such as xylene, aliphatic hydrocarbons such as hexane, chloroform and dioxane.
[0033]
The electroless plating pretreatment agent of the present invention is a silane coupling agent having a metal scavenging ability, a thermosetting resin, a noble metal soap, etc., for example, alcohol such as butanol, 2-ethylhexanol, octyl alcohol, xylene, etc. Aromatic hydrocarbons, aliphatic hydrocarbons such as hexane, and organic solvents such as chloroform and dioxane are used.
[0034]
Although the density | concentration of the silane coupling agent which has the metal capture | capture ability in an electroless-plating pretreatment agent is not restricted to this, 0.001-10 weight% is preferable and 0.05-3 weight% is more preferable. If it is less than 0.001% by weight, the amount of the compound adhering to the surface of the substrate tends to be low, and the effect is difficult to obtain. On the other hand, if it exceeds 10% by weight, it is difficult to dry because the amount of adhesion is too much, or the powder tends to agglomerate.
[0035]
The concentration of the thermosetting resin in the electroless plating pretreatment agent is preferably 0.001 to 30% by weight, and more preferably 0.05 to 10% by weight. If it is less than 0.001% by weight, there is no effect, and if it exceeds 30% by weight, the liquid viscosity becomes too high, resulting in uneven plating.
[0036]
Further, the noble metal soap can be used in a concentration of 1 to 30000 mg / L, preferably 50 to 10000 mg / L (precious metal conversion) in the solution of the electroless plating pretreatment agent.
[0037]
As a base material of the copper-clad laminate for a flexible substrate of the present invention, various polyimide films, PET and the like are preferably used. Examples of the polyimide film include Kapton (manufactured by Toray DuPont) and Upilex (manufactured by Ube Industries), and examples of PET include Lumirror (manufactured by Toray Industries, Inc.).
[0038]
As a method of treating the substrate with the electroless plating pretreatment agent, methods such as dipping, brush coating, and spin coating are common, but are not limited thereto, and the pretreatment agent is attached to the surface. Any method is acceptable.
[0039]
In order to volatilize the solvent used after the surface treatment, it is sufficient to heat the solvent to a temperature higher than the volatilization temperature and dry the surface, but it is preferable to heat at 60 to 120 ° C. for 3 to 60 minutes.
Moreover, the film thickness of the electroless plating pretreatment agent layer of the present invention is preferably 1 to 200 nm.
[0040]
The copper-clad laminate for a flexible substrate of the present invention is obtained by forming a copper plating layer by a conventional electroless plating method on a base material subjected to the pretreatment described so far, and further performing copper plating by a conventional electroplating method. A plating layer is formed. Thus, according to the present invention, a copper-clad laminate for a flexible substrate that is uniform and excellent in adhesion can be obtained.
【Example】
[0041]
Hereinafter, the present invention will be described in more detail with reference to examples.
[0042]
Example 1
On the surface of a commercially available polyimide film Kapton (200H, manufactured by Toray DuPont), 1 g / L of imidazole silane (equimolar reaction product of imidazole and 3-glycidoxypropyltrimethoxysilane) and Pd soap (naphthoic acid Pd, Nikko) Materials) 0.5 g / L (100 mg / L in terms of Pd) and an organic solvent (butanol) electroless plating pretreatment agent containing 1 g / L of epoxy resin (Epicoat EP828, manufactured by Japan Epoxy Resin) were applied. . After removing the solvent at 150 ° C. and forming a pretreatment agent layer having a thickness of 70 nm, a copper plating layer having a thickness of 0.5 μm is formed by electroless copper plating (plating solution: NKM554, manufactured by Nikko Metal Plating), Next, electrolytic copper plating (plating solution: copper sulfate, manufactured by Nikko Metal Plating) was performed at a current density of 2 A / dm 2 to form a copper plating layer having a thickness of 35 μm. The peel strength in the normal state and then the peel strength after aging in air at 150 ° C. for 168 hours were measured. The peel strength is based on a 90-degree peeling test based on JIS C-6481. The same applies to the following examples and comparative examples. As a result, as shown in Table 1, the strength after aging was as high as 0.7 kgf / cm.
[0043]
Example 2
On the surface of a commercially available polyimide film Kapton (200H, manufactured by Toray DuPont), 1 g / L of imidazole silane (equimolar reaction product of imidazole and 3-glycidoxypropyltrimethoxysilane) and Pd soap (naphthene acid Pd, Nikko Materials) An organic solvent (butanol) electroless plating pretreatment agent containing 0.5 g / L (100 mg / L in terms of Pd) and 2 g / L of a phenol resin (XLC-4L, manufactured by Mitsui Chemicals) was applied. After removing the solvent at 150 ° C. and forming a pretreatment agent layer having a thickness of 70 nm, a copper plating layer having a thickness of 0.5 μm is formed by electroless copper plating (plating solution: NKM554, manufactured by Nikko Metal Plating), Next, electrolytic copper plating (plating solution: copper sulfate, manufactured by Nikko Metal Plating) was performed to form a copper plating layer having a thickness of 35 μm. The peel strength in the normal state and then the peel strength after aging in air at 150 ° C. for 168 hours were measured.
[0044]
Example 3
The treatment and test were conducted in the same manner as in Example 1 except that aminosilane (γ-aminopropyltriethoxysilane, manufactured by Shin-Etsu Chemical Co., Ltd.) was used instead of imidazolesilane in Example 1. As a result, as shown in Table 1, the strength after aging was as high as 0.4 kgf / cm.
[0045]
Comparative Example 1
The treatment and test were conducted in the same manner as in Example 1 except that no epoxy resin was contained. As a result, as shown in Table 1, the initial peel strength was as high as 0.9 kgf / cm, but the peel strength after aging was as low as 0.1 kgf / cm.
[0046]
Comparative Example 2
After forming a copper seed layer by a sputtering method to a thickness of 0.5 μm, a copper plating layer of 35 μm was formed by electrolytic copper plating in the same manner as in Example 1, and the test was performed in the same manner as in Example 1. As a result, as shown in Table 1, the initial peel strength was as high as 0.9 kgf / cm, but was low after aging.
[0047]
[Table 1]
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EP1498511B1 (en) * | 2002-04-23 | 2016-07-06 | JX Nippon Mining & Metals Corporation | Method of electroless plating and semiconductor wafer having metal plating layer formed thereon |
EP1681321B1 (en) * | 2003-11-05 | 2011-08-10 | Nippon Mining & Metals Co., Ltd. | Inkjet ink composition |
US7713340B2 (en) * | 2004-01-29 | 2010-05-11 | Nippon Mining & Metals Co., Ltd. | Pretreating agent for electroless plating, method of electroless plating using the same and product of electroless plating |
-
2005
- 2005-08-22 JP JP2006535103A patent/JP4859232B2/en active Active
- 2005-08-22 KR KR20077008060A patent/KR20070088611A/en not_active Application Discontinuation
- 2005-08-22 WO PCT/JP2005/015228 patent/WO2006027947A1/en active Application Filing
- 2005-08-22 US US11/662,046 patent/US20070269680A1/en not_active Abandoned
- 2005-08-29 TW TW94129458A patent/TWI305237B/en active
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2011
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Also Published As
Publication number | Publication date |
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US20070269680A1 (en) | 2007-11-22 |
JP2012007244A (en) | 2012-01-12 |
TW200619418A (en) | 2006-06-16 |
WO2006027947A1 (en) | 2006-03-16 |
KR20070088611A (en) | 2007-08-29 |
JPWO2006027947A1 (en) | 2008-07-31 |
TWI305237B (en) | 2009-01-11 |
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