TW200611072A - Mask blank, manufacturing method and transfer plate manufacturing method - Google Patents

Mask blank, manufacturing method and transfer plate manufacturing method

Info

Publication number
TW200611072A
TW200611072A TW094118141A TW94118141A TW200611072A TW 200611072 A TW200611072 A TW 200611072A TW 094118141 A TW094118141 A TW 094118141A TW 94118141 A TW94118141 A TW 94118141A TW 200611072 A TW200611072 A TW 200611072A
Authority
TW
Taiwan
Prior art keywords
mask
manufacturing
mask blank
transfer plate
thin film
Prior art date
Application number
TW094118141A
Other languages
Chinese (zh)
Inventor
Hideo Kobayashi
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200611072A publication Critical patent/TW200611072A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Troubles due to foreign material directly adhered on a substrate surface during mask blank or mask manufacture process or at the time of storage, transfer, transport, etc. are prevented. On a mask blank main plane on a side whereupon a mask-functioning thin film and/or thin film to be used in the mask manufacturing process is formed, a cover-like dust-proof protector is removably fixed to form an airtight space by having contact with a non-effective area but not with an effective area whereupon a mask pattern is to be formed.
TW094118141A 2004-06-02 2005-06-02 Mask blank, manufacturing method and transfer plate manufacturing method TW200611072A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004164099 2004-06-02

Publications (1)

Publication Number Publication Date
TW200611072A true TW200611072A (en) 2006-04-01

Family

ID=35783674

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094118141A TW200611072A (en) 2004-06-02 2005-06-02 Mask blank, manufacturing method and transfer plate manufacturing method

Country Status (4)

Country Link
JP (1) JPWO2006006318A1 (en)
KR (1) KR20070039910A (en)
TW (1) TW200611072A (en)
WO (1) WO2006006318A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI627110B (en) * 2013-05-13 2018-06-21 Miraial Co Ltd Package structure for packaging substrate storage container

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007099910A1 (en) * 2006-02-28 2007-09-07 Hoya Corporation Photomask blank and photomask, and their manufacturing method
NL1036193A1 (en) * 2007-12-06 2009-06-09 Asml Netherlands Bv Imprint lithography.
JP5169206B2 (en) * 2007-12-21 2013-03-27 日本電気株式会社 Photomask acceptor and resist inspection method and apparatus using the same
US10670959B2 (en) 2017-05-10 2020-06-02 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle and method of using the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5962856A (en) * 1982-10-04 1984-04-10 Hitachi Ltd Photomask
JPS6231855A (en) * 1985-08-02 1987-02-10 Fujitsu Ltd Mask blank with pellicle
JPH03179351A (en) * 1989-12-07 1991-08-05 Fujitsu Ltd Production of photomask
JPH05188583A (en) * 1992-01-17 1993-07-30 Fujitsu Ltd Pellicle
JPH0619122A (en) * 1992-07-02 1994-01-28 Seiko Epson Corp Structure of blanks and production of photomask
JP3071348B2 (en) * 1993-10-21 2000-07-31 信越化学工業株式会社 Pellicle and its peeling method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI627110B (en) * 2013-05-13 2018-06-21 Miraial Co Ltd Package structure for packaging substrate storage container

Also Published As

Publication number Publication date
JPWO2006006318A1 (en) 2008-04-24
KR20070039910A (en) 2007-04-13
WO2006006318A1 (en) 2006-01-19

Similar Documents

Publication Publication Date Title
TW200707350A (en) Display surface material and a display incorporating the same
TW200637041A (en) Nitride semiconductor light-emitting device and method for fabrication thereof
TW200706373A (en) Display surface material and a display incorporating the same
TW200715456A (en) Substrate mounting base, method for manufacturing the same and substrate processing apparatus
TW200611072A (en) Mask blank, manufacturing method and transfer plate manufacturing method
TW200731518A (en) Semiconductor device and manufacturing method of the same
TW200727461A (en) Semiconductor device and production method thereof
TW200636923A (en) Memory device and fabrication method thereof
TW200636850A (en) Semiconductor device and manufacturing method thereof
TW200641161A (en) Method of forming mask and mask
WO2009028068A1 (en) Pressure sensitive adhesive sheet and process for manufacturing electronic part
TW200712613A (en) Method for supporting a flexible substrate and method for manufacturing a flexible display
WO2008142784A1 (en) Inprint equipment
WO2008087763A1 (en) Semiconductor device and process for manufacturing the same
TW200708870A (en) Manufacturing method of liquid crystal display
TW200632117A (en) Method of mounting substrate in film deposition apparatus and method of depositing film
TW200642833A (en) Polyimide film, polyimide metal laminate using the same and manufacturing method thereof
TWI268367B (en) Patterned member and production method thereof
TW200640283A (en) Method of manufacturing an organic electronic device
TW200615135A (en) Carrier film for ceramic green sheet, ceramic green sheet processing method using it and manufacturing method of electronic part
TW200709942A (en) Method for forming film pattern, and method for manufacturing device, electro-optical device, electronic apparatus and active matrix substrate
TW200834239A (en) Stamp for imprint lithography and imprint lithography method using the same
TWI585516B (en) A pellicle frame, and a pellicle assembly using the pellicle frame
FR2847346B1 (en) METHOD FOR OBTAINING A MARKING ON A LOW ENERGY SURFACE ENERGY OPHTHALMIC LENS
SG160295A1 (en) Method for manufacturing semiconductor device