TW200834239A - Stamp for imprint lithography and imprint lithography method using the same - Google Patents

Stamp for imprint lithography and imprint lithography method using the same

Info

Publication number
TW200834239A
TW200834239A TW096144560A TW96144560A TW200834239A TW 200834239 A TW200834239 A TW 200834239A TW 096144560 A TW096144560 A TW 096144560A TW 96144560 A TW96144560 A TW 96144560A TW 200834239 A TW200834239 A TW 200834239A
Authority
TW
Taiwan
Prior art keywords
imprint lithography
stamp
polymer resin
same
pattern
Prior art date
Application number
TW096144560A
Other languages
Chinese (zh)
Other versions
TWI440974B (en
Inventor
Byung-Uk Kim
Jae-Won Yoo
Seung-Hyup Shin
Ki-Man Lee
Jun-Yong Song
Ki Beom Lee
Won Young Lee
Sung Hyun Lee
Eun Jin Kwak
Myoung Soo Lee
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200834239A publication Critical patent/TW200834239A/en
Application granted granted Critical
Publication of TWI440974B publication Critical patent/TWI440974B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41K—STAMPS; STAMPING OR NUMBERING APPARATUS OR DEVICES
    • B41K3/00—Apparatus for stamping articles having integral means for supporting the articles to be stamped
    • B41K3/02—Apparatus for stamping articles having integral means for supporting the articles to be stamped with stamping surface located above article-supporting surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

This invention provides a stamp for imprint lithography and an imprint lithography method using the same. When a polymer resin stamp is used to form a pattern, the inner surface of the polymer resin stamp having pattern is processed with vapor deposition and a conductor-containing high transmittance conductive layer is used as a backside support body to inhibit occurrence of static electricity. The imprint lithography using molded article manufacturing process of the polymer resin mold is used to prevent foreign object adhesion and damage to the lower portion pattern caused by occurrence of static electricity to provide patterns with good quality on substrates. Therefore, this invention relates to a mold for imprint lithography and an imprint lithography method using the same. Particularly, the stamp for imprint lithography is formed on one side with concave convex shaped polymer resin mold for forming patterns, and a backside support body with light transmittance and conductivity is formed on the other side with respect to the side adhered with the polymer resin mold.
TW096144560A 2006-11-24 2007-11-23 Stamp for imprint lithography and imprint lithography method using the same TWI440974B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060116764A KR101322133B1 (en) 2006-11-24 2006-11-24 Stamp for imprint lithography and imprint lithography method using the same

Publications (2)

Publication Number Publication Date
TW200834239A true TW200834239A (en) 2008-08-16
TWI440974B TWI440974B (en) 2014-06-11

Family

ID=39480219

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096144560A TWI440974B (en) 2006-11-24 2007-11-23 Stamp for imprint lithography and imprint lithography method using the same

Country Status (3)

Country Link
KR (1) KR101322133B1 (en)
CN (1) CN101187777A (en)
TW (1) TWI440974B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI761597B (en) * 2017-09-29 2022-04-21 日商佳能股份有限公司 Forming device, manufacturing method of semiconductor device, and manufacturing method of article

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4542167B2 (en) * 2008-03-31 2010-09-08 株式会社日立ハイテクノロジーズ Microstructure transfer device
KR101603222B1 (en) * 2009-07-28 2016-03-15 엘지디스플레이 주식회사 Method for Forming Pattern in Flat Panel Display and Apparatus for Forming pattern with Using the Same
CN102508410A (en) * 2011-10-27 2012-06-20 南京大学 Composite nanometer impressing mold plate with sandwich structure and preparation method of composite nanometer impressing mold plate
CN102361013B (en) * 2011-11-08 2015-05-20 无锡瑞威光电科技有限公司 Method for manufacturing gold salient points on wafer-level flip chip
KR101515180B1 (en) * 2012-05-18 2015-04-24 주식회사 휴템 Substrates bonding apparatus unsing fluid pressure and substrates bonding method
KR101399440B1 (en) 2012-06-20 2014-05-28 한국기계연구원 Method for making stamp for plasmonic nano lithography apparatus plasmonic nano lithography apparatus
CN103360709A (en) * 2013-06-25 2013-10-23 辅讯光电工业（苏州）有限公司 Multifunctional optical film and composite thereof, as well as multifunctional optical plate and manufacturing method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990010876A (en) * 1997-07-18 1999-02-18 김영귀 Vehicle console box switchgear
AU2002368430A1 (en) * 2001-05-16 2004-08-10 Board Of Regents, The University Of Texas System Method and system for fabricating nanoscale patterns in light curable compositions using an electric field
KR100943561B1 (en) * 2003-06-03 2010-02-22 엘지전자 주식회사 A method of making a wavelength filter
KR100601263B1 (en) * 2003-09-18 2006-07-14 주식회사 미뉴타텍 Method for forming micro-pattern by using rapid thermal nano-molding

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI761597B (en) * 2017-09-29 2022-04-21 日商佳能股份有限公司 Forming device, manufacturing method of semiconductor device, and manufacturing method of article
US11904522B2 (en) 2017-09-29 2024-02-20 Canon Kabushiki Kaisha Imprint apparatus and method for manufacturing article

Also Published As

Publication number Publication date
KR101322133B1 (en) 2013-10-25
CN101187777A (en) 2008-05-28
TWI440974B (en) 2014-06-11
KR20080046986A (en) 2008-05-28

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees