TW200608133A - Support method and support structure for optical member, optical apparatus, exposure apparatus, and device production method - Google Patents

Support method and support structure for optical member, optical apparatus, exposure apparatus, and device production method

Info

Publication number
TW200608133A
TW200608133A TW094123995A TW94123995A TW200608133A TW 200608133 A TW200608133 A TW 200608133A TW 094123995 A TW094123995 A TW 094123995A TW 94123995 A TW94123995 A TW 94123995A TW 200608133 A TW200608133 A TW 200608133A
Authority
TW
Taiwan
Prior art keywords
lens
flat plate
support
parallel flat
optical
Prior art date
Application number
TW094123995A
Other languages
English (en)
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200608133A publication Critical patent/TW200608133A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
TW094123995A 2004-07-16 2005-07-15 Support method and support structure for optical member, optical apparatus, exposure apparatus, and device production method TW200608133A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004209941 2004-07-16

Publications (1)

Publication Number Publication Date
TW200608133A true TW200608133A (en) 2006-03-01

Family

ID=35785177

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094123995A TW200608133A (en) 2004-07-16 2005-07-15 Support method and support structure for optical member, optical apparatus, exposure apparatus, and device production method

Country Status (7)

Country Link
US (1) US20070268470A1 (zh)
EP (1) EP1801852A4 (zh)
JP (1) JPWO2006009064A1 (zh)
KR (1) KR20070039952A (zh)
CN (1) CN100490065C (zh)
TW (1) TW200608133A (zh)
WO (1) WO2006009064A1 (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4543767B2 (ja) * 2004-06-10 2010-09-15 株式会社ニコン 露光装置及びデバイス製造方法
US7944628B2 (en) * 2005-03-09 2011-05-17 Carl Zeiss Smt Gmbh Optical element unit
US7583358B2 (en) * 2005-07-25 2009-09-01 Micron Technology, Inc. Systems and methods for retrieving residual liquid during immersion lens photolithography
US7456928B2 (en) 2005-08-29 2008-11-25 Micron Technology, Inc. Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography
US8472004B2 (en) * 2006-01-18 2013-06-25 Micron Technology, Inc. Immersion photolithography scanner
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
US7880798B2 (en) * 2008-09-09 2011-02-01 Electro Scientific Industries, Inc. Apparatus and method for optically converting a three-dimensional object into a two-dimensional planar image
JP2010245123A (ja) * 2009-04-01 2010-10-28 Mitsuboshi Diamond Industrial Co Ltd 透過照明付きテーブル
CN102472840B (zh) * 2009-07-06 2015-05-20 康蒂特米克微电子有限公司 用于同时聚焦到两个视野范围的光学模块
KR20130024910A (ko) 2010-04-01 2013-03-08 콘티 테믹 마이크로일렉트로닉 게엠베하 광학 모듈과 지지판이 장착된 장치
CN103221805B (zh) 2010-11-30 2016-10-12 康蒂特米克微电子有限公司 借助于摄像机和照明装置检测窗玻璃上的雨滴
DE102011103302A1 (de) 2011-06-03 2012-12-06 Conti Temic Microelectronic Gmbh Kamerasystem für ein Fahrzeug
DE102012103873A1 (de) 2012-05-03 2013-11-21 Conti Temic Microelectronic Gmbh Detektion von Regentropfen auf einer Scheibe mittels einer Kamera und Beleuchtung
US10928606B2 (en) * 2016-03-23 2021-02-23 Tianjin Ofilm Opto Electronics Co., Ltd. Lens unit

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1068549B (zh) * 1959-11-05
US2953970A (en) * 1957-09-26 1960-09-27 Indiana General Corp Mount for optical system component
US4346164A (en) * 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
JPS57153433A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
US4783039A (en) * 1986-07-28 1988-11-08 Buell Industries, Inc. Shock isolating mount
US5110081A (en) * 1990-09-26 1992-05-05 Lang Jr William O Vibration-isolating mount
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JPH06177007A (ja) * 1992-12-01 1994-06-24 Nippon Telegr & Teleph Corp <Ntt> 投影露光装置
JPH08316124A (ja) * 1995-05-19 1996-11-29 Hitachi Ltd 投影露光方法及び露光装置
JP3487527B2 (ja) * 1995-09-14 2004-01-19 株式会社東芝 光屈折装置
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
US6354578B1 (en) * 1999-07-21 2002-03-12 Tokai Rubber Industries, Ltd. Vibration absorber for vehicle wiper devices
DE10121346A1 (de) * 2001-05-02 2002-11-07 Zeiss Carl Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie
US7110081B2 (en) * 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101382738B (zh) * 2002-11-12 2011-01-12 Asml荷兰有限公司 光刻投射装置
DE10258718A1 (de) * 2002-12-09 2004-06-24 Carl Zeiss Smt Ag Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives
JP4232449B2 (ja) * 2002-12-10 2009-03-04 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
KR20070039952A (ko) 2007-04-13
JPWO2006009064A1 (ja) 2008-05-01
WO2006009064A1 (ja) 2006-01-26
CN100490065C (zh) 2009-05-20
US20070268470A1 (en) 2007-11-22
CN1969371A (zh) 2007-05-23
EP1801852A4 (en) 2008-04-09
EP1801852A1 (en) 2007-06-27

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