TW200606273A - Vacuum treatment apparatus - Google Patents

Vacuum treatment apparatus

Info

Publication number
TW200606273A
TW200606273A TW094116817A TW94116817A TW200606273A TW 200606273 A TW200606273 A TW 200606273A TW 094116817 A TW094116817 A TW 094116817A TW 94116817 A TW94116817 A TW 94116817A TW 200606273 A TW200606273 A TW 200606273A
Authority
TW
Taiwan
Prior art keywords
vacuum treatment
treatment apparatus
substrate carrier
path
chamber
Prior art date
Application number
TW094116817A
Other languages
Chinese (zh)
Other versions
TWI391515B (en
Inventor
Masato Shishikura
Katsuhiko Mori
Toshio Nakajima
Susumu Arai
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004155900A external-priority patent/JP2005340425A/en
Priority claimed from JP2004172370A external-priority patent/JP2005351359A/en
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of TW200606273A publication Critical patent/TW200606273A/en
Application granted granted Critical
Publication of TWI391515B publication Critical patent/TWI391515B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G19/00—Conveyors comprising an impeller or a series of impellers carried by an endless traction element and arranged to move articles or materials over a supporting surface or underlying material, e.g. endless scraper conveyors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/44—Factory adjustment of completed discharge tubes or lamps to comply with desired tolerances
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt

Abstract

A vacuum treatment apparatus includes vacuum treatment chambers 20, 22, 24, a substrate carrier 40, and a preparation chamber 14. This vertical-type vacuum treatment apparatus 10 has two conveyance paths that are an outward path 16 and a return path 18 in a preparation chamber 14 and the vacuum treatment chambers 20, 22, and 24, and further has a load shifter M which transfers in the vacuum treatment chamber 24 the substrate carrier 40 from the outward path 16 to the return path 18.
TW094116817A 2004-05-26 2005-05-24 Vacuum treatment apparatus TWI391515B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004155900A JP2005340425A (en) 2004-05-26 2004-05-26 Vacuum treatment device
JP2004172370A JP2005351359A (en) 2004-06-10 2004-06-10 Positioner of carrier of vacuum processor in vacuum processing chamber

Publications (2)

Publication Number Publication Date
TW200606273A true TW200606273A (en) 2006-02-16
TWI391515B TWI391515B (en) 2013-04-01

Family

ID=37149930

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094116817A TWI391515B (en) 2004-05-26 2005-05-24 Vacuum treatment apparatus

Country Status (3)

Country Link
KR (1) KR101270526B1 (en)
CN (1) CN101916716A (en)
TW (1) TWI391515B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2489759B1 (en) * 2011-02-21 2014-12-10 Applied Materials, Inc. System for utilization improvement of process chambers and method of operating thereof
CN103993273B (en) * 2014-05-09 2016-01-27 浙江上方电子装备有限公司 A kind of sound the admixture plates the film system and utilize it to carry out the method for sound the admixture plates the film
JP6352436B2 (en) 2014-10-10 2018-07-04 キヤノンアネルバ株式会社 Deposition equipment
KR101958411B1 (en) * 2018-08-28 2019-03-14 한국알박(주) Film Deposition Apparatus and Method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69420786T2 (en) * 1993-02-05 2000-03-23 Toshiba Kawasaki Kk METHOD FOR PRODUCING THIN FILMS UNDER VACUUM
JP4034860B2 (en) * 1997-10-31 2008-01-16 キヤノンアネルバ株式会社 Tray transfer film forming apparatus and auxiliary chamber
JP2002203885A (en) * 2000-12-27 2002-07-19 Anelva Corp Inter-back type apparatus for processing substrate
JP3970042B2 (en) * 2002-02-13 2007-09-05 三菱重工業株式会社 Method for controlling the traveling of a transport carriage in a vacuum chamber

Also Published As

Publication number Publication date
CN101916716A (en) 2010-12-15
KR101270526B1 (en) 2013-06-04
TWI391515B (en) 2013-04-01
KR20060049437A (en) 2006-05-19

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