TW200602816A - Method of manufacturing micro-structure body, method of manufacturing stamper using the micro-structure body, and method of manufacturing micro-structure body made of resin using the stamper - Google Patents

Method of manufacturing micro-structure body, method of manufacturing stamper using the micro-structure body, and method of manufacturing micro-structure body made of resin using the stamper

Info

Publication number
TW200602816A
TW200602816A TW094111097A TW94111097A TW200602816A TW 200602816 A TW200602816 A TW 200602816A TW 094111097 A TW094111097 A TW 094111097A TW 94111097 A TW94111097 A TW 94111097A TW 200602816 A TW200602816 A TW 200602816A
Authority
TW
Taiwan
Prior art keywords
structure body
micro
manufacturing
stamper
resist layer
Prior art date
Application number
TW094111097A
Other languages
Chinese (zh)
Inventor
Yukihiro Yanagawa
Original Assignee
Kuraray Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co filed Critical Kuraray Co
Publication of TW200602816A publication Critical patent/TW200602816A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00769—Producing diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements

Abstract

This invention is related to a method of manufacturing a micro-structure body which has trenches at the surface. The method includes two steps(step 100, step 101): through a photomask(13) which has plural slits(13b) disposed in set intervals, to a vertical plane which is along longitudinal direction of slits(13b), parallel light from a light source is directed from one direction to another direction, and continuously or gradually change the angle, and according to irradiation to a resist layer(12) formed on a substrate, form trapezoid-like irradiated portions(12a) on the resist layer(12)(step 100); According to the development of the resist layer(12), remove non-irradiated portions(12b) of the resist layer(12)(step 101).
TW094111097A 2004-04-09 2005-04-08 Method of manufacturing micro-structure body, method of manufacturing stamper using the micro-structure body, and method of manufacturing micro-structure body made of resin using the stamper TW200602816A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004115938 2004-04-09

Publications (1)

Publication Number Publication Date
TW200602816A true TW200602816A (en) 2006-01-16

Family

ID=35125212

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094111097A TW200602816A (en) 2004-04-09 2005-04-08 Method of manufacturing micro-structure body, method of manufacturing stamper using the micro-structure body, and method of manufacturing micro-structure body made of resin using the stamper

Country Status (3)

Country Link
JP (1) JP4802093B2 (en)
TW (1) TW200602816A (en)
WO (1) WO2005098486A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106842825A (en) * 2017-03-21 2017-06-13 京东方科技集团股份有限公司 Master mold and its manufacture method
CN112584623A (en) * 2019-09-27 2021-03-30 恒煦电子材料股份有限公司 Method for manufacturing electroplated metal wire

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5151101B2 (en) * 2006-09-12 2013-02-27 ソニー株式会社 Lens film and display device
KR101362729B1 (en) * 2007-05-08 2014-02-12 삼성디스플레이 주식회사 Optical sheet, method of manufacturing the same and display apparatus having the same
JP2009151257A (en) * 2007-12-24 2009-07-09 Ind Technol Res Inst Inclined exposure lithography system
JP6135347B2 (en) * 2013-07-16 2017-05-31 凸版印刷株式会社 Color filter manufacturing method and color filter
DE102013107947A1 (en) * 2013-07-25 2015-02-19 Acquandas GmbH A method of manufacturing a medical device, a method of modifying the surface of a medical device, a medical device, and a laminate with a substrate
JP5987894B2 (en) * 2014-12-22 2016-09-07 王子ホールディングス株式会社 Method for producing uneven pattern sheet and method for producing optical sheet

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Publication number Priority date Publication date Assignee Title
JPS57200042A (en) * 1981-06-02 1982-12-08 Hoya Corp Exposure method for chemically machinable photosensitive glass
JP3047603B2 (en) * 1992-03-12 2000-05-29 凸版印刷株式会社 Printing plate manufacturing method
JPH06300905A (en) * 1993-04-14 1994-10-28 Nikon Corp Optical component with light scattering surface and its manufacture
JP2000105370A (en) * 1998-09-29 2000-04-11 Matsushita Electric Ind Co Ltd Reflection plate as well as reflection type display element and its production
JP2001235873A (en) * 2000-02-24 2001-08-31 Mitsubishi Electric Corp Method for forming tapered shape
JP2002146584A (en) * 2000-04-14 2002-05-22 Citizen Watch Co Ltd Microshape structure, nozzle parts, optical parts, display device, electroforming archetype and method of manufacturing for the same
JP2002105621A (en) * 2000-09-27 2002-04-10 Tokyo Process Service Kk Metal plate, its manufacturing method and aligner
JP2003215314A (en) * 2002-01-18 2003-07-30 Dainippon Printing Co Ltd Antireflection article
JP2003345029A (en) * 2002-05-24 2003-12-03 Shin Sti Technology Kk Photomask, diffusing reflector and method for manufacturing same
JP2004013060A (en) * 2002-06-11 2004-01-15 Seiko Epson Corp Reflecting plate, manufacturing method therefor, and liquid crystal display device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106842825A (en) * 2017-03-21 2017-06-13 京东方科技集团股份有限公司 Master mold and its manufacture method
CN106842825B (en) * 2017-03-21 2021-01-12 京东方科技集团股份有限公司 Master mold and method for manufacturing same
US11131930B2 (en) 2017-03-21 2021-09-28 Boe Technology Group Co., Ltd. Female mold and method for manufacturing the same
CN112584623A (en) * 2019-09-27 2021-03-30 恒煦电子材料股份有限公司 Method for manufacturing electroplated metal wire

Also Published As

Publication number Publication date
JPWO2005098486A1 (en) 2008-02-28
JP4802093B2 (en) 2011-10-26
WO2005098486A1 (en) 2005-10-20

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