TW200602807A - Photosensitive insulative paste composition and photosensitive film using the same - Google Patents

Photosensitive insulative paste composition and photosensitive film using the same

Info

Publication number
TW200602807A
TW200602807A TW094108645A TW94108645A TW200602807A TW 200602807 A TW200602807 A TW 200602807A TW 094108645 A TW094108645 A TW 094108645A TW 94108645 A TW94108645 A TW 94108645A TW 200602807 A TW200602807 A TW 200602807A
Authority
TW
Taiwan
Prior art keywords
photosensitive
paste composition
insulative paste
same
water
Prior art date
Application number
TW094108645A
Other languages
English (en)
Other versions
TWI311688B (en
Inventor
Kiminori Oshio
Ryuma Mizusawa
Akira Kumazawa
Hitoshi Setsuda
Hiroyuki Obiya
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200602807A publication Critical patent/TW200602807A/zh
Application granted granted Critical
Publication of TWI311688B publication Critical patent/TWI311688B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
TW94108645A 2004-03-22 2005-03-21 Photosensitive insulative paste composition and photosensitive film using the same TWI311688B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004082416A JP4282518B2 (ja) 2004-03-22 2004-03-22 感光性絶縁ペースト組成物、およびそれを用いた感光性フィルム

Publications (2)

Publication Number Publication Date
TW200602807A true TW200602807A (en) 2006-01-16
TWI311688B TWI311688B (en) 2009-07-01

Family

ID=34962379

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94108645A TWI311688B (en) 2004-03-22 2005-03-21 Photosensitive insulative paste composition and photosensitive film using the same

Country Status (5)

Country Link
JP (1) JP4282518B2 (zh)
KR (1) KR100868550B1 (zh)
CN (1) CN1934496B (zh)
TW (1) TWI311688B (zh)
WO (1) WO2005091071A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100754485B1 (ko) * 2005-12-14 2007-09-03 엘지전자 주식회사 플라즈마 디스플레이 패널의 유전체층 제조방법
KR20100135861A (ko) * 2008-05-02 2010-12-27 코니카 미놀타 옵토 인코포레이티드 광학 필름의 제조 방법, 광학 필름, 편광판 및 액정 표시 장치
CN106773533A (zh) * 2017-02-09 2017-05-31 中国科学院上海微系统与信息技术研究所 一种光刻胶及其应用方法
EP3882959A4 (en) 2018-11-15 2022-08-17 Tokyo Ohka Kogyo Co., Ltd. PROTECTIVE FILM FORMING AGENT FOR PLASMA DICING AND SEMICONDUCTOR CHIP MANUFACTURING METHOD
CN112500156B (zh) * 2020-12-08 2022-06-03 北京科技大学 一种蓝色氧化锆陶瓷及制备方法
CN115185160B (zh) * 2022-09-09 2023-06-27 之江实验室 基于纤维素衍生物的激光直写光刻胶组合物及图案化方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1387384A1 (en) * 1996-01-22 2004-02-04 Hitachi Chemical Co., Ltd. Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same
KR100327360B1 (ko) * 1999-04-22 2002-03-06 구자홍 저온 소성이 가능한 플라즈마 디스플레이 패널용 감광성 페이스트 조성물
JP4240733B2 (ja) * 2000-02-22 2009-03-18 三菱重工業株式会社 薄型ディスプレイパネルの隔壁用組成物
KR100663100B1 (ko) * 2000-09-01 2007-01-02 후지 휘루무오린 가부시키가이샤 감광성 조성물, 감광성 도포물 및 미세패턴 구조체
JP3827196B2 (ja) * 2001-05-01 2006-09-27 東京応化工業株式会社 感光性絶縁ペースト組成物及びそれを用いた感光性フィルム
JP4130102B2 (ja) * 2001-09-18 2008-08-06 富士フイルム株式会社 感放射線性着色組成物

Also Published As

Publication number Publication date
KR20070007107A (ko) 2007-01-12
CN1934496A (zh) 2007-03-21
JP4282518B2 (ja) 2009-06-24
WO2005091071A1 (en) 2005-09-29
TWI311688B (en) 2009-07-01
CN1934496B (zh) 2010-10-20
JP2005266663A (ja) 2005-09-29
KR100868550B1 (ko) 2008-11-13

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees