TW200602150A - Stage control device and stage device using the control device - Google Patents

Stage control device and stage device using the control device

Info

Publication number
TW200602150A
TW200602150A TW094112585A TW94112585A TW200602150A TW 200602150 A TW200602150 A TW 200602150A TW 094112585 A TW094112585 A TW 094112585A TW 94112585 A TW94112585 A TW 94112585A TW 200602150 A TW200602150 A TW 200602150A
Authority
TW
Taiwan
Prior art keywords
stage
control device
gravity
center
thrust
Prior art date
Application number
TW094112585A
Other languages
English (en)
Other versions
TWI292356B (zh
Inventor
Kennichi Makino
Original Assignee
Sumitomo Heavy Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries filed Critical Sumitomo Heavy Industries
Publication of TW200602150A publication Critical patent/TW200602150A/zh
Application granted granted Critical
Publication of TWI292356B publication Critical patent/TWI292356B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094112585A 2004-07-14 2005-04-20 Stage control device and stage device using the control device TW200602150A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004207526A JP4327672B2 (ja) 2004-07-14 2004-07-14 移動体位置制御装置及びこの制御装置を用いたステージ装置

Publications (2)

Publication Number Publication Date
TW200602150A true TW200602150A (en) 2006-01-16
TWI292356B TWI292356B (zh) 2008-01-11

Family

ID=35783793

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094112585A TW200602150A (en) 2004-07-14 2005-04-20 Stage control device and stage device using the control device

Country Status (5)

Country Link
US (1) US7333862B2 (zh)
JP (1) JP4327672B2 (zh)
CN (1) CN100470431C (zh)
TW (1) TW200602150A (zh)
WO (1) WO2006006449A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI549774B (zh) * 2010-06-18 2016-09-21 循環工程股份有限公司 使用編碼器反饋、誤差映像和空氣壓力控制的誤差補償系統

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JP2006216852A (ja) * 2005-02-04 2006-08-17 Fujitsu Ltd 位置決め装置および位置決め装置の制御方法
JP2008033610A (ja) * 2006-07-28 2008-02-14 Yokogawa Electric Corp Ｘｙステージ
JP5100317B2 (ja) * 2007-01-31 2012-12-19 株式会社東芝 光走査装置、画像形成装置、スラスト方向力相殺方法
US8140288B2 (en) * 2007-04-18 2012-03-20 Nikon Corporation On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage
CN102279529B (zh) * 2010-06-11 2015-03-25 上海微电子装备有限公司 柔性双边驱动设备的位置控制装置、及相关参数的整定方法
CN102768468B (zh) * 2011-05-03 2015-07-22 上海微电子装备有限公司 用于光刻设备的粗动台的质心测校的方法
TWI494725B (zh) * 2012-12-18 2015-08-01 Ind Tech Res Inst 控制裝置、控制方法及位置命令補償方法
CN106863267B (zh) * 2017-01-19 2020-02-28 中国科学院自动化研究所 重心驱动并联xy运动平台及其控制系统
WO2021044710A1 (ja) * 2019-09-02 2021-03-11 パナソニックＩｐマネジメント株式会社 ステージ位置制御装置、及びステージ位置制御方法
TWI726498B (zh) 2019-11-22 2021-05-01 財團法人工業技術研究院 龍門機構線上慣量匹配同步控制方法

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US4376416A (en) * 1980-02-19 1983-03-15 Carver George P Convertible sailboat/motorboat
US4347996A (en) * 1980-05-22 1982-09-07 Raytheon Company Spin-stabilized projectile and guidance system therefor
EP0184407B1 (en) * 1984-12-04 1990-03-14 Canadian Patents and Development Limited Floating marine structure of thin disc form
JPH0659771B2 (ja) * 1988-09-30 1994-08-10 富士重工業株式会社 自動車用アクティブサスペンションの制御装置
CA1335239C (en) * 1989-08-09 1995-04-18 Mortimer S. Delroy Gyrostat propulsion system
JPH07115053A (ja) 1993-10-15 1995-05-02 Canon Inc 移動ステージ装置
US5798885A (en) * 1994-06-06 1998-08-25 Fujitsu Limited Head positioning control for disk apparatus using peak detection, polarity detection and sector mark detection
JPH09184537A (ja) 1996-01-05 1997-07-15 Canon Inc 除振装置
US6490025B1 (en) * 1997-03-17 2002-12-03 Nikon Corporation Exposure apparatus
JP3312297B2 (ja) * 1999-07-02 2002-08-05 住友重機械工業株式会社 ステージ位置制御装置
JP3481540B2 (ja) * 2000-02-21 2003-12-22 シャープ株式会社 ステージ装置
JP3540239B2 (ja) 2000-03-01 2004-07-07 シャープ株式会社 ステージ装置
US6538348B2 (en) * 2000-02-21 2003-03-25 Sharp Kabushiki Kaisha Stage device capable of moving an object to be positioned precisely to a target position
JP2001327152A (ja) 2000-05-12 2001-11-22 Yaskawa Electric Corp リニアモータ
JP3762401B2 (ja) * 2002-09-30 2006-04-05 キヤノン株式会社 位置決め装置及び露光装置並びにデバイスの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI549774B (zh) * 2010-06-18 2016-09-21 循環工程股份有限公司 使用編碼器反饋、誤差映像和空氣壓力控制的誤差補償系統

Also Published As

Publication number Publication date
JP4327672B2 (ja) 2009-09-09
US7333862B2 (en) 2008-02-19
CN1973250A (zh) 2007-05-30
JP2006031266A (ja) 2006-02-02
TWI292356B (zh) 2008-01-11
US20070068231A1 (en) 2007-03-29
CN100470431C (zh) 2009-03-18
WO2006006449A1 (ja) 2006-01-19

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