TW200600750A - A diffraction type angle positioning five-degree-of-freedom measuring apparatus - Google Patents

A diffraction type angle positioning five-degree-of-freedom measuring apparatus

Info

Publication number
TW200600750A
TW200600750A TW093119558A TW93119558A TW200600750A TW 200600750 A TW200600750 A TW 200600750A TW 093119558 A TW093119558 A TW 093119558A TW 93119558 A TW93119558 A TW 93119558A TW 200600750 A TW200600750 A TW 200600750A
Authority
TW
Taiwan
Prior art keywords
degree
measuring apparatus
angle positioning
type angle
diffraction type
Prior art date
Application number
TW093119558A
Other languages
Chinese (zh)
Other versions
TWI249609B (en
Inventor
Wen-Yuh Jywe
Chien-Hong Liu
Lung-Tien Li
Original Assignee
Nat Huwei Inst Of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nat Huwei Inst Of Technology filed Critical Nat Huwei Inst Of Technology
Priority to TW93119558A priority Critical patent/TWI249609B/en
Publication of TW200600750A publication Critical patent/TW200600750A/en
Application granted granted Critical
Publication of TWI249609B publication Critical patent/TWI249609B/en

Links

Abstract

The invented diffraction type angle positioning five-degree-of-freedom measuring apparatus, which applies optical interference and diffraction principle, includes a light source, a reflective cylinder diffraction grating, three beam splitters, two location sensors, a lens set, a photodiode array, and a revolving disc to be measured, wherein the photodiode array detects variations of interference strips to measure the angular displacement variation, and the two location sensors detect four position variations so as to measure two tilt angular errors and two radial errors of the revolving disc to be measured.
TW93119558A 2004-06-30 2004-06-30 Diffractive positioning 5-degree of freedom measuring device that uses optical interference and diffractive theories TWI249609B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW93119558A TWI249609B (en) 2004-06-30 2004-06-30 Diffractive positioning 5-degree of freedom measuring device that uses optical interference and diffractive theories

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW93119558A TWI249609B (en) 2004-06-30 2004-06-30 Diffractive positioning 5-degree of freedom measuring device that uses optical interference and diffractive theories

Publications (2)

Publication Number Publication Date
TW200600750A true TW200600750A (en) 2006-01-01
TWI249609B TWI249609B (en) 2006-02-21

Family

ID=37430163

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93119558A TWI249609B (en) 2004-06-30 2004-06-30 Diffractive positioning 5-degree of freedom measuring device that uses optical interference and diffractive theories

Country Status (1)

Country Link
TW (1) TWI249609B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104634280A (en) * 2015-02-03 2015-05-20 中国科学院上海光学精密机械研究所 Method for measuring absolute angle and rotating angle of universal horizontal turntable
CN111504184A (en) * 2020-04-22 2020-08-07 荆亮 Calibration method and calibration system for double-line laser measurement
CN112083633A (en) * 2020-09-30 2020-12-15 上海集成电路研发中心有限公司 Photoetching device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104634280A (en) * 2015-02-03 2015-05-20 中国科学院上海光学精密机械研究所 Method for measuring absolute angle and rotating angle of universal horizontal turntable
CN104634280B (en) * 2015-02-03 2017-09-12 中国科学院上海光学精密机械研究所 The measuring method of general level turntable absolute angle and the anglec of rotation
CN111504184A (en) * 2020-04-22 2020-08-07 荆亮 Calibration method and calibration system for double-line laser measurement
CN111504184B (en) * 2020-04-22 2022-04-22 荆亮 Calibration method and calibration system for double-line laser measurement
CN112083633A (en) * 2020-09-30 2020-12-15 上海集成电路研发中心有限公司 Photoetching device

Also Published As

Publication number Publication date
TWI249609B (en) 2006-02-21

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