TW200520170A - Coiled memory device and method of making the same - Google Patents

Coiled memory device and method of making the same

Info

Publication number
TW200520170A
TW200520170A TW093116343A TW93116343A TW200520170A TW 200520170 A TW200520170 A TW 200520170A TW 093116343 A TW093116343 A TW 093116343A TW 93116343 A TW93116343 A TW 93116343A TW 200520170 A TW200520170 A TW 200520170A
Authority
TW
Taiwan
Prior art keywords
making
same
memory device
coiled
circuit layer
Prior art date
Application number
TW093116343A
Other languages
English (en)
Inventor
Harvey C Nathanson
Robert S Howell
Garrett A Storaska
Original Assignee
Northrop Grumman Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Northrop Grumman Corp filed Critical Northrop Grumman Corp
Publication of TW200520170A publication Critical patent/TW200520170A/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1203Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/84Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78603Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the insulating substrate or support

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Thin Film Transistor (AREA)
TW093116343A 2003-06-06 2004-06-07 Coiled memory device and method of making the same TW200520170A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US47620003P 2003-06-06 2003-06-06
US53217503P 2003-12-24 2003-12-24

Publications (1)

Publication Number Publication Date
TW200520170A true TW200520170A (en) 2005-06-16

Family

ID=33514072

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093116343A TW200520170A (en) 2003-06-06 2004-06-07 Coiled memory device and method of making the same

Country Status (6)

Country Link
US (1) US7488994B2 (zh)
EP (1) EP1636837B1 (zh)
JP (1) JP2006527484A (zh)
AT (1) ATE527691T1 (zh)
TW (1) TW200520170A (zh)
WO (1) WO2004109794A2 (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080009687A1 (en) * 2003-06-06 2008-01-10 Smith Joseph T Coiled circuit bio-sensor
US7868358B2 (en) * 2003-06-06 2011-01-11 Northrop Grumman Systems Corporation Coiled circuit device with active circuitry and methods for making the same
US7795647B2 (en) * 2003-06-06 2010-09-14 Northrop Grumman Systems Corporation Curled semiconductor transistor
TWI234188B (en) * 2004-08-18 2005-06-11 Ind Tech Res Inst Method for fabricating semiconductor device
EP1943186A4 (en) * 2005-09-23 2012-06-06 Northrop Grumman Systems Corp MICROSCOPIC ELECTRO-MECHANICAL SYSTEMS, NANOSCULES USING HIGH FREQUENCY DEVICES AND SPIRAL TERMINATION TECHNIQUES FOR PRODUCING THE SAME
US7834424B2 (en) * 2006-09-12 2010-11-16 The Board Of Trustees Of The Leland Stanford Junior University Extendable connector and network
WO2008148413A1 (en) * 2007-06-08 2008-12-11 Alex Kleiner Rolled- up micro-solenoids and micro-transformers
US20100221596A1 (en) * 2009-02-06 2010-09-02 Huggins Robert A Systems, methods of manufacture and use involving lithium and/or hydrogen for energy-storage applications
US7902541B2 (en) * 2009-04-03 2011-03-08 International Business Machines Corporation Semiconductor nanowire with built-in stress
US20110019370A1 (en) * 2009-07-27 2011-01-27 Gainteam Holdings Limited Flexible circuit module
EP2734261B1 (en) 2011-07-18 2018-02-21 Mor-Research Applications Ltd. A device for adjusting the intraocular pressure
USD709894S1 (en) * 2012-09-22 2014-07-29 Apple Inc. Electronic device
DE102012221932A1 (de) * 2012-11-30 2014-06-05 Leibniz-Institut für Festkörper- und Werkstoffforschung e.V. Aufgerollte, dreidimensionale Feldeffekttransistoren und ihre Verwendung in der Elektronik, Sensorik und Mikrofluidik
US11444148B2 (en) * 2018-12-17 2022-09-13 Intel Corporation Recoiled metal thin film for 3D inductor with tunable core

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4510551A (en) * 1984-05-21 1985-04-09 Endeco Canada Limited Portable memory module
JPH06125153A (ja) * 1992-10-12 1994-05-06 Shinko Electric Ind Co Ltd 窒化アルミニウム回路基板及びその製造方法
US5689136A (en) * 1993-08-04 1997-11-18 Hitachi, Ltd. Semiconductor device and fabrication method
US6464687B1 (en) 1999-03-09 2002-10-15 Ball Semiconductor, Inc. Implantable drug delivery system
US6183267B1 (en) 1999-03-11 2001-02-06 Murray Hill Devices Ultra-miniature electrical contacts and method of manufacture
US6496351B2 (en) 1999-12-15 2002-12-17 Jds Uniphase Inc. MEMS device members having portions that contact a substrate and associated methods of operating
CA2305069A1 (en) 2000-04-12 2001-10-12 Yanwei Zhang Micromachined element and method of fabrication thereof
AU2001262948A1 (en) * 2000-04-25 2001-11-07 Standard Mems, Inc. Louvers for spacecraft thermal control
US6856225B1 (en) 2000-05-17 2005-02-15 Xerox Corporation Photolithographically-patterned out-of-plane coil structures and method of making
US6396620B1 (en) 2000-10-30 2002-05-28 Mcnc Electrostatically actuated electromagnetic radiation shutter
JP4070176B2 (ja) 2000-12-01 2008-04-02 株式会社山武 球状半導体装置
US6655964B2 (en) 2001-02-09 2003-12-02 Xerox Corporation Low cost integrated out-of-plane micro-device structures and method of making
ITTO20010250A1 (it) * 2001-03-16 2002-09-16 Fiat Ricerche Dispositivo micro-otturatore ottico a controllo elettrostatico con elettrodo fisso non trasparente.
DE10122324A1 (de) * 2001-05-08 2002-11-14 Philips Corp Intellectual Pty Flexible integrierte monolithische Schaltung

Also Published As

Publication number Publication date
US20050013151A1 (en) 2005-01-20
WO2004109794A3 (en) 2005-04-28
WO2004109794B1 (en) 2005-09-01
ATE527691T1 (de) 2011-10-15
US7488994B2 (en) 2009-02-10
EP1636837A2 (en) 2006-03-22
EP1636837B1 (en) 2011-10-05
JP2006527484A (ja) 2006-11-30
WO2004109794A2 (en) 2004-12-16

Similar Documents

Publication Publication Date Title
TW200520170A (en) Coiled memory device and method of making the same
TW200730062A (en) Multilayered wiring substrate and method of manufacturing the same
TW200614298A (en) Thick-film capacitors, embedding thick-film capacitors inside printed circuit boards, and methods of forming such capacitors and printed circuit boards
TW362222B (en) Coiled component and its production method
WO2007120697A3 (en) Methods and apparatus for integrated circuit having multiple dies with at least one on chip capacitor
WO2003019569A3 (en) Magneto-electronic component
TW200503255A (en) Non-volatile memory device
TW200516708A (en) An integrated circuit structure and a manufacturing method thereof
TW200802889A (en) Semiconductor device and manufacturing method thereof
TW200629414A (en) Low-k dielectric layer formed from aluminosilicate precursors
TW200637051A (en) Mask, mask manufacturing method, pattern forming apparatus, and pattern formation method
WO2006094241A3 (en) Thin-film device comprising an oxide semiconductor and method of selective annealing a blanket coated oxide semiconductor layer
EP1560280A4 (en) THIN FILM MULTILAYER BODY, ELECTRONIC DEVICE USING SUCH BODY, CONTROL UNIT, AND MANUFACTURING METHOD THEREOF
WO2006047025A3 (en) Method of forming a component having dielectric sub-layers
TW200616105A (en) Integrated low-k hard mask
JP2012134329A5 (zh)
TW200637043A (en) Superconducting thin film material, superconducting wire rod and the method for manufacturing the same
GB2436505A (en) A single chip having a magnetoresistive memory
TW200731505A (en) Magnetic-bias ferromagnetic spiral inductor
WO2003085698A3 (en) Encapsulated organic semiconductor device and method
WO2005001854A3 (en) Method for manufacturing a transformer winding
WO2008088831A3 (en) Coiled circuit device with active circuitry and methods for making the same
WO2002102924A3 (en) Electroluminescent devices
ATE467219T1 (de) Verfahren zur herstellung einer spule und eine spule
EP4083081A4 (en) ACTINIC RADIATION SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RADIATION SENSITIVE OR RADIO SENSITIVE FILM, METHOD OF PATTERNING AND METHOD OF MANUFACTURING AN ELECTRONIC DEVICE