TW200514864A - Vacuum-processing equipment for plane rectangular or quadratic substrate - Google Patents

Vacuum-processing equipment for plane rectangular or quadratic substrate

Info

Publication number
TW200514864A
TW200514864A TW093108293A TW93108293A TW200514864A TW 200514864 A TW200514864 A TW 200514864A TW 093108293 A TW093108293 A TW 093108293A TW 93108293 A TW93108293 A TW 93108293A TW 200514864 A TW200514864 A TW 200514864A
Authority
TW
Taiwan
Prior art keywords
substrate
vacuum
disposer
arrangements
chamber
Prior art date
Application number
TW093108293A
Other languages
English (en)
Other versions
TWI250220B (en
Inventor
Ralph Lindenberg
Frank Fuchs
Uwe Schussler
Stefan Bangert
Tobias Stolley
Original Assignee
Applied Films Gmbh & Co Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Films Gmbh & Co Kg filed Critical Applied Films Gmbh & Co Kg
Publication of TW200514864A publication Critical patent/TW200514864A/zh
Application granted granted Critical
Publication of TWI250220B publication Critical patent/TWI250220B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/067Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/02Controlled or contamination-free environments or clean space conditions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Chemical And Physical Treatments For Wood And The Like (AREA)
  • Wrappers (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
TW093108293A 2003-10-17 2004-03-26 Vacuum-processing equipment for plane rectangular or quadratic substrate TWI250220B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10348281A DE10348281B4 (de) 2003-10-17 2003-10-17 Vakuum-Behandlungsanlage für ebene rechteckige oder quadratische Substrate

Publications (2)

Publication Number Publication Date
TW200514864A true TW200514864A (en) 2005-05-01
TWI250220B TWI250220B (en) 2006-03-01

Family

ID=34353448

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093108293A TWI250220B (en) 2003-10-17 2004-03-26 Vacuum-processing equipment for plane rectangular or quadratic substrate

Country Status (9)

Country Link
US (1) US20050081791A1 (zh)
EP (1) EP1524215B1 (zh)
JP (1) JP3997223B2 (zh)
KR (1) KR100689652B1 (zh)
CN (1) CN100381605C (zh)
AT (1) ATE334920T1 (zh)
DE (2) DE10348281B4 (zh)
PL (1) PL1524215T3 (zh)
TW (1) TWI250220B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007022431A1 (de) * 2007-05-09 2008-11-13 Leybold Optics Gmbh Behandlungssystem für flache Substrate
ATE518970T1 (de) 2008-02-01 2011-08-15 Applied Materials Inc Doppelbeschichtungsvorrichtung mit verbesserter trennplatte
WO2010055876A1 (ja) * 2008-11-14 2010-05-20 株式会社アルバック 有機薄膜蒸着装置、有機el素子製造装置、及び有機薄膜蒸着方法
DE102008059794B3 (de) * 2008-12-01 2010-04-01 Grenzebach Maschinenbau Gmbh Verfahren und Vorrichtung zur Umkehr der Beschickung von Sputter-Beschichtungsanlagen in Reinräumen, sowie Computerprogramm zur Durchführung des Verfahrens und maschinenlesbarer Träger mit dem Programmcode
DE102010043883A1 (de) * 2010-11-12 2012-05-16 Von Ardenne Anlagentechnik Gmbh Beschichtungsverfahren und Beschichtungsanlage
CN103147053B (zh) * 2012-12-14 2015-04-22 广东志成冠军集团有限公司 多功能连续式磁控溅射镀膜装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE648039A (zh) *
FR2307770A1 (fr) * 1975-04-17 1976-11-12 Saint Gobain Dispositif automatique pour servir des feuilles de verre sur une machine et simultanement evacuer les feuilles travaillees
GB8501177D0 (en) * 1985-01-17 1985-02-20 Edwards A M Plate glass handling machine
JP2948842B2 (ja) * 1989-11-24 1999-09-13 日本真空技術株式会社 インライン型cvd装置
KR100327716B1 (ko) * 1994-01-11 2002-06-27 노만 에이취. 폰드 진공처리시스템및진공처리시스템내에서의기판조작방법
CH691376A5 (de) * 1995-10-17 2001-07-13 Unaxis Balzers Ag Vakuumanlage zur Oberflächenbearbeitung von Werkstücken.
JP2001253536A (ja) * 2000-03-09 2001-09-18 Hirata Corp 基板移載ロボット装置
JP4856308B2 (ja) * 2000-12-27 2012-01-18 キヤノンアネルバ株式会社 基板処理装置及び経由チャンバー
JP3794964B2 (ja) * 2002-02-06 2006-07-12 三菱重工業株式会社 クラスタ型真空処理装置
PL1617456T3 (pl) * 2004-05-28 2007-03-30 Applied Mat Gmbh & Co Kg Mechanizm napędowy dla instalacji do obróbki próżniowej

Also Published As

Publication number Publication date
KR100689652B1 (ko) 2007-03-08
DE502004001084D1 (de) 2006-09-14
CN1609269A (zh) 2005-04-27
JP3997223B2 (ja) 2007-10-24
EP1524215A1 (de) 2005-04-20
EP1524215B1 (de) 2006-08-02
KR20050037360A (ko) 2005-04-21
CN100381605C (zh) 2008-04-16
DE10348281B4 (de) 2007-06-06
JP2005120468A (ja) 2005-05-12
DE10348281A1 (de) 2005-05-19
PL1524215T3 (pl) 2006-11-30
TWI250220B (en) 2006-03-01
US20050081791A1 (en) 2005-04-21
ATE334920T1 (de) 2006-08-15

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees