TW200510936A - Spacer for display panels, radiation sensitive resin composition and liquid crystal display device - Google Patents

Spacer for display panels, radiation sensitive resin composition and liquid crystal display device

Info

Publication number
TW200510936A
TW200510936A TW093116718A TW93116718A TW200510936A TW 200510936 A TW200510936 A TW 200510936A TW 093116718 A TW093116718 A TW 093116718A TW 93116718 A TW93116718 A TW 93116718A TW 200510936 A TW200510936 A TW 200510936A
Authority
TW
Taiwan
Prior art keywords
spacer
radiation sensitive
liquid crystal
resin composition
sensitive resin
Prior art date
Application number
TW093116718A
Other languages
Chinese (zh)
Other versions
TWI336815B (en
Inventor
Daigo Ichinohe
Tomohiro Uetsuhara
Toshihiro Nishio
Michinori Nishikawa
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200510936A publication Critical patent/TW200510936A/en
Application granted granted Critical
Publication of TWI336815B publication Critical patent/TWI336815B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

A spacer for display panels which can keep the gap width between substrates constant at normal temperature and high temperatures and can always ensure excellent display quality without being affected by temperature variations. This spacer has a linear thermal expansion coefficient of higher than 2.0×10-4/ DEG C and 8.0×10-4/ DEG C or lower. A radiation sensitive resin composition which gives this spacer comprises [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride and (a2) an unsaturated compound other than the component (a1), [B] a polyfunctional unsaturated monomer and [C] a radiation sensitive polymerization initiator. A liquid crystal display device comprising the above spacer.
TW093116718A 2003-06-12 2004-06-10 Spacer for display panels, radiation sensitive resin composition and liquid crystal display device TWI336815B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003167238A JP4016893B2 (en) 2003-06-12 2003-06-12 Radiation sensitive resin composition and liquid crystal display element used for forming spacer for display panel

Publications (2)

Publication Number Publication Date
TW200510936A true TW200510936A (en) 2005-03-16
TWI336815B TWI336815B (en) 2011-02-01

Family

ID=34093100

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093116718A TWI336815B (en) 2003-06-12 2004-06-10 Spacer for display panels, radiation sensitive resin composition and liquid crystal display device

Country Status (5)

Country Link
JP (1) JP4016893B2 (en)
KR (1) KR100874567B1 (en)
CN (1) CN100526981C (en)
SG (1) SG120989A1 (en)
TW (1) TWI336815B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101142516B (en) * 2005-03-14 2011-08-24 富士通株式会社 LCD device and method for manufacturing the same
TWI411877B (en) * 2005-06-15 2013-10-11 Jsr Corp A photosensitive resin composition, a display panel spacer, and a display panel
JP2007033635A (en) * 2005-07-25 2007-02-08 Fujitsu Ltd Liquid crystal display element and method for manufacturing the same
JP5313499B2 (en) * 2005-08-30 2013-10-09 京セラケミカル株式会社 Photosensitive resin composition, spacer, color filter, and liquid crystal display device
WO2007105381A1 (en) * 2006-03-13 2007-09-20 Fujifilm Corporation Photosensitive resin composition for photospacer, method for producing photospacer, substrate for liquid crystal display, liquid crystal display element, and liquid crystal display
JP4816917B2 (en) * 2006-03-17 2011-11-16 Ｊｓｒ株式会社 Radiation-sensitive resin composition, spacer for liquid crystal display panel, method for forming spacer for liquid crystal display panel, and liquid crystal display panel
KR101241596B1 (en) 2006-07-28 2013-03-08 코오롱인더스트리 주식회사 Photoresist resin composition for column spacer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11133600A (en) 1997-10-30 1999-05-21 Jsr Corp Radiation-sensitive resin composition for display panel spacer
JP2001154206A (en) * 1999-11-25 2001-06-08 Jsr Corp Radiation sensitive resin composition for spacer, spacer and liquid crystal display element
JP4269480B2 (en) * 2000-04-19 2009-05-27 Ｊｓｒ株式会社 Radiation sensitive resin composition
JP4660990B2 (en) * 2001-07-17 2011-03-30 Ｊｓｒ株式会社 Radiation-sensitive resin composition, projection material and spacer formed therefrom, and liquid crystal display device comprising the same
JP2003066604A (en) * 2001-08-28 2003-03-05 Jsr Corp Radiation sensitive resin composition for spacer, spacer and liquid crystal display element
JP3734436B2 (en) 2001-09-19 2006-01-11 奇美実業股▲分▼有限公司 Photosensitive resin composition for liquid crystal display spacers

Also Published As

Publication number Publication date
JP2005003930A (en) 2005-01-06
JP4016893B2 (en) 2007-12-05
TWI336815B (en) 2011-02-01
CN1573547A (en) 2005-02-02
SG120989A1 (en) 2006-04-26
KR100874567B1 (en) 2008-12-16
CN100526981C (en) 2009-08-12
KR20040107392A (en) 2004-12-20

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