TW200509235A - Apparatus for wafer rinsing and drying - Google Patents

Apparatus for wafer rinsing and drying

Info

Publication number
TW200509235A
TW200509235A TW092123076A TW92123076A TW200509235A TW 200509235 A TW200509235 A TW 200509235A TW 092123076 A TW092123076 A TW 092123076A TW 92123076 A TW92123076 A TW 92123076A TW 200509235 A TW200509235 A TW 200509235A
Authority
TW
Taiwan
Prior art keywords
liquid
drain
drying
wafer
turbulent
Prior art date
Application number
TW092123076A
Other languages
Chinese (zh)
Other versions
TWI238463B (en
Inventor
Yuan-Hsin Li
Chih-Hung Wu
Yang-Shih Hsu
Han-Min Huang
Original Assignee
Grand Plastic Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grand Plastic Technology Corp filed Critical Grand Plastic Technology Corp
Priority to TW92123076A priority Critical patent/TWI238463B/en
Publication of TW200509235A publication Critical patent/TW200509235A/en
Application granted granted Critical
Publication of TWI238463B publication Critical patent/TWI238463B/en

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

The present invention discloses a wafer rinsing and drying apparatus by using an open type rinse tank, supplying liquid from the bottom of tank by controlling the liquid flow pattern to form turbulent flow, and by keeping constant flow rate of the drain to perform accuracy and continuous rinsing and drying. The drying apparatus using liquid phase drying liquid (i.e.isopropanol, IPA) to displace water, such that the wafer may dry quickly and cleanly. Comprising: a rinse tank; a drain plate tilt outwardly; plurality of drain outlet to drain contamination particle quickly; plurality of liquid inlet, stretching into the rinse tank to form a turbulent, the vertical inlet(s) also to be the liquid outlet; plurality of aspirator control the flow rate by programming to form a turbulent, helping the cleaning of the wafer. The drain rate is under control by a plurality of aspirators to keep a constant and steady drain, such that the liquid surface can steadily come down.
TW92123076A 2003-08-21 2003-08-21 Apparatus for wafer rinsing and drying TWI238463B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92123076A TWI238463B (en) 2003-08-21 2003-08-21 Apparatus for wafer rinsing and drying

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92123076A TWI238463B (en) 2003-08-21 2003-08-21 Apparatus for wafer rinsing and drying

Publications (2)

Publication Number Publication Date
TW200509235A true TW200509235A (en) 2005-03-01
TWI238463B TWI238463B (en) 2005-08-21

Family

ID=37000275

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92123076A TWI238463B (en) 2003-08-21 2003-08-21 Apparatus for wafer rinsing and drying

Country Status (1)

Country Link
TW (1) TWI238463B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110544649A (en) * 2018-05-29 2019-12-06 政汉电子科技有限公司 batch-type wet etching cleaning device and batch-type wet etching cleaning method
CN111842348A (en) * 2020-05-29 2020-10-30 广州新诚生物科技有限公司 Cleaning device and using method
CN112599441A (en) * 2020-11-30 2021-04-02 硅密芯镀(海宁)半导体技术有限公司 Cleaning system, wafer cleaning equipment and wafer soaking and washing method
WO2023029203A1 (en) * 2021-09-02 2023-03-09 长鑫存储技术有限公司 Semiconductor structure cleaning device and cleaning method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108447799B (en) * 2017-02-16 2022-03-01 弘塑科技股份有限公司 Wet chemical treatment apparatus and method of using same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110544649A (en) * 2018-05-29 2019-12-06 政汉电子科技有限公司 batch-type wet etching cleaning device and batch-type wet etching cleaning method
CN110544649B (en) * 2018-05-29 2024-06-07 政汉电子科技有限公司 Batch type wet etching cleaning device and batch type wet etching cleaning method
CN111842348A (en) * 2020-05-29 2020-10-30 广州新诚生物科技有限公司 Cleaning device and using method
CN112599441A (en) * 2020-11-30 2021-04-02 硅密芯镀(海宁)半导体技术有限公司 Cleaning system, wafer cleaning equipment and wafer soaking and washing method
WO2023029203A1 (en) * 2021-09-02 2023-03-09 长鑫存储技术有限公司 Semiconductor structure cleaning device and cleaning method

Also Published As

Publication number Publication date
TWI238463B (en) 2005-08-21

Similar Documents

Publication Publication Date Title
CN104205304B (en) Substrate board treatment and substrate processing method using same
KR101925173B1 (en) Substrate processing apparatus and heater cleaning method
CN111032923B (en) Electroplating device
JP4734416B2 (en) Sulfuric acid electrolysis apparatus, electrolysis method, and substrate processing apparatus
US8216417B2 (en) Substrate treating apparatus and substrate treating method
TW200640584A (en) Method and apparatus for cleaning and drying substrates
KR101055465B1 (en) Substrate Processing Method and Substrate Processing Apparatus
CN206325876U (en) Wafer cleaning device
TW200509235A (en) Apparatus for wafer rinsing and drying
KR20170017806A (en) Substrate liquid processing apparatus, substrate liquid processing method, and storage medium
TW200807528A (en) Substrate treating apparatus
JP3556583B2 (en) Semiconductor substrate cleaning and drying equipment
KR20190002060A (en) Apparatus and Method for processing substrate
KR101295793B1 (en) Apparatus and method for supplying isopropyl alcohol liquid
JP2022167919A (en) bathroom
CN204842350U (en) Spare parts belt cleaning device
CA3080613C (en) Method for increasing dissolution of solid chemistry blocks
TW200509234A (en) Method for wafer drying
KR101425813B1 (en) Apparatus of cleaning and drying wafer
KR102215207B1 (en) Washing apparatus for parts of semiconductor equipment
CN210676159U (en) Cleaning tank and dresser cleaning system
US20150090299A1 (en) Processes and apparatus for cleaning, rinsing, and drying substrates
KR100549203B1 (en) Method and apparatus for wafer transaction
JP2862918B2 (en) Chemical treatment equipment
KR100912703B1 (en) Appartus for treating substrate and method for treating substrate using the same

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent