TW200509235A - Apparatus for wafer rinsing and drying - Google Patents
Apparatus for wafer rinsing and dryingInfo
- Publication number
- TW200509235A TW200509235A TW092123076A TW92123076A TW200509235A TW 200509235 A TW200509235 A TW 200509235A TW 092123076 A TW092123076 A TW 092123076A TW 92123076 A TW92123076 A TW 92123076A TW 200509235 A TW200509235 A TW 200509235A
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid
- drain
- drying
- wafer
- turbulent
- Prior art date
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The present invention discloses a wafer rinsing and drying apparatus by using an open type rinse tank, supplying liquid from the bottom of tank by controlling the liquid flow pattern to form turbulent flow, and by keeping constant flow rate of the drain to perform accuracy and continuous rinsing and drying. The drying apparatus using liquid phase drying liquid (i.e.isopropanol, IPA) to displace water, such that the wafer may dry quickly and cleanly. Comprising: a rinse tank; a drain plate tilt outwardly; plurality of drain outlet to drain contamination particle quickly; plurality of liquid inlet, stretching into the rinse tank to form a turbulent, the vertical inlet(s) also to be the liquid outlet; plurality of aspirator control the flow rate by programming to form a turbulent, helping the cleaning of the wafer. The drain rate is under control by a plurality of aspirators to keep a constant and steady drain, such that the liquid surface can steadily come down.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92123076A TWI238463B (en) | 2003-08-21 | 2003-08-21 | Apparatus for wafer rinsing and drying |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92123076A TWI238463B (en) | 2003-08-21 | 2003-08-21 | Apparatus for wafer rinsing and drying |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200509235A true TW200509235A (en) | 2005-03-01 |
TWI238463B TWI238463B (en) | 2005-08-21 |
Family
ID=37000275
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW92123076A TWI238463B (en) | 2003-08-21 | 2003-08-21 | Apparatus for wafer rinsing and drying |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI238463B (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110544649A (en) * | 2018-05-29 | 2019-12-06 | 政汉电子科技有限公司 | batch-type wet etching cleaning device and batch-type wet etching cleaning method |
CN111842348A (en) * | 2020-05-29 | 2020-10-30 | 广州新诚生物科技有限公司 | Cleaning device and using method |
CN112599441A (en) * | 2020-11-30 | 2021-04-02 | 硅密芯镀(海宁)半导体技术有限公司 | Cleaning system, wafer cleaning equipment and wafer soaking and washing method |
WO2023029203A1 (en) * | 2021-09-02 | 2023-03-09 | 长鑫存储技术有限公司 | Semiconductor structure cleaning device and cleaning method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108447799B (en) * | 2017-02-16 | 2022-03-01 | 弘塑科技股份有限公司 | Wet chemical treatment apparatus and method of using same |
-
2003
- 2003-08-21 TW TW92123076A patent/TWI238463B/en not_active IP Right Cessation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110544649A (en) * | 2018-05-29 | 2019-12-06 | 政汉电子科技有限公司 | batch-type wet etching cleaning device and batch-type wet etching cleaning method |
CN110544649B (en) * | 2018-05-29 | 2024-06-07 | 政汉电子科技有限公司 | Batch type wet etching cleaning device and batch type wet etching cleaning method |
CN111842348A (en) * | 2020-05-29 | 2020-10-30 | 广州新诚生物科技有限公司 | Cleaning device and using method |
CN112599441A (en) * | 2020-11-30 | 2021-04-02 | 硅密芯镀(海宁)半导体技术有限公司 | Cleaning system, wafer cleaning equipment and wafer soaking and washing method |
WO2023029203A1 (en) * | 2021-09-02 | 2023-03-09 | 长鑫存储技术有限公司 | Semiconductor structure cleaning device and cleaning method |
Also Published As
Publication number | Publication date |
---|---|
TWI238463B (en) | 2005-08-21 |
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