TW200507281A - Two mask Shottky barrier diode with LOGOS structure - Google Patents

Two mask Shottky barrier diode with LOGOS structure

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Publication number
TW200507281A
TW200507281A TW092121185A TW92121185A TW200507281A TW 200507281 A TW200507281 A TW 200507281A TW 092121185 A TW092121185 A TW 092121185A TW 92121185 A TW92121185 A TW 92121185A TW 200507281 A TW200507281 A TW 200507281A
Authority
TW
Taiwan
Prior art keywords
regions
doped
layer formed
field oxide
logos
Prior art date
Application number
TW092121185A
Other languages
Chinese (zh)
Other versions
TWI226709B (en
Inventor
Shye-Lin Wu
Original Assignee
Chip Integration Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chip Integration Tech Co Ltd filed Critical Chip Integration Tech Co Ltd
Priority to TW92121185A priority Critical patent/TWI226709B/en
Application granted granted Critical
Publication of TWI226709B publication Critical patent/TWI226709B/en
Publication of TW200507281A publication Critical patent/TW200507281A/en

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Abstract

A power Schottky rectifier device and method of making the same are disclosed. The Schottky rectifier device including a LOGOS structure and two p doped regions, which are positioned one above another therein to isolate cells so as to avoid premature of breakdown. The Schottky rectifier device comprises: an n-drift layer formed on an n+substrate; a cathode metal layer formed on a surface of the n+substrate opposite the n-drift layer; a pair of field oxide regions and termination region formed into the n-drift layer and each is spaced from each other by the mesas, where the mesas have metal silicide layer formed thereon. A top metal layer formed on the field oxide regions and termination region and contact with the silicide layer. Under each of field oxide regions and termination region is a p-doped and p-doped region cascade which provide depleted regions enclosed the p-doped regions to block the leakage current while a reverse bias voltage is exerted to the Schottky power rectifier diode.
TW92121185A 2003-08-01 2003-08-01 Two mask Schottky barrier diode with LOCOS structure TWI226709B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92121185A TWI226709B (en) 2003-08-01 2003-08-01 Two mask Schottky barrier diode with LOCOS structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92121185A TWI226709B (en) 2003-08-01 2003-08-01 Two mask Schottky barrier diode with LOCOS structure

Publications (2)

Publication Number Publication Date
TWI226709B TWI226709B (en) 2005-01-11
TW200507281A true TW200507281A (en) 2005-02-16

Family

ID=35634299

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92121185A TWI226709B (en) 2003-08-01 2003-08-01 Two mask Schottky barrier diode with LOCOS structure

Country Status (1)

Country Link
TW (1) TWI226709B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4743447B2 (en) 2008-05-23 2011-08-10 三菱電機株式会社 Semiconductor device
TWI743818B (en) * 2020-06-02 2021-10-21 台灣半導體股份有限公司 Schottky diode with multiple guard ring structures

Also Published As

Publication number Publication date
TWI226709B (en) 2005-01-11

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees