TW200507088A - System and method for cleaning of workpieces using supercritical carbon dioxide - Google Patents

System and method for cleaning of workpieces using supercritical carbon dioxide

Info

Publication number
TW200507088A
TW200507088A TW093113525A TW93113525A TW200507088A TW 200507088 A TW200507088 A TW 200507088A TW 093113525 A TW093113525 A TW 093113525A TW 93113525 A TW93113525 A TW 93113525A TW 200507088 A TW200507088 A TW 200507088A
Authority
TW
Taiwan
Prior art keywords
stream
output
cleaning
receive
workpieces
Prior art date
Application number
TW093113525A
Other languages
English (en)
Inventor
Michael A Fury
Robert W Sherrill
Original Assignee
Ekc Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ekc Technology Inc filed Critical Ekc Technology Inc
Publication of TW200507088A publication Critical patent/TW200507088A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02101—Cleaning only involving supercritical fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D2111/22—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/427—Stripping or agents therefor using plasma means only
TW093113525A 2003-05-13 2004-05-13 System and method for cleaning of workpieces using supercritical carbon dioxide TW200507088A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46982603P 2003-05-13 2003-05-13

Publications (1)

Publication Number Publication Date
TW200507088A true TW200507088A (en) 2005-02-16

Family

ID=33452327

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093113525A TW200507088A (en) 2003-05-13 2004-05-13 System and method for cleaning of workpieces using supercritical carbon dioxide

Country Status (4)

Country Link
US (1) US20040244818A1 (zh)
JP (1) JP2006528553A (zh)
TW (1) TW200507088A (zh)
WO (1) WO2004101181A2 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI501819B (zh) * 2011-02-23 2015-10-01 Organo Corp 過濾器之潔淨化方法及被處理體之清潔或乾燥方法
CN112974412A (zh) * 2021-02-23 2021-06-18 中国核动力研究设计院 放射性污染超临界二氧化碳化学去污方法及其去污装置

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060260657A1 (en) * 2005-05-18 2006-11-23 Jibb Richard J System and apparatus for supplying carbon dioxide to a semiconductor application
CN103339316B (zh) * 2011-02-02 2015-11-25 Ykk株式会社 清洗方法和清洗装置
CN103184424A (zh) * 2011-12-30 2013-07-03 陈柏颕 低温材料优质化方法及其处理装置
US9875916B2 (en) * 2012-07-09 2018-01-23 Tokyo Electron Limited Method of stripping photoresist on a single substrate system
JP6104836B2 (ja) * 2014-03-13 2017-03-29 東京エレクトロン株式会社 分離再生装置および基板処理装置
CN103977985A (zh) * 2014-05-05 2014-08-13 大连理工大学 一种再制造零部件复合清洗方法
US9381574B1 (en) * 2014-07-18 2016-07-05 Cleanlogix Llc Method and apparatus for cutting and cleaning a superhard substrate
JP6353379B2 (ja) * 2015-02-06 2018-07-04 オルガノ株式会社 二酸化炭素精製供給方法及びシステム
US20180323063A1 (en) * 2017-05-03 2018-11-08 Applied Materials, Inc. Method and apparatus for using supercritical fluids in semiconductor applications
US10695804B2 (en) 2018-01-25 2020-06-30 Applied Materials, Inc. Equipment cleaning apparatus and method
CN113436998B (zh) * 2021-07-02 2022-02-18 江苏鑫华半导体材料科技有限公司 一种超临界二氧化碳硅块清洗装置、硅块处理系统及方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5337446A (en) * 1992-10-27 1994-08-16 Autoclave Engineers, Inc. Apparatus for applying ultrasonic energy in precision cleaning
US5509431A (en) * 1993-12-14 1996-04-23 Snap-Tite, Inc. Precision cleaning vessel
US5783082A (en) * 1995-11-03 1998-07-21 University Of North Carolina Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
US5881577A (en) * 1996-09-09 1999-03-16 Air Liquide America Corporation Pressure-swing absorption based cleaning methods and systems
US6099619A (en) * 1997-10-09 2000-08-08 Uop Llc Purification of carbon dioxide
JP4169293B2 (ja) * 1998-04-30 2008-10-22 株式会社青木固研究所 提げ手を有する二軸延伸ボトル
US6277753B1 (en) * 1998-09-28 2001-08-21 Supercritical Systems Inc. Removal of CMP residue from semiconductors using supercritical carbon dioxide process
US6612317B2 (en) * 2000-04-18 2003-09-02 S.C. Fluids, Inc Supercritical fluid delivery and recovery system for semiconductor wafer processing
US6802961B2 (en) * 2000-03-13 2004-10-12 David P. Jackson Dense fluid cleaning centrifugal phase shifting separation process and apparatus
EP1189036A1 (de) * 2000-09-19 2002-03-20 Endress + Hauser GmbH + Co. Verfahren zum Bereitstellen von Messwerten und zur Berechnung der Kosten der Bereitstellung
US6425956B1 (en) * 2001-01-05 2002-07-30 International Business Machines Corporation Process for removing chemical mechanical polishing residual slurry

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI501819B (zh) * 2011-02-23 2015-10-01 Organo Corp 過濾器之潔淨化方法及被處理體之清潔或乾燥方法
CN112974412A (zh) * 2021-02-23 2021-06-18 中国核动力研究设计院 放射性污染超临界二氧化碳化学去污方法及其去污装置

Also Published As

Publication number Publication date
WO2004101181A2 (en) 2004-11-25
WO2004101181A3 (en) 2004-12-29
JP2006528553A (ja) 2006-12-21
US20040244818A1 (en) 2004-12-09

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