TW200504322A - Device for drying substrate and method for drying substrate - Google Patents

Device for drying substrate and method for drying substrate

Info

Publication number
TW200504322A
TW200504322A TW093118664A TW93118664A TW200504322A TW 200504322 A TW200504322 A TW 200504322A TW 093118664 A TW093118664 A TW 093118664A TW 93118664 A TW93118664 A TW 93118664A TW 200504322 A TW200504322 A TW 200504322A
Authority
TW
Taiwan
Prior art keywords
substrate
air
substrate surface
pushed
drying substrate
Prior art date
Application number
TW093118664A
Other languages
Chinese (zh)
Other versions
TWI321641B (en
Inventor
Futoshi Shimai
Shigeru Kawata
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200504322A publication Critical patent/TW200504322A/en
Application granted granted Critical
Publication of TWI321641B publication Critical patent/TWI321641B/zh

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
    • F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B15/00—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form
    • F26B15/10—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form with movement in a path composed of one or more straight lines, e.g. compound, the movement being in alternate horizontal and vertical directions
    • F26B15/12—Machines or apparatus for drying objects with progressive movement; Machines or apparatus with progressive movement for drying batches of material in compact form with movement in a path composed of one or more straight lines, e.g. compound, the movement being in alternate horizontal and vertical directions the lines being all horizontal or slightly inclined
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The object of this invention is to provide a drying device which forms mist of a small quantity scattering over a substrate surface. In this invention, the liquid which attaches to a surface of a substrate W conveyed by a conveying roller 2 is pushed into a gap between the substrate surface and an upper straightening vane 10 by air from an air knife 11. The liquid that is pushed in by the air from the upper air knife 11 and air current formed between the substrate surface and the upper straitening vane 11, and then pushed out from along the substrate surface towards the upstream, wherein the upper straightening vane 10 is arranged in an oblique manner. The substrate W is finally placed outside the drying device by flowing towards an upper exhaust means 6.
TW093118664A 2003-06-27 2004-06-25 Device for drying substrate and method for drying substrate TW200504322A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003184525A JP3865717B2 (en) 2003-06-27 2003-06-27 Substrate drying apparatus and substrate drying method

Publications (2)

Publication Number Publication Date
TW200504322A true TW200504322A (en) 2005-02-01
TWI321641B TWI321641B (en) 2010-03-11

Family

ID=34184261

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093118664A TW200504322A (en) 2003-06-27 2004-06-25 Device for drying substrate and method for drying substrate

Country Status (4)

Country Link
JP (1) JP3865717B2 (en)
KR (1) KR101074957B1 (en)
CN (1) CN100412486C (en)
TW (1) TW200504322A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4494269B2 (en) * 2005-03-30 2010-06-30 大日本スクリーン製造株式会社 Substrate processing equipment
JP4679403B2 (en) * 2006-03-20 2011-04-27 株式会社日立ハイテクノロジーズ Substrate drying apparatus, substrate drying method, and substrate manufacturing method
KR200452969Y1 (en) * 2008-12-29 2011-04-04 주식회사 케이씨텍 Dryer for large-area substrate
JP2013045877A (en) * 2011-08-24 2013-03-04 Tokyo Electron Ltd Substrate processing apparatus
KR101557021B1 (en) * 2011-11-07 2015-10-02 (주) 나인테크 The apparatus for drying the substrate
JP6209572B2 (en) * 2015-01-28 2017-10-04 芝浦メカトロニクス株式会社 Substrate processing equipment
JP6801926B2 (en) * 2016-09-26 2020-12-16 株式会社Ｓｃｒｅｅｎホールディングス Substrate processing method and substrate processing equipment
KR102498913B1 (en) * 2021-06-29 2023-02-13 주식회사 디엠에스 Dry apparatus of substrate

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5014447A (en) * 1988-02-10 1991-05-14 Thermo Electron Web Systems, Inc. Positive pressure web floater dryer with parallel flow
JPH0244327U (en) * 1988-09-20 1990-03-27
JPH0735478A (en) * 1993-07-20 1995-02-07 Shimada Phys & Chem Ind Co Ltd Air knife device
JPH09159360A (en) * 1995-12-07 1997-06-20 Joichi Takada Plate type matter drying device
JP2983495B2 (en) * 1997-05-20 1999-11-29 株式会社カイジョー Substrate drying method
JPH11354487A (en) * 1998-06-03 1999-12-24 Dainippon Screen Mfg Co Ltd Method and equipment for drying substrate
JP4213805B2 (en) * 1999-02-09 2009-01-21 芝浦メカトロニクス株式会社 Drying processing equipment
JP3754905B2 (en) * 2001-09-10 2006-03-15 東京エレクトロン株式会社 Substrate dryer
JP2003124184A (en) * 2001-10-18 2003-04-25 Sumitomo Precision Prod Co Ltd Substrate processor

Also Published As

Publication number Publication date
KR101074957B1 (en) 2011-10-18
JP2005016887A (en) 2005-01-20
CN100412486C (en) 2008-08-20
KR20050001374A (en) 2005-01-06
JP3865717B2 (en) 2007-01-10
TWI321641B (en) 2010-03-11
CN1576763A (en) 2005-02-09

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