TW200500798A - Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film - Google Patents

Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film

Info

Publication number
TW200500798A
TW200500798A TW093114346A TW93114346A TW200500798A TW 200500798 A TW200500798 A TW 200500798A TW 093114346 A TW093114346 A TW 093114346A TW 93114346 A TW93114346 A TW 93114346A TW 200500798 A TW200500798 A TW 200500798A
Authority
TW
Taiwan
Prior art keywords
inorganic material
material film
photosensitive composition
film
manufacturing process
Prior art date
Application number
TW093114346A
Other languages
Chinese (zh)
Inventor
Yoshihiro Takagi
Original Assignee
Fujifilm Arch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Arch Co Ltd filed Critical Fujifilm Arch Co Ltd
Publication of TW200500798A publication Critical patent/TW200500798A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B31/00—Packaging articles or materials under special atmospheric or gaseous conditions; Adding propellants to aerosol containers
    • B65B31/04—Evacuating, pressurising or gasifying filled containers or wrappers by means of nozzles through which air or other gas, e.g. an inert gas, is withdrawn or supplied
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories

Landscapes

  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Silicon Compounds (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Formation Of Insulating Films (AREA)
  • Laminated Bodies (AREA)

Abstract

Provided are an inorganic material film having a low dielectric constant and a high precision fine structure, an inorganic material film structure, a manufacturing process thereof, and a transfer film which can be easily produced, having good adhesion to a substrate, and having a photosensitive composition of good developability. The inorganic material film is a porous inorganic material film obtained by calcining a photosensitive composition containing at an inorganic powder. The inorganic material film has a void area ratio of 5 to 75% and a void size of O.1 to 30μm A process for manufacturing the inorganic material film structure by providing the photosensitive composition on a substrate, subjecting it to exposure and development treatments to form a pattern and then calcining it. A transfer film having a coating layer containing the above photosensitive composition on a flexible temporary support.
TW093114346A 2003-05-23 2004-05-21 Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film TW200500798A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003146327A JP3804016B2 (en) 2003-05-23 2003-05-23 Inorganic material film, inorganic material film structure, method for producing the same, and transfer film

Publications (1)

Publication Number Publication Date
TW200500798A true TW200500798A (en) 2005-01-01

Family

ID=33533208

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093114346A TW200500798A (en) 2003-05-23 2004-05-21 Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film

Country Status (3)

Country Link
JP (1) JP3804016B2 (en)
KR (1) KR20040100957A (en)
TW (1) TW200500798A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7214466B1 (en) * 2005-12-14 2007-05-08 E. I. Du Pont De Nemours And Company Cationically polymerizable photoimageable thick film compositions, electrodes, and methods of forming thereof
JP2007287559A (en) * 2006-04-19 2007-11-01 Sony Corp Plasma display panel and method of manufacturing the same
JP4917466B2 (en) * 2007-03-30 2012-04-18 日本電信電話株式会社 Thin film formation method
KR100936518B1 (en) * 2008-09-19 2010-01-13 재단법인대구경북과학기술원 Curable composition for liquid crystal display and liquid crystal display comprising barrier rib and alignment layer manufactured using the same
JP5524776B2 (en) * 2010-09-10 2014-06-18 日本電信電話株式会社 Thin film forming method and sheet film
KR20160060069A (en) * 2013-09-20 2016-05-27 나미키 세이미츠 호오세키 가부시키가이샤 Substrate and method for manufacturing same, light-emitting element and method for manufacturing same, and device having substrate or light-emitting element
JP2018110137A (en) * 2015-03-19 2018-07-12 アダマンド並木精密宝石株式会社 Substrate and method for manufacturing the same, light-emitting element and method for manufacturing the same, and device having substrate or light-emitting element
JP7434736B2 (en) * 2019-06-28 2024-02-21 Ｔｏｐｐａｎホールディングス株式会社 Light control sheet and light control device

Also Published As

Publication number Publication date
JP3804016B2 (en) 2006-08-02
JP2004345917A (en) 2004-12-09
KR20040100957A (en) 2004-12-02

Similar Documents

Publication Publication Date Title
TW200801788A (en) Resist underlayer coating forming composition for mask blank, mask blank and mask
TW200734825A (en) Silicon-containing resist underlayer coating forming composition for forming resist under-layer coating of photo-crosslink cure
TW200801801A (en) Process for producing patterned film and photosensitive resin composition
TW200710580A (en) Resist underlayer coating forming composition for forming photocrosslinking curable resist underlayer coating
TW200606592A (en) Sublayer coating-forming composition containing naphthalene ring having halogen atom for lithography
EP1939691A3 (en) Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
EP1845416A3 (en) Coating compositions for photolithography
JPS57130430A (en) Pattern formation
TW200500798A (en) Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film
TW200801815A (en) Method for forming pattern and composition for forming organic thin film using therefor
TW200506538A (en) Resist pattern thickening material, process for forming resist pattern using the same, and process for manufacturing semiconductor device using the same
TW200503046A (en) Inorganic material film, inorganic material film structure, manufacturing process thereof, and transfer film
TW200502434A (en) Adhesive layer forming method
TW200628529A (en) Inorganic material film, inorganic material film structure, the process of manufacture them and a transfer film
JPS5249772A (en) Process for production of semiconductor device
JPS5687471A (en) Coating process
TW200608575A (en) Preparation method of thin film transistor and its structure
JPS51127680A (en) Manufacturing process of semiconductor device
JPS53120527A (en) Forming method of positive type radiation sensitive material layer
JPS6461025A (en) Method of finely processing polyimide film
JPS5515149A (en) Forming method of resist for microfabrication
JPS5294782A (en) Insulation gate type ic
TW200710942A (en) Method for fabricating semiconductor device including resist flow process and film coating process
JPS5224084A (en) Semiconductor manufacturing rpocess
TW364204B (en) Method for producing semiconductor capacitor of the semiconductor and its eletrode plate