200426346 玖、發明說明： 【發明所屬之技術領】 本發明係關於一種使用光柵式干涉儀之三維量測系 統，特別是指一種使用光栅式干涉儀之三維量測系統。 【先前技術】 近年來Ik工具機、各種産業機械、量測儀器的高精度 化，加上超精密加工機、半導體制程裝置、電子資訊機器、 原子力顯微鏡等的需要高精密定位技術儀器的發展，不論是 j精密機械、半導體産業、微（奈）米科技皆朝微小化、: 密化與奈米級的方向前進，因此在精密機械領域之量測設 備、製造技術、整合技術的發展，微奈米定位平臺與精密： 位檢測技術的相關研究是不容克緩。 阳猾密平壹運動是多 人〜J矽詈者各目参 産生誤差，實際運動時’會産生六自由度誤差包括三她 移誤差⑽，心與三個角位移俯仰、搖擺、滾動誤差，由於沒 動平臺是經由線性元件、旋轉平臺及其它元件經設計組裝a 具有多自由度運動，機5|中之久链、富去 械裔Τ之各種運動平臺的特性將影響養 台機器的精度與加工産品的品質’被加工工件的定位、精窃 零件的安裝及目標物體在空間運動位置和姿態都需要多』 六個自由度的量測與調整或控制。因此對多自由度的檢則 提出更高要求’都希望能同時量測卫件、零部件或目標㈣ 在空間的多個自由度。 而在檢測線性平臺及χ、γ運動平臺的量測儀器上，大 部分的量測❹如雷射干涉儀、光學尺、自動視準儀或電子 水平移等，只能一次詈跑 / 里取個或二個自由度誤差，無法同時 -次量取六自由度誤差，因此在量測所有誤差時需更換不同 罝測架構’儀n的安裝和參考軸的對準亦需個職正，每次 重新校正所量取的實際量料徑並無法與前次路徑完全相 同，多次校正亦産生誤差，量測耗時而且增加量測不確定 性，而自動視準儀器對轉動角度雖具有高解析度，但整體架 構太重不適合安裝機器上做線上量測。光學尺的發展上近年 來結合光柵繞射與干涉原理、電子分割技術與二維光拇製造 的技術發展’目前已有光學尺如專利證號：99283 —對光柵 缺陷與對位不準具有高容許度之繞射光柵線性光學尺，可提 供二維定位且解析度可達奈米級，雖然二維光學尺架設容易 解析度高，但只能提供二維訊號，對於精密運動定位多自由 度誤差無法同時提供。若量測系統每次只僅能檢測一或兩項 誤差，則要將全部誤差量測完畢，其所需時間愈長，量測期 間之環境變化也難以控制，量測不確定度將隨時間而增加。 因此若能發展一套量測系統可同時量取多自由度誤差，則對 於精密運動平臺的精度校正將提供莫大助益，另若能進一步 整合於平臺内將可作爲線上定位量測，提供定也誤差補償訊 5虎’以達到精確控制的目標。 〜由此可見’上述習用物品仍有諸多缺失，實非—良善之 設計者’而亟待加以改良。 ° 本案發明人鑑於上述習用量測系統所衍生的各項缺點， 乃亟思加以改良創新’並經多年苦心孤讀潛心研究後，終於 成功研發完成本件一種使用光柵式干涉儀之三維量測系統。 【發明目的】 本發明之目的即在於提供一種使用光柵式干涉儀之三維 里測系統’利S細密反射式光栅間距做爲量測尺規，以光拇 、v〇射與都卜勒原理爲理論基礎，配合正交訊號之解相位與繞 射光空間繞射方向變化達成一多自由度的光學量測系統。 本發明之次一目的係在於提供一種使用光柵式干涉儀之 二維里測系統，當雷射光源入射分光鏡之後，穿透光與反射 光分別經反射鏡與反射式光柵反射，兩道光束再回到分光鏡 產生干涉’藉由光偵測器接收訊號，如此可量測Z軸方向位 移。 本發明之另一目的係在於提供一種使用光柵式干涉儀之 二維量測系統’當雷射光源入射二維反射式光柵時，産生兩 組互相垂直的正負一階繞射光，並將兩組正負一階繞射光分 別經兩組反射鏡産生反射光，反射光經分光鏡使其正負一階 繞射光束產生干涉，可以構成二維等光程光柵干涉儀，藉由 200426346 光偵測器接收訊號，量測基準也由波長變爲光栅常數，以獲 得互相垂直的兩組（X軸與γ軸）平移自由度位移量。 【發明内容】 可達成上述發明目的之一種使用光柵式干涉儀之三維量 測系統，包括有： 一雷射二極體，係提供足夠同調長度之雷射光束入射至 後述之分光鏡A ; 一分光鏡組，係包含有：一分光鏡A，係接收雷射光束 入射後，會分光產生一穿透光與一反射光a，其反射光a會 入射至後述之光栅，使該光柵反射一 〇階繞射光並與後述之 反射光b入射至分光鏡A以產生一干涉光條紋；二分光鏡β ; 係接收後述反射鏡Β之兩組正負一階反射光； 一反射鏡組，係包含有：一反射鏡A，係接收分光鏡A 分光射出之穿透光’以產生另一道反射光b入射至分光鏡a; 四反射鏡B，係接收後述光柵射出之兩組正負一階繞射光 後’並反射出兩組正負一階反射光至分光鏡B ; 一光柵’係爲接收反射光a，使該反射光a能入射光栅 以產生一組X軸方向之正負一階繞射光與一組γ軸方向之正 負一階繞射光，並將四道一階繞射光分別入射至四反射鏡B; 三透鏡組’係可將干涉光條紋放大並與後述光檢測器相 匹配，包含有：一透鏡組A，係接收並調整分光鏡A射出之 200426346 z軸干涉光條紋大小；二透鏡組β，係接收並調整分光鏡b 、 射出之X軸與Y軸干涉光條紋大小； · 一光檢測器組，係由多個光電二極體組成，能接收透鏡 組輪出之干涉光條紋的訊號相位變化，以計算並偵測平台的 位移變化，包含有：一光檢測器A，係接收透鏡組A射出之 干涉光條紋變化，以獲得平台Z軸移動方向的位移量；二光 檢測為B，係接收透鏡組B射出之干涉光條紋變化，以獲得 平台X軸與γ軸移動方向的位移量；以及 鲁 一平台，係提供光柵貼附之平台。 【實施方式】 「請參閱圖一」，本發明所提供之一種使用光栅式干涉儀 之二維里測系統，主要包括有··一雷射二極體^200426346 发明 Description of the invention: [Technical field to which the invention belongs] The present invention relates to a three-dimensional measurement system using a grating interferometer, and particularly to a three-dimensional measurement system using a grating interferometer. [Previous technology] In recent years, the high precision of Ik machine tools, various industrial machinery, and measuring instruments, coupled with the development of ultra-precision processing machines, semiconductor process equipment, electronic information equipment, and atomic force microscopes, have required the development of high-precision positioning technology instruments. Regardless of whether it is precision machinery, semiconductor industry, or micro (nano) technology, it is moving towards miniaturization: densification and nanometer level. Therefore, the development of measurement equipment, manufacturing technology and integration technology in the field of precision machinery, micro Nano-positioning platform and precision: Related research on bit detection technology is not to be delayed. Yangyi Mi Pingyi movement is a multi-player ~ J silicon error caused by errors in each eye parameter, the actual movement 'will produce a six-degree-of-freedom error including three-dimensional shift error ⑽, heart and three angular displacement pitch, swing, roll error, Since the inactive platform is designed and assembled via linear components, rotating platforms and other componentsa. It has multi-degree of freedom movement, the characteristics of various motion platforms of machine 5 | Zhongjiu Chain and rich mechanical equipment will affect the accuracy of the machine With the quality of the processed product, 'the positioning of the processed workpiece, the installation of fine stealing parts, and the position and posture of the target object in space all require more.' Six degrees of freedom for measurement and adjustment or control. Therefore, there are higher requirements for inspections with multiple degrees of freedom ', all of which hope to measure multiple degrees of freedom of a guard, component or target at the same time. On the measuring instruments that detect linear platforms and χ and γ motion platforms, most of the measurements, such as laser interferometers, optical rulers, automatic collimators, or electronic horizontal shifts, can only be performed at a time. One or two degrees of freedom errors cannot be measured at the same time with six degrees of freedom errors. Therefore, when measuring all errors, different measurement structures need to be replaced. The installation of the instrument and the alignment of the reference axis also need to be professional. The actual material diameter measured during the second recalibration cannot be exactly the same as the previous path. Multiple corrections also cause errors. The measurement is time-consuming and increases the measurement uncertainty. However, the automatic collimation instrument has a high rotation angle. Resolution, but the overall structure is too heavy for online measurement on the installation machine. In recent years, the development of optical rulers combines the development of diffraction and interference principles of gratings, electronic segmentation technology and two-dimensional optical thumb manufacturing. 'At present, there are optical rulers such as patent certificate number: 99283 — it has a high level of defects and misalignment of gratings. Tolerance of the diffraction grating linear optical ruler can provide two-dimensional positioning and the resolution can reach nanometer level. Although the two-dimensional optical ruler is easy to set up, it can only provide two-dimensional signals. It has multiple degrees of freedom for precise motion positioning. Errors cannot be provided at the same time. If the measurement system can only detect one or two errors at a time, the measurement of all errors must be completed, the longer it takes, the environmental changes during the measurement are difficult to control, and the measurement uncertainty will change with time. While increasing. Therefore, if a measurement system can be developed to measure multiple degrees of freedom errors at the same time, it will greatly help the accuracy correction of precision motion platforms, and if it can be further integrated into the platform, it can be used as an online positioning measurement and provide a fixed It also compensates for the error of 5 tigers to achieve the goal of precise control. ~ It can be seen that ‘the above-mentioned conventional articles still have a lot of shortcomings, which is really not a good designer’ and needs to be improved. ° In view of the various shortcomings derived from the above-mentioned conventional measuring system, the inventor of this case is eager to improve and innovate. After years of painstaking research, he has successfully developed a three-dimensional measuring system using a grating interferometer. . [Objective of the Invention] The purpose of the present invention is to provide a three-dimensional in-line measurement system using a grating interferometer, the "Li S fine reflection type grating pitch, as a measuring ruler, based on the principle of thumb, v0 radiation and Doppler. The theoretical basis is to achieve a multi-degree-of-freedom optical measurement system by coordinating the phase of orthogonal signals and the spatial diffraction direction of diffracted light. A second object of the present invention is to provide a two-dimensional in-line measurement system using a grating interferometer. After a laser light source enters a beam splitter, transmitted light and reflected light are reflected by a mirror and a reflective grating, respectively. Go back to the spectroscope to generate interference. The signal is received by the light detector, so the Z-axis displacement can be measured. Another object of the present invention is to provide a two-dimensional measurement system using a grating interferometer. 'When a laser light source enters a two-dimensional reflective grating, two sets of mutually orthogonal positive and negative first-order diffracted lights are generated, and two sets of The positive and negative first-order diffracted light is reflected by two sets of mirrors, and the reflected light causes the positive and negative first-order diffracted beams to interfere with the beam splitter, which can form a two-dimensional equal-path grating interferometer, which is received by the 200426346 light detector. The signal and the measurement reference are also changed from the wavelength to the grating constant to obtain the two degrees of freedom (X-axis and γ-axis) translational freedom displacement. [Summary] A three-dimensional measurement system using a grating interferometer that can achieve the above-mentioned object of the invention includes: a laser diode, which provides a laser beam of sufficient coherence length to enter a beam splitter A described later; a The beam splitter group includes: a beam splitter A, which receives the laser beam incident, and will split the light to generate a penetrating light and a reflected light a, and the reflected light a will be incident on a grating described later, so that the grating reflects a The 0th order diffracted light is incident on the spectroscope A to generate an interference light fringe with the reflected light b described later; the dichroic mirror β; receives two sets of positive and negative first-order reflected light of the mirror B described later; a mirror group including There are: a mirror A, which receives the transmitted light from the beam splitter A and transmits the reflected light b to enter the beam splitter a; a four-mirror B, which receives two sets of positive and negative first-order diffracted light emitted by the grating described later And 'reflects two sets of positive and negative first-order reflected light to the spectroscope B; a grating' is used to receive the reflected light a, so that the reflected light a can enter the grating to generate a set of positive and negative first-order diffracted light in the X-axis direction and a Group γ-axis direction positive First-order diffracted light, and the four first-order diffracted lights are respectively incident on the four mirrors B; The three-lens group 'system can enlarge the interference light fringe and match the photo detector described later, including: a lens group A, Receive and adjust the size of the 200426346 z-axis interference light fringes emitted by the spectroscope A; the two lens groups β receive and adjust the sizes of the X-axis and Y-axis interference light fringes emitted by the spectroscope b, and the output; · A photodetector group, which consists of It is composed of multiple photodiodes and can receive the phase change of the interference light fringe signal emitted by the lens group to calculate and detect the displacement change of the platform. It includes: a photodetector A that receives the interference emitted by the lens group A The light fringe changes to obtain the displacement in the Z-axis movement direction of the platform; the second light detection is B, which is the change in the interference light fringe emitted by the receiving lens group B to obtain the displacement in the X-axis and γ-axis movement directions of the platform; and Lu Yi The platform is a platform that provides grating attachment. [Embodiment] "Please refer to Fig. 1", a two-dimensional in-situ measurement system using a grating interferometer provided by the present invention mainly includes a laser diode ^
Diode)、一 分光鏡（BeamSplitter)組、一反射鏡（Mirr〇r) 組、一光柵 4(DiffractionGrating)、三透鏡（Lens)組、 光檢’貝J器（Photo Sensor Detector )組以及一平台γ。 鲁 本發明係利用細密反射式光柵4間距做爲量測尺規，以 光柵繞射（Diffraction)與都卜勒（D〇ppler)原理爲理論 基礎’配合正交訊號之解相位與繞射光m繞射方向變化而 發明具有多自由度的光學量測系統。為更詳盡說明本發明 「請參閱®二」為本發明三維量測系統之流程圖，本發明係 主要利用-雷射二極體i之雷射光束或可見光、微波、紅外Diode), a BeamSplitter group, a Mirror group, a Grating 4 (DiffractionGrating), a three lens (Lens) group, a photodetector (Photo Sensor Detector) group, and a platform γ. The invention uses the fine reflection grating 4 pitch as a measuring ruler, and uses the principle of grating diffraction (Diffraction) and Doppler (Doppler) as the theoretical basis to cooperate with the phase of the orthogonal signal and the diffraction light m The diffraction direction changes to create an optical measurement system with multiple degrees of freedom. In order to explain the present invention in more detail, "See II" is a flowchart of the three-dimensional measurement system of the present invention. The present invention mainly uses the laser beam of laser diode i or visible light, microwave, and infrared.
10 200426346 光、紫外光及X射線入射至分光鏡A21之後，會分光產生一 穿透光與一反射光a，其反射光a會入射至後述之光柵4, 使該光柵4反射一 0階繞射光，而該穿透光會經反射鏡A31 後反射一道反射光b至分光鏡A21後，該反射光b再與入射 至分光鏡A21之0階繞射光在分光鏡A21内干涉後產生一干 涉光條紋，使透鏡組A51接收並放大調整分光鏡A21輸出之 干涉光條紋大小後，將透鏡組A51輸出之Z軸干涉光條紋的 訊號相位變化’再藉由光檢測器A61接收計算，如此可量測 Z軸移動方向的位移量。 隨著平台7的移動，由分光鏡A21射出之反射光a會入 射光栅4以產生一組X軸方向之正負一階繞射光與一組γ軸 方向之正負^繞射光，並將兩組正負一階繞射光分別入射 至四反射鏡B32，使反射鏡B32於接收兩組正負一階繞射光 後，反射出兩組正負一階反射光分別入射至二分光鏡β22内 産生干涉光條紋，使透鏡組B52於接收並放大調整干涉光條 紋大小後，該透鏡組B52輸出之干涉光條紋的訊號相位變化 接收至光榀測器B62計算，如此可進一步獲得兩組互相垂 直的平口 7移動方向位移量，也就是可量測$軸與γ軸移動 方向的位移量。 光檢測器輸出的干涉光條紋訊號爲㈣度隨光柵4移動 轉動而周期變化的正弦訊號，其光強度振幅受絲4位移的 200426346 調製，當平A 7教去，士 ° 移動時’光柵4移動或轉動速度改變，訊號 頻率亦隨之· 4卜。# 文化。當平台7靜止時，訊號輸出只是與光柵4 瞬間位置有關的直流值，且訊號頻率爲零，由於此量測系統 對位移里測要求須達到奈米等級之辨別率，因此可將所得的 兩、、且正又的弦波訊號利用各種方式的細分割。 另外，文中有提到幾個光學名詞，亦說明如後·· 1干涉（lnterference) ··頻率相同的兩波沿同方向進 行，且保持相位差不隨時間改變時，則此兩波重疊時其能量 不均勻地分佈於空間，而在某些位置有極大值及極小值的現 象稱爲干涉。 %射（diffractlon):當光波前進時，遇到大小與 本身波長相近的障礙物或狹縫時，其傳播的波形會產生變 化’而與原來的波形不同，此現象稱爲繞射。 電子刀d技術·一般而言，利用干涉原理所發展出 的量測儀器’在經過光㈣器的轉換後都會得料互相正交 的餘弦訊號’就是所謂的四象訊號，電子分割即針對四象訊 號加以處理’使頻率增加數倍，或求出所要的相位資訊，達 到訊號細分的目的。 4、都卜勒（D〇Ppler)原理：當頻率f光源照在以速度 V移動的散射表面時’會產生D卿心效應，使得表面散射 回來的光産生Δί的頻率變化。 12 200426346 【特點及功效】 本發明以光栅搭配光檢測器利用光波繞射原理造成入射 與反射角偏移’再利用細密反射式光柵間距做爲量測尺規， 因而反推出射至於平台上光柵之位移，同時配合正交訊號之 解相位與繞射光空間繞射方向變化，進而量測垂直方向(2軸) 位移與互相垂直(X軸與的兩組平移自由度位移量，使 之組合成一個三維的量測系統。 上列詳細說明係針對本發明之一可行實施例之具體說 明’惟該實施例並非用以限制本發明之專利範圍，凡未脫離 本發明技藝精神所為之等效實施或變更，例如：等變化之等 效性實施例，均應包含於本案之專利範圍中。 【圖式簡單說明】 請參閱以下有關本發明-較佳實施例之詳細說明及苴附 圖，將可進-步瞭解本發明之技術内容及其目的功效；有關 5亥實施例之附圖為： -圖-為本發明一種使用光栅式干涉儀之三維量測系統之 二維量測系統之架構圖；以及 圖 圖 該-種使用光栅式干涉儀之三維量測系統之流程 主 f部分代表符號】 1雷射二極體10 200426346 After light, ultraviolet light, and X-rays are incident on the spectroscope A21, the light will be split into a transmitted light and a reflected light a, and the reflected light a will be incident on the grating 4 described later, so that the grating 4 reflects a 0th order The transmitted light will reflect a reflected light b to the spectroscope A21 after passing through the reflector A31, and the reflected light b will interfere with the 0th-order diffracted light incident on the spectroscope A21 in the spectroscope A21 to generate an interference Light streaks, so that the lens group A51 receives and enlarges the interference light fringes output from the beam splitter A21, and then changes the signal phase of the Z-axis interference light fringes output from the lens group A51 'and then calculates them with the light detector A61. Measure the displacement in the Z-axis moving direction. As the platform 7 moves, the reflected light a emitted by the beam splitter A21 will enter the grating 4 to generate a set of positive and negative first-order diffraction lights in the X-axis direction and a set of positive-negative diffraction lights in the γ-axis direction. The first-order diffracted light is incident on the four-mirror B32, so that after the mirror B32 receives two sets of positive and negative first-order diffracted light, the two sets of positive and negative first-order reflected light are incident on the dichroic mirror β22 to generate interference light fringes, so that After the lens group B52 receives and enlarges the size of the interference light fringe, the phase change of the signal of the interference light fringe output by the lens group B52 is received and calculated by the photodetector B62. In this way, two sets of mutually perpendicular flat mouth 7 movement directions can be obtained. The amount, that is, the amount of displacement in the direction of movement of the $ axis and the γ axis can be measured. The interference light fringe signal output by the photodetector is a sinusoidal signal whose degree changes periodically as the grating 4 moves and rotates. Its light intensity amplitude is modulated by the 200426346 of the displacement of the wire 4. When the flat A 7 teaches, when the ° moves, the grating 4 When the moving or rotating speed changes, the signal frequency also changes. # Culture. When the platform 7 is stationary, the signal output is only a DC value related to the instantaneous position of the grating 4 and the signal frequency is zero. Since this measurement system requires the displacement measurement to reach a nanometer level discrimination, the obtained two The positive and negative sine wave signals are finely divided in various ways. In addition, there are several optical terms mentioned in the text, and it is also explained that the two waves of the same frequency are in the same direction and the phase difference does not change with time when the two waves overlap. Its energy is unevenly distributed in space, and the phenomenon of maximum and minimum values at some locations is called interference. % Diffractlon: When the light wave advances, when it encounters an obstacle or slit with a size close to its own wavelength, its propagating waveform will change and it is different from the original waveform. This phenomenon is called diffraction. Electronic knife technology · Generally speaking, the measuring instrument developed by using the principle of interference 'will obtain mutually orthogonal cosine signals after the conversion of the optical resonator' is a so-called four-signal signal. The signal is processed to increase the frequency several times or to obtain the required phase information to achieve the purpose of signal subdivision. 4. Doppler principle: When the light source with frequency f strikes the scattering surface moving at speed V, it will produce the Ding Qing effect, which makes the light scattered back from the surface produce a frequency change of Δί. 12 200426346 [Features and effects] In the present invention, the grating and the light detector are used to shift the incident and reflection angles by using the principle of light diffraction, and the fine reflective grating pitch is used as a measuring ruler, so the grating is projected on the platform. The displacement of the orthogonal signal and the diffraction direction of the diffracted light space at the same time, and then measure the vertical (2 axis) displacement and the two sets of translational degrees of freedom (X axis and A three-dimensional measurement system. The above detailed description is a specific description of a feasible embodiment of the present invention, but this embodiment is not intended to limit the scope of the patent of the present invention, and any equivalent implementation that does not depart from the technical spirit of the present invention Or equivalent changes, such as: equivalent equivalent embodiments of such changes shall be included in the patent scope of this case. [Simplified description of the drawings] Please refer to the following detailed description of the present invention-preferred embodiments and the attached drawings. You can further understand the technical content of the present invention and its purpose and effectiveness; the drawings related to the embodiment of the invention are:-Figure-This is a kind of grating interferometer of the present invention. Architecture FIG dimensional measurement of dimensional measurement system of the system; and the view - the main portion of the f-dimensional symbol representing the amount of flow kinds grating interferometer measurement system of the laser diode 1]
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21分光鏡A 22分光鏡B 31反射鏡A 32反射鏡B 4光柵 51透鏡組A 52透鏡組B 61光檢測器A 62光檢測器B21 beam splitter A 22 beam splitter B 31 reflector A 32 reflector B 4 grating 51 lens group A 52 lens group B 61 light detector A 62 light detector B