200426249 Ο) 玖、發明說明 【發明所屬之技術領域】 本發明是關於光通訊連接器用的金屬套圈製造裝置及 金屬套圈製造方法。 【先前技術】 對於此種金屬套圈製造裝置，已有提案：其爲把可放 入電解澱積金屬的架器和芯材保持用的架器，於電鑄層內 ® 沿著圓周配置成垂直方向的製造裝置（日本特開2001 -1 9 2883號公報）。使用配置有該複數芯材的製造裝置時， 能以高生產性製造套圈。 然而，於該製造裝置所製成的金屬套圈，產生了套圈 的外徑在其長度方向會有所偏差的問題。套圈，由於其是 輔助著光纖的軸整列，防止偏軸所造成的光學衰耗的一種 器具，因此其被要求的同軸性非常高，所以於套圈外徑產 生偏差將是嚴重的問題。 · 【發明內容】 【發明槪要】 第1觀點所提案的發明，其具備有：可裝滿電解液的 ’ 電鑄槽；可保持著被浸泡在上述電解液中之上述電解澱積 . 源金屬的一個或二個以上的金屬保持手段；及，可支撐著 被浸泡在上述電解液中之上述芯材的一個或二個以上的支 撐手段；其是把電解澱積源金屬浸泡在電解液中，藉由對 -4- (2) (2)200426249 芯材進行通電，使上述芯材的周圍電解潑積著金屬來製造 出套圈的金屬套圈製造裝置，其特徵爲上述一個或二個以 上的支撐手段是分別支撐上述芯材於實質上成水平。 同樣地根據第1觀點，本發明提案一種把電解澱積源 金屬浸泡在電解液中，將上述芯材於實質上成水平浸泡在 電解液中’對芯材進行通電，使該當芯材的周圔電解澱積 著金屬來製造出套圈的一種金屬套圈製造方法。 其次，第2觀點所提案的發明，其爲在芯材周圍電解 澱積著指定厚度的電解澱積源金屬後，去除上述芯材來製 造出金屬套圈的金屬套圈製造方法，其特徵爲把上述芯材 浸泡在含有可使其被電解澱積之電解澱積源金屬的電解液 中，於電解澱積開始後的指定時間內，對上述芯材通電著 第1電流値的電流，接著，對該芯材通電著比上述第1電流 値還高之第2電流値的電流，使其電解澱積著指定厚度的 金屬來製造出金屬套圈。 另，於本發明中之「於實質上成水平」一詞，並非嚴 格之意，其包括芯材被支撐的狀態是與金屬套圈製造裝置 所被載置的面於實質上成平行狀態之旨意，也包括因應於 裝設計上或裝置配置上的需求多少會成傾斜狀態時的旨意 。此外，「電解澱積源金屬」並不單指金屬個體，包括合 金、氧化物等其他的化合物，其形態無特別限定，也可以 是板狀、棒狀、粒狀的任何形態。另外，「芯材」的材質 也無特別限定，也可採用金屬製、樹脂、玻璃等其他的非 金屬材料行材質。 (3) (3)200426249 【發明揭示】 第1觀點所提案的金屬套圈製造裝置，是把電解澱積 源金屬浸泡在電解液中，藉由對芯材進行通電，使金屬電 解澱積在上述芯材的周圍來製造出套圈的金屬套圈製造裝 置，其特徵爲具備有：可裝滿電解液的電鑄槽；可保持著 被浸泡在上述電解液中之上述電解澱積源金屬的一個或二 個以上的金屬保持手段；及，可支撐著被浸泡在上述電解 液中之上述芯材的一個或二個以上的支撐手段。 該金屬套圈製造裝置，是被構成爲可製造出具高精度 同軸性的金屬套圈。即，在金屬套圈製造時的電解澱積過 程中，從電解澱積源金屬中淘析出來的金屬離子是透過電 解液往芯材移動，從芯材收取電子後還原，使該金屬被析 出結晶在芯材表面。本發明者，是在如此之過程中，特別 注重從電解澱積源金屬往芯材移動之金屬離子的移動過程 來進行硏究的結果，得知套圈所被要求的高度同軸性將會 受重力影響，根據如此見解，爲讓從電解澱積源金屬中淘 析出來的金屬離子能夠均等到達形成是遍佈在芯材全體上 ，而使芯材被支撐爲於實質上成水平。 如以上所述，根據第1觀點所提案之發明時，可提供 一種在維持量產性的同時且可製造出同軸性高的套圈之金 屬套圈製造裝置及金屬套圈製造方法。 於如此般之第1觀點所提案的金屬套圈製造裝置中， 上述支撐手段，最好是遍及整個芯材全長，與上述金屬保 持手段保持成一定距離支撐著上述芯材，除此外上述支撐 -6 - (4) (4)200426249 手段最好是具有以上述芯材的延伸方向爲旋轉軸，可使該 當芯材旋轉的旋轉部。 再者，上述金屬保持手段，最好是在可保持著複數之 粒狀電解澱積源金屬的同時，具有可使該當金屬保持手段 於實質上成水平方向擺動的擺動部。關於這些發明，在設 有複數個支撐手段和金屬保持手段時，上述二個以上的支 撐手段，最好是該當支撐手段爲並列配置成其所分別支撐 的芯材成略平行；上述二個以上的金屬保持手段，最好是 分別與上述並列配置之支撐手段所支撐的各芯材成對面配 置。 此外，第1觀點所提案的金屬套圈製造方法，其特徵 爲把上述電解澱積源金屬浸泡在電解液中，將上述芯材於 實質上成水平浸泡在電解液中，對上述芯材進行通電，使 金屬電解澱積在該當芯材的周圍。 於該發明中，對上述芯材的通電最好是從該當芯材的 兩端進行通電。再者，最好是構成爲：藉由將芯材支撐成 使芯材全長整體都離開上述金屬保持手段保持成一定距離 ，讓從電解澱積源金屬中淘析出來的金屬離子之其往芯材 的移動至到達爲止條件可均等遍及整個芯材全長。另外， 最好是構成爲：藉由旋轉芯材使辛材表面之金屬的析出條 件可均等遍及整個芯材全長。加上，最好是構成爲：電解 澱積源金屬是粒狀，使保持著電解澱積源金屬的金屬保持 手段於實質上擺動成水平，使從電解澱積源金屬所淘析之 金屬離子的淘析條件爲均等的同時，使其至芯材爲止的距 (5) (5)200426249 離保持成一定。再者，最好是構成爲：從芯材兩端進彳了通 電，使芯材中之電荷分佈爲略均等，使朝金屬離子之電子 的交接可均等發生遍及芯材全長。根據如此之構成時，就 可使金屬離子的移動、還原反應，朝芯材表面之金屬的析 出等各別的物理性條件爲均等，可使均厚的電解澱積層遍 及芯材全長形成在芯材表面。 當能如此般使均厚的電解澱積層形成在芯材表面時， 就可使該芯材的芯線電阻成爲有用。即，只要電解澱積層 的厚度是均等遍及芯材全長，就可從芯線電阻的値正確導 出形成在芯材上的電解澱積層厚度。因此，於本發明中是 根據芯線電阻來控制芯材表面上之電解澱積層的形成，製 造出外徑爲均等且同軸性高的金屬套圈。具體而言，控制 通電是從上述芯材兩端來進行的控制手段，是構成爲具有 :可讀出上述各芯材之芯線電阻的電阻讀出部；從上述電 阻讀出部所讀出的芯線電阻中，根據上述電解澱積層的厚 度及上述芯材的芯線電阻之相關資訊，算出形成在上述芯 材上的電解澱積層的厚度，因應著該算出之電解澱積層的 厚度，來控制對上述芯材的通電之電流控制部；及，可執 行上述電流控制部的起動和上述電阻讀出部的起動之切換 的切換部。 於該發明，切換部將使電阻讀出部起動，讀出芯材的 芯線電阻，經由切換部的切換所起動的電流控制部，會根 據於電阻讀出部所讀出的芯線電阻，算出形成在芯材上的 電解澱積層厚度，對芯材進行通電直到該厚度爲所設定的 (6) (6)200426249 厚度爲止’當電解澱積層厚度成爲所設定的厚度時就停止 對芯材進行通電，來製造出具指定直徑的金屬套圈。於該 電解澱積層厚度之算出中所使用的「電解澱積層的厚度及 芯材的芯線電阻之相關資訊」，可於事先記憶在控制手段 中的存儲器中，也可安裝在電流控制部之控制電路等的硬 體上。 藉此，就可提供一種在維持量產性的同時且可製造出 同軸性高的套圈之金屬套圈製造裝置及金屬套圈製造方法 〇 其次，對於第2觀點所提案的發明進行說明。 該發明，是在芯材周圍電解澱積著指定厚度的電解澱 積源金屬後，去除上述芯材來製造出金屬套圈的金屬套圈 製造方法，其特徵爲把上述芯材浸泡在含有所欲電解澱積 之電解澱積源金屬的電解液中，於電解澱積開始後的指定 時間內，對上述芯材執行第1電流値的電流通電，接著， 對該芯材執行比上述第1電流値還高之第2電流値的電流通 電，使其電解澱積著指定厚度的金屬來製造出金屬套圈。 於該發明，是要在電解澱積開始後的指定時間內，對 述芯材進行第1電流値的通電，然後，再進行比第1電流値 還高之第2電流値的通電。該第2電流値和第2電流値的通 電時間，是可視需求：所應形成的電解澱積層的直徑、電 解澱積源金屬的材料、芯材的材質、電解液的種類，以經 驗或理論做適宜決定。 相對於此，第1電流値的絕對値和第1電流値的通電時 (7) (7)200426249 間，是根據持續著第1電流値的通電來增加其強度的第2電 流値，來決定其通電時間使芯材的周圍可形成有均勻狀態 的電解澱積膜。 如此一來，藉由在電解澱積開始後的指定時間中以比 較低的第1電流値來進行電解澱積，可使來自於電解澱積 源金屬之均勻的金屬膜有規則性地成長在芯材周圍，然後 ，於第2電流値中所形成的電解澱積層也可形成均勻狀態 ，其結果是可使電解澱積層均等遍及形成在芯材全長及全 周圍。 如此一來，就可提供一種其所製造出來的金屬套圈是 比以相同電流値進行電解澱積處理的金屬套圈還具均等的 外徑且同軸性還高的的金屬套圈製造方法。 於如此般之第2觀點所提案的金屬套圈製造方法中， 上述電解澱積開始後的指定時間，以1分鍾至2小時爲佳； 對上述芯材的通電以從該芯材的兩端進行通電爲佳。 再者，該發明中之第1電流値，並不一定要爲指定的 電流値不可，其也可以是具指定範圍的電流値群。此外， 第2電流値只要比第1電流値高就可以，並不限定於指定的 電流値，其包括具指定範圍的電流値群，又包括在將電流 値上昇爲指定電流値時到達指定電流値爲止前之呈階梯狀 變化的電流値或呈波狀變化的電流値或呈直線狀的電流値 〇 第2電流値以2A/Cm2〜5A/cm2爲佳，在第1電流値通 電後，使電流以+1 %〜+10%的增加率從第1電流値上昇至 (8) (8)200426249 第2電流値。此外，第2電流値的通電時間以2小時〜6小時 爲佳。 第1電流値和第2電流値的關係，以第1電流値爲第2電 流値的1%〜60 %程度爲佳。此外，於第1電流値的通電， 是以電解澱積開始後1分鐘至10小時爲佳，但以40分鐘至 8 0分鐘爲更佳，針對此來看第1電流値和第2電流値的關係 時，以第1電流値的通電時間爲第2電流値的的通電時間之 1%〜60%程度爲佳。 如此一來，就可提供一種其所製造出來的金屬套圈是 比以相同電流値進行電解澱積處理的金屬套圈還具均等的 外徑且同軸性還高的的金屬套圈製造方法。 【實施方式】 【發明之實施形態】 以下是根據圖面對本發明之實施形態所進行的說明。 第1圖爲表示本實施形態相關之金屬套圈製造裝置從平面 方向看時的說明圖，第2圖爲第1圖所示之金屬套圈製造裝 置從正面方向看時的說明圖，第3圖爲第1圖所示之金屬套 圈製造裝置的部份分解透視圖。 首先，在參考第1圖的同時對金屬套圈製造裝置100的 整體構成進行說明。 該金屬套圈製造裝置1〇〇，其主要構成具有：可裝滿 電解液11的電鑄槽1;對被電解澱積在芯材31表面上的電 解澱積源金屬22進行保持的金屬保持手段2 ;對芯材31進 200426249 Ο) 行保持的芯材保持手段3 ;及，可可控制裝置動作的控制 手段4。 對芯材31進行保持的芯材保持手段3和金屬保持手段2 是成一對收納在工作件架具12內，工作件架具12是於實質 上成水平並列（平行）配置在電鑄槽1中。因此，工作件 架具12內之芯材保持手段3所保持的芯材31也於實質上成 水平並列（平行）配置。如此般之被區隔的工作件架具1 2 就成爲控制手段4之控制單位，對芯材31的通電是針對芯 材31的每1支分別進行控制。 與工作件架具12同時並列配置的金屬保持手段2，是 由擺動框231連結著，傳遞著與該擺動框231相連的擺動部 23所引起的擺動運動，金屬保持手段2是沿著如第1圖中的 箭頭符號a所示方向（即，與金屬保持手段2長度方向垂 直的方向）進行前後擺動。 擺動部23可採用包括有曲柄的擺動機構等之通常所使 用的往復運動傳遞機構。此外，工作件架具12內的芯材31 單側端部或兩端部是連接於旋轉部3 2，該芯材31是藉由 旋轉部32使其以芯材31的延伸方向爲旋轉軸進行旋轉。 本實施形態的旋轉部32，爲與驅動馬達相連的鎖鏈狀 構件，其以相同速度使並列配置的芯材31進行旋轉。旋轉 速度通常是以設定在5〜20次/分鐘的範圍內爲佳。 另，倂設在金屬套圈製造裝置1〇〇中的電鑄池管理裝 置5,是管理著電解槽1內電鑄池的溫度或電解液11的濃度 等；雜質去除裝置6是對電解槽內電鑄池所含的金屬殘渣 (10) (10)200426249 或微細塵埃進行去除。該雜質去除裝置6，具備著網眼過 濾手段61和除塵手段62。 於第2圖中圖示著該第1圖所示之金屬套圈製造裝置 100的Π — Π剖面說明圖。 如第2圖所示，滿裝著電解液11的電鑄槽1是由頂蓋16 封閉著。該頂蓋16在可遮擋來自於外部的塵埃等雜質混入 的同時，可防止電解液11的蒸發等使電解液11的濃度保持 成一定濃度。再者，於該電鑄槽1內，設有：金屬保持手 段2、由芯材保持手段3所保持的芯材31、攪拌用配管13、 接盤15、循環用配管14。電鑄槽1中的電解液11經常是被 攪拌著，以防止局部性的濃度不均等。於此雖是說明著由 循環用配管14來進行攪拌，但也可由設在電鑄槽1內的羽 翼片等來攪拌電解液11，又也可使用超音波產生器來攪拌 電解液11。此外，電解液11是藉由循環用配管14循環在電 鑄池管理裝置5及雜質去除裝置6中，藉此對電解槽1內電 鑄池的電解液11狀態（溫度、濃度）進行管理的同時，去 除金屬殘渣等雜質。具體而言所設定的電解液溫度是維持 成誤差5 °C，以維持在誤差21的範圍內爲佳；網眼過濾手 段6 1是由0.051〜2// m程度過濾片進行高速過濾。在電鑄 槽1內，設有1個或2個以上之可吸取電解液11進入在該循 環用配管14內的吸取口和使電解液11從循環用配管14排出 的吐出口。此外，攪拌用配管13是將循環用配管14所送來 的電解液11噴出，使其形成水流來攪拌電解液11。另，位 於攪拌用配管13下方的接盤15，是承接著電解液11中所含 (11) (11)200426249 的雜質沉澱物。 另，電解液11的循環速度，以比電解澱積源金屬22的 離子（例如鎳離子在電解液11的移動速度還小爲佳。若金 屬離子的移動速度比電解液11的循環速度還大時，電解液 11的循環對金屬離子的移動所造成的影響就會小，所以就 能夠使金屬保持手段2、芯材3 1間的離子移動條件更加均 勻地遍及在芯材31全長。 該構成中，金屬保持手段2是中介著控制手段4連接於 供電部40的陽極；芯材31是中介著芯材保持手段3和控制 手段4連接於供電部40陰極的通電用電極40b。該芯材31的 另一端部也同樣地連接於陰極的通電用電極40b。如此， 使芯材31是從兩端進行通電。 金屬保持手段2和芯材保持手段3,於實質上是成水平 配置，兩者之間的距離d於整個芯材3 1全長上在實質上是 爲一定距離。通常，距離d是設定成50mm〜150mm程度 。爲說明該位置關係，於第3圖中圖示著以金屬保持手段2 和控制手段4爲中心的分解透視圖。 於此所示之金屬保持手段2，爲鈦網容器21，其可保 持著被視爲是電解澱積源金屬22的鎳粒22 a。 電解澱積源金屬22，並不限定是鎳，也可以是適合於 套圈之電解澱積的其他金屬。本實施形態中的鎳粒22a也 可以是屬於含有鈷等之電解鎳的鎳粒，亦可以是含有硫磺 的鎳。該鎳粒22a雖是放入在已考慮使用電力容量的鈦網 容器21內，但爲不使殘渣（電解澱積源金屬的不溶解殘渣 -14- (12) (12)200426249 )流漏其以覆蓋有陽極罩爲佳。 鈦網容器21，從橫剖看，是往底邊逐漸狹窄的形狀， 換句話說其是往芯材3 1逐漸狹窄的形狀，其以形成爲例如 第3圖所示之V槽狀、U槽狀等形狀爲佳。爲如此般之往 底邊逐漸狹窄的形狀時，即使進行著電解澱積而鈦網容器 21內的電解澱積源金屬22減少，但因在鈦網容器21的底部 經常存在著電解澱積源金屬22，所以電解澱積源金屬22的 淘析位置經常爲一定位置，因此就可常時性正確地保持電 解澱積源金屬22的前端緣部與芯材31的距離爲一定距離。 再者，鈦網容器21的上側部（不包括著底部的其他部 份），具體而言若爲V槽時以用合成樹脂或橡膠等的絕 緣材來遮蓋其不包括著兩側壁部下側10%〜30 %程度的上 側部份爲佳。例如：於離開鈦網容器21的底側下側10〜 30%程度距離處在其上部外側貼有由絕緣物質形成的板片 即可。 此外，鈦網容器21，是藉由擺動部23 (參考第1圖） 使其往箭頭符號a方向（即，與金屬保持手段2的長度方 向爲垂直的方向）進行往復擺動運動。於此是使鈦網容器 21沿著水平面進行約50mm〜100mm的往復運動。由於該 鈦網容器21的擺動，防止了鎳粒22a彼此的接觸點爲固定 ’可使鎳粒22a成平坦遍及整個鈦網容器21全長，其結果 可使鎳離子的淘析位置爲一定位置。尤其，伴隨著電解澱 積的進行可均勻地減少鎳粒22a，所以可防止隨著該鎳粒 2 2a減少之離子移動開始點的變動，及可防止往芯材31移 (13) (13)200426249 動之鎳離子到達條件的變動。如此般若可使鎳離子的淘析 位置爲一定位置時，就可使鎳離子到達芯材31爲止的移動 條件均等遍及在整個芯材全長，也可使抵達芯材31之鎳離 子的還原均等遍及在整個芯材全長。其結果，可使電解澱 積條件均等遍及在整個芯材全長。 保持著芯材31使其與該鈦網容器21成平行的是芯材保 持手段3。該芯材3 1爲保持著於實質上爲水平狀態而施有 指定張力。具體而言芯材31的兩端和通電用電極40a、40b ^ 的接觸部份是利用纏繞來固定，單一端是配置著彈簧、橡 膠等彈性體，對芯材31施有約2kg的張力。藉此使芯材31 維持成水平狀態不會鬆弛，也可降低芯材31的接觸電阻。 另，該接觸部份的接觸電阻値是在〇.〇1 Ω以下爲佳。此外 ，該芯材31是接受著旋轉部32的驅動以其延伸方向爲軸進 行旋轉。藉由該旋轉可提高形成在芯材31周圍的金屬套圈 的正圓度，可使外徑及面粗度爲均等的電解澱積層形成在 芯材31整個36 0度的周圍。 _ 於芯材保持手段3的下方配置著具複數噴出口的攪拌 用配管13。從該噴出口噴出電解液11，對電鑄槽1內的電 解液11進行攪拌。又在攪拌用配管13下方配置著接盤15， 以承接從電解液11沉降下來的殘渣等雜質或偶發性落下的 零件。 . 其次，對要被電解澱積的芯材31進行說明。 芯材31，具導電性，可採用其粗度是因應著套圈光纖 要插入的孔而形成線狀芯材。具體而言，可採用：鎳或鎳 -16- (14) (14)200426249 合金、鐵或鐵合金、鈷或鈷合金、鎢或鎢合金。做爲芯材 31之電鑄母材的長度以200mm〜300mm爲佳，其線徑以 0.125mm〜0.128mm爲佳。於本實施形態中是採用不銹鋼 的金屬線，使用了爲高精度SUS金屬線的SUS304〔日本 有限會社NICK (譯音）社製〕。該芯材31的線徑爲 0.1260mm。該芯材31的線徑，當然是可視其用途做適宜 決定，也可視考慮其電解澱積後所要進行的硏磨等最終完 成處理的目標性直徑來做適宜決定。 該芯材3 1所要浸泡的電解液1 1，以視電解澱積源金屬 的種類來做適宜決定爲佳，可利用：氨基磺酸鎳、氯化鎳 、硫酸鎳、氨基磺酸亞鐵、氟硼化亞鐵、焦磷酸銅、硫酸 銅、氟硼化亞銅、氟矽酸銅、鈦氟化銅、鏈烷醇氨基磺酸 銅鐵、硫酸鈷鐵、鎢酸鈉、其他因應著組成芯材3 1的金屬 的電解液。例如：可採用能夠用於鎳之電解澱積的電解液 ，可利用含有鎳離子源和陽極溶蝕劑和p Η緩衝劑的電解 液。具體而言於本實施形態中是使用著高純度60%的氨基 磺酸鎳溶液（日本化學產業株式會社製）。 接著，對如此之構成的金屬套圈製造裝置的動作進行 說明。 從浸泡在電解液11中的鎳粒22a，淘析出含有鎳的離 子，於電解液11中含有含鎳的離子（以下稱鎳離子）。當 藉由控制手段4對被連接在負極上的芯材31開始進行通電 時，鎳離子會朝芯材31開始移動。此時鈦網容器21是和芯 材3 1成平行，此外，鈦網容器21和芯材31是實質上成水平 -17- (15) (15)200426249 方向配置著。因此，鈦網容器21和芯材31的距離於整個芯 材31全長在實質上是保持著相同距離。又因爲鈦網容器21 是水平方向擺動著，所以使鎳離子的移動開始點是被保持 成一定的移動開始點。因此，從鈦網容器21內的鎳粒22a 重新淘析出來的鎳離子，會在相同條件下到達芯材31的表 面。另一方面，因芯材31是旋轉著，所以於芯材31之鎳離 子的結晶化是以均等槪率發生在芯材31的周圍全體，電解 澱積層的形成於芯材31的周圍全體上是均等進行著。如此 所形成的電解澱積物，遍及其全長具有著相同直徑，並且 成爲其中心的芯材31位置是爲一定位置。將芯材31從該電 解澱積物抽出時，就可獲得線徑爲0.126mm，更好是 0.0125mm之具高同軸性的金屬套圈。根據本實施形態的 金屬套圈製造裝置100所製得的金屬套圈具有1mm〜3 mm 的外徑，其同軸性保持著0.5 // m以下的誤差。 接著，對本實施形態相關之金屬套圈製造裝置100的 動作控制進行說明。 對該金屬套圈製造裝置100之芯材31的通電進行控制 的是第4圖所示的控制手段4。該控制手段4是中介著切換 部41來運作芯材31兩端的通電用電極40a和40b。該2個通 電用電極40a、40b均連接於陰極，電子是從芯材31的兩 端流入。如此藉由將芯材3 1的兩端連接於陰極，使電流密 度c能夠更均等遍及在整個芯材3 1全長。另，若只將芯材 31的一端連接於陰極時，會因芯材31電阻等的種種重要因 素，而無法使要流入芯材31中的電子和電解澱積源22金屬 (16) (16)200426249 的金屬離子的分佈密度能嚴密地均勻遍及在整個芯材31全 長。因此，於本實施形態中是在芯材3 1的兩端設有連接著 陰極的通電用電極40a、40b。 上述控制手段4，具有：可讀出芯材3 1之芯線電阻的 芯線電阻讀出部42 ;根據該芯線電阻讀出部42所讀出的芯 線電阻可算出形成在芯材31周圍的電解澱積層厚度之電解 澱積層算出部43;及根據該電解澱積層算出部43所算出之 電解澱積層厚度，來控制對芯材3 1的通電之電流控制部44 〇 上述芯線電阻讀出部42，是連接於可測定出芯材3 1電 阻的電阻測定器42a ;電流控制部44，是連接於對芯材3 1 供電之供電手段40。可切換成是要起動可讀出芯材31之芯 線電阻的芯線電阻讀出部42，或是要起動對芯材31供電之 供電手段40的是切換部41。 本實施形態中的切換部4 1，是於事先切換成程式指定 的時機來起動芯線電阻讀出部42以讀出形成在芯材31周圍 的電解澱積層厚度。具體而言，開始後即刻以長時間間隔 讀出芯線電阻，隨著電解澱積層逐漸接近指定厚度就以短 時間間隔讀出芯線電阻。由該切換部41所執行的切換，也 可設定成如本實施形態般爲不同的時間間隔，但也可設定 成一定的時間間隔。 根據第5圖的流程圖對具有這些各構成之控制手段4的 動作進行說明。 於該實施形態中，爲要使形成在芯材31上的電解澱積 (17) (17)200426249 層厚度能夠均等地遍及在整個芯材31全長，應更有規則行 地進行鎳離子的結晶化，因此把要對芯材3 1進行通電之電 流的電流値控制成2階段。於此，芯材31是使用0.126mm 的S US 3 04不銹鋼金屬線，電解澱積源金屬爲鎳。此外， 目標的金屬套圈外徑爲1mm，要處理的芯材長度爲200mm 〜3 00mm 〇 首先，從外部收到開始命令的同時控制手段會被起動 (步驟10 )，根據電流控制部44的指令使供電手段4以第1 電流値對芯材3 1開始進行通電（步驟1 1 )。於本實際形態 中是將第1電流値設定成lA/cm2，在通電開始後進行了約1 小時的通電。當控制手段4的計時器讀出該指定時間是爲 經過1小時的時候（步驟12)，就結束於第1電流値中之電 解澱積。 其次，以第2電流値所執行的通電是一直執行到可獲 得指定厚度的電解澱積爲止。於此，是遵照切換部41的切 換，來重覆。著芯線電阻讀出部42的起動和電流控制部44 的起動。 在此，參考著第6圖的同時對第1電流値和第2電流値 進行說明。第6圖爲表示本實施形態相關之通電履歷圖， 其表示著時間的經過與電流値的變化。 如於該圖所示在通電開始後1小時是以第1電流値執行 通電，之後就以第2電流値執行通電。比較後的結果是若 要獲得均等之電解澱積層遍及在整個芯材3 i全長，則最好 是將做爲第1電流値之lA/cm2電流進行1小時通電，然後， (18) (18)200426249 再將電流上昇至做爲第2電流値的3A/cm2，包括上昇中的 通電以3A/cm2進行約4小時的通電’即以從通電開始進行 約5小時的通電爲佳。將實際的通電履歷圖示在第6圖中。 另，該第1電流値和第2電流値並非是絕對性的1個數値， 也可將該等設定成具指定範圍的電流値。此外，在從所設 定之開始至第1電流値爲止的電流値，及從第1電流値至第 2電流値爲止的過程中，變化成階梯狀或波浪狀的電流値 亦包括在其中。 接著，說明步驟1 3以後的動作。首先，切換部4 1會起 動（步驟13 )，透過電流控制部44來停止通電，使芯線電 阻讀出部42起動。芯材電阻讀出部42會透過電阻測定器 42a來讀出芯材31的芯線電阻（步驟14)。然後，電解澱 積層算出部43會根據芯線電阻讀出部42所讀出的芯線電阻 ’算出電解澱積層的厚度。另，該電解澱積層厚度的算出 ’是根據在事先已安裝在算出電路中之芯線電阻値和電解 澱積層厚度的相關資訊來執行（步驟15。接著電解澱積層 算出部43’又會判斷所算出的電解澱積層厚度是否已達到 所設定的厚度（步驟16，當未達到所設定的厚度時，切換 部4 1會起動，電流控制部44會遵照著其切換指令（步驟2 1 )’開始進行第2電流値的通電（步驟2 2 )。另一方面， 若獲得所設定之厚度的電解澱積層時，就會結束對芯材31 的通電（步驟17)。該步驟13中的切換部41是在事先設定 好’以不同的（從開始起逐漸變短）時間間隔起動著，但 也能以相等的時間間隔來使其起動。另，於步驟1 2中，按 (19) (19)200426249 照第1電流値進行的電解澱積雖是以指定的時間來進行’ 但也可使其構成爲如按照第1電流値進行的電解澱積似地 是根據芯線電阻讀出部42所讀出的芯線電阻來因應電解澱 積層的厚度進行通電。即’取代步驟12，執行步驟13至步 驟16的處理。 如此般，根據本實施形態來執行時，就可使遍及整個 芯材全長的電解澱積條件爲均等，在維持量產性的同時製 造出同軸性高的套圏。 其次，對第7圖所示之其他實施形態進行說明。 第7圖所示之例是把第1圖所示之金屬套圈製造裝置 100橫向並排成5列（100-1〜100-5 )，做爲已提高其量產 性的金屬套圈製造裝置200。於該金屬套圈製造裝置200中 ，倂設有著可集中管理5個電鑄槽1 ( 1-1〜1-5 )電鑄池的 電鑄池管理裝置5，及可去除這些電解槽1內之電鑄池（1-1〜1-5)雜質的雜質去除裝置6。該電鑄池管理裝置5具備 加熱器或濃度分析機器，以保持成一定的電解液11的溫度 狀態或濃度狀態。另外，雜質去除裝置6具備網眼過濾手 段6 1和除塵手段62，可去除電解澱積過程中所產生的微細 雜質。該金屬套圈製造裝置200所包括的金屬套圈製造裝 置（100-1〜100-5 )，是與先前所說明的金屬套圈製造裝 置1〇〇在構造上爲相同。如第7 ( b)圖所示般，未圖示於 該圖中的芯材支撐手段3是中介著通電用電極40a、40b將 芯材31保持成水平，此外，在與該芯材31成對面的位置上 水平配置著金屬保持手段2。該金屬保持手段2是被工作件 (20) (20)200426249 架具12保持著於電鑄槽1沿著水平面排成並列。擺動部23 是使該擺動框23 1進行擺動，來擺動金屬保持手段2。藉此 ’可更大量生產同軸性高的金屬套圈。 以上所說明的實施例，是爲讓讀者容易理解本發明而 記載的例子，並非是爲限定本發明而記載的例子。因此， 上述實施例中所揭示的各要素及各數値，其旨意也包括本 發明技術性範圍所屬之全部的設計變更或同等品。 【圖式簡單說明】 第1圖爲表示本發明相關之金屬套圈製造裝置的一例 從平面方向看時的說明圖。 第2圖爲第1圖所示之金屬套圈製造裝置從正面方向看 時的說明圖。 第3圖爲第1圖所示之金屬套圈製造裝置的部份分解透 視圖。 第4圖爲表示本發明之控制相關構成的一例方塊圖。 · 弟5圖爲說明本發明之控制手段控制程序的一例之說 明用流程圖。 第6圖爲說明第1電流値和第2電流値的說明圖。 第7圖爲表示本實施形態其他例的圖面，第7(a)圖 表示平面圖，第7(b)圖表示正面圖。 [圖號說明] 1 :電鑄槽，電解槽 -23- (21) (21)200426249 2 :金屬保持手段 3 :芯材保持手段 4 :控制手段 5 :電鑄池管理裝置 6 :雜質去除裝置 11 :電解液 1 2 :工作件架具 13 ： mn mmm ® 14 :循環用配管 15 :接盤 1 6 :頂蓋 2 1 :鈦網容器 22 =電解澱積源金屬 22a :鎳粒 23 :擺動部 31 :芯材 鲁 32 :旋轉部 40 :供電手段 40a:通電用電極 40b :通電用電極 ’ 41 :切換部 42 :芯線電阻讀出部 42a :電阻測定器 43:電解澱積層厚度 -24- (22) (22)200426249 44 :電流控制部 6 1 ··網眼過濾手段 62 :除塵手段 1〇〇 :金屬套圈製造裝置 200:金屬套圈製造裝置 231 :擺動框 1〜1 - 5 ··電鑄槽 100-1〜100-5:金屬套圈製造裝置 a :擺動方向 c :電流密度 d :距離 I :電流値 t :時間 S10〜Sn:步驟10~步驟17 S21〜S22 :步驟21〜步驟22200426249 〇). Description of the invention [Technical field to which the invention belongs] The present invention relates to a metal ferrule manufacturing device and a metal ferrule manufacturing method for an optical communication connector. [Prior art] There has been a proposal for such a metal ferrule manufacturing device: a holder for holding an electrolytically deposited metal and a holder for holding a core material are arranged in an electroformed layer® along a circumference Manufacturing device in vertical direction (Japanese Patent Application Laid-Open No. 2001-1 9 2883). When a manufacturing apparatus equipped with the plurality of core materials is used, the ferrule can be manufactured with high productivity. However, the metal ferrule manufactured by this manufacturing apparatus has a problem that the outer diameter of the ferrule may vary in the longitudinal direction. The ferrule is a device that assists in the alignment of the axis of the optical fiber and prevents optical attenuation caused by off-axis. Therefore, the ferrule is required to have a very high coaxiality. Therefore, a deviation in the outer diameter of the ferrule will be a serious problem. · [Summary of the invention] [Summary of the invention] The invention proposed in the first aspect includes: an electroforming tank that can be filled with an electrolytic solution; and the electrolytic deposition that can be immersed in the electrolytic solution can be maintained. One or two or more metal holding means of the source metal; and one or two or more supporting means that can support the core material immersed in the above-mentioned electrolyte; it is an immersion of the electrolytic deposition source metal in the electrolytic A metal ferrule manufacturing device for manufacturing a ferrule by applying current to a core material -4- (2) (2) 200426249, and electrolytically depositing metal around the core material to produce a ferrule. The two or more supporting means respectively support the core material to be substantially horizontal. Similarly, according to the first aspect, the present invention proposes a method of immersing an electrolytic deposition source metal in an electrolytic solution, and immersing the core material in the electrolytic solution at a substantially horizontal level.圔 A method of manufacturing a metal ferrule by electrolytically depositing metal to produce a ferrule. Next, the invention proposed in the second aspect is a metal ferrule manufacturing method in which a predetermined thickness of an electrodeposition source metal is electrolytically deposited around a core material, and then the core material is removed to produce a metal ferrule. The core material was immersed in an electrolytic solution containing an electrolytic deposition source metal capable of being electrolytically deposited, and a current of a first current was applied to the core material within a specified time after the start of the electrolytic deposition, and then A current of a second current 値, which is higher than the first current 通电, is applied to the core material, and a metal of a specified thickness is electrolytically deposited to produce a metal ferrule. In addition, the term "substantially horizontal" in the present invention is not strictly intended, and includes a state in which the core material is supported in a state substantially parallel to the surface on which the metal ferrule manufacturing device is placed. The intention also includes the intention when the requirements in terms of installation design or device configuration will be inclined to some extent. In addition, the "electrolytic deposition source metal" does not only refer to the individual metal, including other compounds such as alloys and oxides, and the form is not particularly limited, and may be any form of plate, rod, or granular form. The material of the "core material" is not particularly limited, and other non-metal materials such as metal, resin, and glass may be used. (3) (3) 200426249 [Invention of disclosure] The metal ferrule manufacturing device proposed in the first aspect is to immerse an electrolytic deposition source metal in an electrolytic solution, and apply current to a core material to cause the metal to be electrolytically deposited. The metal ferrule manufacturing device for manufacturing a ferrule around the core material is characterized by comprising: an electroforming tank that can be filled with an electrolytic solution; and an electrolytic deposition source metal that can be immersed in the electrolytic solution. One or two or more metal retaining means; and one or two or more supporting means that can support the core material immersed in the electrolyte. This metal ferrule manufacturing apparatus is configured to produce a metal ferrule with high-precision coaxiality. That is, during the electrolytic deposition process during the manufacture of the metal ferrule, the metal ions eluting from the electrolytic deposition source metal are moved to the core material through the electrolyte, and the electrons are collected from the core material and reduced, so that the metal is precipitated. Crystallized on the surface of the core material. The inventors have paid special attention to the process of moving the metal ions from the electrolytic deposition source metal to the core material in such a process. It is known that the required high coaxiality of the ferrule will be affected. The influence of gravity is based on the findings that the metal ions eluting from the electrolytic deposition source metal can reach the formation uniformly throughout the core material, and the core material is supported at a substantially horizontal level. As described above, the invention proposed according to the first aspect can provide a metal ferrule manufacturing device and a metal ferrule manufacturing method capable of manufacturing a ferrule having high coaxiality while maintaining mass productivity. In the metal ferrule manufacturing device proposed in such a first aspect, it is preferable that the supporting means covers the entire length of the core material and supports the core material at a certain distance from the metal holding means, in addition to the support- 6-(4) (4) 200426249 It is preferable that the means has a rotating portion that uses the extending direction of the core material as a rotation axis to rotate the core material. Further, it is preferable that the metal holding means includes a swinging portion capable of swinging the metal holding means in a substantially horizontal direction while holding a plurality of granular electrolytic deposition source metals. Regarding these inventions, when a plurality of supporting means and metal retaining means are provided, it is preferable that the above two or more supporting means should be arranged in parallel so that the core materials respectively supported by them are slightly parallel; the above two or more The metal holding means is preferably arranged opposite to each core material supported by the support means arranged in parallel. In addition, the metal ferrule manufacturing method proposed in the first aspect is characterized in that the electrolytic deposition source metal is immersed in an electrolytic solution, the core material is immersed in the electrolytic solution at a substantially horizontal level, and the core material is processed. The current is applied to cause the metal to be deposited around the core material. In this invention, it is preferable that the core material is energized from both ends of the current core material. Furthermore, it is preferable that the core material be supported such that the entire length of the core material is kept away from the above-mentioned metal holding means at a certain distance, so that the other metal ions eluting from the source metal of the electrolytic deposition are directed to the core. The conditions for the movement of the material until it reaches the entire length of the core material. In addition, it is preferable that the core material is rotated so that the precipitation conditions of the metal on the surface of the hard material can be uniformly distributed over the entire length of the core material. In addition, it is preferable that the electrodeposition source metal is granular, and the metal holding means holding the electrodeposition source metal is substantially swung to a level, so that the metal ions eluting from the electrodeposition source metal are eluted. The elutriation conditions are equal and the distance from the core material (5) (5) 200426249 is kept constant. Furthermore, it is preferable that the electric power is supplied from both ends of the core material so that the charge distribution in the core material is slightly uniform, so that the transfer of electrons toward the metal ions can occur uniformly throughout the entire length of the core material. According to this structure, the physical conditions such as the movement and reduction reaction of metal ions and the precipitation of metal on the surface of the core material can be made equal, and a uniform electrolytic deposition layer can be formed on the core over the entire length of the core material.材 表面。 Wood surface. When a uniform electrolytic deposition layer can be formed on the surface of a core material in this way, the core wire resistance of the core material can be made useful. That is, as long as the thickness of the electrolytic deposition layer is uniform over the entire length of the core material, the thickness of the electrolytic deposition layer formed on the core material can be accurately derived from the core resistance. Therefore, in the present invention, the formation of the electrolytic deposition layer on the surface of the core material is controlled according to the core wire resistance, and a metal ferrule having a uniform outer diameter and high coaxiality is manufactured. Specifically, the control energization is a control means performed from both ends of the core material, and is configured to include a resistance reading section capable of reading the core wire resistance of each of the core materials; In the core resistance, the thickness of the electrolytic deposition layer formed on the core material is calculated based on the thickness of the electrolytic deposition layer and the information about the core resistance of the core material. The thickness of the electrolytic deposition layer is controlled according to the calculated thickness of the electrolytic deposition layer. A current control unit for energizing the core material; and a switching unit that can switch between activation of the current control unit and activation of the resistance readout unit. In this invention, the switching unit will activate the resistance reading unit, read the core wire resistance of the core material, and the current control unit started by switching the switching unit will calculate the formation based on the core wire resistance read by the resistance reading unit. The thickness of the electrolytic deposition layer on the core material, and the core material is energized until the thickness is the set thickness (6) (6) 200426249. 'When the thickness of the electrolytic deposition layer reaches the set thickness, the core material is stopped from being energized. To produce metal ferrules with a specified diameter. The "information about the thickness of the electrodeposited layer and the core wire resistance of the core material" used in the calculation of the thickness of the electrodeposited layer can be stored in the memory in the control means in advance, or it can be installed in the control of the current control unit. Circuit, etc. Accordingly, it is possible to provide a metal ferrule manufacturing device and a metal ferrule manufacturing method capable of manufacturing a ferrule having high coaxiality while maintaining mass productivity. Next, the invention proposed in the second aspect will be described. This invention is a method for manufacturing a metal ferrule by electrolytically depositing an electrodeposition source metal with a specified thickness around a core material, and removing the core material to produce a metal ferrule. In the electrolytic solution of the electrolytic deposition source metal to be electrolytically deposited, a current of a first current is applied to the core material within a specified time after the start of the electrolytic deposition. The current 値, which is higher than the second current 通电, is energized, so that metal with a specified thickness is electrolytically deposited to produce a metal ferrule. In this invention, the core material is energized with a first current 値 within a specified time after the start of electrolytic deposition, and then energized with a second current 高 which is higher than the first current 値. The energization time of the second current 値 and the second current 値 can be determined according to requirements: the diameter of the electrolytic deposition layer to be formed, the material of the electrolytic deposition source metal, the material of the core material, and the type of electrolyte, based on experience or theory. Make the right decision. On the other hand, the absolute current 1 of the first current 値 and the time when the first current 値 is energized (7) (7) 200426249 are determined based on the second current 增加 which increases its strength by continuing the energization of the first current 値. The energization time enables a uniform state of an electrolytic deposition film to be formed around the core material. In this way, by performing electrolytic deposition at a relatively low first current 値 for a specified time after the start of electrolytic deposition, a uniform metal film from the source metal of the electrolytic deposition can be grown regularly. Around the core material, the electrolytic deposition layer formed in the second current layer can also be formed in a uniform state. As a result, the electrolytic deposition layer can be formed uniformly over the entire length and the entire periphery of the core material. In this way, it is possible to provide a method for manufacturing a metal ferrule which has a uniform outer diameter and higher coaxiality than a metal ferrule which is electrolytically deposited at the same current. In the method for manufacturing a metal ferrule proposed in the second aspect, the specified time after the start of the electrolytic deposition is preferably from 1 minute to 2 hours; the core material is energized to remove electricity from both ends of the core material. It is better to apply power. Furthermore, the first current 値 in this invention does not necessarily have to be a specified current 其, and it may be a current 値 group having a specified range. In addition, the second current 値 may be higher than the first current ，, and is not limited to the specified current 値, and includes a current 値 group having a specified range, and includes reaching the specified current when the current 値 rises to the specified current 値.値 A stepwise current 値 or a wave-shaped current 値 or a linear current 値 2nd current 値 is preferably 2A / Cm2 ~ 5A / cm2. After the first current 値 is energized, Increase the current from the first current 値 to (8) (8) 200426249 the second current 以 at an increase rate of + 1% to + 10%. The second current 値 is preferably energized for 2 to 6 hours. The relationship between the first current 値 and the second current 値 is preferably about 1% to 60% of the second current 値. In addition, the current applied to the first current 1 is preferably 1 minute to 10 hours after the start of electrolytic deposition, but more preferably 40 minutes to 80 minutes. In this regard, the first current 値 and the second current 値In the case of the relationship, it is preferable that the conduction time of the first current 値 is about 1% to 60% of the conduction time of the second current 値. In this way, it is possible to provide a method for manufacturing a metal ferrule which has a uniform outer diameter and higher coaxiality than a metal ferrule which is electrolytically deposited at the same current. [Embodiment] [Embodiment of the invention] The following is a description of an embodiment of the present invention based on the drawings. FIG. 1 is an explanatory diagram showing a metal ferrule manufacturing apparatus according to this embodiment when viewed from a plane direction, and FIG. 2 is an explanatory diagram when a metal ferrule manufacturing apparatus shown in FIG. 1 is viewed from a front direction, and FIG. The figure is a partially exploded perspective view of the metal ferrule manufacturing apparatus shown in FIG. 1. First, the overall configuration of the metal ferrule manufacturing apparatus 100 will be described with reference to FIG. 1. The metal ferrule manufacturing device 100 mainly includes: an electroforming tank 1 that can be filled with an electrolytic solution 11; and a metal holding device that holds an electrolytic deposition source metal 22 that is electrolytically deposited on the surface of a core material 31. Means 2; core material retaining means 3 for holding the core material 31 (200426249); and, control means 4 for controlling the operation of the cocoa device. The core material holding means 3 and the metal holding means 2 holding the core material 31 are accommodated in a pair in the work piece holder 12, and the work piece holder 12 is arranged side by side (parallel) substantially horizontally in the electroforming tank 1. in. Therefore, the core material 31 held by the core material holding means 3 in the work piece holder 12 is also arranged side by side (parallel) substantially horizontally. The partitioned work pieces 12 in this way become the control unit of the control means 4, and the energization of the core material 31 is controlled separately for each of the core materials 31. The metal holding means 2 arranged in parallel with the work piece holder 12 is connected by a swing frame 231 and transmits the swing motion caused by the swing portion 23 connected to the swing frame 231. The metal holding means 2 is along the first The direction shown by the arrow symbol a in FIG. 1 (that is, the direction perpendicular to the length direction of the metal holding means 2) swings back and forth. As the oscillating portion 23, a reciprocating motion transmitting mechanism generally used including a oscillating mechanism with a crank or the like can be used. In addition, one or both ends of the core material 31 in the work piece holder 12 are connected to the rotating portion 32, and the core material 31 uses the rotating portion 32 to make the rotation direction of the core material 31 the rotation axis. Rotate. The rotating portion 32 of this embodiment is a chain-like member connected to a drive motor, and rotates the core materials 31 arranged in parallel at the same speed. The rotation speed is usually preferably set in a range of 5 to 20 times / minute. In addition, the electroformed pool management device 5 provided in the metal ferrule manufacturing device 100 manages the temperature of the electroformed pool in the electrolytic cell 1 or the concentration of the electrolytic solution 11; the impurity removal device 6 is used for the electrolytic cell. The metal residue (10) (10) 200426249 or fine dust contained in the inner electroforming pool is removed. This impurity removing device 6 is provided with a mesh filtering means 61 and a dust removing means 62. Fig. 2 is a diagram illustrating a Π-Π cross-section of the metal ferrule manufacturing apparatus 100 shown in Fig. 1. As shown in FIG. 2, the electroforming tank 1 filled with the electrolyte 11 is closed by the top cover 16. The top cover 16 can prevent impurities such as dust from the outside from being mixed in, and can prevent evaporation of the electrolytic solution 11 and the like to keep the concentration of the electrolytic solution 11 at a certain concentration. The electroforming tank 1 is provided with a metal holding means 2, a core material 31 held by the core material holding means 3, a stirring pipe 13, a connection plate 15, and a circulation pipe 14. The electrolytic solution 11 in the electroforming tank 1 is often stirred to prevent local uneven concentration. Although it is explained here that the circulation pipe 14 is used for stirring, the electrolytic solution 11 may be stirred by a vane or the like provided in the electroforming tank 1, or the electrolytic solution 11 may be stirred using an ultrasonic generator. In addition, the electrolytic solution 11 is circulated through the electroforming cell management device 5 and the impurity removing device 6 through a circulation pipe 14 to manage the state (temperature, concentration) of the electrolytic solution 11 in the electroforming cell in the electrolytic cell 1. At the same time, impurities such as metal residues are removed. Specifically, the set electrolyte temperature is maintained to an error of 5 ° C, and it is better to maintain the error within the range of 21; the mesh filtering means 61 is from 0. 051 ~ 2 // m filter for high-speed filtration. The electroforming tank 1 is provided with one or two or more suction ports capable of sucking the electrolyte 11 into the circulation pipe 14 and a discharge port for discharging the electrolyte 11 from the circulation pipe 14. In addition, the stirring pipe 13 discharges the electrolytic solution 11 sent from the circulation pipe 14 to form a water flow to stir the electrolytic solution 11. In addition, the receiving pan 15 located below the stirring pipe 13 is an impurity precipitate that receives (11) (11) 200426249 contained in the electrolytic solution 11. In addition, the circulation speed of the electrolytic solution 11 is preferably smaller than the moving speed of the ions of the electrolytic deposition source metal 22 (for example, nickel ions in the electrolytic solution 11. If the moving speed of the metal ions is greater than the circulating speed of the electrolytic solution 11 In this case, the influence of the circulation of the electrolytic solution 11 on the movement of metal ions is small, so that the ion movement conditions between the metal holding means 2 and the core material 31 can be more uniform throughout the entire length of the core material 31. This configuration Among them, the metal holding means 2 is an anode connected to the power supply section 40 via the control means 4; the core material 31 is a current-carrying electrode 40b connected to the cathode of the power supply section 40 via the core material holding means 3 and the control means 4. The other end of 31 is similarly connected to the current-carrying electrode 40b of the cathode. In this way, the core material 31 is energized from both ends. The metal holding means 2 and the core material holding means 3 are arranged substantially horizontally. The distance d between them is substantially a certain distance over the entire length of the core material 31. Generally, the distance d is set to about 50 mm to 150 mm. To illustrate this positional relationship, a metal is illustrated in FIG. 3 maintain An exploded perspective view centered on the segment 2 and the control means 4. The metal holding means 2 shown here is a titanium mesh container 21, which can hold nickel particles 22a, which are considered as the source metal 22 for electrolytic deposition. Electrolysis The deposition source metal 22 is not limited to nickel, and may be another metal suitable for electrolytic deposition of a ferrule. The nickel particles 22a in this embodiment may also be nickel particles belonging to electrolytic nickel containing cobalt or the like. Sulfur-containing nickel may be used. Although the nickel particles 22a are placed in a titanium mesh container 21 that has been considered for the use of electric capacity, it does not cause residues (insoluble residues of electrolytic deposition source metals-14- (12) ( 12) 200426249) It is better to cover it with anode cover. Titanium mesh container 21 has a shape gradually narrowing toward the bottom when viewed in cross section, in other words it has a shape gradually narrowing toward core material 31. It is preferably formed in a shape such as a V-groove shape, a U-groove shape as shown in FIG. 3. When the shape is gradually narrowed toward the bottom, the electrolytic deposition in the titanium mesh container 21 is performed even if electrolytic deposition is performed. The source metal 22 is reduced, but electrolytic deposition often exists on the bottom of the titanium mesh container 21 The source metal 22, therefore, the elutriation position of the electrolytic deposition source metal 22 is always a certain position, so the distance between the front end edge portion of the electrolytic deposition source metal 22 and the core material 31 can always be maintained at a certain distance. The upper side of the titanium mesh container 21 (excluding the other parts of the bottom), specifically, if it is a V-groove, it is covered with an insulating material such as synthetic resin or rubber, which does not include the lower side of the two side walls 10% ~ An upper portion of about 30% is preferable. For example, a sheet made of an insulating material may be pasted on the outside of the upper portion at a distance of about 10 to 30% from the bottom of the bottom of the titanium mesh container 21. In addition, the titanium mesh The container 21 is reciprocated by a swinging portion 23 (refer to FIG. 1) in a direction of an arrow symbol a (that is, a direction perpendicular to the longitudinal direction of the metal holding means 2). Here, the titanium mesh container 21 is reciprocated along the horizontal plane by about 50 mm to 100 mm. Due to the wobbling of the titanium mesh container 21, the contact points of the nickel particles 22a are prevented from being fixed. The nickel particles 22a can be flattened throughout the entire length of the titanium mesh container 21, and as a result, the elutriation position of the nickel ions can be a certain position. In particular, the nickel particles 22a can be uniformly reduced with the progress of the electrolytic deposition, so that the change in the starting point of ion movement as the nickel particles 22a is reduced can be prevented, and the migration to the core material 31 can be prevented (13) (13) 200426249 Changes in moving nickel ion arrival conditions. In this way, if the elutriation position of nickel ions can be set to a certain position, the movement conditions of nickel ions until reaching the core material 31 can be uniformly distributed throughout the entire length of the core material, and the reduction of nickel ions reaching the core material 31 can be uniformly distributed Over the entire length of the core material. As a result, the electrolytic deposition conditions can be uniformly distributed over the entire length of the core material. The core material holding means 3 holds the core material 31 so as to be parallel to the titanium mesh container 21. The core material 31 is applied with a predetermined tension so as to be maintained in a substantially horizontal state. Specifically, the contact portions between the two ends of the core material 31 and the current-carrying electrodes 40a and 40b are fixed by winding. A single end is provided with an elastic body such as a spring and rubber, and a tension of about 2 kg is applied to the core material 31. Thereby, the core material 31 is maintained in a horizontal state without slackening, and the contact resistance of the core material 31 can be reduced. In addition, the contact resistance 値 of the contact portion is at 0.1. 〇1 Ω or less is preferred. In addition, the core material 31 is rotated around the extension direction of the shaft by being driven by the rotation portion 32. By this rotation, the roundness of the metal ferrule formed around the core material 31 can be improved, and an electrolytic deposition layer having an uniform outer diameter and surface roughness can be formed around the entire core material 31 at 360 °. _ Below the core material holding means 3, a stirring pipe 13 having a plurality of ejection outlets is arranged. The electrolytic solution 11 is sprayed from the discharge port, and the electrolytic solution 11 in the electroforming tank 1 is stirred. Further, a receiving plate 15 is arranged below the stirring pipe 13 to receive impurities such as residues settling down from the electrolytic solution 11 or occasionally dropped parts. . Next, the core material 31 to be electrolytically deposited will be described. The core material 31 is conductive, and its thickness can be formed by forming a linear core material according to the hole into which the ferrule optical fiber is to be inserted. Specifically, nickel or nickel -16- (14) (14) 200426249 alloy, iron or iron alloy, cobalt or cobalt alloy, tungsten or tungsten alloy can be used. As the core material 31, the length of the electroformed base material is preferably 200mm ~ 300mm, and its wire diameter is 0. 125mm ~ 0. 128mm is better. In this embodiment, a stainless steel wire is used, and SUS304 [made by Niken Co., Ltd.] is a high-precision SUS wire. The core 31 has a wire diameter of 0. 1260mm. The wire diameter of this core material 31 is of course determined appropriately depending on its use, and may also be determined by considering the target diameter of the final finishing process such as honing to be performed after electrolytic deposition. The electrolyte 11 to be immersed in the core material 31 is preferably determined according to the type of the metal of the electrolytic deposition source, and can be used: nickel sulfamate, nickel chloride, nickel sulfate, ferrous sulfamate, Ferrous Fluoroboride, Copper Pyrophosphate, Copper Sulfate, Cuprous Fluoroboride, Copper Fluorosilicate, Copper Titanium Fluoride, Copper Iron Alkane Sulfonate, Iron Cobalt Sulfate, Sodium Tungstate, Other Corresponding Compositions Electrolyte for metal of core material 31. For example, an electrolytic solution capable of being used for the electrolytic deposition of nickel can be used, and an electrolytic solution containing a nickel ion source and an anode etchant and a pΗ buffer can be used. Specifically, in this embodiment, a nickel sulfamate solution (manufactured by Nippon Chemical Industry Co., Ltd.) with a high purity of 60% is used. Next, the operation of the metal ferrule manufacturing apparatus configured as described above will be described. Nickel-containing ions are eluted from the nickel particles 22a immersed in the electrolytic solution 11, and nickel-containing ions (hereinafter referred to as nickel ions) are contained in the electrolytic solution 11. When the core material 31 connected to the negative electrode is started to be energized by the control means 4, nickel ions start to move toward the core material 31. At this time, the titanium mesh container 21 is parallel to the core material 31, and the titanium mesh container 21 and the core material 31 are arranged substantially horizontally in the direction of -17- (15) (15) 200426249. Therefore, the distance between the titanium mesh container 21 and the core material 31 is kept substantially the same distance over the entire length of the core material 31. Since the titanium mesh container 21 is swinging in the horizontal direction, the movement start point of the nickel ions is kept at a certain movement start point. Therefore, nickel ions re-elutriated from the nickel particles 22a in the titanium mesh container 21 will reach the surface of the core material 31 under the same conditions. On the other hand, since the core material 31 is rotating, the crystallization of nickel ions on the core material 31 occurs at an equal rate throughout the entire periphery of the core material 31, and an electrolytic deposition layer is formed on the entire periphery of the core material 31. Equally. The electrolytic deposit thus formed has the same diameter throughout its entire length, and the position of the core material 31 which becomes its center is a certain position. When the core material 31 is extracted from the electrolytic deposit, a wire diameter of 0 can be obtained. 126mm, more preferably 0. 0125mm metal ferrule with high coaxiality. The metal ferrule produced by the metal ferrule manufacturing apparatus 100 according to this embodiment has an outer diameter of 1mm ~ 3 mm, and its coaxiality is maintained at 0. 5 // Error below m. Next, operation control of the metal ferrule manufacturing apparatus 100 according to this embodiment will be described. The control means 4 shown in Fig. 4 is used to control the energization of the core material 31 of the ferrule manufacturing apparatus 100. This control means 4 operates the current-generating electrodes 40a and 40b at both ends of the core material 31 via the switching section 41. The two current-carrying electrodes 40a and 40b are connected to the cathode, and electrons flow in from both ends of the core material 31. By connecting both ends of the core material 31 to the cathode in this way, the current density c can be spread more evenly throughout the entire length of the core material 31. In addition, if only one end of the core material 31 is connected to the cathode, due to various important factors such as the resistance of the core material 31, the electrons and the electrolytic deposition source 22 that will flow into the core material 31 cannot be made of metal (16) (16) The distribution density of metal ions of 200426249 can be tightly and uniformly distributed throughout the entire length of the core material 31. For this reason, in this embodiment, the electrodes for electric conduction 40a, 40b connected to the cathode are provided at both ends of the core material 31. The above-mentioned control means 4 includes a core wire resistance reading section 42 capable of reading the core wire resistance of the core material 31; and based on the core wire resistance read out by the core wire resistance reading section 42, the electrolytic deposit formed around the core material 31 can be calculated. An electrolytic deposition layer calculation section 43 of the laminated thickness; and a current control section 44 that controls the energization of the core material 31 based on the electrolytic deposited layer thickness calculated by the electrolytic deposition layer calculation section 43. The above-mentioned core wire resistance reading section 42, The resistance measuring device 42a is connected to the core material 31, and the current control unit 44 is connected to the power supply means 40 for supplying power to the core material 31. The switching unit 41 can be switched to activate the core wire resistance reading section 42 capable of reading the core wire resistance of the core material 31, or to switch on the power supply means 40 for supplying power to the core material 31. The switching section 41 in this embodiment switches the core wire resistance reading section 42 at a timing designated in advance by a program to read the thickness of the electrolytic deposition layer formed around the core material 31. Specifically, the core resistance is read out at a long interval immediately after the start, and the core resistance is read out at a short interval as the electrolytic deposition layer gradually approaches a specified thickness. The switching performed by the switching unit 41 may be set to a different time interval as in this embodiment, but may be set to a constant time interval. The operation of the control means 4 having these structures will be described with reference to the flowchart in FIG. 5. In this embodiment, in order to enable the electrolytic deposition (17) (17) 200426249 formed on the core material 31 to be uniformly distributed throughout the entire length of the core material 31, the crystallization of nickel ions should be performed more regularly. Therefore, the current 値 of the current to be applied to the core material 31 is controlled in two stages. Here, the core material 31 is 0. 126mm S US 3 04 stainless steel wire. The source metal for electrolytic deposition is nickel. In addition, the outer diameter of the target metal ferrule is 1 mm, and the length of the core material to be processed is 200 mm to 300 mm. First, the control means will be activated at the same time as the start command is received from the outside (step 10). The command causes the power supply means 4 to start energizing the core material 31 with the first current (step 1 1). In the actual embodiment, the first current 値 is set to 1A / cm2, and the power is applied for about one hour after the start of the power. When the timer of the control means 4 reads that the specified time is 1 hour passed (step 12), the electrodeposition in the first current frame ends. Next, the energization performed with the second current 値 is performed until electrolytic deposition of a specified thickness is obtained. Here, the process is repeated in accordance with the switching of the switching unit 41. The start of the core wire resistance reading section 42 and the start of the current control section 44. Here, the first current 値 and the second current 値 will be described while referring to FIG. 6. Fig. 6 is a diagram showing a history of energization according to this embodiment, which shows the passage of time and the change in current 値. As shown in the figure, the energization is performed at the first current 1 one hour after the start of the energization, and the energization is performed at the second current 之后 after that. The result of the comparison is that to obtain an equal electrolytic deposition layer over the entire length of the core material 3 i, it is best to apply the current of 1A / cm2 as the first current for 1 hour, and then, (18) (18 200426249 The current is increased to 3A / cm2 as the second current 値, including energizing at 3A / cm2 for about 4 hours, that is, about 5 hours from the start of the current. The actual energization history is shown in FIG. 6. The first current 値 and the second current 値 are not absolute numbers 値, and these may be set to a current 値 having a predetermined range. In addition, in the process from the set current to the first current 値 and from the first current 値 to the second current ，, the current 变化 which changes into a step or wave shape is also included. Next, operations from Steps 13 to 13 will be described. First, the switching unit 41 is activated (step 13), and the current is stopped by the current control unit 44 to activate the core resistance reading unit 42. The core material resistance reading section 42 reads the core wire resistance of the core material 31 through the resistance measuring device 42a (step 14). Then, the electrodeposition layer calculation unit 43 calculates the thickness of the electrodeposition layer based on the core wire resistance 'read out by the core wire resistance reading unit 42. In addition, the calculation of the thickness of the electrodeposition layer is performed based on information about the core resistance 値 and the thickness of the electrodeposition layer that have been installed in the calculation circuit in advance (step 15. Then the electrodeposition layer calculation unit 43 'will judge the Whether the calculated thickness of the electrolytic deposition layer has reached the set thickness (step 16, when the set thickness is not reached, the switching section 41 will start, and the current control section 44 will follow its switching command (step 21)) to start The second current 値 is energized (step 2 2). On the other hand, when an electrodeposition layer having a set thickness is obtained, the energization of the core material 31 is ended (step 17). The switching section in step 13 41 is set in advance to start at different (gradually shorter from the beginning) time interval, but it can also be started at equal time intervals. In addition, in step 12, press (19) (19 200426249 Although the electrolytic deposition according to the first current 虽 is performed at a specified time ', it may be configured such that the electrolytic deposition according to the first current 値 is based on the core wire resistance reading section 42. Read core The resistance is applied in accordance with the thickness of the electrolytic deposition layer. That is, 'instead of step 12, the processes of steps 13 to 16 are performed. In this way, when executed according to this embodiment, the electrolytic deposition conditions can be made throughout the entire length of the core material. For uniformity, a ferrule with high coaxiality is produced while maintaining mass productivity. Next, another embodiment shown in FIG. 7 will be described. The example shown in FIG. 7 is the metal shown in FIG. 1 The ferrule manufacturing device 100 is arranged side by side in five rows (100-1 to 100-5) as a metal ferrule manufacturing device 200 which has improved its mass productivity. The metal ferrule manufacturing device 200 is provided with: An electroformed pool management device 5 that can centrally manage five electroformed tanks 1 (1-1 to 1-5), and an electroformed pool (1-1 to 1-5) that can remove these electrolytic cells 1. Impurity removing device 6. The electroformed pool management device 5 is provided with a heater or a concentration analysis device to maintain a constant temperature or concentration state of the electrolyte solution 11. The impurity removing device 6 is provided with a mesh filtering means 6 1 And dust removal means 62, which can remove micro particles generated during the electrolytic deposition process. Fine impurities. The metal ferrule manufacturing device (100-1 to 100-5) included in the metal ferrule manufacturing device 200 is the same in structure as the metal ferrule manufacturing device 100 previously described. 7 (b) As shown in the figure, the core material supporting means 3 (not shown in the figure) maintains the core material 31 horizontally through the electrodes 40a and 40b for energization. A metal holding means 2 is horizontally arranged at the position. The metal holding means 2 is held by the work piece (20) (20) 200426249. The gantry 12 is held in parallel with the electroforming tank 1 along the horizontal plane. The swinging portion 23 makes the swing The frame 23 1 swings to swing the metal holding means 2. With this, it is possible to produce metal ferrules with high coaxiality in a larger amount. The embodiments described above are examples described in order to facilitate the reader's understanding of the present invention, and are not examples described to limit the present invention. Therefore, each element and each number disclosed in the above embodiments also includes all design changes or equivalents belonging to the technical scope of the present invention. [Brief Description of the Drawings] Fig. 1 is an explanatory view showing an example of a metal ferrule manufacturing apparatus according to the present invention when viewed from a plane direction. Fig. 2 is an explanatory view when the metal ferrule manufacturing apparatus shown in Fig. 1 is viewed from the front. Fig. 3 is a partially exploded perspective view of the metal ferrule manufacturing apparatus shown in Fig. 1. Fig. 4 is a block diagram showing an example of a control-related configuration of the present invention. Fig. 5 is a flowchart for explaining an example of a control procedure of the control means of the present invention. FIG. 6 is an explanatory diagram illustrating a first current 値 and a second current 値. Fig. 7 is a diagram showing another example of this embodiment, Fig. 7 (a) is a plan view, and Fig. 7 (b) is a front view. [Illustration of drawing number] 1: Electroforming cell, electrolytic cell-23- (21) (21) 200426249 2: Metal holding means 3: Core material holding means 4: Control means 5: Electroforming cell management device 6: Impurity removing device 11: Electrolyte 1 2: Work piece holder 13: mn mmm® 14: Recycling piping 15: Tray 1 6: Top cover 2 1: Titanium mesh container 22 = Electrolytic deposition source metal 22a: Nickel particles 23: Swing Section 31: Core material 32: Rotating section 40: Power supply means 40a: Current-supplying electrode 40b: Current-supplying electrode 41: Switching section 42: Core resistance reading section 42a: Resistance tester 43: Electrolytic deposition layer thickness -24- (22) (22) 200426249 44: Current control unit 6 1 · Mesh filtering means 62: Dust removal means 100: Metal ferrule manufacturing device 200: Metal ferrule manufacturing device 231: Swing frame 1 ~ 1-5 · Electroforming tank 100-1 ~ 100-5: Metal ferrule manufacturing device a: Swing direction c: Current density d: Distance I: Current 値 t: Time S10 ~ Sn: Step 10 ~ Step 17 S21 ~ S22: Step 21 ~ Step 22