200420916 五、發明說明（l) 發明所屬之技術領域 本發明係有關於彩色濾光片及其製作方法，特 於可改善串音現象的彩色濾光片及其製作方法。 先前技術 液晶顯示器（liquid crystal display，以下巧稱 LCD)是目前平面顯示器發展的主流，其顯示原理是利用液 晶分子所具有的介電異方性及導電異方性，於外加電場日^ 使液晶分子的排列狀態轉換，造成液晶薄膜產生各 == 效應。 寬 液晶顯示器的面板結構一般為由兩片基板疊合而成， <瞻 中間留有一定距離的空隙用以灌注液晶，而在上下兩基板 上刀別形成有對應電極’用以控制液晶分子的轉向及排 列。 一般薄膜電晶體（Thin Film Transistor ; TFT)液晶 顯示器的面板’由一片設置有薄膜電晶體陣列的TFT陣列 基板及一片設置有彩色濾光膜層的彩色濾光片所組成，以 下說明彩色濾光片的詳細結構。 請參照第1圖，說明一般彩色濾光片的結構。彩色濾 光片的基本結構為於一玻璃基板201上，先製作一防反射 ‘ 的黑矩陣202 (black matrix，BM)，接著再依序製作可透 光之紅203、綠204、藍205 (RGB)三原色的彩色濾光膜層 (彩色濾光膜層的形狀、尺寸、色澤、配列依不同用途的 液晶顯示器而異），最後再濺鍍上一層電極層2 〇 6，其材200420916 V. Description of the invention (l) Technical field to which the invention belongs The present invention relates to a color filter and a method for manufacturing the same, particularly to a color filter capable of improving a crosstalk phenomenon and a method for manufacturing the same. The prior art liquid crystal display (hereinafter referred to as LCD) is the mainstream of current flat display development. Its display principle is to use the dielectric anisotropy and conductive anisotropy of liquid crystal molecules to apply an electric field to the liquid crystal. ^ The arrangement state of the molecules is changed, which causes each of the == effects in the liquid crystal film. The panel structure of a wide liquid crystal display is generally formed by stacking two substrates. ≪ A certain distance is left in the middle to fill the liquid crystal, and corresponding electrodes are formed on the upper and lower substrates to control the liquid crystal molecules. Steering and alignment. The panel of a general thin film transistor (TFT) liquid crystal display is composed of a TFT array substrate provided with a thin film transistor array and a color filter provided with a color filter film layer. The color filter is described below. Detailed structure of the tablet. The structure of a general color filter will be described with reference to FIG. 1. The basic structure of a color filter is a glass substrate 201. First, an anti-reflection black matrix 202 (black matrix, BM) is produced, and then transparent red 203, green 204, and blue 205 ( RGB) three primary colors of color filter film (the shape, size, color, and arrangement of the color filter film vary according to the liquid crystal display of different purposes), and finally a layer of electrode layer 206 is sputtered.
.Q773-9235TWF(N1) ;P91170; renee. ptd 200420916 五、發明說明（2) = :氧化銦錫，1T0)，以作為薄膜 卷扳上畫素電極的對應電極。 為全面尺寸方向發展之㉟，由於電極層206 亦代表彩色：ί 濾光片基板201上，大尺寸的面板 , ^ k光膜層上方形成畫素電極層206的面積愈 C no 致電阻值愈大’此時訊號容易受干擾、雜訊^ © σ e等而造成衰減，引發串音現象，導致顯示時書 面口口質不良，影響良率。 一 發明内容 現象有ϊ ΐ ί ’本發明的目的在於改善液晶顯示器的串音 現象，並提升顯示畫面品質。 甲曰 電極iiif目的’本發明藉由降低彩色濾光片基板上方 =層：電阻值，使訊號傳送時不易因干 哀減，進而避务窜立相备 ^ ^ e ^ m 升面板的良率。 善顯示時的畫面品質’並提 所描2降，形色渡光片基板上方電極層的電阻值，本發明 片包括：-透明基板一遮光矩陣區二 =明基板上，遮光矩陣區係由複數條相互平行且朝 $方向延伸之第-遮光線與複數條相 向延伸之第二遮光線所組成一方 鄰二第二遮光線中間形成欠弟一遮光線與相 取 _人篁素區（subpixei); 一 :二濾光區一形成於上述次畫素區；一電極層形成於透明基 板上’至 > 一絕4線形成於電極層上，其下方對應於遮光.Q773-9235TWF (N1); P91170; renee. Ptd 200420916 V. Description of the invention (2) =: Indium tin oxide, 1T0), as the corresponding electrode of the pixel electrode on the film roll. For the development of the overall size direction, since the electrode layer 206 also represents color: On the filter substrate 201, a large-sized panel, the area where the pixel electrode layer 206 is formed over the ^ k light film layer, the more C no, the more the resistance value At this time, the signal is easily attenuated by interference and noise ^ © σ e, etc., which will cause attenuation, cause crosstalk phenomenon, cause poor quality of the written mouth when displaying, and affect the yield. SUMMARY OF THE INVENTION The phenomenon is as follows: The objective of the present invention is to improve the crosstalk phenomenon of a liquid crystal display and to improve the display picture quality. A. The purpose of the electrode iiif 'is to reduce the upper layer of the color filter substrate = layer: resistance value, which makes it difficult to reduce the signal transmission due to dryness, so as to avoid the problem of ^^ e ^ m panel yield . The picture quality of the display is good, and the resistance value of the electrode layer above the substrate of the light-transmitting sheet is described. The sheet of the present invention includes:-a transparent substrate-a light-shielding matrix area 2 = on a bright substrate, and the light-shielding matrix area is formed by A plurality of first and second light-shielding lines which are parallel to each other and extend in the direction of $ and a plurality of second light-shielding lines which extend opposite to each other form one adjacent two second light-shielding lines to form an inferior light-shielding line and phase taking_ 人 篁 素 区 (subpixei ); One: two filter areas are formed in the above-mentioned sub-pixel area; an electrode layer is formed on the transparent substrate 'to> a four-line is formed on the electrode layer, and the lower part thereof corresponds to light shielding
200420916 五、發明說明（3) " " - -------- 矩陣區，以及一導電線形成於絕緣線上方，其長度較絕緣· 線長’且延伸至絕緣線兩端以與電極層連接。 上述彩色濾光片的製作方法，包括··提供一透明基 板；形成一遮光矩陣區於上述透明基板上，此遮光矩陣區 係由複數條相互平行且朝第一方向延伸之第一遮光線與複 數條相互平行且朝第二方向延伸之第二遮光線所組成，且 於相鄰二第一遮光線與相鄰二第二遮光線中間形成一次畫 素區（subpixei);形成一彩色濾光區於上述次畫素旦 區；形成一電極層於透明基板上；形成至少一絕緣線於電 極層上’其下方對應於遮光矩陣區；以及形成一導電線於 絕緣線上方，其長度較絕緣線長，且延伸至絕緣線兩端以丨_ 與電極層連接。 根據本發明，上述絕緣線下方係對應於該遮光矩陣區 之第一遮光線；上述導電線可為鉻、鋁或鋁鈥；電極層與 畫素電極的材質並無限定，較佳為氧化銦錫（丨τ〇)或氧化 銦鋅（ΙΖ0 )。 根據本發明，上述彩色據 一步包含複數條絕緣線，分別 方；並可進一步包含複數條導 遮光線之上方。 根據本發明之彩色濾光片 光片的結構設計，亦即藉由在 一額外的導電線，此導電線並 緣線與電極層隔絕，以與電極 光片或液晶顯示器面板可進 對應於該等第一遮光線之上 電線，分別對應於該等第一 及其製作方法，透過彩色濾 遮光線的對應上方形成至少 經由一長度較導電線短的絕 層形成一並聯的電路，可降200420916 V. Description of the invention (3) " "--------- The matrix area and a conductive wire are formed above the insulated wire, its length is longer than the insulated wire length, and it extends to both ends of the insulated wire to Connected to the electrode layer. The manufacturing method of the color filter includes: providing a transparent substrate; forming a light-shielding matrix region on the transparent substrate, the light-shielding matrix region is formed by a plurality of first light-shielding lines parallel to each other and extending in a first direction; A plurality of second light-shielding lines that are parallel to each other and extend in the second direction, and form a subpixelei between the adjacent two first light-shielding lines and the adjacent two second light-shielding lines; forming a color filter Forming an electrode layer on the transparent substrate; forming at least one insulating line on the electrode layer; the lower portion thereof corresponds to the light-shielding matrix area; and forming a conductive line above the insulating line, the length of which is more insulating The wire is long and extends to both ends of the insulated wire to be connected to the electrode layer. According to the present invention, the first light-shielding line corresponding to the light-shielding matrix area is below the insulated wire; the conductive wire may be chromium, aluminum, or aluminum; the material of the electrode layer and the pixel electrode is not limited, and indium oxide is preferred Tin (丨 τ〇) or indium zinc oxide (IZ0). According to the present invention, the above-mentioned color data includes a plurality of insulated wires in one step, respectively; and may further include a plurality of above the light-shielding wires. According to the structural design of the color filter light sheet of the present invention, that is, by an additional conductive line, the conductive line and the edge line are isolated from the electrode layer so as to be in correspondence with the electrode light sheet or the liquid crystal display panel. The wires above the first light-shielding line correspond to the first and their manufacturing methods, respectively. A parallel circuit is formed through the corresponding upper portion of the color filter light-shielding line through at least one insulation layer that is shorter than the conductive line.
200420916 五、發明說明（4) 3 電線下方對應電極層的電阻’而藉由電極層整體 $阻：降低’可使訊號傳送時不易因干擾、雜訊而造成衰 滅丄進而避免串音現象，改善顯示時的畫面品質，並 面板的良率。 、 為了讓本發明之上述目的、特徵和優點更明顯易懂， 下文特舉出較佳實施例，並配合所附圖示，作詳細說明如 下· 實施方式 實施例 ^動陣列某扼的擊祚 · 第2圖係顯示本實施例TFT一LCD主動陣列基板之上視 圖0 如第2圖所示，首先在如為玻璃的一基底〇上，形成閘 極線3 0 0、3 0 1、閘極3 1 2。接著，形成一閘極絕緣層（未 顯示）於基底〇上。其中閘極線3 〇 〇、3 〇 1與閘極3 1 2例如是 金屬層’閘極絕緣層例如是二氧化矽層、氮化矽（s丨Ν χ)層 或氮氧化矽層。 接者形成a-Si層（在η+ύ：-Si層313下方，未顯示）與 n+ a -S i層3 1 3於部分閘極絕緣層上，以構成位在電晶體區 jp 310 的一半導體島（〇；-Si semiconductor island)。 接著形成資料線400、401、源極316與一汲極314，如 此即構成了 一薄膜電晶體（TFT)結構，其中源極31 6係與資 料線4 0 0電性連接。200420916 V. Description of the invention (4) 3 The resistance of the corresponding electrode layer under the wire 'and the overall resistance of the electrode layer: reduce' can make the signal transmission difficult to decay due to interference, noise, and thus avoid crosstalk, Improve the picture quality during display and the yield of the panel. In order to make the above-mentioned objects, features, and advantages of the present invention more comprehensible, the following describes the preferred embodiments and the accompanying drawings in detail to explain as follows: Figure 2 shows the top view of the TFT-LCD active array substrate of this embodiment. As shown in Figure 2, firstly, a gate line 3 0 0, 3 0 1 is formed on a substrate 0, such as glass. Pole 3 1 2. Next, a gate insulating layer (not shown) is formed on the substrate 0. The gate lines 300, 301, and 3 1 2 are, for example, metal layers. The gate insulating layer is, for example, a silicon dioxide layer, a silicon nitride (snN) layer, or a silicon oxynitride layer. The a-Si layer (below the η + ύ: -Si layer 313, not shown) and the n + a -S i layer 3 1 3 are formed on a part of the gate insulating layer to form a transistor located in the transistor region jp 310. -A semiconductor island (0; -Si semiconductor island). Then, data lines 400, 401, a source electrode 316, and a drain electrode 314 are formed, thus forming a thin film transistor (TFT) structure, where the source electrode 316 is electrically connected to the data line 400.
200420916200420916
接著全面性形成一透明光阻層（未顯示 面’並於對應汲極314上方形成一接觸孔3〇7 3 1 4表面。 於基板0表 以露出汲極 最後，形成畫素電極8 01於畫素區3〇6上。畫 8 0 1的材質例如為氧化銦錫。書辛 f 屯極801經由接觸孔307 與及極314形成電性連接。 彩...色濾光i的製作 彩色濾光片有許多製作方法，如顏料分散法、 法、電著法、印刷法等。以下舉顏料分散法為{列，說明本 實施例中彩色濾光片的製程。參照第3A〜3L圖， 濾光片的製作流程。 也月知色 如第3Α圖，首先提供一玻璃基板〇，，並在其上形 遮光層701，其材質例如為金屬鉻或黑色感光樹脂，接 如第3 Β圖，利用微影餘刻形成矩陣圖案7 〇 1，，稱為絜矩 陣，作為遮光之用，並用以分隔接續製作的彩^濾=芦， 以增進色彩的對比性。第3 C圖顯示矩陣圖荦了 〇 1， 圖，矩陣圖細，包含有複數條相互平=縱=之 第-遮先線701a與複數條相互平行且朝橫向延伸之第二遮 光線mb所組成’且於相鄰兩第—遮光線7〇la與相鄰兩第 二遮光線701b中間形成一次晝素區。 其次依序製作紅、藍、綠三原色的濾光畫素。首先如 第3D圖’利用旋塗方式在基板〇’表面形成一紅色顏料光阻 702，接著如第3E圖，以曝光顯影的方式，在預定形成紅Then, a transparent photoresist layer (the surface not shown) is formed comprehensively and a contact hole 3007 3 1 4 surface is formed above the corresponding drain electrode 314. On the substrate 0 surface to expose the drain electrode, finally, a pixel electrode 8 01 is formed. The pixel area 306. The material for drawing 801 is, for example, indium tin oxide. Shu Xin f Tun pole 801 forms an electrical connection with the pole 314 through the contact hole 307. Color ... color filter i making color There are many manufacturing methods of the filter, such as pigment dispersion method, method, electronic writing method, printing method, etc. The pigment dispersion method is listed below as {column, to describe the process of color filter in this embodiment. Refer to Figures 3A to 3L The manufacturing process of the filter. As shown in Figure 3A, a glass substrate 0 is provided first, and a light-shielding layer 701 is formed on the glass substrate. The material is, for example, metal chromium or black photosensitive resin, and is connected as described in Section 3B. In the figure, a lithographic matrix pattern 7 〇1 is used to form a matrix pattern, which is called a 絜 matrix, which is used for shading and is used to separate the successively made color filters = reed to improve the contrast of colors. Figure 3C shows the matrix The figure shows 〇1, the figure, the matrix diagram is thin, and contains a plurality of pieces that are flat to each other = vertical = The first-first shading line 701a is formed by a plurality of second light-shielding lines mb parallel to each other and extending in the lateral direction, and forms a diurnal element between the adjacent two first-light-shielding lines 70a and the two adjacent second light-shielding lines 701b. The second step is to make the red, blue, and green primary color filter pixels in sequence. First, as shown in Figure 3D, a red pigment photoresist 702 is formed on the surface of the substrate 0 by spin coating, and then exposed and developed as shown in Figure 3E. Way to form red on schedule
200420916 五、發明說明（6) 色畫素的次畫素區留下紅色顏料光阻7〇2，並去除其餘位 置的紅色顏料光阻。如第3F圖，以同樣方式，依序於基板 0’表面，分別在黑矩陣701分隔的次畫素區7〇lc中形成藍 色703與綠色704的濾光畫素。彩色濾光片中畫素的排列位 置並不限定，紅、綠、藍三色可以馬赛克方式、直條式或 三角形等形式排列。 、工/ 如第3G圖，接著在基板〇’表面覆蓋一層透明的平括層 705，最後如第3H圖，再於平坦層705表面形成一層電極層 706，其材質一般為透明導電膜，例如為17〇或丨如，用以曰 驅動液晶分子的排列。之後進行本發明之一關鍵步驟· 於電極層7 0 6上形成一層絕緣層，其材質為如二氧化 矽、氮化矽。之後再於此絕緣層上形成一層光阻（未圖二 )，並經一道微影蝕刻製程，剝除光阻後於電極層7 〇 6上τ 形成一絕緣層圖案707’ ，如第31圖。絕緣層圖案7〇7，為 至少一條絕緣線70 7, ’所組成，在本實施例中此絕緣線、、、由 707’’的位置下方對應於矩陣圖案7〇1，中的第一遮光線 701a，但亦可對應於第二遮光線70 lb，或同時對應於第一 遮光線701a及第二遮光線701b。 〜、一 接著製作覆蓋在絕緣線707, ’上方的導電線。首先、 電極層70 6上形成一層導電層708，其材質為如鉻、銘或%呂 鉉。之後再於此導電層708上形成一層光阻（未顯示，、呂 並經一道微影蝕刻製程，剝除光阻後形成一導電層圖案 70 8’ ，如第3J圖。導電層圖案708，係由覆蓋於絕緣線、 7 0 7’，上方的至少一導電線7〇8,，組成，根據本發明，浐200420916 V. Description of the invention (6) The red pixel photoresist 702 is left in the sub-pixel area of the color pixel, and the red pigment photoresist in the remaining positions is removed. As shown in FIG. 3F, in the same manner, on the surface of the substrate 0 ', filter pixels of blue 703 and green 704 are formed in the sub-pixel regions 70lc separated by the black matrix 701, respectively. The arrangement position of the pixels in the color filter is not limited, and the three colors of red, green, and blue can be arranged in the form of a mosaic, a bar, or a triangle. As shown in Fig. 3G, a transparent covering layer 705 is then covered on the surface of the substrate 0 '. Finally, as shown in Fig. 3H, an electrode layer 706 is formed on the surface of the flat layer 705. The material is generally a transparent conductive film, such as It is 17 or such as to drive the alignment of liquid crystal molecules. Then, a key step of the present invention is performed. An insulating layer is formed on the electrode layer 706, and the material is, for example, silicon dioxide or silicon nitride. After that, a photoresist is formed on the insulating layer (not shown in FIG. 2), and after a photolithographic etching process, the photoresist is stripped to form an insulating layer pattern 707 'on the electrode layer 70, as shown in FIG. 31. . The insulating layer pattern 707 is composed of at least one insulating line 70 7, '. In this embodiment, the position of the insulating line 704 is corresponding to the first light shielding in the matrix pattern 701'. Line 701a, but may also correspond to the second light-shielding line 70 lb, or to both the first light-shielding line 701a and the second light-shielding line 701b. ~,-Next, a conductive wire is formed over the insulated wire 707, '. First, a conductive layer 708 is formed on the electrode layer 70 6. The conductive layer 708 is made of, for example, chromium, aluminum, or aluminum. Then, a photoresist is formed on the conductive layer 708 (not shown, Lu Bing undergoes a lithographic etching process, and the photoresist is removed to form a conductive layer pattern 70 8 ′, as shown in FIG. 3J. The conductive layer pattern 708, Is composed of at least one conductive wire 708, covering an insulated wire, 7 0 ', and according to the present invention,
五、發明說明（7) 線707’，/導電線7〇8，，的長戶 於電極層706上方形成至少二數量並未限定，其因只需 708’’ ，即可達降低電極層=邑緣線70 7’，/導電線 70 7’ ’/導電線708,，的長^及電^卩且的功效，而絕緣線 效降低電極層70 6的電阻Γ本^ ^以長、多更佳，可更有 遮光線70 1 a上方對應形成絕貫$例之設計為於所有第一 上視圖如第3K圖所示。 、線70 7,，/導電線708,，，其 本實施例中絕緣線與導 驟所製作，然而亦可於同一轉Ϊ係利用個別的微影蝕刻步 第3L圖顯示第3K圖中沿 j /鄉τ I作 絕緣線707,，/導電線708,，的 一遮光線7(Ha方向切割 7〇8’ ’的長度較絕緣線7()7，，長，Θ，如，所不，導電線 螅7 η 7，，λ # ·、，λ & 1 „ ' 且其兩端分別延伸至絕緣 綠兩端以與電極層70 6遠桩，二f丄、 7 η 7，，工山* 逆接而形成一以絕緣線 707 兩端為接點的並聯電路，可队& & P电格，可降低電極層7 0 6原始電阻 c e 1 1製裎 接著，如一般液晶顯不器面板製程，進行彩色濾光片 基板0’與TFT-LCD主動陣列基板〇的對準及貼合步驟，使每 一晝素區3 0 6上方分別對應有一彩色濾光區7 〇 2、7 〇 3、 704 〇 最後，再於貼和後的液晶顯示器面板内灌注液晶3， 封口後即元成本貫施例液晶顯示器面板，其部分剖面圖如 第4圖所示。V. Description of the invention (7) The number of long-distance lines 707 ', / conductive lines 708 ,, formed at least two above the electrode layer 706 is not limited, because only 708' 'can be used to reduce the electrode layer = The elongation line 70 7 ′, / the conductive line 70 7 ′ ′ / the conductive line 708, ′ has a long ^ and electrical efficiency, and the insulation line effect reduces the resistance of the electrode layer 70 6. More preferably, the design above the light-shielding line 70 1 a correspondingly forms an absolute example is shown in FIG. 3K in all the first top views. , Line 70 7 ,, / conductive line 708 ,, which is made by insulated wires and steps in this embodiment, but can also use individual lithography etching steps in the same transition system. Figure 3L shows the edges in Figure 3K. j / township τ I is an insulated wire 707 ,, / conductive wire 708 ,, a light-shielding wire 7 (Ha direction cutting 708 '' is longer than the insulated wire 7 () 7, ,, Θ, as , Conductive wire 螅 7 η 7 ,, λ # · ,, λ & 1 „'and its two ends respectively extend to the ends of the insulating green to be far away from the electrode layer 70 6, two f 丄, 7 η 7, * Connected in reverse to form a parallel circuit with insulated wire 707 at both ends as a contact, which can form an & P grid, which can reduce the electrode layer 7 0 6 original resistance ce 1 1 system. Device panel process, the alignment and bonding steps of the color filter substrate 0 ′ and the TFT-LCD active array substrate 0 are performed, so that a color filter area 7 〇2, 7 above each day element area 3 06 corresponds to 〇3, 704 〇Finally, the liquid crystal display panel 3 is filled with the liquid crystal display panel after the paste. After sealing, the liquid crystal display panel is implemented in a cost-effective manner. 4 shown in FIG.
0773-9235TW(Nl) ;P91170; renee. ptd 第11頁 200420916 五、發明說明（8) ________ 如上述，本發明之〜 遮光線的對應上方 > 私色濾光片及其製作方法，藉由在 經由一長度較導雷成至夕—額外的導電線’此導電線並 層形成一並聯的電路 的絕緣線與電極層隔絕，以與電極 的電阻，而藉ώ曾k ’可降低上述導電線下方對應電極層 m ^电極Μ赴SUL， 不易因干擾、雜訊而1 、二電阻的降低，可使訊號傳送時 顯示時的畫面品皙，成衰減，進而避免串音現象，改盖 g4 ^ I,貝並提升面板的良率。 〇 W發明已以較佳實施例揭露如上，然苴 發明，任何熟習此技藝者，在不脫“發明= 和靶圍内，當可作些許之更動與潤飾，因 精砷 範圍當視後附之申請專利範圍所界定者為準發明之保護 <1 0773-9235TWF(Nl);P91170;renee.ptd 第12頁 200420916 圖式簡單說明 第1圖係顯示一習知彩色濾光片的結構。 第2圖係顯示本發明實施例TFT-LCD主動陣列基板之上 視圖。 第3 A〜3L·圖係顯示本發明實施例彩色濾光片的製程。 第4圖顯示本發明實施例液晶顯示器面板之部分剖面 圖0 符號說明 0、0，' 2 (Π〜基板； 400、401〜資料線； 3 0 7〜接觸孔； 310〜電晶體區， 313〜n+ a -Si 層； 3 1 6〜源極電極； 203、70 2〜紅色濾光 2 0 4、7 0 4〜綠色滤光 2 0 5、7 0 3〜藍色濾光 206〜透明導電膜； 7 0 Γ〜矩陣圖案； 701b〜第二遮光線； 7 0 5〜平坦層； 7 0 7 ’〜絕緣層圖案； 708〜導電層； 7 0 8 ’’〜導電線。 300 306 801 312 314' 202 膜層 膜層 、3 0 1〜閘極線 畫素區； 畫素電極； 閘極； 汲極； 、701〜遮光層 膜層 3〜液晶， 701a〜第一遮光線 7 0 1 c〜次晝素區； 7 0 6〜電極層； 7 0 7 ’’〜絕緣線； 708’〜導電層圖案0773-9235TW (Nl); P91170; renee. After a long length of lightning, an extra conductive line is used, 'the conductive line is layered to form a parallel circuit. The insulated wire is isolated from the electrode layer to resist the electrode resistance. The corresponding electrode layer m ^ electrode M below the line goes to SUL, which is not easy to reduce the resistance of 1 and 2 due to interference and noise, which can make the picture displayed during signal transmission fair, attenuate, and avoid crosstalk. g4 ^ I, and improve the yield of the panel. 〇WThe invention has been disclosed as above with a preferred embodiment. However, the invention, anyone who is familiar with this skill can make some changes and retouching without "invention = and the target range. What is defined by the scope of the patent application is the protection of the quasi-invention < 1 0773-9235TWF (Nl); P91170; renee.ptd page 12 200420916 The figure briefly illustrates the first figure which shows the structure of a conventional color filter. Fig. 2 is a top view of a TFT-LCD active array substrate according to an embodiment of the present invention. Figs. 3 A to 3L. Fig. 3 is a process showing a color filter according to an embodiment of the present invention. Fig. 4 is a liquid crystal display panel according to an embodiment of the present invention. Partial sectional view 0 Symbol description 0, 0, '2 (Π ~ substrate; 400, 401 ~ data line; 3 0 7 ~ contact hole; 310 ~ transistor region, 313 ~ n + a-Si layer; 3 1 6 ~ Source electrode; 203, 70 2 ~ red filter 2 0 4, 7 0 4 ~ green filter 2 0 5, 7 0 3 ~ blue filter 206 ~ transparent conductive film; 7 0 Γ ~ matrix pattern; 701b ~ Second light-shielding line; 705 ~ flat layer; 708 '~ insulating layer pattern; 708 ~ conductive layer; 708' '~ conductive Electric wire. 300 306 801 312 314 '202 film layer film layer, 3 0 1 ~ gate line pixel area; pixel electrode; gate electrode; drain electrode; 701 ~ light-shielding layer film layer 3 ~ liquid crystal, 701a ~ first Light-shielding line 7 0 1 c ~ subdiurnal zone; 70 6 ~ electrode layer; 7 0 7 '' ~ insulated wire; 708 '~ conductive layer pattern
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